会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 64. 发明授权
    • Method for forming transistor of semiconductor device
    • 半导体器件晶体管形成方法
    • US07651923B2
    • 2010-01-26
    • US11730614
    • 2007-04-03
    • Young Man ChoSeung Wan Kim
    • Young Man ChoSeung Wan Kim
    • H01L21/76
    • H01L29/1037H01L21/28123H01L21/31053H01L21/76224H01L29/66621
    • A method for forming a transistor of a semiconductor device, includes forming a trench by etching a semiconductor substrate on which a pad oxide film and a pad nitride film are sequentially formed; forming a isolation oxide film by filling the trench with oxide; removing an upper portion of the isolation oxide film until an upper lateral portion of the semiconductor substrate is exposed; forming a barrier nitride film over the isolation oxide film, the semiconductor substrate, and the pad nitride film; forming a sacrificial oxide film over the barrier nitride film; performing a planarization process until the pad nitride film is exposed; performing a wet etching process until the active region is exposed; forming a photoresist pattern over the active region and the barrier nitride film; and performing a dry etching process by using the photoresist pattern as an etching mask, thereby forming a recessed gate trench.
    • 一种用于形成半导体器件的晶体管的方法,包括通过蚀刻半导体衬底来形成沟槽,半导体衬底上依次形成衬垫氧化物膜和衬垫氮化物膜; 通过用氧化物填充沟槽来形成隔离氧化膜; 去除隔离氧化膜的上部直到半导体衬底的上侧部分露出; 在隔离氧化膜,半导体衬底和衬垫氮化物膜上形成阻挡氮化物膜; 在阻挡氮化物膜上形成牺牲氧化膜; 进行平坦化处理直到衬垫氮化物膜露出为止; 执行湿式蚀刻工艺,直到有源区域暴露; 在有源区和阻挡氮化物膜上形成光致抗蚀剂图案; 并通过使用光致抗蚀剂图案作为蚀刻掩模进行干蚀刻处理,从而形成凹陷栅沟槽。
    • 66. 发明授权
    • Internal voltage generator for use in semiconductor memory device
    • 用于半导体存储器件的内部电压发生器
    • US07646652B2
    • 2010-01-12
    • US11647401
    • 2006-12-29
    • Sang-Jin Byeon
    • Sang-Jin Byeon
    • G11C5/14
    • G11C5/14
    • An internal voltage generator stably supplies an internal voltage in a semiconductor device. The internal voltage generator includes: a first internal voltage generating means for supplying a first internal voltage which has a level corresponding to a first reference voltage using an external voltage; a second internal voltage generating means for supplying a second internal voltage which has a level corresponding to a second reference voltage using the external voltage; and a third internal voltage generating means for supplying a third internal voltage which has a level corresponding to a third reference voltage generated based on the first internal voltage, using the second internal voltage as a power source.
    • 内部电压发生器稳定地提供半导体器件中的内部电压。 内部电压发生器包括:第一内部电压产生装置,用于使用外部电压提供具有对应于第一参考电压的电平的第一内部电压; 第二内部电压产生装置,用于使用外部电压提供具有对应于第二参考电压的电平的第二内部电压; 以及第三内部电压产生装置,用于使用第二内部电压作为电源来提供具有与基于第一内部电压产生的第三参考电压相对应的电平的第三内部电压。
    • 68. 发明授权
    • One-transistor type dram
    • 单晶体管式
    • US07630262B2
    • 2009-12-08
    • US12003923
    • 2008-01-03
    • Hee Bok KangJin Hong AnSung Joo HongSuk Kyoung Hong
    • Hee Bok KangJin Hong AnSung Joo HongSuk Kyoung Hong
    • G11C7/02
    • G11C11/404G11C11/4091G11C11/4096G11C11/4099G11C2211/4016
    • A one-transistor type DRAM includes a floating body storage element connected between a bit line and a source line and controlled by a word line. The DRAM comprises a plurality of source lines and word lines arranged in a row direction, a plurality of bit lines arranged in a column direction, a plurality of reference bit lines arranged in a column direction, a cell array including the floating body storage element and formed in a region where the source line, the word line and the bit line are crossed, a reference cell array including the floating body storage element, formed in a region where the source line, the word line and the bit line are crossed and configured to output a reference current having a plurality of levels, a plurality of reference voltage generating units connected to the reference bit lines and configured to generate a plurality of reference voltages corresponding to the reference current having a plurality of levels, and a sense amplifier and a write driving unit connected to the bit line and configured to receive the plurality of reference voltages.
    • 单晶体管型DRAM包括连接在位线和源极线之间并由字线控制的浮体存储元件。 DRAM包括沿行方向布置的多个源极线和字线,沿列方向布置的多个位线,沿列方向布置的多个参考位线,包括浮体存储元件的单元阵列和 形成在源极线,字线和位线交叉的区域中,形成在源极线,字线和位线交叉配置的区域中的包括浮体存储元件的基准单元阵列 输出具有多个电平的参考电流;多个参考电压产生单元,连接到参考位线并被配置为产生与具有多个电平的参考电流相对应的多个参考电压;以及读出放大器和 写入驱动单元连接到位线并被配置为接收多个参考电压。
    • 69. 发明授权
    • Delay locked loop in semiconductor memory device and method for generating divided clock therein
    • 半导体存储器件中的延迟锁定环和其中产生分频时钟的方法
    • US07629822B2
    • 2009-12-08
    • US12078095
    • 2008-03-27
    • Kyoung-Nam KimTae-Yun Kim
    • Kyoung-Nam KimTae-Yun Kim
    • H03L7/06
    • G11C7/1072G11C7/222
    • Provided are a delay locked loop (DLL) and a method for generating a divided clock therein. In the DLL, a width of a reference frequency for phase comparison can be changed depending on a magnitude of an operating frequency. In the DLL, a clock buffer receives a clock equal to an external clock and generates an internal clock. An enable clock generator generates a 1-period enable clock or a 2-period enable clock using a command signal generated for performing a predefined operation. The command signal is generated according to an address command signal inputted from an exterior. A clock divider divides the internal clock to generate a divided clock. The divided clock is controlled by the 1-period enable clock or the 2-period enable clock, such that the divided clock is made to be a 1-period based dividing clock or a 2-period based dividing clock.
    • 提供了一种延迟锁定环(DLL)和用于在其中产生分频时钟的方法。 在DLL中,用于相位比较的参考频率的宽度可以根据工作频率的大小而改变。 在DLL中,时钟缓冲器接收等于外部时钟的时钟并产生内部时钟。 使能时钟发生器使用为执行预定义的操作生成的命令信号生成1周期使能时钟或2周期使能时钟。 根据从外部输入的地址指令信号生成指令信号。 时钟分频器分隔内部时钟以产生分频时钟。 分频时钟由1周期使能时钟或2周期使能时钟控制,使得分频时钟为1周期分频时钟或2周期分频时钟。
    • 70. 发明授权
    • Semiconductor memory device
    • 半导体存储器件
    • US07629821B2
    • 2009-12-08
    • US11987834
    • 2007-12-05
    • Seok-Bo Shim
    • Seok-Bo Shim
    • H03L7/06
    • H03L7/0812H03L7/0818
    • A semiconductor memory device includes a phase comparator, a delay chain, a delay controller, a fine delay chain, a delay model, a locking state detector, and a fine delay controller. The phase comparator compares a phase of a reference clock with that of a feedback clock. The delay chain delays and outputs the reference clock. The delay controller controls a delay value of the delay chain in response to the comparison result of the phase comparator. The fine delay chain outputs a delay value of a clock outputted from the delay chain. The delay model delays a clock to a modeled delay value to provide a delayed clock as the feedback clock. The locking state detector generates a locking variation signal corresponding to a phase difference between the reference clock and the feedback clock. The fine delay controller controls a fine adjustment value of the fine delay chain.
    • 半导体存储器件包括相位比较器,延迟链,延迟控制器,精细延迟链,延迟模型,锁定状态检测器和精细延迟控制器。 相位比较器将参考时钟的相位与反馈时钟的相位进行比较。 延迟链延迟并输出参考时钟。 响应于相位比较器的比较结果,延迟控制器控制延迟链的延迟值。 精细延迟链输出从延迟链输出的时钟的延迟值。 延迟模型将时钟延迟到建模延迟值,以提供延迟时钟作为反馈时钟。 锁定状态检测器产生对应于参考时钟和反馈时钟之间的相位差的锁定变化信号。 精细延迟控制器控制精细延迟链的精细调整值。