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    • 7. 发明申请
    • Methods of fabricating semiconductor devices having insulating layers with differing compressive stresses and related devices
    • 制造具有不同压缩应力的绝缘层和相关器件的半导体器件的方法
    • US20060148153A1
    • 2006-07-06
    • US11322440
    • 2005-12-30
    • Hyung-Shin KwonDong-Won LeeJun-Beom Park
    • Hyung-Shin KwonDong-Won LeeJun-Beom Park
    • H01L21/8234
    • H01L21/823807
    • Methods of fabricating semiconductor devices are provided. An NMOS transistor and a PMOS transistor are provided on a substrate. The NMOS transistor is positioned on an NMOS region of the substrate and the PMOS transistor is positioned on a PMOS region of the substrate. A first insulating layer is provided on the NMOS transistor. The first insulating layer has a first compressive stress. A second insulating layer is provided on the PMOS transistor. The second insulating layer has a second compressive stress and a stress relief ratio higher than a stress relief ratio of the first insulating layer. A thermal treatment process is performed on the first insulating layer and the second insulating layer such that the second compressive stress of the second insulating layer is lower than the first compressive stress of the first insulating layer. Related devices are also provided.
    • 提供制造半导体器件的方法。 NMOS晶体管和PMOS晶体管设置在基板上。 NMOS晶体管位于衬底的NMOS区域上,PMOS晶体管位于衬底的PMOS区域上。 第一绝缘层设置在NMOS晶体管上。 第一绝缘层具有第一压缩应力。 第二绝缘层设置在PMOS晶体管上。 第二绝缘层具有比第一绝缘层的应力消除比高的第二压缩应力和应力消除比。 在第一绝缘层和第二绝缘层上进行热处理工艺,使得第二绝缘层的第二压缩应力低于第一绝缘层的第一压缩应力。 还提供了相关设备。