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    • 6. 发明授权
    • Method for production of a radiation-emitting semiconductor chip
    • 辐射发射半导体芯片的制造方法
    • US08273593B2
    • 2012-09-25
    • US13027810
    • 2011-02-15
    • Berthold HahnStephan KaiserVolker Härle
    • Berthold HahnStephan KaiserVolker Härle
    • H01L21/66H01L21/30
    • H01L33/22H01L33/0079
    • A method for micropatterning a radiation-emitting surface of a semiconductor layer sequence for a thin-film light-emitting diode chip, wherein the semiconductor layer sequence is grown on a substrate, a mirror layer is formed or applied on the semiconductor layer sequence, which reflects back into the semiconductor layer sequence at least part of a radiation that is generated in the semiconductor layer sequence during the operation thereof and is directed toward the mirror layer, the semiconductor layer sequence is separated from the substrate, and a separation surface of the semiconductor layer sequence, from which the substrate is separated, is etched by an etchant which predominantly etches at crystal defects and selectively etches different crystal facets at the separation surface.
    • 一种用于对薄膜发​​光二极管芯片的半导体层序列的辐射发射表面进行微图形化的方法,其中在衬底上生长半导体层序列,在半导体层序列上形成或施加镜面层, 在半导体层序列中在半导体层序列中产生的至少一部分辐射反射回半导体层序列并且朝向镜面层,半导体层序列与衬底分离,并且半导体层的分离表面 衬底分离的层序列被蚀刻剂蚀刻,蚀刻剂主要在晶体缺陷处蚀刻并选择性地蚀刻分离表面处的不同晶面。