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1. 发明授权

US09341942B2 Vacuum chamber assembly for supporting a workpiece 有权
标题翻译：用于支撑工件的真空室组件
公开(公告)号：US09341942B2
公开(公告)日：2016-05-17
申请号：US13818567
申请日：2011-08-23
申请人： Fardad Hashemi , Douglas C. Watson , Lorri L. Watson
发明人： Fardad Hashemi , Douglas C. Watson
IPC分类号： G03F7/20 , G03F1/64 , G03F1/66 , H01L21/67 , G03B27/64
CPC分类号： G03F1/64 , G03B27/64 , G03F1/66 , G03F7/70841 , G03F7/70908 , H01L21/6719
摘要： A chamber assembly (26) for providing a sealed chamber (40) adjacent to a workpiece (28) to counteract the influence of gravity on the workpiece (28) includes a chamber housing (244), and a seal assembly (33) that expands and/or contracts to better seal against the workpiece (28). Further, the chamber assembly (26) can include one or more transducer assemblies (34) that expand or contract to quickly respond to leaks or injections of fluid in chamber assembly (26) to maintain a constant and stable chamber pressure in the chamber assembly (26). Moreover, the chamber assembly (26) can utilize a pressure source (35) that directs a lager amount of fluid (374) through a fluid passageway (368) to accurately maintain the pressure within the chamber assembly (26).
摘要翻译：用于提供与工件（28）相邻的密封腔（40）以抵抗重力对工件（28）的影响的室组件（26）包括腔室壳体（244）和膨胀的密封组件（33）和/或收缩以更好地密封工件（28）。此外，腔室组件（26）可以包括一个或多个换能器组件（34），其膨胀或收缩以快速响应腔室组件（26）中的流体的泄漏或喷射，以保持腔室组件中恒定且稳定的腔室压力（ 26）。此外，腔室组件（26）可以利用压力源（35），该压力源将较大量的流体（374）引导通过流体通道（368）以精确地保持腔室组件（26）内的压力。

2. 发明授权

US09323157B2 Mirror assembly for an exposure apparatus 有权
标题翻译：用于曝光设备的镜组件
公开(公告)号：US09323157B2
公开(公告)日：2016-04-26
申请号：US14116634
申请日：2012-06-13
申请人： Alton H. Phillips , Douglas C. Watson , Lorri L. Watson
发明人： Alton H. Phillips , Douglas C. Watson
IPC分类号： G03B27/54 , G03F7/20 , G02B7/18
CPC分类号： G03F7/7015 , G02B7/1815
摘要： A mirror assembly (332) for directing a beam (28) from an illumination source (26) to a reticle (36) includes a mirror (352) and a back plate (350). The mirror (352) includes a mirror body (352A) that defines a reflective first surface (352B) that directs the beam (28), a mirror mounting region (370), a mirror perimeter region (372) that encircles the mirror mounting region (370), and mirror slot (374) that separates the mirror perimeter region (372) from the mirror mounting region (370). The back plate (350) retains and engages the mirror mounting region (370) of the mirror (352) with the mirror perimeter region (372) spaced apart from the back plate (350). Further, the mirror body (352A) can include a second surface (352C) that is substantially opposite the first surface (352B), and the mirror mounting region (370) extends between the second surface (352C) to near the first surface (352B). Further, the mirror slot (374) extends from the second surface (352C) to near the first surface (352B).
摘要翻译：用于将光束（28）从照明源（26）引导到掩模版（36）的反射镜组件（332）包括反射镜（352）和背板（350）。反射镜（352）包括：镜体（352A），其限定引导光束（28）的反射第一表面（352B）;反射镜安装区域（370）;镜面周边区域（372），其包围反射镜安装区域（370）和将反射镜周边区域（372）与反射镜安装区域（370）分离的反射镜槽（374）。背板（350）将反射镜（352）的反射镜安装区域（370）保持并与反射镜周边区域（372）与后板（350）间隔开。此外，镜体（352A）可以包括与第一表面（352B）大致相对的第二表面（352C），并且镜安装区域（370）在第二表面（352C）之间延伸到第一表面（352B）附近）。此外，镜槽（374）从第二表面（352C）延伸到第一表面（352B）附近。

3. 发明授权

US09304385B2 Exposure method and device manufacturing method including selective deformation of a mask 有权
标题翻译：包括掩模选择性变形的曝光方法和装置制造方法
公开(公告)号：US09304385B2
公开(公告)日：2016-04-05
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/32 , G03F1/00 , G03F7/20
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

4. 发明授权

US08416386B2 Conforming seats for clamps used in mounting an optical element, and optical systems comprising same 有权
标题翻译：适合用于安装光学元件的夹具的座椅，以及包括其的光学系统
公开(公告)号：US08416386B2
公开(公告)日：2013-04-09
申请号：US12047244
申请日：2008-03-12
申请人： Christopher S. Margeson , Douglas C. Watson
发明人： Christopher S. Margeson , Douglas C. Watson
IPC分类号： G03B27/42 , G03B27/52 , G03B27/54 , G02B7/02
CPC分类号： G02B7/026 , G02B7/182 , G03F7/70825 , G03F7/7095
摘要： Clamps are disclosed for holding an optical element relative to a support. An exemplary clamp includes first and second arms and a member connecting the arms such that a portion of a mounting feature of the optical element is between the first and second arms. The first arm applies a clamping force toward a respective portion of the mounting feature, and the second arm includes a seat. The seat has at least upper and intermediate portions. The upper portion engages the respective location on the mounting feature. The intermediate portion is situated between the upper portion and the second arm and has a lateral thickness less than the lateral thickness of the upper portion. The intermediate portion exhibits elastic and plastic deformability sufficient for any moment applied by the clamp to the mounting feature to be limited to less than a designated peak moment, while maintaining substantially full engagement of the upper portion with the respective location.
摘要翻译：公开了用于相对于支撑件保持光学元件的夹具。示例性夹具包括第一臂和第二臂以及连接臂的构件，使得光学元件的安装特征的一部分在第一和第二臂之间。第一臂向安装构件的相应部分施加夹紧力，并且第二臂包括座。座椅至少具有上部和中间部分。上部接合安装特征上的相应位置。中间部分位于上部和第二臂之间，其横向厚度小于上部的横向厚度。中间部分表现出弹性和塑性可变形性，足以使夹具对安装特征施加的任何时刻被限制在小于指定的峰值时刻，同时保持上部与相应位置的基本上完全接合。

5. 发明授权

US07932989B2 Liquid jet and recovery system for immersion lithography 有权
标题翻译：用于浸没光刻的液体喷射和回收系统
公开(公告)号：US07932989B2
公开(公告)日：2011-04-26
申请号：US11808850
申请日：2007-06-13
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70341
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.
摘要翻译：用于浸没式光刻设备的液体喷射和回收系统具有布置成使其开口位于曝光区域附近的喷嘴阵列，通过该曝光区域将图像图案投影到诸如晶片的工件上。这些喷嘴各自适于选择性地用作用于将流体供应到曝光区域中的源喷嘴或用作从曝光区域回收流体的回收喷嘴。流体控制装置用于使得在曝光区域的所选一个或多个侧面上的喷嘴用作源喷嘴并且使所选择的一个或多个剩余侧面上的喷嘴用作回收喷嘴，使得可以建立期望的流动模式为了方便浸没光刻。

6. 发明授权

US07821615B2 Liquid jet and recovery system for immersion lithography 有权
公开(公告)号：US07821615B2
公开(公告)日：2010-10-26
申请号：US11808850
申请日：2007-06-13
申请人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
发明人： W. Thomas Novak , Andrew J. Hazelton , Douglas C. Watson
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/32 , G03C5/00
摘要： A liquid jet and recovery system for an immersion lithography apparatus has arrays of nozzles arranged to have their openings located proximal to an exposure region through which an image pattern is projected onto a workpiece such as a wafer. These nozzles are each adapted to serve selectively either as a source nozzle for supplying a fluid into the exposure region or as a recovery nozzle for recovering the fluid from the exposure region. A fluid controlling device functions to cause nozzles on selected one or more sides of the exposure region to serve as source nozzles and to cause nozzles on selected one or more of the remaining sides to serve as recovery nozzles such that a desired flow pattern can be established for the convenience of immersion lithography.

7. 发明申请

US20100097588A1 EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND MASK 有权
标题翻译：曝光方法，装置制造方法和掩模
公开(公告)号：US20100097588A1
公开(公告)日：2010-04-22
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/42 , G03B27/32 , G03F1/00
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

8. 发明授权

US07692768B2 Iron core motor driven automatic reticle blind 有权
标题翻译：铁芯电机驱动自动掩模版盲
公开(公告)号：US07692768B2
公开(公告)日：2010-04-06
申请号：US11427439
申请日：2006-06-29
申请人： Michael B. Binnard , Douglas C. Watson , Christopher S. Margeson
发明人： Michael B. Binnard , Douglas C. Watson , Christopher S. Margeson
IPC分类号： G03B27/54 , G03B27/42 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70066
摘要： Methods and apparatus for shielding a reticle within an illumination system are disclosed. According to one aspect of the present invention, a blind arrangement for shielding an object such as a reticle includes a coil assembly which has at least one coil, an air supply that supplies air, and a first blind portion. The first blind portion includes at least one magnet and is not in physical contact with the coil. The first blind portion is supported at a distance from the coil by the air, and the coil assembly cooperates with the magnet to cause the first blind portion to move. The first blind portion shields the object when the first blind portion is in a first position.
摘要翻译：公开了用于屏蔽照明系统内的掩模版的方法和装置。根据本发明的一个方面，用于屏蔽诸如掩模版的物体的盲装置包括具有至少一个线圈的线圈组件，供应空气的空气供应器和第一盲区部件。第一盲部包括至少一个磁体并且不与线圈物理接触。第一盲部通过空气与线圈支撑一定距离，并且线圈组件与磁体协作以使第一盲部移动。当第一盲区部分处于第一位置时，第一盲区部分屏蔽物体。

9. 发明申请

US20100053738A1 High NA Catadioptric Imaging Optics For Imaging A reticle to a Pair of Imaging Locations 有权
标题翻译：高NA反射折射成像光学用于成像一个掩模版到一对成像位置
公开(公告)号：US20100053738A1
公开(公告)日：2010-03-04
申请号：US12547086
申请日：2009-08-25
申请人： David M. Williamson , Michael B. Binnard , Douglas C. Watson
发明人： David M. Williamson , Michael B. Binnard , Douglas C. Watson
IPC分类号： G02B17/08
CPC分类号： G02B17/0892 , G02B27/1066 , G02B27/143 , G03F7/70225 , G03F7/7025 , G03F7/70275 , G03F7/70833
摘要： New and useful concepts for an imaging optical system configured to simultaneously image a reticle to a pair of imaging locations are provided, where the imaging optics comprise a pair of arms, each of which includes catadioptric imaging optics. In addition, the imaging optics are preferably designed to image a reticle simultaneously to the pair of imaging locations, at a numerical aperture of at least 1.3, and without obscuration of light by the imaging optics.
摘要翻译：提供了一种被配置为将掩模版同时成像到一对成像位置的成像光学系统的新的和有用的概念，其中成像光学器件包括一对臂，每个臂包括反射折射成像光学元件。此外，成像光学器件优选地设计成在至少为1.3的数值孔径同时成像成对位置的成对位置成像，并且不会由成像光学元件遮挡光。

10. 发明申请

US20090303454A1 EXPOSURE APPARATUS WITH A SCANNING ILLUMINATION BEAM 审中-公开
标题翻译：曝光装置与扫描照明光束
公开(公告)号：US20090303454A1
公开(公告)日：2009-12-10
申请号：US12481326
申请日：2009-06-09
申请人： Michael B. Binnard , Douglas C. Watson , Daniel Gene Smith , David M. Williamson
发明人： Michael B. Binnard , Douglas C. Watson , Daniel Gene Smith , David M. Williamson
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70358
摘要： An exposure apparatus (10) for transferring a mask pattern (358) from a mask (12) to a substrate (14) includes a mask retainer (44), a substrate stage assembly (24), and an illumination system (18). The mask retainer (44) retains the mask (12). The substrate stage assembly (24) retains and positions the substrate (14). The illumination system (18) generates an illumination beam (31) that moves along a beam scan axis (35) relative to the mask (12) to scan at least a portion of the mask pattern (358). The beam scan axis (35) is substantially parallel to the mask pattern (358). The illumination system (18) can include an illumination source (32) that generates the illumination beam (31) and an illumination optical assembly (34) that guides the illumination beam (31). The illumination optical assembly (34) moves the illumination beam (31) relative to the mask (12) so that the illumination beam (31) scans substantially the entire mask pattern (358). The illumination optical assembly (34) can further include an illumination reflector (36) that is incident on the illumination beam (31), and the illumination reflector (36) can be selectively moved to move the illumination beam (31) along the beam scan axis (35).
摘要翻译：用于将掩模图案（358）从掩模（12）传送到基板（14）的曝光装置（10）包括掩模保持器（44），基板台组件（24）和照明系统（18）。掩模保持器（44）保持掩模（12）。衬底台组件（24）保持并定位衬底（14）。照明系统（18）产生相对于掩模（12）沿着光束扫描轴（35）移动以扫描掩模图案（358）的至少一部分的照明光束（31）。光束扫描轴（35）基本上平行于掩模图案（358）。照明系统（18）可以包括产生照明光束（31）的照明源（32）和引导照明光束（31）的照明光学组件（34）。照明光学组件（34）相对于掩模（12）移动照明光束（31），使得照明光束（31）基本上扫描整个掩模图案（358）。照明光学组件（34）还可以包括入射到照明光束（31）上的照明反射器（36），并且照明反射器（36）可以被选择性地移动以沿着光束扫描来移动照明光束（31）轴（35）。

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