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71. 发明授权

US3128181A Sheet material coated with water-resistant polyvinyl alcohol and method of making the same 失效
标题翻译：涂有耐水性聚乙烯醇的薄片材料及其制造方法
公开(公告)号：US3128181A
公开(公告)日：1964-04-07
申请号：US17287462
申请日：1962-02-13
申请人： WARREN S D CO
发明人： TOWERS DOGGETT
IPC分类号： B41N3/03 , C08F8/00 , D21H19/60 , G03F7/021
CPC分类号： G03F7/0215 , C08F8/00 , D21H19/60 , Y10S430/136 , C08F16/06

72. 发明申请

US20220404699A1 RESIN COMPOSITION AND FLOW CELLS INCORPORATING THE SAME 有权
公开(公告)号：US20220404699A1
公开(公告)日：2022-12-22
申请号：US17624216
申请日：2020-12-21
申请人： ILLUMINA, INC.
发明人： Yekaterina Rokhlenko , Timothy J. Merkel
IPC分类号： G03F7/021 , G03F7/00 , G03F7/004 , G03F7/038 , G03F7/075 , G01N21/05 , G01N21/64
摘要： An example resin composition includes an epoxy resin matrix, a first photoacid generator, and a second photoacid generator. The first photoacid generator includes an anion having a molecular weight less than about 250 g/mol. The second photoacid generator includes an anion having a molecular weight greater than about 300 g/mol. In an example, i) a cation of the first photoacid generator has, or ii) a cation of the second photoacid generator has, or iii) the cations of the first and second photoacid generators have a mass attenuation coefficient of at least 0.1 L/(g*cm) at a wavelength of incident light to cure the resin composition.

73. 发明申请

US20170248846A1 COMPOUND, POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, AND COLOR FILTER 审中-公开
公开(公告)号：US20170248846A1
公开(公告)日：2017-08-31
申请号：US15404689
申请日：2017-01-12
申请人： SAMSUNG SDI CO., LTD.
发明人： Kyuyoung KIM , Hyeongmook KIM , Young LEE , Myoungyoup SHIN , Seungjib CHOI
IPC分类号： G03F7/016 , C08F220/68 , C09B11/24 , G03F7/021
CPC分类号： G03F7/0163 , C07D311/82 , C08F212/14 , C08F220/36 , C08F220/68 , C09B11/24 , C09B69/103 , C09B69/109 , G02B5/223 , G03F7/0007 , G03F7/021
摘要： A compound, an acrylic polymer formed by a copolymerization reaction of the compound with an ethylenic unsaturated monomer, photosensitive resin composition including the compound being represented by Chemical Formula 1 and a color filter:

74. 发明授权

US08846297B2 Positive photoresist composition, coating film thereof, and novolac phenol resin 有权
标题翻译：正性光致抗蚀剂组合物，其涂膜和酚醛清漆酚树脂
公开(公告)号：US08846297B2
公开(公告)日：2014-09-30
申请号：US14110311
申请日：2012-04-10
申请人： Tomoyuki Imada , Takakazu Kage , Norifumi Imaizumi
发明人： Tomoyuki Imada , Takakazu Kage , Norifumi Imaizumi
IPC分类号： G03F7/039 , C08G8/08 , C08G8/12 , C08L61/06 , C08G8/20 , C09D161/06 , G03F7/021 , G03F7/023
CPC分类号： G03F7/039 , C08G8/08 , C08G8/12 , C08G8/20 , C08L61/06 , C08L2205/02 , C09D161/06 , G03F7/0233 , G03F7/0236
摘要： A positive photoresist composition includes 3 to 80 parts by mass of a novolac phenol resin (B) relative to 100 parts by mass of a cresol novolac resin (A). The novolac phenol resin (B) has a repeating structural unit represented by formula (1) [In the formula, R represents a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms and X represents a structure (x1) represented by formula (2)
摘要翻译：相对于100质量份的甲酚酚醛清漆树脂（A），正型光致抗蚀剂组合物包含3〜80质量份酚醛清漆型酚醛树脂（B）。酚醛清漆型酚醛树脂（B）具有式（1）所示的重复结构单元[式中，R表示氢原子或碳原子数1〜12的烃基，X表示由式（1）表示的结构（x1） 2）

75. 发明申请

US20130012648A1 COLORED COMPOSITION, INKJET INK, COLOR FILTER AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGE SENSOR AND DISPLAY DEVICE 有权
标题翻译：彩色组合物，喷墨墨水，彩色滤色片及其制造方法，固态图像传感器和显示装置
公开(公告)号：US20130012648A1
公开(公告)日：2013-01-10
申请号：US13583877
申请日：2011-03-30
申请人： Yoshihiko Fujie , Masaru Yoshikawa , Shinichi Kanna , Kenta Ushijima
发明人： Yoshihiko Fujie , Masaru Yoshikawa , Shinichi Kanna , Kenta Ushijima
IPC分类号： C08F236/22 , C08F226/02 , C08F224/00 , B05D5/06 , G03F7/004 , G03F7/021 , C09D11/10 , G03F7/20 , C08F226/06 , C08F228/06
CPC分类号： G02B5/201 , C09B69/101 , C09B69/103 , C09B69/106 , C09B69/109 , C09D11/101 , C09D11/328 , G03F7/0007
摘要： The invention provides a colored composition including a dye multimer having an alkali-soluble group as a dye, the dye multimer having a weight-average molecular weight (Mw) of from 5,000 to 20,000 and a dispersity (weight-average molecular weight (Mw)/number-average molecular weight (Mn)) of from 1.00 to 2.50.
摘要翻译：本发明提供了一种着色组合物，其包含具有碱溶性基团作为染料的染料多聚体，所述染料多聚体的重均分子量（Mw）为5,000〜20,000，分散性（重均分子量（Mw） /数均分子量（Mn））为1.00〜2.50。

76. 发明授权

US07316892B2 Process of preparing planographic printing plate 失效
标题翻译：制备平版印刷版的工艺
公开(公告)号：US07316892B2
公开(公告)日：2008-01-08
申请号：US11077256
申请日：2005-03-10
申请人： Yasuhiko Takamuki , Toshiyuki Matsumura
发明人： Yasuhiko Takamuki , Toshiyuki Matsumura
IPC分类号： G03F7/03 , G03F7/021
CPC分类号： G03F7/027 , G03F7/0212 , G03F7/0388
摘要： Disclosed is a process of preparing a planographic printing plate from a light sensitive planographic printing plate material comprising a hydrophilic support and provided thereon, an image formation layer containing (A) a polymerization initiator selected from a hexaarylbisimidazole compound and a diazo resin, and (B) an alkali soluble resin with an acid value of 5 to 200 having an acryloyl group or a methacryloyl group, the alkali soluble resin being obtained by reacting a vinyl copolymer having a monomer unit derived from acrylic acid or methacrylic acid with an epoxy compound having an acryloyl group or a methacryloyl group in the molecule, and, the process comprising the steps of imagewise exposing the light sensitive planographic printing plate material to ultraviolet laser, and removing an image formation layer at non-exposed portions with an aqueous alkali solution to form an image.
摘要翻译：公开了一种从包含亲水性载体并在其上提供的光敏平版印刷版材料制备平版印刷版的方法，包含（A）选自六芳基双咪唑化合物和重氮树脂的聚合引发剂的成像层和（B ）具有丙烯酰基或甲基丙烯酰基的酸值为5〜200的碱溶性树脂，所述碱溶性树脂是通过使具有来自丙烯酸或甲基丙烯酸的单体单元的乙烯基共聚物与具有丙烯酸或甲基丙烯酸的环氧化合物丙烯酰基或甲基丙烯酰基，并且该方法包括以下步骤：将光敏平版印刷版材料成像曝光于紫外线激光，并用碱水溶液除去未曝光部分的图像形成层，以形成图片。

77. 发明授权

US07300738B2 Azolinyl acetic acid derivative and azolinyl acetic acid derivative containing recording material 失效
标题翻译：含有苯乙烯基乙酸衍生物和含有记录材料的吡咯烷基乙酸衍生物
公开(公告)号：US07300738B2
公开(公告)日：2007-11-27
申请号：US10773366
申请日：2004-02-09
申请人： Naoki Saito , Tetsunori Matsushita , Akinori Fujita , Yohsuke Takeuchi , Satoshi Higuchi , Kimi Ikeda
发明人： Naoki Saito , Tetsunori Matsushita , Akinori Fujita , Yohsuke Takeuchi , Satoshi Higuchi , Kimi Ikeda
IPC分类号： G03F7/021
CPC分类号： G03C1/54 , G03C1/58
摘要： A recording material having, on a support, a recording layer containing an azolinyl acetic acid derivative and a diazo compound. The azolinyl acetic acid derivative is preferably is a compound represented by the following general formula (1): wherein X represents an oxygen atom or a sulfur atom; R11 represents an alkyl group, an aryl group, a heterocyclic group, —OR13 or —NR14R15; R12 represents a substituent; R13 represents an alkyl group, an aryl group or a heterocyclic group; R14 and R15 each independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group; n represents an integer from 0 to 4; and, when n is an integer of 2 or greater, two or more R12s may be linked with each other to form a ring.
摘要翻译：一种记录材料，在载体上具有包含偶氮二乙酸乙酯衍生物和重氮化合物的记录层。噻唑啉基乙酸衍生物优选为由以下通式（1）表示的化合物：其中X表示氧原子或硫原子; R 11表示烷基，芳基，杂环基，-OR 13或-NR 14 R 15， SUP>; R 12表示取代基; R 13表示烷基，芳基或杂环基; R 14和R 15各自独立地表示氢原子，烷基，芳基或杂环基; n表示0〜4的整数，并且当n为2以上的整数时，可以将两个以上的R 12彼此连接形成环。

78. 发明授权

US07270928B2 Isocyanate composition, microcapsule and production method thereof, and recording material 失效
标题翻译：异氰酸酯组合物，微胶囊及其制备方法和记录材料
公开(公告)号：US07270928B2
公开(公告)日：2007-09-18
申请号：US11029428
申请日：2005-01-06
申请人： Takashi Tamura , Koreshige Ito
发明人： Takashi Tamura , Koreshige Ito
IPC分类号： G03F7/021 , C08L71/00
CPC分类号： C08G18/3206 , B41M5/165 , B41M5/30 , B41M5/34 , C08G18/10 , C08G18/3215 , C08G18/703 , C08G18/73 , C08G18/7635 , C08G18/8019
摘要： The present invention provides an isocyanate composition including an adduct of a multifunctional isocyanate compound having two or more isocyanate groups in the molecule thereof with a polymer obtained by radically polymerizing in the presence of a chain transfer agent having active hydrogen at least a vinyl monomer including a polymerizable compound having a polyether represented by the following Formula (I): A1-(L-O)n-B1 Formula (I) wherein A1 represents a group having an ethylenically unsaturated double bond; L represents an alkylene group; B1 represents an alkyl group or an aryl group; and n is an average polymerization degree of the polyether and represents a number of 8 to 300.
摘要翻译：本发明提供了一种异氰酸酯组合物，其包含分子中具有两个以上异氰酸酯基的多官能异氰酸酯化合物的加合物与在具有活性氢的链转移剂存在下通过自由基聚合得到的聚合物，至少含有乙烯基单体具有由下式（I）表示的聚醚的聚合性化合物：<？在线式说明=“在线式”末端=“铅”→> A 1 - （LO）式（I）<βin-line-formula description =“In-line Formulas”end =“tail”？>其中A <1> 表示具有烯属不饱和双键的基团; L代表亚烷基; B 1表示烷基或芳基; n为聚醚的平均聚合度，为8〜300的数。

79. 发明申请

US20050277051A1 Increased sensitivity, UV imageable photographic elements 审中-公开
标题翻译：增加灵敏度，可UV成像摄影元素
公开(公告)号：US20050277051A1
公开(公告)日：2005-12-15
申请号：US10857990
申请日：2004-06-01
申请人： Stephan Platzer , Howard Fromson
发明人： Stephan Platzer , Howard Fromson
IPC分类号： B41C1/10 , B41M5/36 , G03C1/52 , G03C5/18 , G03F7/021 , G03F7/038
CPC分类号： G03F7/038 , G03C1/52 , G03F7/0217
摘要： The invention provides a photosensitive element which comprises a sheet substrate having coated thereon an actinic radiation sensitive imageable layer. The imageable layer has an admixture an aromatic diazonium salt having an anion, and having a weight average molecular weight of from about 15,000 to about 35,000. The aromatic diazonium salt is present in an amount of from about 1 weight % to about 9 weight % of the imageable layer. The composition also has a solid epoxy polymer having a weight average molecular weight of from about 2,000 to about 8,000. The coating weight of the imageable layer per area is preferably from about 0.3 to about 0.9 g/m2. The imageable layer is sensitive to low levels of actinic irradiation, namely, from about 1 to about 40 mj/cm2 in the UV region. The sensitivity is increased by heating the imageable layer before development. After imagewise exposure and aqueous development, an imaged element is obtained, which is useful for lithographic printing.
摘要翻译：本发明提供了一种感光元件，其包括其上涂覆有光化辐射敏感可成像层的片状基材。可成像层具有具有阴离子的芳族重氮盐的混合物，其重均分子量为约15,000至约35,000。芳族重氮盐的存在量为可成像层的约1重量％至约9重量％。该组合物还具有重均分子量为约2,000至约8,000的固体环氧聚合物。每个面积的可成像层的涂层重量优选为约0.3至约0.9g / m 2。可成像层对于低水平的光化辐射敏感，即UV区域中约1至约40mJ / cm 2。通过在显影前对可成像层进行加热来提高灵敏度。在成像曝光和水性显影之后，获得成像元件，其可用于平版印刷。

80. 发明授权

US06953649B2 Photosensitive composition for photoresist manufacture 失效
标题翻译：用于光致抗蚀剂制造的光敏组合物
公开(公告)号：US06953649B2
公开(公告)日：2005-10-11
申请号：US10312638
申请日：2001-06-01
申请人： Evelyne Prat , Mathias Destarac
发明人： Evelyne Prat , Mathias Destarac
IPC分类号： C08F293/00 , G03F7/039 , H01L21/027 , G03F7/021 , G03F7/004
CPC分类号： C08F293/005 , C08F2438/03 , G03F7/0392 , Y10S430/106
摘要： The invention concerns a novel photosensitive composition for photoresist and a system comprising a substrate and a photoresist obtained from said novel composition. The photosensitive composition for photoresist comprises a copolymer with hydrophobic blocks whereof at least one block is an hydrophobic block capable of generating a hydrophilic block and comprising at its end a group selected among dithioesters, thioesters-thiones, dithiocarbamates and xanthates, and a photoactive compound capable of generating under the effect of a radiation an active species reacting with the hydrophobic block to generate the hydrophilic block.
摘要翻译：本发明涉及一种用于光致抗蚀剂的新型感光组合物，以及一种包含由所述新型组合物获得的基材和光致抗蚀剂的系统。用于光致抗蚀剂的光敏组合物包含具有疏水嵌段的共聚物，其中至少一个嵌段是能够产生亲水嵌段的疏水嵌段，并且其末端包含选自二硫代酯，硫酯 - 硫素，二硫代氨基甲酸酯和黄原酸酯的基团，以及具有光活性的化合物在辐射的作用下产生与疏水性嵌段反应产生亲水嵌段的活性物质。

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