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1. 发明申请

US20120133938A1 MEASURING METHOD, APPARATUS AND SUBSTRATE 审中-公开
标题翻译：测量方法，装置和基板
公开(公告)号：US20120133938A1
公开(公告)日：2012-05-31
申请号：US13306668
申请日：2011-11-29
申请人： David DECKERS , Franciscus Godefridus Casper BIJNEN , Sami MUSA
发明人： David DECKERS , Franciscus Godefridus Casper BIJNEN , Sami MUSA
IPC分类号： G01N21/84 , B29C59/02
CPC分类号： G03F7/70683 , G03F1/42 , G03F1/44 , G03F1/70 , G03F7/70625 , G03F7/70633 , G03F9/7076 , G03F9/7088
摘要： A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.
摘要翻译：形成在基板上的图案包括彼此相邻并且具有相应的第一和第二周期性的第一和第二子图案。观察该图案以获得组合信号，该组合信号包括频率低于第一和第二周期的频率的第三周期的拍子分量。通过参考拍子组件的相位来确定光刻工艺的性能的测量。根据子模式的形成方式，例如，性能参数可能是关键维度（CD）或覆盖。对于CD测量，子图案之一可以包括每个具有被产品类特征细分的部分的标记。可以使用光刻设备的现有对准传感器进行测量。通过选择第一和第二周期性，因此可以调整测量的灵敏度和精度，因此可以调整第三周期性。

2. 发明申请

US20100123886A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20100123886A1
公开(公告)日：2010-05-20
申请号：US12621143
申请日：2009-11-18
申请人： Franciscus Godefridus Casper BIJNEN , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
发明人： Franciscus Godefridus Casper BIJNEN , Jozef Cornelis Antonius Roijers , Patrick Warnaar , Marc Van Kemenade , Hoite Pieter Theodoor Tolsma
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/7084
摘要： A method for manufacturing a device includes providing a substrate, the substrate including a plurality of exposure fields, each exposure field including one or more target portions and at least one mark structure, the mark structure being arranged as positional mark for the exposure field; scanning and measuring the mark of each exposure field to obtain alignment information for the respective exposure field; determining an absolute position of each exposure field from the alignment information for the respective exposure field; determining a relative position of each exposure field with respect to at least one other exposure field by use of additional information on the relative parameters of the exposure field and the at least one other exposure field relative to each other; and combining the absolute positions and the determined relative positions into improved absolute positions for each of the plurality of exposure fields.
摘要翻译：一种制造器件的方法包括：提供衬底，所述衬底包括多个曝光场，每个曝光场包括一个或多个目标部分和至少一个标记结构，所述标记结构被布置为所述曝光场的位置标记; 扫描和测量每个曝光场的标记以获得相应曝光场的对准信息; 根据相应曝光场的对准信息确定每个曝光场的绝对位置; 通过使用关于相对于彼此的曝光场和至少一个其他曝光场的相对参数的附加信息来确定每个曝光场相对于至少一个其它曝光场的相对位置; 以及将所述绝对位置和所确定的相对位置组合为所述多个曝光场中的每一个的改进的绝对位置。

3. 发明授权

US07562686B2 Method and system for 3D alignment in wafer scale integration 有权
标题翻译：晶圆级整合三维对准的方法和系统
公开(公告)号：US07562686B2
公开(公告)日：2009-07-21
申请号：US11317241
申请日：2005-12-27
申请人： Keith Frank Best , Geoffrey Norman Phillipps , Franciscus Godefridus Casper Bijnen , Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Peter Ten Berge
发明人： Keith Frank Best , Geoffrey Norman Phillipps , Franciscus Godefridus Casper Bijnen , Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph J. Consolini , Peter Ten Berge
IPC分类号： H01L21/30 , H01L21/46
CPC分类号： H01L25/50 , B81C3/001 , G03F9/7084 , H01L24/26 , H01L24/83 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01041 , H01L2924/01061 , H01L2924/01074 , H01L2924/01076 , H01L2924/01082 , H01L2924/01087 , H01L2924/07802 , H01L2924/12042 , H01L2924/14 , H01L2924/19041 , H01L2924/30105 , H01L2924/00
摘要： A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.
摘要翻译：基板接合系统具有用于分别保持第一基板和第二基板的第一和第二基板台，以及控制器。第一衬底包括具有第一接触焊盘的第一器件，而第二衬底具有第二接触焊盘的第二器件。晶片接合系统布置成以第一和第二器件形成电路的方式结合第一和第二器件。第一和第二衬底台各自包括位置传感器，其布置成分别测量在第一和第二衬底的对准标记上产生的光信号。第一和第二衬底台包括分别设置成改变相应衬底台的位置和取向的第一和第二致动器。

4. 发明申请

US20090051891A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20090051891A1
公开(公告)日：2009-02-26
申请号：US12261663
申请日：2008-10-30
申请人： Franciscus Godefridus Casper BIJNEN , Joannes Theodoor De Smit
发明人： Franciscus Godefridus Casper BIJNEN , Joannes Theodoor De Smit
IPC分类号： G03B27/80
CPC分类号： G03F7/70291 , G03F7/70791 , G03F9/7003
摘要： A system and method use a substrate with a pattern of individual, indiscrete alignment marks, i.e., the marks are separate and distinct from each other, and each mark is not divided into component parts. The pattern of marks is distributed over an area of the substrate, and the method also comprises the steps of providing a beam of radiation using an illumination system and an array of individually controllable elements to impart the beam with a pattern in its cross-section, providing a projection system to project the patterned beam onto the substrate, and providing a movement system to effect relative movement between the substrate and the projection system. A detection system, able to detect the alignment marks individually, is also provided, and the method includes using the detection system to detect the marks to determine a relative position of the substrate to the projection system, using the movement system to position the substrate relative to the projection system, and using the projection system to project the patterned beam of radiation onto a target portion of the substrate. The pattern comprises one or more rows of simple alignment marks, such as spots and short linear marks.
摘要翻译：一种系统和方法使用具有单独的，不分开的对准标记的图案的基板，即标记彼此分开和不同，并且每个标记不分为组成部分。标记的图案分布在基板的一个区域上，并且该方法还包括以下步骤：使用照明系统和单独可控元件的阵列提供辐射束，以在其横截面中赋予光束图案，提供投影系统以将图案化的光束投影到基板上，以及提供移动系统以实现基板和投影系统之间的相对移动。还提供了能够分别检测对准标记的检测系统，并且该方法包括使用检测系统来检测标记以确定基板与投影系统的相对位置，使用移动系统将基板相对定位并且使用投影系统将图案化的辐射束投影到基板的目标部分上。该图案包括一行或多行简单对准标记，例如斑点和短线性标记。

5. 发明申请

US20120062863A1 Alignment Measurement System, Lithographic Apparatus, and a Method to Determine Alignment in a Lithographic Apparatus 有权
标题翻译：对准测量系统，平版印刷设备和确定平版印刷设备中对准的方法
公开(公告)号：US20120062863A1
公开(公告)日：2012-03-15
申请号：US13206592
申请日：2011-08-10
申请人： Franciscus Godefridus Casper BIJNEN , Sami MUSA , David DECKERS
发明人： Franciscus Godefridus Casper BIJNEN , Sami MUSA , David DECKERS
IPC分类号： G03B27/54 , G01J4/00 , G01B11/02 , G01B11/00
CPC分类号： G03F7/70141 , G01B9/02 , G01B11/272 , G01D5/344 , G03F9/7046 , G03F9/7088
摘要： An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
摘要翻译：对准测量系统测量物体上的对准目标。测量照亮目标并被反射。反射的测量光束被分离，其部分被不同的极化。检测器接收反射的测量光束。处理单元基于由检测器接收的测量波束来确定对准。一种替代方案是使用光学色散光纤将从物体反射的多波长测量光束引导到检测器。

6. 发明授权

US07463337B2 Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatus 失效
标题翻译：具有窗的基板，测量基板的位置的方法和光刻设备
公开(公告)号：US07463337B2
公开(公告)日：2008-12-09
申请号：US11321467
申请日：2005-12-30
申请人： Henricus Wilhelmus Maria Van Buel , Franciscus Godefridus Casper Bijnen
发明人： Henricus Wilhelmus Maria Van Buel , Franciscus Godefridus Casper Bijnen
IPC分类号： G03B27/58
CPC分类号： G03F7/70716 , G03F9/7084 , G03F9/7088
摘要： A substrate table is provided with an optical system that includes a first window and a second window arranged to allow radiation to pass into an optical arm. At least two mirrors are provided within the optical arm and are arranged to reflect radiation that is passed through the windows. At least two lenses are positioned to receive radiation reflected from the mirrors, wherein the first window is provided with a first alignment mark and the at least two mirrors and at least two lenses are arranged to form an image of the first alignment mark at the second window. A second alignment mark is provided in the second window, or in the substrate table at a location adjacent to the second window.
摘要翻译：衬底台设置有光学系统，该光学系统包括第一窗口和布置成允许辐射进入光学臂的第二窗口。至少两个反射镜设置在光学臂内，并被布置成反射穿过窗户的辐射。至少两个透镜被定位成接收从反射镜反射的辐射，其中第一窗口设置有第一对准标记，并且至少两个反射镜和至少两个透镜被布置成在第二个第二对准标记处形成第一对准标记的图像窗口。第二对准标记设置在第二窗口中，或者在与第二窗口相邻的位置处的衬底台中。

7. 发明授权

US10151987B2 Measuring method, apparatus and substrate 有权
公开(公告)号：US10151987B2
公开(公告)日：2018-12-11
申请号：US13306668
申请日：2011-11-29
申请人： David Deckers , Franciscus Godefridus Casper Bijnen , Sami Musa
发明人： David Deckers , Franciscus Godefridus Casper Bijnen , Sami Musa
IPC分类号： G01N21/86 , G03F7/20 , G03F1/42 , G03F1/70 , G03F1/44 , G03F9/00
摘要： A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.

8. 发明授权

US09046385B2 Alignment measurement system, lithographic apparatus, and a method to determine alignment in a lithographic apparatus 有权
标题翻译：对准测量系统，光刻设备和确定光刻设备中的对准的方法
公开(公告)号：US09046385B2
公开(公告)日：2015-06-02
申请号：US13206592
申请日：2011-08-10
申请人： Franciscus Godefridus Casper Bijnen , Sami Musa , David Deckers
发明人： Franciscus Godefridus Casper Bijnen , Sami Musa , David Deckers
IPC分类号： G01B11/00 , G01J4/00 , G01D5/34 , G03F9/00
CPC分类号： G03F7/70141 , G01B9/02 , G01B11/272 , G01D5/344 , G03F9/7046 , G03F9/7088
摘要： An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector.
摘要翻译：对准测量系统测量物体上的对准目标。测量照亮目标并被反射。反射的测量光束被分离，其部分被不同的极化。检测器接收反射的测量光束。处理单元基于由检测器接收的测量波束来确定对准。一种替代方案是使用光学色散光纤将从物体反射的多波长测量光束引导到检测器。

9. 发明授权

US08208139B2 Alignment system and alignment marks for use therewith 有权
公开(公告)号：US08208139B2
公开(公告)日：2012-06-26
申请号：US12346063
申请日：2008-12-30
申请人： Edo Maria Hulsebos , Franciscus Godefridus Casper Bijnen , Patrick Warnaar
发明人： Edo Maria Hulsebos , Franciscus Godefridus Casper Bijnen , Patrick Warnaar
IPC分类号： G01B11/00
CPC分类号： G03B27/42 , G03F9/7003 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088
摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.

10. 发明申请

US20100245792A1 Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic Apparatus 审中-公开
标题翻译：对准测量布置，对准测量方法，器件制造方法和平版印刷设备
公开(公告)号：US20100245792A1
公开(公告)日：2010-09-30
申请号：US12730764
申请日：2010-03-24
申请人： Franciscus Godefridus Casper BIJNEN , Richard Johannes Franciscus VAN HAREN , Xiuhong WEI
发明人： Franciscus Godefridus Casper BIJNEN , Richard Johannes Franciscus VAN HAREN , Xiuhong WEI
IPC分类号： G03B27/42 , H04N7/18
CPC分类号： G03B27/42 , G03F9/7046 , G03F9/7088 , G03F9/7092
摘要： An alignment measurement arrangement includes a source, an optical system and a detector. The source generates a radiation beam with a plurality of wavelength ranges. The optical system receives the radiation beam, produces an alignment beam, directs the alignment beam to a mark located on an object, receives alignment radiation back from the mark, and transmits the received radiation. The detector receives the alignment radiation and detects an image of the alignment mark and outputs a plurality of alignment signals, r, each associated with one of the wavelength ranges. A processor, in communication with the detector, receives the alignment signals, determines signal qualities of the alignment signals; determines aligned positions of the alignment signals, and calculates a position of the alignment mark based on the signal qualities, aligned positions, and a model relating the aligned position to the range of wavelengths and mark characteristics, including mark depth and mark asymmetry.
摘要翻译：对准测量装置包括源，光学系统和检测器。源产生具有多个波长范围的辐射束。光学系统接收辐射束，产生对准光束，将对准光束引导到位于物体上的标记，从标记接收对准辐射，并发送接收到的辐射。检测器接收对准辐射并检测对准标记的图像，并输出多个与波长范围之一相关联的对准信号r。与检测器通信的处理器接收对准信号，确定对准信号的信号质量; 确定对准信号的对准位置，并且基于信号质量，对准位置以及与对准位置相关联的波长范围和标记特征（包括标记深度和标记不对称性）来计算对准标记的位置。

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