专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07393764B2 Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device 有权
标题翻译：激光治疗装置，激光治疗方法及半导体装置的制造方法
公开(公告)号：US07393764B2
公开(公告)日：2008-07-01
申请号：US11274272
申请日：2005-11-16
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： H01L21/20
CPC分类号： H01L21/02683 , B23K26/0853 , B23K2101/40 , H01L21/02686 , H01L21/2026 , H01L27/1285
摘要： The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.
摘要翻译：本发明涉及一种激光治疗装置，包括激光振荡器，设置在激光振荡器中的联锁装置，以一定运动周期移动的可移动工作台，定时器，定时器中设置的互锁装置，能够检测活动台和计算机，其中定时器开始测量时间，当传感器感测到可移动台的通过时，并且当移动台甚至在移动时段之后也不通过传感器时，设置在定时器中的互锁装置的触点之间的传导被阻止在激光振荡器中操作互锁，从而停止激光输出。本发明还涉及使用激光治疗装置的激光治疗方法。

2. 发明申请

US20070158315A1 Laser irradiation apparatus and laser irradiation method 有权
标题翻译：激光照射装置和激光照射方法
公开(公告)号：US20070158315A1
公开(公告)日：2007-07-12
申请号：US10586048
申请日：2005-07-28
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： B23K26/08 , B23K26/06 , H01L21/268 , H01L21/20
CPC分类号： H01L21/02683 , B23K26/0604 , B23K26/066 , H01L21/02672 , H01L21/02686 , H01L21/2026 , H01L21/268 , H01L27/1266 , H01L27/1285 , H01L27/13
摘要： It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method for conducting a laser process homogeneously to the whole surface of a semiconductor film. A first laser beam emitted from a first laser oscillator passes through a slit and a condensing lens and then enters an irradiation surface. At the same time, a second laser beam emitted from a second laser oscillator is delivered so as to overlap the first laser beam on the irradiation surface. Further, the laser beams are scanned relative to the irradiation surface to anneal the irradiation surface homogeneously.
摘要翻译：本发明的目的是提供一种激光照射装置和激光照射方法，用于均匀地对半导体膜的整个表面进行激光加工。从第一激光振荡器发射的第一激光束通过狭缝和聚光透镜，然后进入照射表面。同时，从第二激光振荡器发射的第二激光束被输送以与照射表面上的第一激光束重叠。此外，相对于照射表面扫描激光束，以均匀地退火照射表面。

3. 发明授权

US08188402B2 Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device 有权
标题翻译：激光治疗装置，激光治疗方法及半导体装置的制造方法
公开(公告)号：US08188402B2
公开(公告)日：2012-05-29
申请号：US12153646
申请日：2008-05-22
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： B23K26/02
CPC分类号： H01L21/02683 , B23K26/0853 , B23K2101/40 , H01L21/02686 , H01L21/2026 , H01L27/1285
摘要： The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.
摘要翻译：本发明涉及一种激光治疗装置，包括激光振荡器，设置在激光振荡器中的联锁装置，以一定运动周期移动的可移动工作台，定时器，定时器中设置的互锁装置，能够检测活动台和计算机，其中定时器开始测量时间，当传感器感测到可移动台的通过时，并且当移动台甚至在移动时段之后也不通过传感器时，设置在定时器中的互锁装置的触点之间的传导被阻止在激光振荡器中操作互锁，从而停止激光输出。本发明还涉及使用激光治疗装置的激光治疗方法。

4. 发明申请

US20080223838A1 Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device 有权
公开(公告)号：US20080223838A1
公开(公告)日：2008-09-18
申请号：US12153646
申请日：2008-05-22
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： B23K26/08 , B23K26/00
CPC分类号： H01L21/02683 , B23K26/0853 , B23K2101/40 , H01L21/02686 , H01L21/2026 , H01L27/1285
摘要： The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.

5. 发明授权

US07772523B2 Laser irradiation apparatus and laser irradiation method 有权
标题翻译：激光照射装置和激光照射方法
公开(公告)号：US07772523B2
公开(公告)日：2010-08-10
申请号：US10586048
申请日：2005-07-28
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： B23K26/08 , B23K26/06
CPC分类号： H01L21/02683 , B23K26/0604 , B23K26/066 , H01L21/02672 , H01L21/02686 , H01L21/2026 , H01L21/268 , H01L27/1266 , H01L27/1285 , H01L27/13
摘要： It is an object of the present invention to provide a laser irradiation apparatus and a laser irradiation method for conducting a laser process homogeneously to the whole surface of a semiconductor film. A first laser beam emitted from a first laser oscillator passes through a slit and a condensing lens and then enters an irradiation surface. At the same time, a second laser beam emitted from a second laser oscillator is delivered so as to overlap the first laser beam on the irradiation surface. Further, the laser beams are scanned relative to the irradiation surface to anneal the irradiation surface homogeneously.
摘要翻译：本发明的目的是提供一种激光照射装置和激光照射方法，用于均匀地对半导体膜的整个表面进行激光加工。从第一激光振荡器发射的第一激光束通过狭缝和聚光透镜，然后进入照射表面。同时，从第二激光振荡器发射的第二激光束被输送以与照射表面上的第一激光束重叠。此外，相对于照射表面扫描激光束，以均匀地退火照射表面。

6. 发明申请

US20060141754A1 Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device 有权
标题翻译：激光治疗装置，激光治疗方法及半导体装置的制造方法
公开(公告)号：US20060141754A1
公开(公告)日：2006-06-29
申请号：US11274272
申请日：2005-11-16
申请人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
发明人： Koichiro Tanaka , Yoshiaki Yamamoto , Takatsugu Omata
IPC分类号： H01L21/20 , H01L21/36
CPC分类号： H01L21/02683 , B23K26/0853 , B23K2101/40 , H01L21/02686 , H01L21/2026 , H01L27/1285
摘要： The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.
摘要翻译：本发明涉及一种激光治疗装置，包括激光振荡器，设置在激光振荡器中的联锁装置，以一定运动周期移动的可移动工作台，定时器，定时器中设置的互锁装置，能够检测活动台和计算机，其中定时器开始测量时间，当传感器感测到可移动台的通过时，并且当移动台甚至在移动时段之后也不通过传感器时，设置在定时器中的互锁装置的触点之间的传导被阻止在激光振荡器中操作互锁，从而停止激光输出。本发明还涉及使用激光治疗装置的激光治疗方法。

7. 发明授权

US08138058B2 Substrate with marker, manufacturing method thereof, laser irradiation apparatus, laser irradiation method, light exposure apparatus, and manufacturing method of semiconductor device 有权
标题翻译：具有标记的基板，其制造方法，激光照射装置，激光照射方法，曝光装置以及半导体装置的制造方法
公开(公告)号：US08138058B2
公开(公告)日：2012-03-20
申请号：US11942133
申请日：2007-11-19
申请人： Koichiro Tanaka , Takatsugu Omata
发明人： Koichiro Tanaka , Takatsugu Omata
IPC分类号： H01L21/76
CPC分类号： H01L21/02675 , B23K26/042 , B23K26/0738 , B23K26/0853 , G03F7/7085 , G03F9/7065 , G03F9/7076 , G03F9/7088 , H01L21/02678 , H01L21/2026 , H01L27/1214 , H01L27/1218 , H01L27/1266 , H01L27/1285 , Y10S438/942
摘要： To provide a laser irradiation apparatus which performs alignment of an irradiated object and emits a laser beam precisely, a laser irradiation method, and a manufacturing method of a TFT with high reliability with the use of a method for precisely targeting a desired irradiation position of the laser beam. A substrate with marker is mounted on a stage formed using a material which transmits infrared light; a marker, which is provided in the substrate with marker mounted on the stage, is detected using a camera capable of sensing infrared light, and a position of the stage is controlled; a laser beam is emitted from a laser oscillator; the laser beam emitted from the laser oscillator is processed into a linear shape by an optical system, and the substrate with marker mounted on the stage is irradiated with the laser beam.
摘要翻译：为了提供一种激光照射装置，其通过使用精确地瞄准所需照射位置的方法，可以精确地瞄准被照射物体的对准并发射激光束，激光照射方法和具有高可靠性的TFT的制造方法激光束。具有标记的基板安装在使用透射红外光的材料形成的台上; 使用能够感测红外光的照相机检测在基板中设置有安装在平台上的标记的标记，并且控制台的位置; 从激光振荡器发射激光束; 从激光振荡器发射的激光束通过光学系统被处理为线状，并且用激光束照射安装在台上的标记的基板。

8. 发明授权

US08232723B2 Lighting device 有权
标题翻译：照明设备
公开(公告)号：US08232723B2
公开(公告)日：2012-07-31
申请号：US12882567
申请日：2010-09-15
申请人： Koichiro Tanaka , Takatsugu Omata
发明人： Koichiro Tanaka , Takatsugu Omata
IPC分类号： H01J1/62
CPC分类号： H01L51/5275 , H01L51/0096 , H01L2251/5361 , Y02E10/549
摘要： One object is to provide a lighting device having a large irradiation range at low cost. One object is to provide a lighting device with improved light extraction efficiency at low cost. The lighting device includes a light-transmitting base, a first light-transmitting electrode formed over almost the whole area of a surface of the light-transmitting base, an EL layer over the first light-transmitting electrode, and a second electrode over the EL layer. The light-transmitting base has a cylindrical shape, a conical shape, a prismatic shape, or a pyramidal shape whose bottom surface is the surface of the light-transmitting base.
摘要翻译：一个目的是以低成本提供具有大的照射范围的照明装置。一个目的是以低成本提供具有改善的光提取效率的照明装置。照明装置包括透光基底，在透光性基底的表面的几乎整个区域上形成的第一透光性电极，第一透光性电极上的EL层和EL侧的第二电极层。透光基座具有圆筒形状，圆锥形，棱柱形状或底面是透光基底表面的金字塔形状。

9. 发明授权

US08456083B2 Lighting device 有权
标题翻译：照明设备
公开(公告)号：US08456083B2
公开(公告)日：2013-06-04
申请号：US13558672
申请日：2012-07-26
申请人： Koichiro Tanaka , Takatsugu Omata
发明人： Koichiro Tanaka , Takatsugu Omata
IPC分类号： H01J1/62
CPC分类号： H01L51/5275 , H01L51/0096 , H01L2251/5361 , Y02E10/549
摘要： One object is to provide a lighting device having a large irradiation range at low cost. One object is to provide a lighting device with improved light extraction efficiency at low cost. The lighting device includes a light-transmitting base, a first light-transmitting electrode formed over almost the whole area of a surface of the light-transmitting base, an EL layer over the first light-transmitting electrode, and a second electrode over the EL layer. The light-transmitting base has a cylindrical shape, a conical shape, a prismatic shape, or a pyramidal shape whose bottom surface is the surface of the light-transmitting base.
摘要翻译：一个目的是以低成本提供具有大的照射范围的照明装置。一个目的是以低成本提供具有改善的光提取效率的照明装置。照明装置包括透光基底，在透光性基底的表面的几乎整个区域上形成的第一透光性电极，第一透光性电极上的EL层和EL侧的第二电极层。透光基座具有圆筒形状，圆锥形，棱柱形状或底面是透光基底表面的金字塔形状。

10. 发明授权

US08227353B2 Method for manufacturing semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US08227353B2
公开(公告)日：2012-07-24
申请号：US11893226
申请日：2007-08-14
申请人： Takatsugu Omata , Koichiro Tanaka
发明人： Takatsugu Omata , Koichiro Tanaka
IPC分类号： H01L21/326 , H01L21/479 , H01L21/00 , G03F7/00
CPC分类号： B23K26/40 , B23K26/066 , B23K26/0676 , B23K26/382 , B23K26/389 , B23K2101/40 , B23K2103/02 , B23K2103/08 , B23K2103/14 , B23K2103/172 , B23K2103/26 , B23K2103/42 , B23K2103/50 , B23K2103/56 , H01L27/1288 , H01L27/1292 , H01L51/0005 , H01L51/0022 , H01L51/0036 , H01L51/0038 , H01L51/0039 , H01L51/0059 , H01L51/0545 , Y02P80/30
摘要： A technique for increasing productivity by simplified steps in a manufacturing process of TFTs, electronic circuits using TFTs, and semiconductor devices formed of TFTs is provided. A method for manufacturing a semiconductor device includes forming a light absorbing layer, forming a light-transmitting layer on the light absorbing layer emitting a linear laser beam with a homogenized energy onto a mask and thereby splitting the linear laser beam into a plurality of laser beams and emitting the plurality of laser beams onto the light-transmitting layer on the light absorbing layer, and thereby forming a plurality of openings in the light-transmitting layer and the light absorbing layer.
摘要翻译：提供了通过TFT的制造工艺中的简化步骤，使用TFT的电子电路和由TFT形成的半导体器件来提高生产率的技术。一种制造半导体器件的方法包括形成光吸收层，在光吸收层上形成具有均匀化能量的线性激光束的光透射层到掩模上，从而将线性激光束分成多个激光束并将多个激光束发射到光吸收层上的透光层上，从而在透光层和光吸收层中形成多个开口。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式