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81. 发明授权

US07631482B2 Multiple phase power supply for rocket engines 失效
标题翻译：火箭发动机多相电源
公开(公告)号：US07631482B2
公开(公告)日：2009-12-15
申请号：US11123374
申请日：2005-05-06
申请人： Geoffrey N. Drummond , Jeffery M. Monheiser
发明人： Geoffrey N. Drummond , Jeffery M. Monheiser
IPC分类号： F03H1/00 , H05H1/00
CPC分类号： F03H1/0037 , F03H1/0018
摘要： Conventional power supplies that actify the grids of electric rockets use an output capacitor to smooth the output DC voltage signal. Large capacitors tend to store a great amount of energy. Arcing acts to transfer this energy to create a well or pit on an accelerator grid of the electric rockets that may eventually cause repeating arcing or perforation on the accelerator grid. Various embodiments of the present invention eliminate or reduce the need to use an output capacitor. Additionally, various embodiments of the present invention use multiple phases of an input signal into the power supply to cause the output DC voltage signal to be substantially smooth.
摘要翻译：激活电子火箭网格的传统电源使用输出电容器平滑输出直流电压信号。大容量电容器倾向于储存大量的能量。电弧作用是传递这种能量，以在电火箭的加速器网格上产生井或坑，这可能最终在加速器网格上引起重复的电弧或穿孔。本发明的各种实施例消除或减少使用输出电容器的需要。此外，本发明的各种实施例将输入信号的多个相位用于电源以使输出直流电压信号基本上平滑。

82. 发明申请

US20090294276A1 METHOD AND APPARATUS OF FORMING DOMAIN INVERSION STRUCTURES IN A NONLINEAR FERROELECTRIC SUBSTRATE 审中-公开
标题翻译：非线性微电子基板中形成域反转结构的方法与装置
公开(公告)号：US20090294276A1
公开(公告)日：2009-12-03
申请号：US12442523
申请日：2007-09-20
申请人： Chang Qing Xu , Jen-Shih Chang , Jonathan Markle
发明人： Chang Qing Xu , Jen-Shih Chang , Jonathan Markle
IPC分类号： H05H1/00 , B01J19/08
CPC分类号： G02F1/3558 , C30B29/30 , C30B33/04
摘要： A crystal poling apparatus has as ingle-domain ferroelectric substrate (e.g. MgO doped LiNbO3 substrate), a sample holder, a high voltage source, a corona torch, a gas source, a chamber, and at least one vacuum pump. An electrode with a certain structure (e.g. a periodical pattern) is formed on the first surface of the substrate, and the substrate is set with the electrode facing down on top of the sample holder. The electrode is grounded so that high electric field is formed in the area with electrode due to the formation of charges generated by the corona torch on the second surface of the substrate. The charge distribution on the second surface of the substrate is controlled by the high voltage source and the gas source. To achieve the optimized crystal poling, the temperature of the substrate is set by the temperature controller, and the electrode on the first surface of the substrate is isolated by the vacuum pump.
摘要翻译：晶体极化装置具有单域铁电衬底（例如MgO掺杂的LiNbO 3衬底），样品保持器，高压源，电晕炬，气体源，腔室和至少一个真空泵。在基板的第一表面上形成具有一定结构（例如周期性图案）的电极，并且将电极设置为位于样品保持器顶部的电极。电极接地，由于在基板的第二表面上形成由电晕炬产生的电荷，所以在具有电极的区域中形成高电场。基板的第二表面上的电荷分布由高电压源和气体源控制。为了实现优化的晶体极化，通过温度控制器设置基板的温度，并且通过真空泵将衬底的第一表面上的电极隔离。

83. 发明申请

US20090191355A1 Methods for forming a thin layer of particulate on a substrate 审中-公开
标题翻译：在基材上形成薄层颗粒的方法
公开(公告)号：US20090191355A1
公开(公告)日：2009-07-30
申请号：US12011558
申请日：2008-01-28
申请人： Hee Hyun Lee , Graciela Beatriz Blanchet , James F. Ryley
发明人： Hee Hyun Lee , Graciela Beatriz Blanchet , James F. Ryley
IPC分类号： H05B6/02 , H05H1/00
CPC分类号： H05K3/1283 , B82Y10/00 , H05B2214/04 , H05K2203/087 , H05K2203/095 , H05K2203/102 , H05K2203/1131
摘要： The invention is a method for forming a thin layer of particulate on a substrate by applying a layer of a composition comprising the particulate and a dispersing agent on the substrate, treating the layer with charged gas to remove the dispersing agent from the layer; and induction heating to form operative connection of the particulate.
摘要翻译：本发明是一种通过在基材上涂覆包含颗粒和分散剂的组合物层在基材上形成薄层颗粒的方法，用带电气体处理该层以从该层除去分散剂; 和感应加热以形成颗粒的操作连接。

84. 发明申请

US20090188525A1 Apparatus, carrier and method for the plasma treatment of molds 有权
标题翻译：用于等离子体处理模具的装置，载体和方法
公开(公告)号：US20090188525A1
公开(公告)日：2009-07-30
申请号：US12321444
申请日：2009-01-21
申请人： Gabriela Cocora , Axel Heinrich , Peter Hagmann
发明人： Gabriela Cocora , Axel Heinrich , Peter Hagmann
IPC分类号： A61L2/14 , B01J19/08 , H05H1/00
CPC分类号： H01J37/32541 , B29C33/56 , B29C33/72 , B29L2011/0041 , H01J37/32366 , H01J37/32403 , H01J37/32568 , H01J37/32715
摘要： An apparatus for the plasma treatment of molds (2), in particular for contact lens molds, comprises a treatment chamber (50), in which a first electrode (51) is arranged facing a carrier (1;4) for carrying the molds (2) to be treated. The carrier (1;4) forms the second electrode (52) and comprises a first metal plate (10;40) having holes (100;400) therein and a second metal plate (11;41) which is arranged spaced apart from the first metal plate (10;40), and which is connected to the first metal plate (10;40) in an electrically conductive manner (12,13;43). The molds (2) are arranged on the second metal plate (11;41) with their molding surfaces (210) facing towards the first electrode (51) and are exposable to plasma through the holes (100;400) in the first metal plate (10;40).
摘要翻译：用于等离子体处理模具（2）的装置，特别是用于隐形眼镜模具的装置包括处理室（50），其中第一电极（51）面向用于承载模具的载体（1; 4） 2）待处理。载体（1; 4）形成第二电极（52），并且包括其中具有孔（100; 400）的第一金属板（10; 40）和与第一金属板间隔开的第二金属板（11; 41）第一金属板（10; 40），并且以导电方式（12,13; 43）连接到第一金属板（10; 40）。模具（2）布置在第二金属板（11; 41）上，其模制表面（210）面向第一电极（51），并且可通过第一金属板中的孔（100; 400）暴露于等离子体（10; 40）。

85. 发明授权

US07567037B2 High frequency power supply device and plasma generator 有权
标题翻译：高频电源装置和等离子发生器
公开(公告)号：US07567037B2
公开(公告)日：2009-07-28
申请号：US10542289
申请日：2004-01-15
申请人： Yuichi Setsuhara , Tatsuo Shoji , Masayoshi Kamai
发明人： Yuichi Setsuhara , Tatsuo Shoji , Masayoshi Kamai
IPC分类号： H05H1/00
CPC分类号： H01J37/32174 , H01J37/32091 , H01J37/321 , H01J37/3299 , H05H1/46
摘要： A high frequency power supplying device and a plasma generation device using the same includes: two or more inductive antennas; high frequency power sources, respectively supplying power to the antennas; and a vacuum chamber on which the antennas are provided so as to generate a plasma by inductive coupling with high frequency power, wherein each of the high frequency power sources is positioned close to a corresponding antenna. On this account, it is possible to reduce unevenness in high frequency voltages generated in the antennas. Thus, even when a diameter and a volume of the plasma generation section are made larger, it is possible to generate much more uniform plasma, thereby stabilizing (i) thin film formation processes based on the plasma and (ii) plasma ion implantation processes.
摘要翻译：高频供电装置和使用该高频电力装置的等离子体产生装置包括：两个或更多个电感天线; 高频电源，分别向天线供电; 以及真空室，其上设置天线，以便通过高频电力的感应耦合产生等离子体，其中每个高频电源被定位成靠近对应的天线。因此，可以减少在天线中产生的高频电压的不均匀性。因此，即使当等离子体产生部分的直径和体积更大时，也可以产生更均匀的等离子体，从而稳定（i）基于等离子体的薄膜形成过程和（ii）等离子体离子注入工艺。

86. 发明申请

US20090173360A1 Lithographic Apparatus, and Device Manufacturing Method 失效
标题翻译：平版印刷设备和设备制造方法
公开(公告)号：US20090173360A1
公开(公告)日：2009-07-09
申请号：US12405831
申请日：2009-03-17
申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich BANINE , Johannes Peterus Henricus DE KUSTER , Johannes Hubertus Josephina MOORS , Lucas Henricus Johannes STEVENS , Bastiaan Theodoor WOLSCHRIJN , Yurii Victorovitch SIDELNIKOV , Marc Hubertus Lorenz VAN DER VELDEN , Wouter Anthon SOER , Thomas STEIN , Kurt Gielissen
发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich BANINE , Johannes Peterus Henricus DE KUSTER , Johannes Hubertus Josephina MOORS , Lucas Henricus Johannes STEVENS , Bastiaan Theodoor WOLSCHRIJN , Yurii Victorovitch SIDELNIKOV , Marc Hubertus Lorenz VAN DER VELDEN , Wouter Anthon SOER , Thomas STEIN , Kurt Gielissen
IPC分类号： G21K5/00 , B08B7/00 , H05H1/00
CPC分类号： G03F7/70925 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
摘要翻译：公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

87. 发明授权

US07554053B2 Corrugated plasma trap arrangement for creating a highly efficient downstream microwave plasma system 有权
标题翻译：用于创建高效下游微波等离子体系统的波纹等离子体捕集装置
公开(公告)号：US07554053B2
公开(公告)日：2009-06-30
申请号：US11317874
申请日：2005-12-23
申请人： Mohammad Kamarehi , Ing-Yann Albert Wang
发明人： Mohammad Kamarehi , Ing-Yann Albert Wang
IPC分类号： C23C16/00 , H05H1/00 , H05B6/76
CPC分类号： H05H1/46 , H01J37/32229 , H01J37/32266 , H01J37/32357
摘要： A plasma system is disclosed. The plasma system includes a microwave waveguide assembly having a longitudinal axis parallel with a first axis. The plasma system also includes a plasma tube assembly intersecting the microwave waveguide assembly. The plasma tube assembly has a longitudinal axis parallel with a second axis that is substantially orthogonal with the first axis. The plasma tube assembly also has a plasma-sustaining region defined by an upstream plurality of plasma traps and a downstream plurality of plasma traps.
摘要翻译：公开了一种等离子体系统。等离子体系统包括具有与第一轴平行的纵轴的微波波导组件。等离子体系统还包括与微波波导组件相交的等离子体管组件。等离子体管组件具有与第二轴线平行的纵向轴线，该第二轴线基本上与第一轴线正交。等离子体管组件还具有由上游多个等离子体捕集器和下游多个等离子体捕集器限定的等离子体维持区域。

88. 发明授权

US07497922B2 Plasma-assisted gas production 失效
标题翻译：等离子体辅助天然气生产
公开(公告)号：US07497922B2
公开(公告)日：2009-03-03
申请号：US10513220
申请日：2003-05-07
申请人： Satyendra Kumar , Devendra Kumar
发明人： Satyendra Kumar , Devendra Kumar
IPC分类号： H05H1/00
CPC分类号： C01B3/342 , B01J19/088 , B01J19/126 , B01J2219/0809 , B01J2219/083 , B01J2219/0835 , B01J2219/0869 , B01J2219/0886 , B01J2219/0892 , C01B2203/04 , C01B2203/0861 , C01B2203/1041 , H05H1/46 , H05H2001/4607
摘要： Methods and apparatus are provided for plasma-assisted gas production. In one embodiment, a gas, which includes at least one atomic or molecular species, can flow into a cavity (305). The gas can be subjected to electromagnetic radiation having a frequency less than about 333 GHz (optionally in the presence of a plasma catalyst) such that a plasma (310) forms in the cavity (305). A filter (315) capable of passing the atomic or molecular species, but preventing others from passing, can be in fluid communication with the cavity (305). In this way, the selected species can be extracted and collected, for storage or immediate use.
摘要翻译：提供了等离子体辅助气体生产的方法和装置。在一个实施方案中，包括至少一种原子或分子种类的气体可以流入空腔（305）。气体可以经受频率小于约333GHz的电磁辐射（任选在存在等离子体催化剂的情况下），使得在空腔（305）中形成等离子体（310）。能够使原子或分子物质通过但防止其他物质通过的过滤器（315）可以与空腔（305）流体连通。以这种方式，可以提取和收集所选择的物种，用于储存或立即使用。

89. 发明申请

US20080271987A1 SYSTEM AND METHOD FOR PREPARING NANOPARTICLES USING NON-THERMAL PULSED PLASMA 审中-公开
标题翻译：使用非热脉冲等离子体制备纳米颗粒的系统和方法
公开(公告)号：US20080271987A1
公开(公告)日：2008-11-06
申请号：US11951467
申请日：2007-12-06
申请人： Chang Ho NOH , Tae Sung KIM , Kwang Su KIM
发明人： Chang Ho NOH , Tae Sung KIM , Kwang Su KIM
IPC分类号： H05H1/00
CPC分类号： H05H1/46 , H01J37/32146 , H01J37/32449 , H05H2001/4652 , H05H2245/124
摘要： A system for preparing nanoparticles using non-thermal pulsed plasma is provided. The system comprises a reaction chamber having two divided regions, i.e. a first region where nanoparticles are to be formed and a second region where the nanoparticles are to be received, to prevent the formation of a thin film of nanoparticles in the second region. The use of the system enables the preparation of nanoparticles with improved uniformity and high collection efficiency. In addition, collection and deposition of nanoparticles can be simultaneously performed in the second region. Therefore, the system can find applications in various fields, including devices, secondary cells and sensors. Further provided is a method for preparing nanoparticles using the system.
摘要翻译：提供了一种使用非热脉冲等离子体制备纳米颗粒的系统。该系统包括反应室，其具有两个分开的区域，即要形成纳米颗粒的第一区域和待接收纳米颗粒的第二区域，以防止在第二区域中形成纳米颗粒薄膜。该系统的使用使得能够制备具有改进的均匀性和高收集效率的纳米颗粒。此外，纳米颗粒的收集和沉积可以在第二区域中同时进行。因此，该系统可以在各种领域找到应用，包括设备，二次电池和传感器。还提供了使用该系统制备纳米颗粒的方法。

90. 发明申请

US20080258081A1 REMOVABLE LINERS FOR CHARGED PARTICLE BEAM SYSTEMS 失效
标题翻译：充电粒子束系统的可拆卸线
公开(公告)号：US20080258081A1
公开(公告)日：2008-10-23
申请号：US12167271
申请日：2008-07-03
申请人： Alan Michael Chandler , Tushar Desai , Ellis Craig Hayford , Nicholas Mone , James Spiros Nakos
发明人： Alan Michael Chandler , Tushar Desai , Ellis Craig Hayford , Nicholas Mone , James Spiros Nakos
IPC分类号： H01J37/30 , H05H1/00
CPC分类号： H01J37/3171 , H01J37/16 , H01J2237/0213 , H01J2237/022 , H01J2237/0268
摘要： A method of improving the performance of charged beam apparatus. The method including: providing the apparatus, the apparatus comprising: a chamber having an interior surface; a pump port for evacuating the chamber; a substrate holder within the chamber; and a charged particle beam within the chamber, the charged beam generated by a source and the charged particle beam striking the substrate; and positioning one or more liners in contact with one or more different regions of the interior surface of the chamber, the liners preventing material generated by interaction of the charged beam and the substrate from coating the one or more different regions of the interior surface of the chamber.
摘要翻译：一种提高带电束装置性能的方法。该方法包括：提供该装置，该装置包括：具有内表面的腔室; 用于抽空室的泵口; 腔室内的衬底保持器; 以及室内的带电粒子束，由源产生的带电束和带电粒子束撞击衬底; 并且将一个或多个衬垫定位成与腔室的内表面的一个或多个不同区域接触，衬垫防止由带电束和衬底的相互作用产生的材料涂覆在腔室的内表面的一个或多个不同区域房间。

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