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    • 46. 发明授权
    • MR head offset correction method and magnetic disk certifier
    • MR磁头偏移校正方法和磁盘验证器
    • US5998994A
    • 1999-12-07
    • US15249
    • 1998-01-29
    • Kyoichi Mori
    • Kyoichi Mori
    • G11B5/012G11B5/48G11B5/56G11B27/36G11B33/10G11B5/596
    • G11B5/4886G11B27/36G11B33/10G11B5/012G11B5/56
    • A test data is written in an arbitrary point p on a non-linear characteristics portion of a hysteresis characteristics of a piezo actuator by a write head and the written test data is read out by an MR head using the point p as a reference to detect a maximum read-out voltage to thereby obtain a drive voltage of the piezo actuator corresponding thereto. From the drive voltage of the piezo actuator thus obtained, a position of the MR head whose offset is to be corrected is detected. In a magnetic disk certifier, the position of the MR head is corrected by applying the drive voltage corresponding to the maximum read-out voltage to the piezo actuator and the written test data is read out thereby. Thus, the position of the MR head on the piezo actuator becomes that of the write head when the offset correction value is detected and it becomes possible to correct the offset of the MR head with respect to the write head.
    • 测试数据通过写入头写在压电致动器的滞后特性的非线性特性部分上的任意点p上,并且使用点p作为参考由MR头读出写入的测试数据,以检测 最大读出电压,从而获得对应于其的压电致动器的驱动电压。 根据这样获得的压电致动器的驱动电压,检测要校正其偏移的MR头的位置。 在磁盘验证器中,通过将对应于最大读出电压的驱动电压施加到压电致动器来校正MR磁头的位置,从而读出写入的测试数据。 因此,当检测到偏移校正值时,MR头在压电致动器上的位置成为写入头的位置,并且可以相对于写入头校正MR头的偏移。
    • 48. 发明授权
    • Disk drive and method for minimizing shock-induced damage
    • 磁盘驱动器和减少冲击引起的损坏的方法
    • US5982573A
    • 1999-11-09
    • US168805
    • 1993-12-15
    • Richard H. Henze
    • Richard H. Henze
    • G01P15/00G11B5/54G11B19/04G11B19/20G11B21/12G11B25/04G11B33/08G11B33/10G11B33/14G11B21/02G11B15/04
    • G11B5/54G11B19/04G11B19/20G11B33/08G11B33/10G11B5/5582G11B5/59694
    • A disk drive has a fall detection control system that detects when a disk drive is in a free fall, and takes precautionary protective action to minimize physical damage from any resulting shock upon impact. The disk drive includes an accelerometer device that measures acceleration of the disk drive along three mutually orthogonal axes x, y, and z and resolves the measurement into respective vectors a.sub.x, a.sub.y, and a.sub.z. In one embodiment, a processor is programmed to (1) compute a net acceleration a.sub.net of the disk drive, (2) compare the net acceleration a.sub.net with the selected acceleration threshold level, (3) measure a duration that the net acceleration a.sub.net exceeds the acceleration threshold level, (4) compare the measured duration with a selected reference time period, and (5) output the warning signal when the measured duration exceeds the reference time period. Upon receipt of the warning signal, a controller initiates protective routines in preparation for shock.
    • 磁盘驱动器具有检测控制系统,该系统检测磁盘驱动器何时处于自由落体状态,并采取预防性保护措施,以减少因冲击而产生的任何冲击的物理损坏。 磁盘驱动器包括加速度计装置,其测量沿着三个相互正交的轴线x,y和z的磁盘驱动器的加速度,并且将测量值解析为相应的矢量ax,ay和az。 在一个实施例中,处理器被编程为(1)计算磁盘驱动器的网络加速度,(2)将网络加速度anet与所选择的加速度阈值水平进行比较,(3)测量网络加速度超过 加速度阈值电平,(4)将测量的持续时间与所选参考时间段进行比较;(5)当测量持续时间超过参考时间时,输出警告信号。 一旦接收到警告信号,控制器启动保护程序以准备冲击。
    • 50. 发明授权
    • Method for making bump disks
    • 制造碰撞盘的方法
    • US5951880A
    • 1999-09-14
    • US877100
    • 1997-05-26
    • Chun-Jen ChenMing-Hung SuJoseph C-C HungJames Hsi-Tang Lee
    • Chun-Jen ChenMing-Hung SuJoseph C-C HungJames Hsi-Tang Lee
    • G11B5/60G11B23/00G11B33/10B44C1/22
    • G11B5/6005G11B23/0021G11B33/10
    • A wet etching method for making calibration bump disks for use in providing quality control of production run magnetic hard disks is disclosed. It includes the steps of: (a) coating a layer of bump material on a substrate; (b) coating a photoresist layer on the layer of bump material; (c) exposing the photoresist layer to a light source under a photomask; (d) developing the photoresist layer using a developer solution to form an undeveloped photoresist layer; (e) etching the substrate containing the layer of bump material and the undeveloped photoresist layer to remove portions of the layer of bump material not covered by the undeveloped photoresist layer; and (f) stripping the undeveloped photoresist layer to leave at least a bump on the substrate which was originally covered by the undeveloped photoresist layer. The wet etching method eliminates many of the problems observed from the conventional metal mask method, including the elimination of the convex-shaped bump surface.
    • 公开了一种用于制造用于提供生产运行磁性硬盘的质量控制的校准凸块的湿式蚀刻方法。 它包括以下步骤:(a)在衬底上涂覆一层凸块材料; (b)在凸块材料层上涂覆光致抗蚀剂层; (c)在光掩模下将光致抗蚀剂层曝光于光源; (d)使用显影剂溶液显影光致抗蚀剂层以形成未显影的光致抗蚀剂层; (e)蚀刻含有凸起材料层和未显影光致抗蚀剂层的基板以去除未被未显影光致抗蚀剂层覆盖的凸起材料层的部分; 和(f)剥离未显影的光致抗蚀剂层,以至少留下最初被未显影的光致抗蚀剂层覆盖的基底上的凸块。 湿蚀刻方法消除了从传统的金属掩模方法观察到的许多问题,包括消除凸形凸起表面。