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1. 发明申请

US20200272050A1 Enhanced EUV Photoresist Materials, Formulations and Processes 审中-公开
公开(公告)号：US20200272050A1
公开(公告)日：2020-08-27
申请号：US16284069
申请日：2019-02-25
申请人： Alex P. G. Robinson , Carmen Popescu , John Roth , Andreas Frommhold , Edward Jackson , Alexandra McClelland , Tom Lada , Greg O'Callahan
发明人： Alex P. G. Robinson , Carmen Popescu , John Roth , Andreas Frommhold , Edward Jackson , Alexandra McClelland , Tom Lada , Greg O'Callahan
IPC分类号： G03F7/021 , G03F7/20 , G03F7/038
摘要： The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.

2. 发明申请

US20190018318A1 BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREPARED THEREFROM 审中-公开
公开(公告)号：US20190018318A1
公开(公告)日：2019-01-17
申请号：US16066475
申请日：2016-11-21
申请人： Rohm and Haas Electronic Materials Korea Ltd.
发明人： Hyung Gu Jeong , Seok-Bong Park , Ji Ung Kim
IPC分类号： G03F7/033 , G03F7/031 , G03F7/021 , G03F7/105 , C08F2/48 , C08L33/08 , C08L33/10 , C08L63/00
摘要： Disclosed herein are a black photosensitive resin composition and a black column spacer prepared therefrom. The black photosensitive resin composition may form a cured film exhibiting good adhesion to a substrate, good height difference property, good surface roughness and high light shielding property (optical density), and may be effectively used for the formation of a cured film, particularly a black column spacer, of a liquid crystal display (LCD) or an organic light-emitting diode (OLED) display.

3. 发明申请

US20180246407A1 COMPOUND, COMPOSITION, AND METHOD FOR PRODUCING SAME, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, AND PURIFICATION METHOD 审中-公开
公开(公告)号：US20180246407A1
公开(公告)日：2018-08-30
申请号：US15757268
申请日：2016-09-02
申请人： Mitsubishi Gas Chemical Company, Inc.
发明人： Masatoshi ECHIGO
IPC分类号： G03F7/021 , G03F7/09 , C08L63/00
CPC分类号： G03F7/0217 , C07B61/00 , C07C43/23 , C07D303/28 , C08L63/00 , C08L2203/16 , C08L2312/04 , G03F7/094 , H01L21/0332 , H01L21/31116 , H01L21/31138
摘要： A compound represented by the following formula (1) and a method for producing the same, and a composition, a composition for optical component formation, a film forming composition for lithography, a resist composition, a method for forming a resist pattern, a radiation-sensitive composition, a method for producing an amorphous film, an underlayer film forming material for lithography, a composition for underlayer film formation for lithography, a method for producing an underlayer film for lithography, a resist pattern formation method, a circuit pattern formation method, and a purification method. wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms, an aryl group of 6 to 30 carbon atoms, an alkenyl group of 2 to 30 carbon atoms, a group represented by the following formula (A), a group represented by the following formula (B), a thiol group, or a hydroxy group, wherein at least one selected from the group consisting of R2 to R5 is a group selected from the group consisting of a group represented by the following formula (A) and a group represented by the following formula (B); m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2: wherein each R6 is independently an alkylene group of 1 to 4 carbon atoms; and m′ is an integer of 1 or larger, and wherein R6 is as defined above; R7 is a hydrogen atom or a methyl group; and m″ is 0 or an integer of 1 or larger.

4. 发明授权

US08753790B2 Self-imageable film forming polymer, compositions thereof and devices and structures made therefrom 有权
标题翻译：可自成像的成膜聚合物，其组合物和由其制成的器件和结构
公开(公告)号：US08753790B2
公开(公告)日：2014-06-17
申请号：US12803602
申请日：2010-06-30
申请人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
发明人： Osamu Onishi , Haruo Ikeda , Larry Rhodes , Paul Evans , Edmund Elce , Andrew Bell , Chad Brick , Hendra Ng , Pramod Kandanarachchi
IPC分类号： G03F7/016 , G03F7/021 , G03F7/30
CPC分类号： C08G61/08 , C08G2261/3324 , C08G2261/418 , C08L65/00 , G03F7/0233 , G03F7/0382
摘要： Embodiments in accordance with the present invention encompass self-imageable film forming compositions that comprise norbornene-type polymers and that can be formulated to be either positive tone imaging or negative tone. The films formed thereby are useful in the forming of microelectronic and optoelectronics devices.
摘要翻译：根据本发明的实施方案包括包含降冰片烯型聚合物并且可以配制为正色调成像或负色调的自成像成膜组合物。由此形成的膜可用于形成微电子和光电子器件。

5. 发明申请

US20130164681A1 Pigment Dispersion Composition, Photosensitive Resin Composition Including the Same and Color Filter Using the Same 有权
标题翻译：颜料分散组合物，包含其的感光性树脂组合物和使用其的滤色器
公开(公告)号：US20130164681A1
公开(公告)日：2013-06-27
申请号：US13591484
申请日：2012-08-22
申请人： Kyung-Hee HYUNG , Taek-Jin BAEK , Eui-June JEONG , Jae-Hyun KIM , Gyu-Seok HAN
发明人： Kyung-Hee HYUNG , Taek-Jin BAEK , Eui-June JEONG , Jae-Hyun KIM , Gyu-Seok HAN
IPC分类号： G03F7/016 , G03F7/021
CPC分类号： C09B67/0041 , C09B67/0051 , C09B69/106 , C09D17/003 , G02B5/201 , G02B5/223 , G03F7/0007 , G03F7/105
摘要： Disclosed are a pigment dispersion composition including a pyridone azo-based compound including a monomer represented by the following Chemical Formula 1, a polymer including a repeating unit represented by the following Chemical Formula 2, or a combination thereof, wherein each substituents of Chemical Formulae 1 and 2 are the same as defined the detailed description, (B) a pigment, (C) a binder resin, (D) a dispersing agent, and (E) a solvent; a photosensitive resin composition including the same; and a color filter including the same.
摘要翻译：公开了一种颜料分散体组合物，其包含吡啶基偶氮类化合物，其包含由以下化学式1表示的单体，包含由以下化学式2表示的重复单元的聚合物或其组合，其中化学式1 （B）颜料，（C）粘合剂树脂，（D）分散剂和（E）溶剂; 包含它的感光性树脂组合物; 和包括其的滤色器。

6. 再颁专利

USRE40728E1 Acid functional polymers based on benzocyclobutene 有权
公开(公告)号：USRE40728E1
公开(公告)日：2009-06-09
申请号：US10808270
申请日：2004-03-24
申请人： Ying H. So , Robert A. DeVries , Mitchell G. Dibbs , Robert L. McGee , Edward O. Shaffer, II , Michael J. Radler , Richard P. DeCaire
发明人： Ying H. So , Robert A. DeVries , Mitchell G. Dibbs , Robert L. McGee , Edward O. Shaffer, II , Michael J. Radler , Richard P. DeCaire
IPC分类号： G03F7/038 , G03F7/039 , G03F7/021 , G03F7/023
CPC分类号： C08G61/06 , C08G77/04 , G03F7/0045 , G03F7/027 , G03F7/0755 , G03F7/0757 , G03F7/095
摘要： The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.

7. 发明授权

US07507518B2 Photosensitive resin precursor composition 有权
标题翻译：感光树脂前体组合物
公开(公告)号：US07507518B2
公开(公告)日：2009-03-24
申请号：US10885100
申请日：2004-07-07
申请人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
发明人： Yoji Fujita , Tomoyuki Yuba , Mitsuhito Suwa
IPC分类号： G03F7/021 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0233 , G03F7/0045 , G03F7/0751
摘要： The present invention relates to a positive photosensitive resin precursor composition which exhibits good storage stability after exposure.A photosensitive resin precursor composition comprises (a) a polymer essentially composed of a structural unit expressed by formula (1); (b) at least two photo acid generators; and (c) a compound having an alkoxymethyl group: wherein R1 represents an organic group with a valence of 2 to 8, having at least two carbon atoms; R2 represents an organic group with a valence of 2 to 6, having at least two carbon atoms; R3 represents hydrogen or an organic group having a carbon number in the range of 1 to 20; n represents a number ranging from 10 to 100,000; m represents an integer in the range of 0 to 2; and p and q represent integers in the range of 0 to 4 and satisfy p+q>0.
摘要翻译：本发明涉及曝光后显示良好的储存稳定性的正型感光性树脂前体组合物。光敏树脂前体组合物包含（a）基本上由式（1）表示的结构单元组成的聚合物; （b）至少两个光酸产生剂; 和（c）具有烷氧基甲基的化合物：其中R1表示具有至少两个碳原子的价数为2至8的有机基团; R2表示具有至少2个碳原子的2价至6价的有机基团; R3表示氢或碳数为1〜20的有机基团; n表示10〜100,000的数; m表示0〜2的整数， p和q表示0〜4的整数，满足p + q> 0。

8. 发明授权

US07351521B2 Photoresist composition for deep ultraviolet lithography 失效
标题翻译：用于深紫外光刻的光刻胶组合物
公开(公告)号：US07351521B2
公开(公告)日：2008-04-01
申请号：US11716361
申请日：2007-03-09
申请人： Ralph R. Dammel , Raj Sakamuri , Francis M. Houlihan
发明人： Ralph R. Dammel , Raj Sakamuri , Francis M. Houlihan
IPC分类号： G03F7/30 , G03F7/021
CPC分类号： G03F7/0395 , G03F7/0046
摘要： The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photoresist composition of the present invention, and to a process of making the polymer in the presence of an organic base.
摘要翻译：本发明涉及一种光致抗蚀剂组合物，其包含光致酸产生剂和至少一种包含至少一种如结构1所述的单元的聚合物。本发明还涉及用于使本发明的光致抗蚀剂组合物成像的方法，以及使聚合物在有机碱存在下进行。

9. 发明授权

US07291438B2 Negative photosensitive composition and negative photosensitive lithographic printing plate 失效
标题翻译：负感光组合物和负光敏平版印刷版
公开(公告)号：US07291438B2
公开(公告)日：2007-11-06
申请号：US10558956
申请日：2004-06-17
申请人： Hideo Sakurai , Eiji Hayakawa
发明人： Hideo Sakurai , Eiji Hayakawa
IPC分类号： G03F7/021 , G03F7/031
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , G03F7/021 , G03F7/029
摘要： There are provided a negative-working photosensitive composition which can be cured by infrared rays and is less likely to suffer polymerization inhibition by oxygen during radical polymerization, and also exhibits high adhesion with a metal, and a negative-working photosensitive lithographic printing plate which is capable of directly forming images by irradiation with infrared rays from a solid or semiconductor laser based on digital signals, and also has high sensitivity and excellent printing durability. The negative-working photosensitive composition contains an infrared absorber (A), an organoboron compound (B) which functions as a polymerization initiator by using in combination with the infrared absorber (A), a compound having a polymerizable unsaturated group (C) and a diazo resin (D), and the negative-working photosensitive lithographic printing plate comprises a support, and a photosensitive layer containing the negative-working photosensitive composition formed on the support.
摘要翻译：提供了可以通过红外线固化的负性光敏组合物，并且在自由基聚合期间不太可能遭受氧的聚合抑制，并且还表现出与金属的高粘合性和负性光敏平版印刷版，其是能够通过基于数字信号从固体或半导体激光器的红外线照射而直接形成图像，并且还具有高灵敏度和优异的印刷耐久性。负性感光性组合物含有与红外线吸收剂（A）组合使用的作为聚合引发剂的红外线吸收剂（A），有机硼化合物（B），具有聚合性不饱和基团（C）和重氮树脂（D），负性感光性平版印刷版包括载体和含有形成在载体上的负性感光性组合物的感光层。

10. 发明授权

US07189488B2 Polyimide precursor, manufacturing method thereof, and resin composition using polyimide precursor 有权
标题翻译：聚酰亚胺前体，其制造方法和使用聚酰亚胺前体的树脂组合物
公开(公告)号：US07189488B2
公开(公告)日：2007-03-13
申请号：US10315558
申请日：2002-12-10
申请人： Toshio Yamanaka , Koji Okada , Kaoru Takagahara
发明人： Toshio Yamanaka , Koji Okada , Kaoru Takagahara
IPC分类号： G03F7/038 , G03F7/021 , G03F7/023 , G03F7/30
CPC分类号： G03F7/0392 , C08G73/1025 , C08G73/1042
摘要： A polyimide precursor in accordance with the present invention contains amide acid ester units, either imide units or amide acid units, and fluorine atoms bonded to some of these structural units. A polyimide precursor resin composition in accordance with the present invention contains either such a polyimide precursor or resins separately containing the structural units. Polyimide precursors in accordance with the present invention and resin compositions based on the same therefore have excellent properties and are suitably used in particular to form a particular pattern and for other purposes by impart photosensitivity to them.
摘要翻译：根据本发明的聚酰亚胺前体包含酰胺酸酯单元，酰亚胺单元或酰胺酸单元，和与这些结构单元中的一些键合的氟原子。根据本发明的聚酰亚胺前体树脂组合物含有分别含有结构单元的这种聚酰亚胺前体或树脂。根据本发明的聚酰亚胺前体和基于该树脂的树脂组合物因此具有优异的性能，并且特别适合用于形成特定的图案，并且为了其它目的赋予它们光敏性。

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