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1. 发明授权

US09164397B2 Optics symmetrization for metrology 有权
标题翻译：计量学的光学对称性
公开(公告)号：US09164397B2
公开(公告)日：2015-10-20
申请号：US13188623
申请日：2011-07-22
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Joel L. Seligson , Alexander Svizher , Guy Cohen , Efraim Rotem , Ohad Bachar , Daria Negri , Noam Sapiens
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Joel L. Seligson , Alexander Svizher , Guy Cohen , Efraim Rotem , Ohad Bachar , Daria Negri , Noam Sapiens
IPC分类号： G01B9/02 , G03F7/20 , G01N21/55
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器，被配置为将由ISM处理的光的第一部分沿着一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器，其中检测器被配置为收集从表面反射的光的一部分的一个或多个标本。

2. 发明授权

US07242477B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07242477B2
公开(公告)日：2007-07-10
申请号：US10785430
申请日：2004-02-23
申请人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Mark Ghinovker , Christopher F. Bevis , Noam Knoll , Moshe Baruch
发明人： Walter D. Mieher , Ady Levy , Boris Golovanesky , Michael Friedmann , Ian Smith , Michael E. Adel , Mark Ghinovker , Christopher F. Bevis , Noam Knoll , Moshe Baruch
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. A sample having a plurality of periodic targets that each have a first structure in a first layer and a second structure in a second layer is provided. There are predefined offsets between the first and second structures. Using a scatterometry overlay metrology, scatterometry overlay data is obtained from a first set of the periodic targets based on one or more measured optical signals from the first target set on the sample. Using an imaging overlay metrology, imaging overlay data is obtained from a second set of the periodic targets based on one or more image(s) from the second target set on the sample.
摘要翻译：公开了一种用于确定多层样品中至少两层之间的覆盖误差的方法。提供具有多个周期性靶的样品，每个周期性靶在第一层中具有第一结构，在第二层中具有第二结构。在第一和第二结构之间有预定义的偏移。使用散射测绘重叠测量，基于来自样品上的第一目标组的一个或多个测量光信号，从第一组周期性目标获得散点测绘覆盖数据。使用成像覆盖度量，基于来自样品上的第二目标集的一个或多个图像，从第二组周期性目标获得成像覆盖数据。

3. 发明申请

US20130063791A1 IMAGING HEAD FOR A FLAT BED SCANNER 有权
标题翻译：平板扫描仪成像头
公开(公告)号：US20130063791A1
公开(公告)日：2013-03-14
申请号：US13229980
申请日：2011-09-12
申请人： Moshe-Baruch Kort
发明人： Moshe-Baruch Kort
IPC分类号： H04N1/04
CPC分类号： H04N1/1135
摘要： A method for imaging using a flatbed imaging system includes providing first imaging data to a first imaging source; providing second imaging data to a second imaging source; imaging a first beam from the first imaging source at a first height on a rotating multi-facet spinner; imaging a second beam from the second imaging source at a second height on the rotating multi-facet spinner; distributing the first beam on a first location on a printing plate; and distributing the second beam on a second location on a the printing plate.
摘要翻译：使用平板成像系统进行成像的方法包括：将第一成像数据提供给第一成像源; 向第二成像源提供第二成像数据; 在旋转的多面旋转器上以第一高度从第一成像源成像第一光束; 在旋转的多面旋转器上的第二高度处成像来自第二成像源的第二光束; 将第一光束分布在印版上的第一位置; 以及将所述第二光束分布在所述印刷版上的第二位置上。

4. 发明申请

US20120033226A1 OPTICS SYMMETRIZATION FOR METROLOGY 有权
标题翻译： OPTICS SYMPETRIZATION FOR METROLOGY
公开(公告)号：US20120033226A1
公开(公告)日：2012-02-09
申请号：US13188623
申请日：2011-07-22
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Joel L. Seligson , Alexander Svizher , Guy Cohen , Efraim Rotem , Ohad Bachar , Daria Negri , Noam Sapiens
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Joel L. Seligson , Alexander Svizher , Guy Cohen , Efraim Rotem , Ohad Bachar , Daria Negri , Noam Sapiens
IPC分类号： G01B9/02 , G01N21/55
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器，被配置为将由ISM处理的光的第一部分沿着一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器，其中检测器被配置为收集从表面反射的光的一部分的一个或多个标本。

5. 发明授权

US08593703B2 Imaging head for a flat bed scanner 有权
标题翻译：平板扫描仪成像头
公开(公告)号：US08593703B2
公开(公告)日：2013-11-26
申请号：US13229980
申请日：2011-09-12
申请人： Moshe-Baruch Kort
发明人： Moshe-Baruch Kort
IPC分类号： H04N1/04 , H04N1/21 , G06F3/12 , A61B6/00 , G01B11/00 , G01J1/42
CPC分类号： H04N1/1135
摘要： A method for imaging using a flatbed imaging system includes providing first imaging data to a first imaging source; providing second imaging data to a second imaging source; imaging a first beam from the first imaging source at a first height on a rotating multi-facet spinner; imaging a second beam from the second imaging source at a second height on the rotating multi-facet spinner; distributing the first beam on a first location on a printing plate; and distributing the second beam on a second location on a the printing plate.
摘要翻译：使用平板成像系统进行成像的方法包括：将第一成像数据提供给第一成像源; 向第二成像源提供第二成像数据; 在旋转的多面旋转器上以第一高度从第一成像源成像第一光束; 在旋转的多面旋转器上的第二高度处成像来自第二成像源的第二光束; 将第一光束分布在印版上的第一位置; 以及将所述第二光束分布在所述印刷版上的第二位置上。

6. 发明授权

US08582114B2 Overlay metrology by pupil phase analysis 有权
标题翻译：通过瞳孔相位分析覆盖度量
公开(公告)号：US08582114B2
公开(公告)日：2013-11-12
申请号：US13209778
申请日：2011-08-15
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
IPC分类号： G01B11/02
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

7. 发明申请

US20130063744A1 IMAGING HEAD FOR A FLAT BED SCANNER 审中-公开
标题翻译：平板扫描仪成像头
公开(公告)号：US20130063744A1
公开(公告)日：2013-03-14
申请号：US13229944
申请日：2011-09-12
申请人： Moshe-Baruch Kort
发明人： Moshe-Baruch Kort
IPC分类号： G06K15/02 , H04N1/23
CPC分类号： H04N1/02436 , B41J2/473 , G02B26/123 , G03F7/2055 , H04N1/1135
摘要： An imaging head for a flatbed imaging system includes a first rotating multi-facet spinner; a first set of long mirrors directed towards imaging media positioned on a flatbed surface wherein the first set mirrors is at a first distance from said media; a second set of long mirrors directed towards the imaging media wherein the second set of mirrors is at a second distance from said media; a first laser source configured to emit light on the spinner at a first height on the spinner wherein light emitted from the first height on the spinner is directed to the first set of mirrors; and a second laser source configured to emit light on the spinner at a second height on the spinner wherein light emitted from the second height on the spinner is directed to the second set of mirrors.
摘要翻译：用于平板成像系统的成像头包括第一旋转多面旋转器; 指向位于平板表面上的成像介质的第一组长镜，其中所述第一组镜与所述介质处于第一距离; 指向成像介质的第二组长反射镜，其中第二组反射镜距离所述介质为第二距离; 第一激光源，被配置为在所述旋转器上的第一高度处在所述旋转器上发光，其中从所述旋转器上的所述第一高度发射的光被引导到所述第一组反射镜; 以及第二激光源，其配置成在所述旋转器上的第二高度在所述旋转器上发光，其中从所述旋转器上的所述第二高度发射的光被引导到所述第二组反射镜。

8. 发明申请

US20110281242A1 TRAINING AID FOR FIREARMS USING ROTATING AND NON-ROTATING BOLTS 审中-公开
标题翻译：使用旋转和非旋转螺栓进行火灾培训
公开(公告)号：US20110281242A1
公开(公告)日：2011-11-17
申请号：US12425936
申请日：2009-04-17
申请人： Moshe Baruch Charles , Shira Charles
发明人： Moshe Baruch Charles , Shira Charles
IPC分类号： F41G3/26
CPC分类号： F41G3/2655 , F41A33/02
摘要： An apparatus and system permitting simulated firing from any firearm including a bolt and/or rotating bolt as well as rifles, machine guns, sniper rifles and the like. In particular, the present invention relates to light emitting munitions, being used as part of a system for registering “hits” during dry-fire exercises and gaming with any hand-held firearm, without any change to either the feel, or the external dimensions of the firearms.
摘要翻译：允许从包括螺栓和/或旋转螺栓以及步枪，机枪，狙击步枪等的任何火器进行模拟点火的装置和系统。特别地，本发明涉及发光弹药，其被用作用于在任何手持火器的干火演习和游戏期间登记“命中”的系统的一部分，而不会改变手感或外部尺寸的火器。

9. 发明申请

US20130044331A1 OVERLAY METROLOGY BY PUPIL PHASE ANALYSIS 有权
标题翻译：通过相位分析的覆盖度量
公开(公告)号：US20130044331A1
公开(公告)日：2013-02-21
申请号：US13209778
申请日：2011-08-15
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
IPC分类号： G01B11/14 , G01B11/26
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

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