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1. 发明授权

US10340166B2 Substrates handling in a deposition system 有权
公开(公告)号：US10340166B2
公开(公告)日：2019-07-02
申请号：US14948381
申请日：2015-11-22
申请人： George Xinsheng Guo
发明人： George Xinsheng Guo
IPC分类号： H01L21/673 , H05K13/00
摘要： The present invention describe a substrate handling system that exerts no or controllable external forces to hold substrates, does not contact front or back of the substrates, has minimum contact with side edge area of the substrate, can hold one or two substrate to each position, can be positioned in any orientation, and can be easily handled by human or robots. In the case that no deposition materials is desirable on the edge or sides of substrate, a self-aligned mask that can be attached to the substrate carrier is presented.

2. 发明申请

US20090180847A1 MULTI-CHAMBER VACUUM PROCESSING AND TRANSFER SYSTEM 有权
标题翻译：多室真空加工和传送系统
公开(公告)号：US20090180847A1
公开(公告)日：2009-07-16
申请号：US12406961
申请日：2009-03-19
申请人： George Xinsheng Guo , Kai-an Wang
发明人： George Xinsheng Guo , Kai-an Wang
IPC分类号： H01L21/677 , H01L21/68
CPC分类号： H01L21/67751 , H01L21/6719 , H01L21/67196 , Y10S414/139
摘要： An apparatus for processing a work piece in a vacuum environment includes a master process chamber that can be exhausted to a sub-atmospheric air pressure or to be filled with a desirable gas, a transfer chamber configured to receive the work piece from outside of the master process chamber, one or more processing stations inside the master process chamber, a rotation plate configured to receive the work piece and to move the work piece to receive one or more processing operations, and a first transport mechanism configured to transfer the work piece from the transfer chamber on to the rotation plate. The transfer chamber is at least partially enclosed in the master process chamber and can be vacuum sealed off from the master process chamber.
摘要翻译：一种用于在真空环境中处理工件的设备包括：主处理室，其能够被排出到次大气压或者填充有所需的气体;传送室，被配置为从母板的外部接收工件处理室，主处理室内的一个或多个处理站，配置成接收工件并移动工件以接收一个或多个处理操作的旋转板，以及第一传送机构，其被配置为将工件从传送室到旋转板上。传送室至少部分地封闭在主处理室中，并且可以从主处理室真空密封。

3. 发明授权

US07638022B2 Magnetron source for deposition on large substrates 有权
标题翻译：用于沉积在大基片上的磁控管源
公开(公告)号：US07638022B2
公开(公告)日：2009-12-29
申请号：US11363024
申请日：2006-02-27
申请人： George Xinsheng Guo
发明人： George Xinsheng Guo
IPC分类号： C23C14/06
CPC分类号： H01J37/3408 , H01J37/3458
摘要： A magnetron source for producing a magnetic field near a surface of a target in a deposition system include a first magnet, a second magnet separated by a gap from the first magnet along a first direction, and a target holder configured to hold the target in the gap between the first magnet and the second magnet. The target includes a sputtering surface from which target material can be sputtered and deposited on a substrate. The target holder is so configured that the sputtering surface is substantially parallel to the first direction and the first magnet and the second magnet can produce a magnetic field near a surface of the target.
摘要翻译：用于在沉积系统中用于产生靶表面附近的磁场的磁控管源包括：第一磁体，沿第一方向与第一磁体间隔开的第二磁体;以及目标保持器，其被配置为将靶保持在第一磁体和第二磁体之间的间隙。目标包括溅射表面，目标材料可从该溅射表面溅射并沉积在基底上。目标保持器被构造成使得溅射表面基本上平行于第一方向，并且第一磁体和第二磁体可以在目标表面附近产生磁场。

4. 发明授权

US06617587B2 Electron optics for multi-beam electron beam lithography tool 失效
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US06617587B2
公开(公告)日：2003-09-09
申请号：US10243585
申请日：2002-09-12
申请人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J37147
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微制造的孔径偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

5. 发明授权

US07874783B2 Multi-chamber vacuum processing and transfer system 有权
标题翻译：多室真空处理和输送系统
公开(公告)号：US07874783B2
公开(公告)日：2011-01-25
申请号：US12406961
申请日：2009-03-19
申请人： George Xinsheng Guo , Kai-an Wang
发明人： George Xinsheng Guo , Kai-an Wang
IPC分类号： H01L21/677
CPC分类号： H01L21/67751 , H01L21/6719 , H01L21/67196 , Y10S414/139
摘要： An apparatus for processing a work piece in a vacuum environment includes a master process chamber that can be exhausted to a sub-atmospheric air pressure or to be filled with a desirable gas, a transfer chamber configured to receive the work piece from outside of the master process chamber, one or more processing stations inside the master process chamber, a rotation plate configured to receive the work piece and to move the work piece to receive one or more processing operations, and a first transport mechanism configured to transfer the work piece from the transfer chamber on to the rotation plate. The transfer chamber is at least partially enclosed in the master process chamber and can be vacuum sealed off from the master process chamber.
摘要翻译：一种用于在真空环境中处理工件的设备包括：主处理室，其能够被排出到次大气压或者填充有所需的气体;传送室，被配置为从母板的外部接收工件处理室，主处理室内的一个或多个处理站，配置成接收工件并移动工件以接收一个或多个处理操作的旋转板，以及第一传送机构，其被配置为将工件从传送室到旋转板上。传送室至少部分地封闭在主处理室中，并且可以从主处理室真空密封。

6. 发明申请

US20090020437A1 Method and system for controlled material removal by electrochemical polishing 审中-公开
标题翻译：通过电化学抛光控制材料去除的方法和系统
公开(公告)号：US20090020437A1
公开(公告)日：2009-01-22
申请号：US10902241
申请日：2004-07-29
申请人： Bulent M. Basol , Cyprian E. Uzoh , George Xinsheng Guo
发明人： Bulent M. Basol , Cyprian E. Uzoh , George Xinsheng Guo
IPC分类号： C25F3/16 , C25D17/00
CPC分类号： B24B37/12 , B24B37/046 , C25F3/30 , C25F7/00 , H01L21/2885 , H01L21/32115 , H01L21/32125 , H01L21/76838 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要： A method and apparatus for electropolishing a conductive layer on a wafer is provided. The apparatus includes an electrode and a conductive member having openings permitting an electropolishing solution to flow through it. Surface of the conductive member includes a surface profile. During the electropolishing process, the surface of the conductive element is placed across from the conductive layer and a potential difference is applied between the conductive layer and the electrode. The process forms a conductive layer profile of the conductive layer.
摘要翻译：提供了一种在晶片上电抛光导电层的方法和装置。该装置包括电极和具有允许电解抛光溶液流过其的开口的导电构件。导电构件的表面包括表面轮廓。在电抛光过程中，导电元件的表面被放置在导电层的两侧，并且在导电层和电极之间施加电位差。该工艺形成导电层的导电层轮廓。

7. 发明授权

US07588669B2 Single-process-chamber deposition system 失效
标题翻译：单过程室沉积系统
公开(公告)号：US07588669B2
公开(公告)日：2009-09-15
申请号：US11185241
申请日：2005-07-20
申请人： George Xinsheng Guo
发明人： George Xinsheng Guo
IPC分类号： C23C14/35
CPC分类号： C23C14/352 , H01J37/3408 , H01J37/3455 , H01J37/3473
摘要： A deposition system includes a process chamber, a workpiece holder for holding the workpiece within the process chamber, a first target comprising a first material, a second target comprising a second material, a single magnet assembly disposed that can scan across the first target and the second target to deposit the first material and the second material on the workpiece, and a transport mechanism that can cause relative movement between the magnet assembly and the first target or the second target.
摘要翻译：沉积系统包括处理室，用于将工件保持在处理室内的工件保持器，包括第一材料的第一靶，包括第二材料的第二靶，设置成能扫过第一靶的单个磁体组件和将第一材料和第二材料沉积在工件上的第二目标，以及可以在磁体组件和第一靶材或第二靶材之间引起相对运动的输送机构。

8. 发明授权

US07534080B2 Vacuum processing and transfer system 有权
标题翻译：真空加工转运系统
公开(公告)号：US07534080B2
公开(公告)日：2009-05-19
申请号：US11212142
申请日：2005-08-26
申请人： George Xinsheng Guo , Kai-An Wang
发明人： George Xinsheng Guo , Kai-An Wang
IPC分类号： H01L21/677
CPC分类号： H01L21/67751 , H01L21/6719 , H01L21/67196 , Y10S414/139
摘要： An apparatus for processing a work piece in a vacuum environment includes a master process chamber configured to be exhausted to a sub-atmospheric air pressure or to be filled with a desirable gas, a transfer chamber configured to receive the work piece from outside of the master process chamber, one or more processing stations inside the master process chamber, a rotation plate configured to receive the work piece and to move the work piece to receive one or more processing operations, and a first transport mechanism configured to transfer the work piece from the transfer chamber on to the rotation plate. The transfer chamber is at least partially enclosed in the master process chamber and can be vacuum sealed off from the master process chamber.
摘要翻译：一种用于在真空环境中处理工件的设备包括：主处理室，其被配置为排出到次大气压或者填充有所需的气体;传送室，被构造成从母板的外部接收工件处理室，主处理室内的一个或多个处理站，配置成接收工件并移动工件以接收一个或多个处理操作的旋转板，以及第一传送机构，其被配置为将工件从传送室到旋转板上。传送室至少部分地封闭在主处理室中，并且可以从主处理室真空密封。

9. 发明授权

US07399516B2 Long-life workpiece surface influencing device structure and manufacturing method 有权
标题翻译：长寿命工件表面影响装置结构及制造方法
公开(公告)号：US07399516B2
公开(公告)日：2008-07-15
申请号：US10367111
申请日：2003-02-14
申请人： Bulent M. Basol , George Xinsheng Guo
发明人： Bulent M. Basol , George Xinsheng Guo
IPC分类号： B24D11/00 , B32B3/30 , B32B5/16 , B32B33/00
CPC分类号： B23H5/10 , B23H5/08 , B24B37/24 , C25D17/14 , Y10T428/24364 , Y10T428/24372 , Y10T428/24579 , Y10T428/24587 , Y10T428/24612 , Y10T428/256 , Y10T428/257 , Y10T428/268
摘要： A top layer comprises a flexible support and a plurality of hard elements anchored in a binder over the flexible support, and a method of forming the same is provided. In one embodiment, certain ones of the hard elements have a contact surface adapted to contact the conductive surface, with the binder being disposed below the contact surface of each of the certain ones of the hard elements. In another embodiment, the top layer comprises a flexible support, a plurality of hard elements are anchored in a binder over the flexible support such that certain ones of the hard elements have a top surface and the binder is disposed below the top surface of each of the certain ones of the hard elements, and a hard material coating is disposed over the plurality of hard elements and the binder, thereby creating a contact surface of the hard material coating at locations corresponding to the top surface of the certain ones of the hard elements.
摘要翻译：顶层包括柔性支撑件和锚固在柔性支撑件上的粘合剂中的多个硬元件，并且提供了一种形成该支撑件的方法。在一个实施例中，某些硬元件具有适于接触导电表面的接触表面，其中粘合剂设置在每个硬质元件中的每一个的接触表面的下方。在另一个实施例中，顶层包括柔性支撑件，多个硬元件锚固在柔性支撑件上的粘合剂中，使得某些硬质元件具有顶表面，并且粘合剂设置在每个的顶表面的下表面之下某些硬质元件和硬质材料涂层设置在多个硬元件和粘合剂上，从而在对应于某些硬元件的顶表面的位置处形成硬质材料涂层的接触表面。

10. 发明申请

US20170144186A1 SUBSTRATES HANDLING IN A DEPOSITION SYSTEM 审中-公开
公开(公告)号：US20170144186A1
公开(公告)日：2017-05-25
申请号：US14948381
申请日：2015-11-22
申请人： George Xinsheng Guo
发明人： George Xinsheng Guo
IPC分类号： B05C13/00 , H01L21/687
CPC分类号： H01L21/67346 , H01L21/67309 , H01L21/67383 , H05K13/0061
摘要： The present invention describe a substrate handling system that exerts no or controllable external forces to hold substrates, does not contact front or back of the substrates, has minimum contact with side edge area of the substrate, can hold one or two substrate to each position, can be positioned in any orientation, and can be easily handled by human or robots. In the case that no deposition materials is desirable on the edge or sides of substrate, a self-aligned mask that can be attached to the substrate carrier is presented.

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