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1. 发明申请

US20230113702A1 METHOD AND APPARATUS FOR PROCESSING A LITHOGRAPHIC MASK 有权
公开(公告)号：US20230113702A1
公开(公告)日：2023-04-13
申请号：US18081820
申请日：2022-12-15
申请人： Carl Zeiss SMT GmbH
发明人： Daniel Rhinow , Bartholomaeus Szafranek , Joachim Welte
IPC分类号： G03F1/74 , G03F1/86 , H01J37/244 , H01J37/147 , H01J37/317
摘要： Methods for repairing a defect of a lithographic mask with a particle beam are described. One such method can comprise the following steps: Processing the defect with the particle beam with a first set of processing parameters; processing the defect with the particle beam with a second set of processing parameters; wherein at least one parameter from the first set of processing parameters differs from the second set of processing parameters.

2. 发明授权

US11619882B2 Method and apparatus for characterizing a microlithographic mask 有权
公开(公告)号：US11619882B2
公开(公告)日：2023-04-04
申请号：US17470340
申请日：2021-09-09
申请人： Carl Zeiss SMT GmbH
发明人： Ulrich Matejka , Holger Seitz , Thomas Frank , Asad Rasool
IPC分类号： G03F7/20 , G03F1/84
摘要： The invention relates to a method and an apparatus for characterizing a microlithographic mask. In a method according to the invention, structures of a mask intended for use in a lithography process in a microlithographic projection exposure apparatus are illuminated by an illumination optical unit, wherein the mask is imaged onto a detector unit which has a plurality of pixels by an imaging optical unit. Here, a plurality of individual imaging processes are carried out with a pixel resolution specified by the detector unit, wherein these individual imaging processes differ from one another in respect of the position of at least one polarization-optical element situated in the imaging optical unit, wherein image data recorded by the detector unit are evaluated in an evaluation unit, wherein polarization-dependent effects on account of a polarization dependence of the interference of electromagnetic radiation that takes place in the wafer plane during the operation of the microlithographic projection exposure apparatus are emulated, wherein a conversion of the image data obtained in the individual imaging processes is implemented, in each case on the basis of at least one calibration image obtained by imaging a structure-free region of the mask onto the detector unit, wherein the calibration image respectively used is chosen differently depending on the position of the at least one polarization-optical element.

3. 发明申请

US20230081234A1 PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY WITH A VIBRATION DAMPER AND METHOD FOR DESIGNING A VIBRATION DAMPER 有权
公开(公告)号：US20230081234A1
公开(公告)日：2023-03-16
申请号：US17989813
申请日：2022-11-18
申请人： Carl Zeiss SMT GmbH
发明人： Philipp Gaida , Michael Erath , Florian Herold
IPC分类号： G03F7/20
摘要： A projection exposure apparatus has a vibration damper with a holder and a mass that is connected to the holder via a damping element. The vibration damper comprises a temperature control device for the temperature control of the damping element. The disclosure also relates to a method for designing a vibration damper.

4. 发明申请

US20230051439A1 DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS 有权
公开(公告)号：US20230051439A1
公开(公告)日：2023-02-16
申请号：US17967163
申请日：2022-10-17
申请人： Carl Zeiss SMT GmbH
发明人： Oliver Herbst , Cornelius Richt
IPC分类号： G03F7/20
摘要： A drive device for driving an actuator of an optical system comprises: a switching amplifier for generating an amplified signal depending on a modulation signal; a filter unit connected between the actuator and the switching amplifier and having at least one inductance; a providing unit for providing a supply voltage; and a two-quadrant controller having feedback capability coupled between the providing unit and the switching amplifier.

5. 发明申请

US20230047921A1 DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS 有权
公开(公告)号：US20230047921A1
公开(公告)日：2023-02-16
申请号：US17961447
申请日：2022-10-06
申请人： Carl Zeiss SMT GmbH
发明人： Michel Aliman , Matthias Manger , Lars Berger , Mohammad Awad
IPC分类号： G03F7/20 , G02B26/08 , G02B7/182 , H02N2/06
摘要： A drive device comprises a drive unit, a source, a filter unit, and a determining unit.

6. 发明申请

US20220381680A1 EUV REFLECTOMETER 有权
公开(公告)号：US20220381680A1
公开(公告)日：2022-12-01
申请号：US17882101
申请日：2022-08-05
申请人： Carl Zeiss SMT GmbH , BESTEC GMBH
发明人： Tatjana GIESSEL , Marco ROESSNER
IPC分类号： G01N21/33 , G01N21/55
摘要： An EUV reflectometer includes a radiation source, a beam shaping unit (130) generating a measurement beam (190) from the radiation; a positioning device (500) for holding and positioning a test object (110) relative to the measurement beam in plural degrees of freedom; and a detector that detects the EUV radiation reflected by the test object. The positioning device has a main carrier (520), which is rotatable about a vertical rotation axis and on which a parallel kinematic multi-axis system (530) having a multiplicity of actuators is arranged. A common platform (540) movable in three linear and three rotational degrees of freedom carries a holding device (550) for holding the test object and a rotary drive for rotating the holding device about a rotation axis. An associated measuring system (700) determines the location and position of the test object in space and/or in relation to the measurement beam.

7. 发明申请

US20220368104A1 CONTROL DEVICE, CONTROL SYSTEM, METHOD FOR OPERATING A CONTROL SYSTEM 有权
公开(公告)号：US20220368104A1
公开(公告)日：2022-11-17
申请号：US17876860
申请日：2022-07-29
申请人： CARL ZEISS SMT GMBH
发明人： Arian KRIESCH , Matthias MANGER , Claudius WEIMANN , Ulrich VOGL
IPC分类号： H01S5/0687 , H01S3/13 , H01S5/02 , H01S3/08
摘要： A control system for frequency control of a laser module, comprising at least one laser module for generating laser radiation, at least one control device coupled or configured to couple to the laser module, and at least one optical resonator coupled or configured to couple to the control device, wherein the control device comprises a semiconductor substrate, a first Pound-Drever-Hall system arranged on the semiconductor substrate and at least one second Pound-Drever-Hall system arranged on the semiconductor substrate, wherein the laser module is coupled to the first Pound-Drever-Hall system of the control device and is configured to couple to the at least second Pound-Drever-Hall system of the control device, wherein the first Pound-Drever-Hall system is coupled to the optical resonator and wherein the second Pound-Drever-Hall system is configured to couple to the optical resonator, and wherein the number of Pound-Drever-Hall systems is greater than the number of laser modules or optical resonators.

8. 发明申请

US20220349789A1 METHOD TO PREPARE A SAMPLE FOR ATOM PROBE TOMOGRAPHY (APT), PREPARATION DEVICE TO PERFORM SUCH METHOD AND METHOD TO INVESTIGATE A REGION OF INTEREST OF A SAMPLE INCLUDING SUCH PERFORMING METHOD 有权
公开(公告)号：US20220349789A1
公开(公告)日：2022-11-03
申请号：US17344367
申请日：2021-06-10
申请人： Carl Zeiss SMT GmbH
发明人： Sascha Christian Mueller , Marcus Kaestner , Cheryl Hartfield
IPC分类号： G01N1/44 , G01N1/32
摘要： To prepare a sample for atom probe tomography, a raw sample body having a surface and a region of interest (ROI) to be inspected by APT is provided. Pillars containing the ROI are formed into the surface of the raw sample body via ablation of material of the raw sample body from the surface with an ultra-short pulsed laser. Redeposited ablated material is removed in the region of the formed pillars. The surface of the formed pillars is polished. A preparation device to perform such a preparation method includes a sample handling unit, a pillar forming unit including an ultra-short pulsed laser, a removal unit to remove redeposited ablated material, and a polishing unit. The result is an efficient preparation of robust samples for atom probe tomography. To investigate a region of interest of a sample, the preparation method is performed and then atom probe tomography of the region of interest is performed.

9. 发明申请

US20220342314A1 ILLUMINATION OPTICAL SYSTEM FOR EUV PROJECTION LITHOGRAPHY 有权
公开(公告)号：US20220342314A1
公开(公告)日：2022-10-27
申请号：US17810740
申请日：2022-07-05
申请人： Carl Zeiss SMT GmbH
发明人： Joachim Kalden , Stig Bieling
IPC分类号： G03F7/20 , G02B5/08
摘要： An illumination optical unit for EUV projection lithography includes a field facet mirror with a plurality of field facets for guiding illumination light into an object field where a lithography mask is arrangeable. At least one spectral output coupling mirror section is arranged on the field facet mirror. The mirror section serves to output couple the spectral analysis partial beam from a beam path of the illumination light. A detector serves for the spectral analysis of the spectral analysis partial beam. This can yield an illumination optical unit in which process monitoring during the projection exposure is improved.

10. 发明申请

US20220334469A1 APPARATUS AND METHOD FOR DETERMINING A POSITION OF AN ELEMENT ON A PHOTOLITHOGRAPHIC MASK 有权
公开(公告)号：US20220334469A1
公开(公告)日：2022-10-20
申请号：US17847641
申请日：2022-06-23
申请人： Carl Zeiss SMT GmbH
发明人： Michael Budach , Nicole Auth
IPC分类号： G03F1/86 , G01B9/02 , G01B11/14 , G03F9/00 , H01J37/28
摘要： The present application relates to an apparatus for determining a position of at least one element on a photolithographic mask, said apparatus comprising: (a) at least one scanning particle microscope comprising a first reference object, wherein the first reference object is disposed on the scanning particle microscope in such a way that the scanning particle microscope can be used to determine a relative position of the at least one element on the photolithographic mask relative to the first reference object; and (b) at least one distance measuring device, which is embodied to determine a distance between the first reference object and a second reference object, wherein there is a relationship between the second reference object and the photolithographic mask.

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