专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08796651B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US08796651B2
公开(公告)日：2014-08-05
申请号：US12929396
申请日：2011-01-20
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21G5/00
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
摘要翻译：相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品通过转动样品台来控制切片。

2. 发明申请

US20120217391A1 CHARGED PARTICLE MICROSCOPE 审中-公开
标题翻译：充电颗粒显微镜
公开(公告)号：US20120217391A1
公开(公告)日：2012-08-30
申请号：US13508040
申请日：2010-11-01
申请人： Hiroyasu Shichi , Shinichi Matsubara , Noriaki Arai , Tohru Ishitani , Yoichi Ose , Yoshimi Kawanami
发明人： Hiroyasu Shichi , Shinichi Matsubara , Noriaki Arai , Tohru Ishitani , Yoichi Ose , Yoshimi Kawanami
IPC分类号： H01J37/28
CPC分类号： H01J37/08 , H01J27/26 , H01J37/09 , H01J37/28 , H01J2237/062 , H01J2237/0807
摘要： The charged particle beam microscope is configured of: a gas field ionization ion source (1); a focusing lens (5) which accelerates and focuses ions that have been discharged from the ion source; a movable first aperture (6) which limits the ion beam that has passed through the focusing lens; a first deflector (35) which scans or aligns the ion beam that has passed through the first aperture; a second deflector (7) which deflects the ion beam that has passed through the first aperture; a second aperture (36) which limits the ion beam that has passed through the first aperture; an objective lens (8) which focuses, on a sample, the ion beam that has passed through the first aperture; and a means for measuring the signal, which is substantially proportional to the current of the ion beam that has passed through the second aperture.
摘要翻译：带电粒子束显微镜由气体离子源（1）构成; 聚焦透镜（5），其加速并聚焦已经从离子源放出的离子; 限制已经通过聚焦透镜的离子束的可移动的第一孔（6）; 第一偏转器（35），其扫描或对准已经穿过第一孔的离子束; 第二偏转器（7），其使已经穿过第一孔的离子束偏转; 限制已经通过第一孔的离子束的第二孔（36）; 物镜（8），其在样品上聚焦已经穿过第一孔的离子束; 以及用于测量与已经通过第二孔的离子束的电流基本成比例的信号的装置。

3. 发明申请

US20110254944A1 SCANNING CHARGED PARTICLE MICROSCOPE 审中-公开
标题翻译：扫描充电颗粒显微镜
公开(公告)号：US20110254944A1
公开(公告)日：2011-10-20
申请号：US13122532
申请日：2009-10-02
申请人： Tohru Ishitani , Isao Nagaoki
发明人： Tohru Ishitani , Isao Nagaoki
IPC分类号： H04N7/18 , G06K9/36
CPC分类号： H01J37/28 , H01J37/09 , H01J37/222 , H01J2237/0216 , H01J2237/223 , H01J2237/2817
摘要： When a scanning image of a scanning charged particle microscope is impaired by an external disturbance, a disturbance frequency can be simply and precisely analyzed from the image in order to specify the external disturbance. The maximum frequency analyzable by the scanning charged particle microscope can also be increased up to several kHz, which is the rotation frequency of, for example, a turbo-molecular pump commonly used as an exhaust pump of the scanning charged particle microscope. In an FFT analysis of a stripe pattern which is an impairment of the scanning image, the scanning charged particle microscope performs a one-dimensional FFT (1D-FFT) in the Y-direction (sub-deflection direction of the charged particle beam) or a one-dimensional DFT (1D-DFT) in the X-direction (main deflection direction of the charged particle beam). To extend the analyzable maximum frequency up to several kHz, the scanning charged particle microscope also performs the 1D-FFT (or 1D-DFT) analysis in the X-direction (main deflection direction of the charged particle beam) along which the charged particle beam has a fast scanning speed.
摘要翻译：当扫描带电粒子显微镜的扫描图像被外部干扰削弱时，可以从图像中简单且精确地分析干扰频率，以便指定外部干扰。通过扫描带电粒子显微镜可分析的最大频率也可以增加到几kHz，这是例如通常用作扫描带电粒子显微镜的排气泵的涡轮分子泵的旋转频率。扫描带电粒子显微镜在对扫描图像的损伤的条纹图案进行FFT分析时，在Y方向（带电粒子束的副偏转方向）上进行一维FFT（1D-FFT）或在X方向（带电粒子束的主偏转方向）上的一维DFT（1D-DFT）。为了将可分析的最大频率扩展到几kHz，扫描带电粒子显微镜还可以在带电粒子束的X方向（带电粒子束的主偏转方向）上进行1D-FFT（或1D-DFT）分析扫描速度快。

4. 发明授权

US07804073B2 Liquid metal ion gun 有权
标题翻译：液态金属离子枪
公开(公告)号：US07804073B2
公开(公告)日：2010-09-28
申请号：US12076481
申请日：2008-03-19
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： H01J49/10 , H01J27/02
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。

5. 发明授权

US07420181B2 Liquid metal ion gun 失效
公开(公告)号：US07420181B2
公开(公告)日：2008-09-02
申请号：US11730803
申请日：2007-04-04
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： H01J37/317 , G21K5/00 , G01N23/00
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.

6. 发明授权

US07236651B2 Image evaluation method and microscope 失效
标题翻译：图像评估方法和显微镜
公开(公告)号：US07236651B2
公开(公告)日：2007-06-26
申请号：US10219765
申请日：2002-08-16
申请人： Tohru Ishitani , Mitsugu Sato , Hideo Todokoro , Tadashi Otaka , Takashi Iizumi , Atsushi Takane
发明人： Tohru Ishitani , Mitsugu Sato , Hideo Todokoro , Tadashi Otaka , Takashi Iizumi , Atsushi Takane
IPC分类号： G06K9/32 , G21K7/00 , G09G5/02
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823
摘要： Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.
摘要翻译：能够客观评价显微镜图像的图像分辨率的图像评价方法。图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化，建立平均值作为图像的整个区域或图像的部分的分辨率评估值。该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

7. 发明授权

US07084399B2 Ion beam apparatus and sample processing method 有权
公开(公告)号：US07084399B2
公开(公告)日：2006-08-01
申请号：US10973304
申请日：2004-10-27
申请人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
发明人： Hiroyuki Muto , Tohru Ishitani , Yuichi Madokoro
IPC分类号： H01J37/26
CPC分类号： H01J37/3005 , H01J2237/304 , H01J2237/3114
摘要： For the sake of realizing high throughput and high processing position accuracy in an ion beam apparatus, two kinds of ion beams for processing are prepared of which one is a focusing ion beam for high image resolution and an edge processing ion beam of large beam current for permitting a sectional edge portion to be processed sharply, whereby high processing position accuracy can be ensured even with a large current ion beam.

8. 发明申请

US20050279952A1 Focused ion beam apparatus 有权
标题翻译：聚焦离子束装置
公开(公告)号：US20050279952A1
公开(公告)日：2005-12-22
申请号：US11151425
申请日：2005-06-14
申请人： Tohru Ishitani , Hiroyuki Muto , Yuichi Madokoro
发明人： Tohru Ishitani , Hiroyuki Muto , Yuichi Madokoro
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/12 , H01J2237/04924 , H01J2237/121 , H01J2237/31749
摘要： In order to implement faster high precision milling and high resolution image observation in the structure analysis and failure analysis of the MEMS and semiconductor devices, a two-lens optical system is mounted on a focused ion beam apparatus, and in the optical system the distance from an emitter apex in an ion source to an earth electrode included in a condenser lens and disposed nearest to the ion source is in the range of 5 to 14 mm.
摘要翻译：为了在MEMS和半导体器件的结构分析和故障分析中实现更快的高精度铣削和高分辨率图像观察，将双透镜光学系统安装在聚焦离子束装置上，并且在光学系统中距离离子源中的发射极顶点包括在聚光透镜中并且最靠近离子源设置的接地电极在5至14mm的范围内。

9. 发明申请

US20050127304A1 Liquid metal ion gun 失效
标题翻译：液态金属离子枪
公开(公告)号：US20050127304A1
公开(公告)日：2005-06-16
申请号：US11004903
申请日：2004-12-07
申请人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
发明人： Hiroyasu Kaga , Yuichi Madokoro , Shigeru Izawa , Tohru Ishitani , Kaoru Umemura
IPC分类号： H01J27/26 , G21G5/00 , H01J27/00 , H01J27/02 , H01J37/08
CPC分类号： H01J27/02 , H01J27/22 , H01J37/08 , H01J2237/0805
摘要： An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.
摘要翻译： Ga液体金属离子源的发射极构成为包括基材的W12和覆盖表面的离子源元素的Ga9作为构造材料。通过使反溅射的颗粒成为Ga液态金属离子源的元素（W和Ga），如果反溅射的颗粒附着到Ga液态金属离子源，则不会发生可能改变Ga9的物理特性的污染物。使用W光圈作为光束限制（GUN）光圈来放置大约的Ga。在束发射区域（Ga储存）中包含的部分的表面上25mg（熔点为30℃））。当将离子发射到光束限制（GUN）孔径时，发射区域中的Ga在W光阑的束发射区域的表面上熔化并扩散。

10. 发明授权

US06538844B2 Method of fabricating a magnetic head by focused ion beam etching 失效
标题翻译：通过聚焦离子束蚀刻制造磁头的方法
公开(公告)号：US06538844B2
公开(公告)日：2003-03-25
申请号：US10083104
申请日：2002-02-27
申请人： Hisashi Takano , Naoki Koyama , Hideo Tanabe , Eijin Moriwaki , Isamu Yuito , Kazuo Shiiki , Tsuyoshi Ohnishi , Tohru Ishitani , Toshio Kobayashi , Hideo Todokoro , Chiaki Ishikawa
发明人： Hisashi Takano , Naoki Koyama , Hideo Tanabe , Eijin Moriwaki , Isamu Yuito , Kazuo Shiiki , Tsuyoshi Ohnishi , Tohru Ishitani , Toshio Kobayashi , Hideo Todokoro , Chiaki Ishikawa
IPC分类号： G11B5187
CPC分类号： G11B5/3903 , G11B5/112 , G11B5/1278 , G11B5/1871 , G11B5/3103 , G11B5/3106 , G11B5/3116 , G11B5/3143 , G11B5/3163 , G11B5/3967
摘要： In a composite magnetic head comprising a magnetoresistive read head including a magnetic thin film having a magnetoresistive effect and soft magnetic members interposing the soft magnetic film between them through a non-magnetic insulation layer, an induction type write head-including poles formed in a moving direction of a medium and a conductor crossing the poles, and disposed in the proximity of the magnetoresistive head, and a substrate supporting these heads, the present invention discloses a composite magnetic head characterized in that part of a floating surface inclusive of the magnetic head constituent members has recesses and the read/write operations to and from the medium are effected by the portion interposed by these recesses.
摘要翻译：在包括具有磁阻效应的磁性薄膜的磁阻读头的复合磁头和通过非磁性绝缘层将软磁体插入到它们之间的软磁性部件的情况下，形成在移动中的感应型写头包含磁极介质和导体的方向，并且设置在磁阻头附近，以及支撑这些磁头的基板，本发明公开了一种复合磁头，其特征在于，包括磁头部件构件具有凹部，并且来自介质的读/写操作由通过这些凹部插入的部分实现。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式