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    • 4. 发明授权
    • Electron lens and charged particle beam apparatus
    • 电子透镜和带电粒子束装置
    • US07759652B2
    • 2010-07-20
    • US11749181
    • 2007-05-16
    • Takashi OhshimaMitsugu SatoYutaka KanekoSouichi KatagiriKoichiro Takeuchi
    • Takashi OhshimaMitsugu SatoYutaka KanekoSouichi KatagiriKoichiro Takeuchi
    • H01J1/50
    • H01J37/143H01J37/28H01J2237/1405H01J2237/2813H01J2237/31749
    • The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.
    • 本发明提供一种产生很小像差的小型电子透镜,以及诸如扫描电子显微镜的带电粒子束装置,其具有超级紧凑并且提供高分辨率。 上磁极和样本侧磁极磁耦合到由诸如稀土钴体系或钕铁硼体系的高强度磁性材料制成的永磁体的各极上,即, 轴向对称,并且在其中心具有孔。 在中心轴的一侧产生内部间隙。 因此,磁性透镜轴向形成。 此外,将外部磁场屏蔽并具有调节磁阻的半静态磁路设置在外部。 样品侧磁极和磁路限定永磁体外磁阻最高的区域。 由永磁体,上磁极,样品芯磁极和半静态磁路限定的空间填充有由非磁性材料制成的填充物。 因此,构成物镜。
    • 5. 发明授权
    • Focused ION beam apparatus
    • 聚焦光束装置
    • US07550740B2
    • 2009-06-23
    • US11828714
    • 2007-07-26
    • Koichiro TakeuchiTohru Ishitani
    • Koichiro TakeuchiTohru Ishitani
    • G21K1/093H01J29/58H01J29/64H01J37/21
    • H01J37/3056H01J37/09H01J37/1471H01J2237/31745H01J2237/31749
    • A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope separation of the ion beam on the sample, even when there is a magnetic field on the ion beam optical axis or the magnetic field fluctuates. The focused ion beam apparatus comprises a corrective magnetic field generating unit 10 disposed on the optical axis of the ion beam 3 for correcting the deflection of the ion beam 3 due to an external magnetic field. The corrective magnetic field generating unit 10 includes pole-piece pairs 26A and 26B, each of which having two pole pieces 26a and 26b or 26c and 26d that are adjacent to each other with a gap d. The pole-piece pairs 26A and 26B are disposed opposite to each other with a gap g (>d) across the optical axis of the ion beam 3. Each of the pole pieces 26a to 26d is wound with an internal coil 29, and the pole-piece pairs 26A and 26B are each wound with an external coil 30 in such a manner as to surround the internal coils 29.
    • 聚焦离子束装置使得离子束能够在不存在磁场的情况下的光束位置处的样品上高精度地聚焦,而不会导致样品上的离子束同位素分离,即使存在磁场 在离子束光轴上或磁场波动。 聚焦离子束装置包括设置在离子束3的光轴上的校正磁场产生单元10,用于校正由外部磁场引起的离子束3的偏转。 校正磁场产生单元10包括极片对26A和26B,每个具有间隙d彼此相邻的两个极片26a和26b或26c和26d。 极片对26A和26B彼此相对地设置有跨越离子束3的光轴的间隙g(> d)。每个极片26a至26d都缠绕有内部线圈29,并且 极片对26A和26B分别以包围内部线圈29的方式缠绕有外部线圈30。
    • 6. 发明授权
    • Chemical vapor deposition using inductively coupled plasma and system
therefor
    • 使用电感耦合等离子体的化学气相沉积及其系统
    • US5824158A
    • 1998-10-20
    • US917803
    • 1997-08-27
    • Koichiro TakeuchiHirokazu UedaAkira Narai
    • Koichiro TakeuchiHirokazu UedaAkira Narai
    • C23C16/507H01J37/32C23C16/00
    • H01J37/321C23C16/507
    • An ICP (Inductively Coupled Plasma) system is used as a plasma generating means. A CVD process gas is introduced within a vacuum vessel from a gas inlet nozzle, and is then converted into plasma by a high frequency electric field induced within the vacuum vessel by an electromagnetic wave from an antenna. A sample can be located at a position not to be exposed to plasma, and a decomposed product material produced from the CVD process gas by the plasma is deposited on the surface of the sample mounted on a sample stage, thus forming a film. A dielectric viewing port, the antenna and the sample are disposed along the same axial direction such that the directions of the planes thereof correspond to each other, so that the film formation on the surface of the sample within the vacuum vessel can be observed through the transparent dielectric viewing port. When a CVD process gas of a CVD source gas mixed with a rare gas is introduced in the vacuum vessel and a bias voltage is applied to the sample, the film is formed by the CVD source gas and it is simultaneously planarized by sputter etching by the rare gas. When an antenna serving as a target material is disposed within the vacuum vessel, it is possible to eliminate the cutoff of the high frequency power which, has been generated for the inductive coupling from the outside of the vacuum vessel.
    • 使用ICP(感应耦合等离子体)系统作为等离子体发生装置。 将CVD工艺气体从气体入口喷嘴引入真空容器内,然后通过来自天线的电磁波在真空容器内感应的高频电场转换成等离子体。 样品可以位于不暴露于等离子体的位置,并且通过等离子体由CVD处理气体产生的分解产物材料沉积在安装在样品台上的样品的表面上,从而形成膜。 电介质观察口,天线和样品沿着相同的轴向方向设置,使得其平面的方向彼此对应,使得真空容器内的样品表面上的成膜可以通过 透明电介质观察口。 当将与稀有气体混合的CVD源气体的CVD工艺气体引入真空容器中并向样品施加偏置电压时,该膜由CVD源气体形成,并且通过溅射蚀刻同时被平坦化 稀有气体 当用作目标材料的天线设置在真空容器内时,可以消除从真空容器的外部产生的用于电感耦合的高频功率的截止。
    • 9. 发明授权
    • Control system for torque converter
    • 变矩器控制系统
    • US5339935A
    • 1994-08-23
    • US928165
    • 1992-08-13
    • Kozo IshiiKazuo TakemotoTakuji FujiwaraTatsutoshi MizobeFumiaki BabaShigeru NagayamaOsamu WatanabeKoichiro Takeuchi
    • Kozo IshiiKazuo TakemotoTakuji FujiwaraTatsutoshi MizobeFumiaki BabaShigeru NagayamaOsamu WatanabeKoichiro Takeuchi
    • F16H61/02F16H61/14F16H45/02
    • F16H61/143F16H2045/021F16H2061/0255F16H2061/145
    • A control system for a torque converter includes a lock-up clutch provided in the torque converter for connecting input and output members of the torque converter directly, and a shift valve having first and second spools disposed in series in a sleeve for shifting an introduction of an engaging and releasing pressure acting on the lock-up clutch in accordance with positions of the first and second spools. The first spool is subjected to a first hydraulic pressure at one end thereof. The second spool is subjected to a second hydraulic pressure at one end thereof opposite to the one end of the first spool. The first and second spools are subjected to a third hydraulic pressure therebetween. The control system further has a first control device for controlling the first hydraulic pressure, and an adjusting valve for controlling the releasing pressure of the lock-up clutch. The shift valve provides the first and second spools with first, second and third positions corresponding to a converter condition, lock-up condition and slip condition, respectively. The shift valve is shifted between the second and third positions when the releasing pressure is relatively low so that the releasing pressure is continuously changed irrespective of the shifting action among the first, second and third positions of the shift valve. An abrupt change in the engaging force of the lock-up clutch is prevented.
    • 用于变矩器的控制系统包括设置在变矩器中用于直接连接变矩器的输入和输出构件的锁止离合器,以及具有串联设置在套筒中的第一和第二线轴的换档阀, 根据第一和第二卷轴的位置,作用在锁止离合器上的接合和释放压力。 第一阀芯在其一端经受第一液压。 第二阀芯在与第一阀芯的一端相对的一端处受到第二液压。 第一和第二线轴之间经受第三液压。 控制系统还具有用于控制第一液压的第一控制装置和用于控制锁止离合器的释放压力的调节阀。 换档阀提供第一和第二线轴,其中第一,第二和第三位置分别对应于转换器状态,锁定状态和滑动状态。 当释放压力相对较低时,换档阀在第二和第三位置之间移动,使得释放压力连续地改变,而与换挡阀的第一,第二和第三位置之间的换档动作无关。 防止了锁止离合器的接合力的突然变化。