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1. 发明授权

US08681413B2 Illumination control 有权
标题翻译：照明控制
公开(公告)号：US08681413B2
公开(公告)日：2014-03-25
申请号：US13170025
申请日：2011-06-27
申请人： Amnon Manassen , Joel Seligson , Noam Sapiens
发明人： Amnon Manassen , Joel Seligson , Noam Sapiens
IPC分类号： G02B26/00 , G02B26/08
CPC分类号： G01J1/4257 , G02B21/0016 , G02B21/082 , G02B21/365 , G02B26/0833 , G03F7/70633
摘要： An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.
摘要翻译：光学系统可以包括目标，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统，以及分别位于瞳孔共轭平面和场共轭平面处的至少两个动态光学阵列器件照明光学。动态光学阵列器件被配置为控制从照明系统耦合到目标的照明的一个或多个特性。

2. 发明申请

US20130044331A1 OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS 有权
标题翻译：通过相位分析的覆盖度量
公开(公告)号：US20130044331A1
公开(公告)日：2013-02-21
申请号：US13209778
申请日：2011-08-15
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
IPC分类号： G01B11/14 , G01B11/26
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

3. 发明申请

US20110069312A1 METROLOGY SYSTEMS AND METHODS 有权
标题翻译：计量系统与方法
公开(公告)号：US20110069312A1
公开(公告)日：2011-03-24
申请号：US12872988
申请日：2010-08-31
申请人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
发明人： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
IPC分类号： G01J4/00 , G01J3/28 , G01B11/14
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：提供了各种计量系统和方法。

4. 发明申请

US20120327503A1 ILLUMINATION CONTROL 有权
标题翻译：照明控制
公开(公告)号：US20120327503A1
公开(公告)日：2012-12-27
申请号：US13170025
申请日：2011-06-27
申请人： Amnon Manassen , Joel Seligson , Noam Sapiens
发明人： Amnon Manassen , Joel Seligson , Noam Sapiens
IPC分类号： G02B26/00 , G02F1/01 , G02F1/29 , G02F1/00
CPC分类号： G01J1/4257 , G02B21/0016 , G02B21/082 , G02B21/365 , G02B26/0833 , G03F7/70633
摘要： An optical system may include an objective, a source of illumination, an illumination system having illumination optics configured to direct the illumination onto the objective, and at least two dynamic optical array devices located at a pupil conjugate plane and a field conjugate plane, respectively in the illumination optics. The dynamic optical array devices are configured to control one or more properties of illumination coupled from the illumination system to the objective.
摘要翻译：光学系统可以包括目标，照明源，具有被配置为将照明引导到物镜上的照明光学器件的照明系统，以及分别位于瞳孔共轭平面和场共轭平面处的至少两个动态光学阵列器件照明光学。动态光学阵列器件被配置为控制从照明系统耦合到目标的照明的一个或多个特性。

5. 发明申请

US20070279630A1 ORDER SELECTED OVERLAY METROLOGY 有权
标题翻译：订单选择重叠度量
公开(公告)号：US20070279630A1
公开(公告)日：2007-12-06
申请号：US11754892
申请日：2007-05-29
申请人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
发明人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
IPC分类号： G01B11/00
CPC分类号： G03F7/70633
摘要： Disclosed are apparatus and methods for measuring a characteristic, such as overlay, of a semiconductor target. In general, order-selected imaging and/or illumination is performed while collecting an image from a target using a metrology system. In one implementation, tunable spatial modulation is provided only in the imaging path of the system. In other implementations, tunable spatial modulation is provided in both the illumination and imaging paths of the system. In a specific implementation, tunable spatial modulation is used to image side-by-side gratings with diffraction orders ±n. The side-by-side gratings may be in different layers or the same layer of a semiconductor wafer. The overlay between the structures is typically found by measuring the distance between centers symmetry of the gratings. In this embodiment, only orders ±n for a given choice of n (where n is an integer and not equal to zero) are selected, and the gratings are only imaged with these diffraction orders.
摘要翻译：公开了用于测量半导体靶的特性（例如覆盖）的装置和方法。通常，在使用度量系统从目标物收集图像的同时执行顺序选择的成像和/或照明。在一个实现中，仅在系统的成像路径中提供可调谐空间调制。在其他实施方式中，在系统的照明和成像路径中提供可调谐的空间调制。在具体实现中，可调谐空间调制用于以衍射级±n对并行光栅进行成像。并排光栅可以在不同的层或相同的半导体晶片层中。通常通过测量光栅的中心对称性之间的距离来发现结构之间的覆盖。在本实施例中，对于给定的n（其中n是整数且不等于零）的选择，仅选择±n，并且光栅仅以这些衍射级成像。

6. 发明授权

US08908175B1 Flexible scatterometry metrology system and method 有权
标题翻译：灵活的散射测量系统和方法
公开(公告)号：US08908175B1
公开(公告)日：2014-12-09
申请号：US11521118
申请日：2006-09-13
申请人： Daniel Kandel , Michael Adel , Joel Seligson , Boris Golovanevsky
发明人： Daniel Kandel , Michael Adel , Joel Seligson , Boris Golovanevsky
IPC分类号： G01N21/00
CPC分类号： G01N21/211
摘要： A scatterometry tool including an illumination source for directing a light beam into a first optical beam shaping and positioning element at an illumination pupil plane of the tool where the light beam is modulated and directed to an objective lens system having a high numerical aperture. The objective receiving the modulated light beam and directing it onto a target to generate a scattering signal. The objective lens collects the scattering signal and directs it to a second optical beam shaping and positioning element at a collection pupil plane where the signal is modulated and then directed to detectors for receiving and processing the signal to determine surface characteristics of the target.
摘要翻译：散射测量工具，其包括用于将光束引导到工具的照明光瞳平面处的第一光束成形和定位元件的照明源，其中光束被调制并被引导到具有高数值孔径的物镜系统。接收调制光束并将其引导到目标上以产生散射信号的目的。物镜收集散射信号，并将其引导到收集光瞳平面处的第二光束整形和定位元件，信号被调制，然后被引导到检测器以接收和处理信号以确定目标的表面特性。

7. 发明授权

US07602491B2 Optical gain approach for enhancement of overlay and alignment systems performance 失效
标题翻译：用于增强覆盖和对准系统性能的光增益方法
公开(公告)号：US07602491B2
公开(公告)日：2009-10-13
申请号：US12108364
申请日：2008-04-23
申请人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
发明人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
IPC分类号： G01B11/00 , G01B11/02 , G06K9/00
CPC分类号： G01B11/272 , G03F7/70633
摘要： A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern.
摘要翻译：可以通过将目标图像划分成第一和第二部分并光学地修改第一和/或第二部分使得由其组合形成的最终图像由莫尔图案表征来获得光栅目标的合成图像。可以分析所得到的图像以确定光栅目标从莫尔图案的偏移中的偏移。光学对准装置可以包括第一分束器，光耦合到第一分束器的图像变换元件和第二分束器。第一分束器将光栅靶的图像分成第一和第二部分。第二分束器组合第一部分和第二部分。图像变换元件光学地修改第一和/或第二部分，使得由它们的组合形成的最终图像的特征在于莫尔图案。

8. 发明申请

US20060280357A1 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US20060280357A1
公开(公告)日：2006-12-14
申请号：US11510147
申请日：2006-08-24
申请人： Joel Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06K9/00
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
摘要翻译：公开了用于从一个或多个半导体覆盖目标获取和分析各种独特度量或“目标诊断”的装置和方法。在一个实施例中，测量覆盖目标以获得两种特定类型的目标诊断信息，系统误差度量和/或随机噪声度量中的一种或两种。系统误差度量通常量化覆盖目标的不对称性，而随机噪声度量量化和/或限定与覆盖目标邻近或相关联的空间噪声。

9. 发明授权

US08896832B2 Discrete polarization scatterometry 有权
标题翻译：离散极化散射法
公开(公告)号：US08896832B2
公开(公告)日：2014-11-25
申请号：US13108892
申请日：2011-05-16
申请人： Andrew V. Hill , Amnon Manassen , Daniel Kandel , Vladimir Levinski , Joel Seligson , Alexander Svizher , David Y. Wang , Lawrence D. Rotter , Johannes D. de Veer
发明人： Andrew V. Hill , Amnon Manassen , Daniel Kandel , Vladimir Levinski , Joel Seligson , Alexander Svizher , David Y. Wang , Lawrence D. Rotter , Johannes D. de Veer
IPC分类号： G01J4/00 , G02B27/14 , G01N21/47
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

10. 发明授权

US08582114B2 Overlay metrology by pupil phase analysis 有权
标题翻译：通过瞳孔相位分析覆盖度量
公开(公告)号：US08582114B2
公开(公告)日：2013-11-12
申请号：US13209778
申请日：2011-08-15
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
IPC分类号： G01B11/02
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

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