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21. 发明授权

US08043969B2 Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08043969B2
公开(公告)日：2011-10-25
申请号：US12827347
申请日：2010-06-30
申请人： Hidekazu Miyairi , Koichiro Tanaka , Hironobu Shoji , Shunpei Yamazaki
发明人： Hidekazu Miyairi , Koichiro Tanaka , Hironobu Shoji , Shunpei Yamazaki
IPC分类号： H01L21/461
CPC分类号： H01L27/1288 , H01L21/0337 , H01L21/3086 , H01L21/32139 , H01L27/1214 , H01L29/66765 , H01L29/78633
摘要： A first layer is formed over a substrate, a light absorbing layer is formed over the first layer, and a layer having a light-transmitting property is formed over the light absorbing layer. The light absorbing layer is selectively irradiated with a laser beam via the layer having a light-transmitting property. When the light absorbing layer absorbs energy of the laser beam, due to emission of gas that is within the light absorbing layer, or sublimation, evaporation, or the like of the light absorbing layer, a part of the light absorbing layer and a part of the layer having a light-transmitting property in contact with the light absorbing layer are removed. By using the remaining part of the layer having a light-transmitting property or the remaining part of the light absorbing layer as a mask and etching the first layer, the first layer can be processed into a desired shape.
摘要翻译：第一层形成在衬底上，在第一层上形成光吸收层，并且在光吸收层上形成具有透光性的层。通过具有透光性的层，用激光束选择性地照射光吸收层。当光吸收层吸收激光束的能量时，由于光吸收层内的气体的发射或者光吸收层的升华，蒸发等，一部分光吸收层和除去与光吸收层接触的透光性的层。通过使用具有透光性的层的剩余部分或光吸收层的剩余部分作为掩模，并蚀刻第一层，可以将第一层加工成所需的形状。

22. 发明申请

US20110183500A1 MANUFACTURING METHOD OF MEMORY ELEMENT, LASER IRRADIATION APPARATUS, AND LASER IRRADIATION METHOD 有权
标题翻译：存储元件的制造方法，激光辐射装置和激光辐照方法
公开(公告)号：US20110183500A1
公开(公告)日：2011-07-28
申请号：US13080812
申请日：2011-04-06
申请人： Koichiro TANAKA , Hirotada OISHI
发明人： Koichiro TANAKA , Hirotada OISHI
IPC分类号： H01L21/20 , H01L21/31
CPC分类号： H01L27/1266 , B23K26/066 , B23K26/067 , B23K26/0676 , G03F7/70316 , G03F7/70383 , H01L21/31144 , H01L21/84 , H01L27/11226 , H01L27/11293 , H01L27/1214 , H01L27/13
摘要： A method for rapidly performing laser irradiation in a desired position as laser irradiation patterns are switched is proposed. A laser beam emitted from a laser oscillator is entered into a deflector, and a laser beam which has passed through the deflector is entered into a diffractive optical element to be diverged into a plurality of laser beams. Then, a photoresist formed over an insulating film is irradiated with the laser beam which is made to diverge into the plurality of laser beams, and the photoresist irradiated with the laser beam is developed so as to selectively etch the insulating film.
摘要翻译：提出了一种用于在激光照射图案切换期间快速执行所需位置的激光照射的方法。从激光振荡器发射的激光束被输入到偏转器中，并且已经穿过偏转器的激光束被输入到衍射光学元件中以分散成多个激光束。然后，用激光束照射形成在绝缘膜上的光致抗蚀剂，该激光束发散到多个激光束中，并且用激光束照射的光致抗蚀剂被显影以选择性地蚀刻绝缘膜。

23. 发明授权

US07983311B2 Signal detection device and signal detection method 有权
标题翻译：信号检测装置及信号检测方法
公开(公告)号：US07983311B2
公开(公告)日：2011-07-19
申请号：US12298375
申请日：2007-04-23
申请人： Shuya Hosokawa , Naganori Shirakata , Koichiro Tanaka , Kenji Miyanaga , Koji Imamura
发明人： Shuya Hosokawa , Naganori Shirakata , Koichiro Tanaka , Kenji Miyanaga , Koji Imamura
IPC分类号： H04J3/00
CPC分类号： H04W56/0085 , H04L7/042 , H04L25/0224 , H04L27/261 , H04L27/2662 , H04W28/06 , H04W56/00
摘要： A correlation unit (32) sequentially obtains correlation values between a baseband signal and a reference signal and outputs the obtained reference signal to a section division unit (33). The output of the correlation unit (32) is divided into symbol time periods by the section division unit (33). A section position detection unit (34) detects a largest correlation value in each of sections resulting from the division by the correlation unit (32) and outputs, to a synchronization judgment unit (35), first position information that indicates a relative position of each detected largest correlation value. The synchronization judgment unit (35) detects an arrival of a packet signal and estimates a symbol timing based on the first position information of the sections.
摘要翻译：相关单元（32）顺序地获得基带信号和参考信号之间的相关值，并将获得的参考信号输出到区段划分单元（33）。相关单元（32）的输出由区段划分单元（33）分成符号时间段。区间位置检测单元（34）检测由相关单元（32）分割得到的每个区间中的最大相关值，并向同步判断单元（35）输出表示每个区域的相对位置的第一位置信息检测到最大相关值。同步判断单元（35）检测分组信号的到达，并基于各部分的第一位置信息来估计符号定时。

24. 发明申请

US20110117859A1 WIRELESS COMMUNICATION DEVICE, WIRELESS COMMUNICATION METHOD, PROGRAM, AND INTEGRATED CIRCUIT 审中-公开
标题翻译：无线通信设备，无线通信方法，程序和集成电路
公开(公告)号：US20110117859A1
公开(公告)日：2011-05-19
申请号：US13054093
申请日：2009-07-15
申请人： Koichiro Tanaka , Akihiko Shiotsuki
发明人： Koichiro Tanaka , Akihiko Shiotsuki
IPC分类号： H04W24/04 , H04W72/12
CPC分类号： H04W28/22
摘要： A first wireless communication device (1) performs wireless communication with a second wireless communication device (2) which is connected via a wireless network. More specifically, the first wireless communication device (1) includes a wireless communication unit which transmits and receives a wireless signal, and a transmission rate controlling unit which controls the second wireless communication device (2) so that a transmission rate of a wireless signal, which is transmitted by the second wireless communication device (2) and received by a wireless transmission and reception unit, becomes constant.
摘要翻译：第一无线通信设备（1）与经由无线网络连接的第二无线通信设备（2）执行无线通信。更具体地，第一无线通信装置（1）包括发送和接收无线信号的无线通信单元和控制第二无线通信装置（2）的传输速率控制单元，使得无线信号的传输速率，由第二无线通信装置发送并被无线发送接收部接收的信息变得不变。

25. 发明授权

US07929154B2 Laser irradiation apparatus and laser irradiation method and method for manufacturing semiconductor device 有权
标题翻译：激光照射装置及激光照射方法及半导体装置的制造方法
公开(公告)号：US07929154B2
公开(公告)日：2011-04-19
申请号：US11640394
申请日：2006-12-18
申请人： Koichiro Tanaka , Yoshiaki Yamamoto
发明人： Koichiro Tanaka , Yoshiaki Yamamoto
IPC分类号： G01B11/14
CPC分类号： B23K26/0853 , B23K26/04 , B23K26/0738 , G03F9/7088 , H01L21/02675 , H01L21/2026
摘要： The present invention provides a laser irradiation apparatus and a laser irradiation method which can conduct irradiation of a laser beam accurately by correcting misalignment of an irradiation position of the laser beam from the predetermined position due to temperature change. A laser irradiation apparatus includes a laser oscillator emitting a laser beam; an XY stage provided with an irradiation object; an optical system which shapes the laser beam into a linear beam on a surface of the irradiation object provided on the XY stage; an illumination device which emits light to the surface of the irradiation object; and a camera for imaging reflected light of the light on the surface of the irradiation object, in which misalignment of an irradiation position of the linear beam detected from the reflected light imaged by the camera is corrected.
摘要翻译：本发明提供一种激光照射装置和激光照射方法，该激光照射装置和激光照射方法能够通过校正由于温度变化导致的来自预定位置的激光束的照射位置的偏移而精确地进行激光束的照射。激光照射装置包括发射激光束的激光振荡器; 设置有照射物体的XY台阶; 光学系统，其将激光束成形为设置在XY台上的照射物体的表面上的线性光束; 向照射物体的表面发光的照明装置; 以及用于对照射物体的表面上的光的反射光进行成像的相机，其中从由照相机成像的反射光检测到的线性光束的照射位置的未对准被校正。

26. 发明授权

US07920611B2 Laser apparatus, laser irradiation method, and manufacturing method of semiconductor device 有权
标题翻译：激光装置，激光照射方法以及半导体装置的制造方法
公开(公告)号：US07920611B2
公开(公告)日：2011-04-05
申请号：US12000814
申请日：2007-12-18
申请人： Hidekazu Miyairi , Akihisa Shimomura , Tamae Takano , Masaki Koyama , Koichiro Tanaka
发明人： Hidekazu Miyairi , Akihisa Shimomura , Tamae Takano , Masaki Koyama , Koichiro Tanaka
IPC分类号： H01S3/13 , H01S3/22
CPC分类号： H01S3/131 , B23K26/702
摘要： It is an object to provide a laser apparatus, a laser irradiating method and a manufacturing method of a semiconductor device that make laser energy more stable. To attain the object, a part of laser beam emitted from an oscillator is sampled to generate an electric signal that contains as data energy fluctuation of a laser beam. The electric signal is subjected to signal processing to calculate the frequency, amplitude, and phase of the energy fluctuation of the laser beam. The transmittance of a light amount adjusting means is controlled in order that the transmittance changes in antiphase to the phase of the energy fluctuation of the laser beam and with an amplitude capable of reducing the amplitude of laser beam emitted from the oscillator, the control being made based on the phase difference between the phase of a signal that is in synchronization with oscillation of laser beam emitted from the oscillator and the phase calculated, on the energy ratio of the sampled laser beam to laser beam emitted from the oscillator, and on the frequency and amplitude calculated. In the light amount adjusting means, energy of the laser beam oscillated from the oscillator energy is adjusted.
摘要翻译：本发明的目的是提供使激光能更稳定的半导体器件的激光装置，激光照射方法和制造方法。为了达到该目的，从振荡器发射的激光束的一部分被采样以产生包含作为激光束的数据能量波动的电信号。对信号进行信号处理，计算激光束的能量波动的频率，振幅和相位。控制光量调节装置的透射率，以便透射率与激光束的能量波动的相位相反，并且能够减小从振荡器发射的激光束的振幅的振幅，进行控制基于与从振荡器发射的激光束的振荡同步的信号的相位与计算的相位之间的相位差相对于从采样的激光束到从振荡器发射的激光束的能量比，以及频率并计算振幅。在光量调节装置中，调整从振荡器能量振荡的激光束的能量。

27. 发明授权

US07919726B2 Laser irradiation apparatus, laser irradiation method, and method for manufacturing a semiconductor device 有权
标题翻译：激光照射装置，激光照射方法以及半导体装置的制造方法
公开(公告)号：US07919726B2
公开(公告)日：2011-04-05
申请号：US10721075
申请日：2003-11-26
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： B23K26/00
CPC分类号： B23K26/0732 , B23K26/0736 , B23K26/0738 , G03B27/48
摘要： It is an object to provide a laser irradiation apparatus for enlarging an area of a beam spot and reducing a proportion of a region with low crystallinity. It is also an object to provide a laser irradiation apparatus for enhancing throughput with a CW laser beam. Furthermore, it is an object to provide a laser irradiation method and a method for manufacturing a semiconductor device with the laser irradiation apparatus. A region melted by a first pulsed laser beam having harmonic is irradiated with a second CW laser beam. Specifically, the first laser beam has a wavelength of visible light or a shorter wavelength than that of visible light (approximately not more than 830 nm, preferably, not more than 780 nm). Since the first laser beam melts a semiconductor film, an absorption coefficient of the second laser beam to the semiconductor film increases drastically and thereby being more absorbable.
摘要翻译：本发明的目的是提供一种激光照射装置，用于扩大光斑的面积并减少低结晶度的区域的比例。本发明的另一个目的是提供一种激光照射装置，用于通过CW激光束增强产量。此外，其目的在于提供一种激光照射方法及其制造方法。由具有谐波的第一脉冲激光束熔化的区域被第二CW激光束照射。具体地说，第一激光束具有可见光波长或比可见光波长短（大约不大于830nm，优选不大于780nm）。由于第一激光束熔化半导体膜，所以第二激光束对半导体膜的吸收系数急剧增加，从而更可吸收。

28. 发明授权

US07892952B2 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment 有权
标题翻译：激光装置，激光照射方法，半导体装置的制造方法，半导体装置，使用该激光装置的半导体装置的制造系统以及电子设备
公开(公告)号：US07892952B2
公开(公告)日：2011-02-22
申请号：US11185737
申请日：2005-07-21
申请人： Shunpei Yamazaki , Hisashi Ohtani , Masaaki Hiroki , Koichiro Tanaka , Aiko Shiga , Mai Akiba
发明人： Shunpei Yamazaki , Hisashi Ohtani , Masaaki Hiroki , Koichiro Tanaka , Aiko Shiga , Mai Akiba
IPC分类号： H01L21/477
CPC分类号： H01L21/02683 , B23K26/0604 , B23K26/0608 , B23K26/082 , B23K2101/007 , H01L21/02691 , H01L21/2026 , H01L27/1285
摘要： Provided are a laser apparatus of continuous oscillation that is capable of enhancing the efficiency of substrate processing, a laser irradiation method, and a manufacturing method for a semiconductor device using the laser apparatus. A portion of a semiconductor film that should be left on a substrate after patterning is grasped in accordance with a mask. Then, a portion to be scanned with a laser light is determined so that it is possible to crystallize at least the portion to be obtained through the patterning. Also, a beam spot is made to strike the portion to be scanned. As a result, the semiconductor film is partially crystallized. That is, with the present invention, the laser light is not scanned and irradiated onto the entire surface of a semiconductor film but is scanned so that at least an indispensable portion is crystallized. With the construction described above, it becomes possible to save a time taken to irradiate the laser light onto a portion that will be removed through the patterning after the crystallization of the semiconductor film.
摘要翻译：提供能够提高基板处理效率的连续振荡的激光装置，激光照射方法以及使用该激光装置的半导体装置的制造方法。根据掩模掌握在图案化之后留在基板上的半导体膜的一部分。然后，确定要用激光扫描的部分，使得可以通过图案化至少使待获得的部分结晶。此外，使光束点撞击要扫描的部分。结果，半导体膜部分结晶。也就是说，利用本发明，激光不被扫描并照射到半导体膜的整个表面上，而是被扫描，使得至少不可缺少的部分结晶化。利用上述结构，可以将半导体膜结晶后的激光照射到通过图案化去除的部分上所花费的时间。

29. 发明申请

US20110027918A1 INSPECTION METHOD AND MANUFACTURING METHOD OF LIGHT-EMITTING DEVICE 有权
标题翻译：发光装置的检测方法和制造方法
公开(公告)号：US20110027918A1
公开(公告)日：2011-02-03
申请号：US12841394
申请日：2010-07-22
申请人： Koichiro TANAKA
发明人： Koichiro TANAKA
IPC分类号： H01L21/66 , G01N21/00
CPC分类号： H01L51/0031 , G09G3/006 , G09G3/3208 , H01L51/5278 , H01L51/56 , H01L2251/568
摘要： In a light-emitting element provided with a thick layer of a plurality of EL layers which are partitioned by a charge generation layer between a pair of electrodes, a portion which a conductive foreign substance enters between the pair of electrodes emits stronger light at a voltage lower than a voltage required when a normal portion starts emitting light. In a light-emitting element provided with a plurality of EL layers which are partitioned by a charge generation layer between a pair of electrodes, a voltage may be applied thereto in the forward direction. Then, an abnormal light-emission portion may be detected because the portion emits light at a luminance of 1 (cd/m2) or higher when the applied voltage is lower than a voltage required when a normal portion starts emitting light. The portion may be irradiated with laser light so as to be insulated.
摘要翻译：在设置有由一对电极之间的电荷产生层隔开的多个EL层的厚层的发光元件中，导电异物进入一对电极之间的部分在电压下发射更强的光低于正常部分开始发光时所需的电压。在具有由一对电极之间的电荷产生层分隔开的多个EL层的发光元件中，可以向前方施加电压。然后，当施加的电压低于正常部分开始发光所需的电压时，该部分以1（cd / m2）或更高的亮度发光，可以检测异常发光部分。该部分可以用激光照射以被绝缘。

30. 发明申请

US20100323504A1 LASER IRRADIATION APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：激光辐照装置及制造半导体器件的方法
公开(公告)号：US20100323504A1
公开(公告)日：2010-12-23
申请号：US12852636
申请日：2010-08-09
申请人： Koichiro TANAKA , Yoshiaki YAMAMOTO
发明人： Koichiro TANAKA , Yoshiaki YAMAMOTO
IPC分类号： H01L21/20 , H01L21/26
CPC分类号： H01L21/02683 , B23K26/0738 , B23K26/082 , B23K26/0821 , B23K26/0853 , H01L21/02532 , H01L21/02686 , H01L21/2026 , H01L21/268 , H01L27/1285 , H01L27/3244 , H01L27/3295 , H01L51/5253
摘要： It is an object of the present invention to provide a laser irradiation apparatus being able to irradiate the irradiation object with the laser beam having homogeneous energy density without complicating the optical system. The laser irradiation apparatus of the present invention comprises a laser oscillator, an optical system for scanning repeatedly a beam spot of the laser beam emitted from the laser oscillator in a uniaxial direction over the surface of the irradiation object, and a position controlling means for moving the position of the irradiation object relative to the laser beam in a direction perpendicular to the uniaxial direction.
摘要翻译：本发明的目的是提供一种激光照射装置，其能够用具有均匀能量密度的激光束照射照射物体，而不会使光学系统复杂化。本发明的激光照射装置包括激光振荡器，用于在照射物体的表面上沿单轴方向重复扫描从激光振荡器发射的激光束的光点的光学系统，以及用于移动的位置控制装置照射对象相对于激光束在垂直于单轴方向的方向上的位置。

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