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    • 55. 发明申请
    • METHOD FOR THE CONTROLLED GROWTH OF A GRAPHENE FILM
    • 石墨膜的控制生长方法
    • US20110198313A1
    • 2011-08-18
    • US13124413
    • 2009-10-16
    • Laurent BaratonCostel-Sorin CojocaruDidier Pribat
    • Laurent BaratonCostel-Sorin CojocaruDidier Pribat
    • B05D5/12B05D3/10B05D3/06B05D3/02C23C14/48C23C14/58B32B37/14B32B38/10
    • C23C16/26C23C16/0281C23C16/56C30B25/02C30B29/02
    • The invention relates to a controlled graphene film growth process characterized in that it comprises the following steps: the production on the surface of a substrate (S1) of a layer of a metal having with carbon a phase diagram such that above a molar concentration threshold ratio CM/CM+CC, where CM is the molar metal concentration in a metal/carbon mixture and CC is the molar carbon concentration in said mixture, a homogeneous solid solution is obtained; the exposure of the metal layer to a controlled flux of carbon atoms or carbon-containing radicals or carbon-containing ions at a temperature such that the molar concentration ratio obtained is greater than the threshold ratio so as to obtain a solid solution of carbon in the metal; and an operation for modifying the phase of the mixture into two phases, a metal phase and a graphite phase respectively, leading to the formation of at least a lower graphene film (31) located at the (metal layer incorporating carbon atoms)/substrate interface and an upper graphene film (30) at the surface of the metal layer.
    • 本发明涉及一种受控石墨烯薄膜生长方法,其特征在于其包括以下步骤:在具有碳的金属层的基底(S1)的表面上生产相图,使得高于摩尔浓度阈值比 CM / CM + CC,其中CM是金属/碳混合物中的摩尔金属浓度,CC是所述混合物中的摩尔碳浓度,获得均匀的固溶体; 在使所获得的摩尔浓度比大于阈值比的温度下将金属层暴露于受控的碳原子或含碳基团或含碳离子的流量,从而获得碳的固溶体 金属; 以及分别将金属相和石墨相改变为两相的相的操作,导致至少形成位于(含有碳原子的金属层)/基板界面的至少一个下部石墨烯膜(31) 和在金属层表面的上部石墨烯膜(30)。
    • 59. 发明申请
    • Nanostructures including a metal
    • 纳米结构包括金属
    • US20100291408A1
    • 2010-11-18
    • US12009579
    • 2008-01-18
    • Hyungsoo Choi
    • Hyungsoo Choi
    • B32B15/02B32B15/01
    • C30B25/02B82Y30/00C30B29/02C30B29/605Y10T428/12993Y10T428/24917Y10T428/26
    • One embodiment includes non-catalyticly forming a nanowire on a substrate from an organometallic vapor without application of any type of reduction agent. The nanowire is grown during this formation in a direction away from the substrate and is freestanding during growth. The nanowire has a first dimension of 500 nanometers or less and a second dimension extending from the substrate to a free end of the nanowire at least 10 times greater than the first dimension. In one form, the organometallic vapor includes copper and the nanowire essentially consists of elemental copper, a copper alloy, or oxide of copper. Alternatively or additionally, the nanowire is of a monocrystalline structure.
    • 一个实施方案包括在不施加任何类型的还原剂的情况下从有机金属蒸气在衬底上非催化形成纳米线。 纳米线在这种形成过程中沿远离基底的方向生长,并且在生长期间是独立的。 纳米线具有500纳米或更小的第一尺寸和从基底延伸到纳米线的自由端的第二尺寸比第一尺寸大至少10倍。 在一种形式中,有机金属蒸汽包括铜,并且纳米线基本上由元素铜,铜合金或铜的氧化物组成。 或者或另外,纳米线是单晶结构的。
    • 60. 发明授权
    • Method of manufacturing carbon nanostructure
    • 制造碳纳米结构的方法
    • US07785558B2
    • 2010-08-31
    • US11587212
    • 2005-01-28
    • Takeshi Hikata
    • Takeshi Hikata
    • D01F9/12D01F9/127C09C1/56C23C16/00
    • C30B29/02B01J23/8906B01J23/8913B01J23/8993B01J35/06B82Y30/00B82Y40/00C01B32/162C30B25/02Y10S977/742
    • The present invention relates to a method of manufacturing a carbon nanostructure for growing crystalline carbon by vapor deposition from a crystal growth surface of a catalytic base including a catalytic material, and in particular, to a method of manufacturing a carbon nanostructure where at least two gases including a feedstock gas are brought into contact with the catalytic base simultaneously. Preferably, the at least two gases are constituted by at least one feedstock gas and at least one carrier gas. Preferably, the carrier gas is brought into contact with the crystal growth surface, and the feedstock gas is brought into contact with at least a part of a region except for the crystal growth surface with which the carrier gas has been brought into contact. Preferably, the material gas contains an ion, and further preferably, it contains a carbon ion.
    • 本发明涉及一种制造碳纳米结构的方法,所述碳纳米结构用于通过气相沉积从包括催化材料的催化剂基底的晶体生长表面生长结晶碳,特别涉及一种制造碳纳米结构的方法,其中至少两种气体 包括原料气体同时与催化底物接触。 优选地,至少两种气体由至少一种原料气体和至少一种载气构成。 优选地,使载气与晶体生长表面接触,并且使原料气体与除载体气体已经接触的晶体生长表面以外的区域的至少一部分接触。 优选地,原料气体含有离子,进一步优选含有碳离子。