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61. 发明授权

US07476629B2 Beam irradiation apparatus, beam irradiation method, and method for manufacturing thin film transistor 有权
标题翻译：光束照射装置，光束照射方法以及薄膜晶体管的制造方法
公开(公告)号：US07476629B2
公开(公告)日：2009-01-13
申请号：US10827402
申请日：2004-04-20
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： H01L21/00
CPC分类号： H01L21/02691 , B23K26/066 , B23K26/08 , B23K26/082 , B23K26/0821 , H01L21/02683 , H01L21/2026 , H01L27/12 , H01L27/1285 , H01L29/66757 , H01L29/78675
摘要： The speed of the laser scanned with the scanning means such as a galvanometer mirror or the polygon mirror is not constant in the center portion and in the end portion of the scanning width. As a result, the object to be irradiated is irradiated with the excessive energy and thereby there is a risk that the amorphous semiconductor film may be peeled.In the case of scanning the spot of the energy beam output continuously with the scanning means, the present invention is to block the CW beam irradiated to the regions in the object to be irradiated where the scanning speed of the spot accelerates, decelerates, and it becomes zero, that is to say, when the spot is in the position where the scanning starts and in the position where the scanning ends.
摘要翻译：用扫描装置如电流计镜或多面镜扫描的激光的速度在扫描宽度的中央部分和末端部分中不是恒定的。结果，被照射的物体被过量的能量照射，从而存在非晶半导体膜可能被剥离的危险。在用扫描装置扫描能量束输出的点的情况下，本发明是阻止照射到被照射物体中的区域的CW光束，其中点的扫描速度加速，减速，并且也就是说，当光点处于扫描开始的位置和扫描结束的位置时。

62. 发明申请

US20080318398A1 Method for manufacturing crystalline semiconductor film and semiconductor device 有权
标题翻译：制造晶体半导体膜和半导体器件的方法
公开(公告)号：US20080318398A1
公开(公告)日：2008-12-25
申请号：US11892968
申请日：2007-08-28
申请人： Tomoaki Moriwaka , Koichiro Tanaka
发明人： Tomoaki Moriwaka , Koichiro Tanaka
IPC分类号： H01L21/20
CPC分类号： H01L21/02532 , H01L21/02683 , H01L21/02686 , H01L21/02691 , H01L27/1285 , H01L29/4908
摘要： There is provided a method for manufacturing a crystalline semiconductor film. An insulating film is formed over a substrate; an amorphous semiconductor film is formed over the insulating film; a cap film is formed over the amorphous semiconductor film; the amorphous semiconductor film is scanned and irradiated with a continuous wave laser beam or a laser beam with a repetition rate of greater than or equal to 10 MHz, through the cap film; and the amorphous semiconductor film is melted and crystallized. At that time, an energy period in a length direction in a laser beam spot of the laser beam is 0.5 μm to 10 μm, preferably, 1 μm to 5 μm; an energy distribution in a width direction in a laser beam spot of the laser beam is a Gaussian distribution; and the amorphous semiconductor film is scanned with the laser beam so as to be irradiated with the laser beam for a period of greater than or equal to 5 microseconds and less than or equal to 100 microseconds per region.
摘要翻译：提供一种制造结晶半导体膜的方法。在基板上形成绝缘膜; 在绝缘膜上形成非晶半导体膜; 在非晶半导体膜上形成盖膜; 通过盖膜扫描并照射具有大于或等于10MHz的重复率的连续波激光束或激光束的非晶半导体膜; 并使非晶半导体膜熔融并结晶。此时，激光束的激光束点的长度方向的能量周期为0.5μm〜10μm，优选为1〜5μm，激光束的激光束点的宽度方向的能量分布为高斯分布; 并且用激光束扫描非晶半导体膜，以便用激光束照射大于或等于5微秒且小于或等于每个区域100微秒的周期。

63. 发明申请

US20080254598A1 Laser Irradiation Method, Laser Irradiation Apparatus, And Semiconductor Device 有权
标题翻译：激光照射方法，激光照射装置和半导体装置
公开(公告)号：US20080254598A1
公开(公告)日：2008-10-16
申请号：US12106643
申请日：2008-04-21
申请人： Shunpei Yamazaki , Koichiro Tanaka
发明人： Shunpei Yamazaki , Koichiro Tanaka
IPC分类号： H01L21/268
CPC分类号： H01L21/02422 , G02B19/0014 , G02B19/0052 , G02B27/0911 , G02B27/0955 , G02B27/0961 , G02B27/0966 , H01L21/02488 , H01L21/02532 , H01L21/02672 , H01L21/02675 , H01L21/02686 , H01L21/02691 , H01L27/1277 , H01L27/1285 , H01L27/1296 , H01L29/78627
摘要： An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.
摘要翻译：本发明的目的是通过改善半导体膜的照射变化来获得具有均匀特性的半导体膜。在用脉冲发射的线性激光束照射时由于扫描而产生照射变化。在用激光照射半导体膜的激光结晶步骤中，使用连续发光准分子激光发射装置作为激光源。例如，在制造有源矩阵型液晶显示装置的方法中，将连续发光准分子激光束照射到被处理为直线形状的半导体膜上，同时沿着与直线方向垂直的方向扫描。因此，通过常规的脉冲激光可以避免照射痕迹，因此可以进行更均匀的结晶。

64. 发明申请

US20080206969A1 Laser Optical Apparatus 有权
标题翻译：激光光学仪器
公开(公告)号：US20080206969A1
公开(公告)日：2008-08-28
申请号：US11463327
申请日：2006-08-09
申请人： Koichiro Tanaka
发明人： Koichiro Tanaka
IPC分类号： H01L21/20
CPC分类号： G02B27/0927 , B23K26/0738 , G02B3/005 , G02B3/0068 , G02B3/06 , G02B5/02 , G02B5/0215 , G02B5/0257 , G02B5/0278 , G02B27/0961 , G02B27/0966
摘要： There is provided a structure for reducing optical loss in an optical apparatus (homogenizer) for making the intensity distribution of a laser beam uniform.In a multi-cylindrical lens (a glass substrate having a multiplicity of cylindrical lenses formed thereon) used in a homogenizer, convex cylindrical lenses and concave cylindrical lenses are arranged alternately, and the boundaries between the cylindrical lenses have a smooth structure. This makes it possible to reduce scattering of beams that has occurred at the boundaries between the cylindrical lenses.
摘要翻译：提供了一种用于减少激光束的强度分布均匀的光学装置（均质器）中的光损耗的结构。在均质器中使用的多柱面透镜（其中形成有多个柱面透镜的玻璃基板）交替布置凸柱面透镜和凹柱面透镜，并且柱面透镜之间的边界具有平滑的结构。这使得可以减少在柱面透镜之间的边界处发生的光束的散射。

65. 发明授权

US07418172B2 Beam homogenizer, laser irradiation apparatus, and method for manufacturing semiconductor device 有权
公开(公告)号：US07418172B2
公开(公告)日：2008-08-26
申请号：US10827449
申请日：2004-04-20
申请人： Koichiro Tanaka , Tomoaki Moriwaka
发明人： Koichiro Tanaka , Tomoaki Moriwaka
IPC分类号： G02B6/26
CPC分类号： G02B27/0966 , G02B6/4204 , G02B27/0994 , H01S3/005
摘要： The present invention provides a beam homogenizer being able to form a rectangular beam spot having homogeneous energy distribution in a direction of its major axis without using the optical lens requiring to be manufactured with high accuracy. In addition, the present invention provides a laser irradiation apparatus being able to irradiate the laser beam having homogeneous energy distribution in a direction of its major axis. Furthermore, the present invention provides a method for manufacturing a semiconductor device being able to enhance crystallinity in the surface of the substrate and to manufacture TFT with a high operating characteristic.The beam homogenizer, one of the present invention, is to shape the beam spot on the surface to be irradiated into a rectangular spot having an aspect ratio of 10 or more, preferably 100 or more, and comprises an optical waveguide for homogenizing the energy distribution of the rectangular beam spot in the direction of its major axis.

66. 发明授权

US07418047B2 Communication apparatus using a plurality of modulation schemes and transmission apparatus composing such communication apparatus 有权
标题翻译：使用多个调制方式的通信装置和构成该通信装置的发送装置
公开(公告)号：US07418047B2
公开(公告)日：2008-08-26
申请号：US11063892
申请日：2005-02-23
申请人： Koichiro Tanaka , Hitoshi Takai , Kenichi Mori
发明人： Koichiro Tanaka , Hitoshi Takai , Kenichi Mori
IPC分类号： H04K1/10
CPC分类号： H04L27/04 , H04L27/0008 , H04L27/206
摘要： A first signal generation section 11 generates a baseband modulation signal for an ASK modulation scheme from transmission data. A second signal generation section 12 generates a pair of baseband modulation signals for a non-ASK modulation scheme from transmission data. When performing non-ASK modulation, a switch 15 connects between an input terminal d and an output terminal and outputs the baseband modulation signals based on the non-ASK modulation. When performing ASK modulation such that the transmission power ratio of the ASK modulation scheme to the non-ASK modulation scheme is a factor of 1, a switch 14 connects between an input terminal b and an output terminal and the switch 15 connects between an input terminal c and the output terminal. When performing ASK modulation such that the transmission power ratio is a factor of 2, the switch 14 connects between an input terminal a and the output terminal and the switch 15 connects between the input terminal c and the output terminal.
摘要翻译：第一信号生成部11从发送数据生成用于ASK调制方式的基带调制信号。第二信号生成部分12从发送数据生成用于非ASK调制方案的一对基带调制信号。当执行非ASK调制时，开关15在输入端子d和输出端子之间连接，并且基于非ASK调制输出基带调制信号。当执行ASK调制使得ASK调制方案的发送功率比与非ASK调制方案的因数为1时，开关14在输入端子b和输出端子之间连接，并且开关15连接在输入端子 c和输出端子。当执行ASK调制使得发送功率比为因子2时，开关14在输入端子a和输出端子之间连接，并且开关15连接在输入端子c和输出端子之间。

67. 发明申请

US20080198799A1 Radio Communication System 有权
标题翻译：无线电通信系统
公开(公告)号：US20080198799A1
公开(公告)日：2008-08-21
申请号：US11631291
申请日：2005-07-05
申请人： Hidetoshi Yamasaki , Kenji Miyanaga , Hitoshi Takai , Koichiro Tanaka
发明人： Hidetoshi Yamasaki , Kenji Miyanaga , Hitoshi Takai , Koichiro Tanaka
IPC分类号： H04Q7/00
CPC分类号： H04W16/24 , H04W74/08
摘要： In a wireless communication system using the contention method, collisions between transmission signals sent from terminals to a base station are avoided, and a communication area is flexibly formed while suppressing unnecessary radiation of the communication area. The base station includes antennas disposed such that wireless zones cover mutually different areas, wireless units connected to the antennas in one-to-one correspondence, and for, via the respective antennas, receiving wireless signals from the terminal stations in the wireless zones and transmitting wireless signals to the terminal stations in the wireless zones, a data processing unit for processing the wireless signals received by the plurality of wireless units and generate data to be transmitted to the terminal stations, and a communication control unit for controlling the wireless units so as to, during a slot other than a transmission request slot, form one communication area combining the wireless zones of all of the antennas, and during the transmission request slot, form mutually independent communication areas less than or equal in number to the antennas.
摘要翻译：在使用争用方法的无线通信系统中，避免了从终端发送到基站的发送信号之间的冲突，并且在抑制通信区域的不必要的辐射的同时灵活地形成通信区域。基站包括天线布置成使得无线区域覆盖相互不同的区域，一对一对应连接到天线的无线单元，并且经由各个天线，从无线区域中的终端站接收无线信号并发送向无线区域中的终端站发送无线信号;数据处理单元，用于处理由多个无线单元接收到的无线信号，并生成要发送到终端站的数据;以及通信控制单元，用于控制无线单元，以便在除了传输请求时隙之外的时隙中，形成组合所有天线的无线区域的一个通信区域，并且在传输请求时隙期间，形成数量小于或等于天线的相互独立的通信区域。

68. 发明申请

US20080165822A1 LASER LIGHT IRRADIATION APPARATUS AND LASER LIGHT IRRADIATION METHOD 有权
标题翻译：激光光照射装置和激光光照射方法
公开(公告)号：US20080165822A1
公开(公告)日：2008-07-10
申请号：US12048419
申请日：2008-03-14
申请人： Koichiro TANAKA
发明人： Koichiro TANAKA
IPC分类号： H01S3/08 , H01L21/84
CPC分类号： B23K26/0626 , B23K26/0732 , B23K26/0738 , B23K26/0853 , B23K2101/40 , C30B13/24 , C30B29/06 , C30B35/00 , H01L21/02672 , H01L21/02675 , H01L27/1285 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01S3/005 , H01L2924/00
摘要： Laser light is emitted from a laser oscillator, and the laser light is made to enter a beam expander optical system including a concave lens through a correction lens. The laser oscillator, the correction lens and the concave lens are disposed so that, when an emission point of the laser oscillator is a first conjugate point, a point at which an image at the first conjugate point is formed through the correction lens is a second conjugate point, a distance between the correction lens and the second conjugate point is b, a focal length of the concave lens is f, and a distance between the correction lens and the concave lens is X, the X satisfies b−3|f|≦X≦b+|f|.
摘要翻译：从激光振荡器发射激光，使激光进入包括通过校正透镜的凹透镜的光束扩展器光学系统。激光振荡器，校正透镜和凹透镜被设置为使得当激光振荡器的发射点是第一共轭点时，通过校正透镜形成第一共轭点处的图像的点是第二共轭点之间，校正透镜和第二共轭点之间的距离为b，凹透镜的焦距为f，校正透镜与凹透镜之间的距离为X，X满足b-3 | f | <= X <= b + | f |。

69. 发明授权

US07393764B2 Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device 有权
标题翻译：激光治疗装置，激光治疗方法及半导体装置的制造方法
公开(公告)号：US07393764B2
公开(公告)日：2008-07-01
申请号：US11274272
申请日：2005-11-16
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： H01L21/20
CPC分类号： H01L21/02683 , B23K26/0853 , B23K2101/40 , H01L21/02686 , H01L21/2026 , H01L27/1285
摘要： The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.
摘要翻译：本发明涉及一种激光治疗装置，包括激光振荡器，设置在激光振荡器中的联锁装置，以一定运动周期移动的可移动工作台，定时器，定时器中设置的互锁装置，能够检测活动台和计算机，其中定时器开始测量时间，当传感器感测到可移动台的通过时，并且当移动台甚至在移动时段之后也不通过传感器时，设置在定时器中的互锁装置的触点之间的传导被阻止在激光振荡器中操作互锁，从而停止激光输出。本发明还涉及使用激光治疗装置的激光治疗方法。

70. 发明申请

US20080151262A1 Light Exposure Apparatus and Manufacturing Method of Semiconductor Device Using the Same 失效
标题翻译：曝光装置及使用其的半导体装置的制造方法
公开(公告)号：US20080151262A1
公开(公告)日：2008-06-26
申请号：US10582616
申请日：2005-12-21
申请人： Koichiro Tanaka , Yoshiaki Yamamoto
发明人： Koichiro Tanaka , Yoshiaki Yamamoto
IPC分类号： G01B11/30 , H01L21/027
CPC分类号： H01L21/02675 , G03F7/70383 , H01L21/2026 , H01L21/268 , H01L27/1266 , H01L27/1285 , Y10T29/41
摘要： When annealing of a semiconductor film is conducted using a plurality of lasers, each of the distances between laser irradiation regions is different. When a lithography step is conducted in accordance with a marker which is formed over a substrate in advance after the step, light-exposure is not correctly conducted to a portion crystallized by laser. By using a laser irradiation region obtained on a laser irradiation step as a marker, light-exposure is conducted by making a light-exposure position of a stepper coincide with a large grain size region in the laser irradiation region. A large grain size region and a poorly crystalline region are detected by utilizing a thing that scattering intensity of light is different between the large grain size region and the poorly crystalline region, thereby determining a light-exposure position.
摘要翻译：当使用多个激光器进行半导体膜的退火时，激光照射区域之间的距离各不相同。当根据在步骤之后预先在衬底上形成的标记进行光刻步骤时，曝光不能正确地传导到通过激光结晶的部分。通过使用在激光照射步骤中获得的激光照射区域作为标记，通过使激光照射区域中的步进曝光位置与大粒径区域一致来进行曝光。通过利用在大晶粒尺寸区域和不良结晶区域之间的散射光强度不同的物质来检测大晶粒尺寸区域和不良结晶区域，从而确定曝光位置。

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