专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09244112B2 Method for detecting an electrical defect of contact/via plugs 有权
标题翻译：用于检测接触/通孔塞的电气缺陷的方法
公开(公告)号：US09244112B2
公开(公告)日：2016-01-26
申请号：US14275437
申请日：2014-05-12
申请人： MACRONIX International Co., Ltd.
发明人： Hsiang-Chou Liao , Tuung Luoh , Ling-Wuu Yang , Ta-Hone Yang , Kuang-Chao Chen
IPC分类号： H01L21/66 , G01R31/04 , H01J37/22 , H01J37/244 , H01J37/28 , G01R31/305
CPC分类号： G01R31/04 , G01R31/305 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/049 , H01J2237/063 , H01J2237/221 , H01J2237/24592 , H01J2237/2594 , H01J2237/28 , H01J2237/2817 , H01L22/12 , H01L22/14
摘要： A method for detecting an electrical defect of contact/via plugs is provided. In the method, the contact/via plugs are monitored by an electron-beam (E-Beam) inspection tool to capture an image with a VC (voltage contrast) difference, and then an image extraction is performed on the image with the VC difference, wherein the image extraction is based on Target gray level/back ground gray level. The extracted image is contrasted with a layout design base to obtain a blind contact or Quasi-blind issue of contact/via plugs. A grayscale value of the VC difference having the blind contact or Quasi-blind issue is compared with a determined range of grayscale value to determine whether the VC difference is abnormal.
摘要翻译：提供一种用于检测接触/通孔的电气缺陷的方法。在该方法中，通过电子束（E-Beam）检查工具来监视接触/通孔塞以捕获具有VC（电压对比度）差异的图像，然后对具有VC差异的图像执行图像提取，其中所述图像提取基于目标灰度/背景灰度级。提取的图像与布局设计基础形成对照，以获得接触/通孔插头的盲接或准盲问题。将具有盲接或准盲问题的VC差的灰阶值与确定的灰度值范围进行比较，以确定VC差异是否异常。

2. 发明授权

US08859984B2 Method and apparatus for inspecting sample surface 有权
标题翻译：检测样品表面的方法和装置
公开(公告)号：US08859984B2
公开(公告)日：2014-10-14
申请号：US13954425
申请日：2013-07-30
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G01N23/00
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于以高精度检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

3. 发明授权

US08754372B2 Structure and method for determining a defect in integrated circuit manufacturing process 有权
标题翻译：用于确定集成电路制造过程中的缺陷的结构和方法
公开(公告)号：US08754372B2
公开(公告)日：2014-06-17
申请号：US13312152
申请日：2011-12-06
申请人： Hong Xiao
发明人： Hong Xiao
IPC分类号： H01J37/26
CPC分类号： H01J37/26 , G01R31/024 , G01R31/307 , G11C11/401 , G11C2029/0403 , H01J2237/24592 , H01J2237/2594 , H01J2237/2814 , H01L22/12
摘要： The present invention discloses a structure and a method for determining a defect in integrated circuit manufacturing process. Test keys are designed for the structure to be the interlaced arrays of grounded and floating conductive cylinders, and the microscopic image can be predicted to be an interlaced pattern of bright voltage contrast (BVC) and dark voltage contrast (DVC) signals for a charged particle beam imaging system. The system can detect the defects by comparing patterns of the detected VC signals and the predicted VC signals.
摘要翻译：本发明公开了一种用于确定集成电路制造工艺中的缺陷的结构和方法。测试键设计用于结构为接地和浮动导电圆柱体的隔行阵列，并且微观图像可以预测为带电粒子的亮电压对比度（BVC）和暗电压对比度（DVC）信号的隔行扫描模式光束成像系统。该系统可以通过比较检测到的VC信号和预测的VC信号的模式来检测缺陷。

4. 发明申请

US20130009057A1 Electron Beam Irradiation Method and Scanning Electron Microscope 有权
标题翻译：电子束照射方法和扫描电子显微镜
公开(公告)号：US20130009057A1
公开(公告)日：2013-01-10
申请号：US13580288
申请日：2011-02-09
申请人： Toshiyuki Yokosuka , Minoru Yamazaki , Hideyuki Kazumi , Kazutami Tago
发明人： Toshiyuki Yokosuka , Minoru Yamazaki , Hideyuki Kazumi , Kazutami Tago
IPC分类号： H01J37/29
CPC分类号： H01J37/28 , H01J37/026 , H01J37/266 , H01J37/268 , H01J2237/0048 , H01J2237/24564 , H01J2237/2594
摘要： The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.To accomplish the above object, a charged particle beam irradiation method and a charged particle beam apparatus are provided according to which the pre-dosing area is divided into a plurality of divisional areas and electrifications are deposited to the plural divisional areas by using a beam under different beam irradiation conditions. With the above construction, the electrifications can be deposited to the pre-dosing area on the basis of such an irradiation condition that the differences in electrification at individual positions inside the pre-dosing area can be suppressed and consequently, an influence an electric field has upon the charged particle beam and electrons given off from the sample can be suppressed.
摘要翻译：本发明的目的是提供一种带电粒子束照射方法和带电粒子束装置，其即使在预给料区域中包含多种不同种类的材料或图案密度程度时也能抑制通电不均匀性预给药区域内的位置与位置不同。为了实现上述目的，提供一种带电粒子束照射方法和带电粒子束装置，根据该装置，预给料区域被分成多个分区，并且通过使用下面的束将电气沉积到多个分区域不同的束照射条件。通过上述结构，可以基于这样一种照射条件将电气沉积到预给料区域，即可以抑制预给料区域内各个位置的通电差异，从而影响电场可以抑制带电粒子束和从样品发出的电子。

5. 发明申请

US20100239319A1 METHOD AND DEVICE FOR MEASURING SURFACE POTENTIAL DISTRIBUTION, METHOD AND DEVICE FOR MEASURING INSULATION RESISTANCE, ELECTROSTATIC LATENT IMAGE MEASUREMENT DEVICE, AND CHARGING DEVICE 有权
标题翻译：用于测量表面电位分布的方法和装置，用于测量绝缘电阻的方法和装置，静电图像测量装置和充电装置
公开(公告)号：US20100239319A1
公开(公告)日：2010-09-23
申请号：US12788989
申请日：2010-05-27
申请人： Hiroyuki SUHARA
发明人： Hiroyuki SUHARA
IPC分类号： G03G15/02
CPC分类号： G03F7/70675 , H01J37/268 , H01J2237/2594
摘要： A surface potential distribution measurement method and device including setting a sample having a surface with a surface potential distribution in a sample installation unit wherein both an electric field intensity formed on the sample surface and a potential bias component of the sample are variable, and scanning the sample surface in a one-dimensional or two-dimensional manner by irradiating a charged particle beam to the sample. The method also includes obtaining a detection signal from charged particles generated by the scanning, to measure the surface potential distribution of the sample by varying the electric field intensity and the potential bias component in order to control a quantity of the detection signal obtained from the charged particles.
摘要翻译：一种表面电位分布测量方法和装置，包括在样品设置单元中设置具有表面电位分布的表面的样品，其中形成在样品表面上的电场强度和样品的电位偏置分量都是可变的，并且扫描通过将带电粒子束照射到样品上，以一维或二维方式的样品表面。该方法还包括从由扫描产生的带电粒子获得检测信号，通过改变电场强度和电位偏置分量来测量样品的表面电位分布，以便控制从带电的电流获得的检测信号的量粒子。

6. 发明授权

US07675300B2 Charged particle beam device probe operation 有权
标题翻译：带电粒子束装置探头操作
公开(公告)号：US07675300B2
公开(公告)日：2010-03-09
申请号：US11957835
申请日：2007-12-17
申请人： Christof Baur , Robert J. Folaron , Adam Hartman , Philip C. Foster , Jay C. Nelson , Richard E. Stallcup, II
发明人： Christof Baur , Robert J. Folaron , Adam Hartman , Philip C. Foster , Jay C. Nelson , Richard E. Stallcup, II
IPC分类号： G01R31/305 , G01R31/02 , G01R31/26
CPC分类号： G01N1/28 , G01N1/32 , G01R31/307 , H01J37/3056 , H01J2237/20 , H01J2237/2008 , H01J2237/206 , H01J2237/24592 , H01J2237/2594 , H01J2237/28 , H01J2237/2817 , H01J2237/31745
摘要： An apparatus including a positioner control device, a measuring device and a control routine. The positioner control device is communicatively coupled to a chamber of a charged particle beam device (CPBD) and is configured to individually manipulate each of a plurality of probes within the CPBD chamber to establish contact between ones of the plurality of probes and corresponding ones of a plurality of contact points of a sample positioned in the CPBD chamber. The measuring device is communicatively coupled to the CPBD and the positioner control device and is configured to perform one of a measurement and a detection of a characteristic associated with one of the plurality of contact points. The control routine is configured to at least partially automate control of at least one of the CPBD, the positioner control device and the measuring device.
摘要翻译：一种包括定位器控制装置，测量装置和控制程序的装置。定位器控制装置通信地耦合到带电粒子束装置（CPBD）的腔室，并且被配置为单独地操作CPBD室内的多个探针中的每一个，以建立多个探针中的一个探针和位于CPBD室中的样品的多个接触点。测量装置通信地耦合到CPBD和定位器控制装置，并被配置为执行与多个接触点之一相关联的特性的测量和检测中的一个。控制程序被配置为至少部分地自动化对CPBD，定位器控制装置和测量装置中的至少一个的控制。

7. 发明授权

US07521679B2 Inspection method and inspection system using charged particle beam 失效
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US07521679B2
公开(公告)日：2009-04-21
申请号：US11706330
申请日：2007-02-15
申请人： Hidetoshi Nishiyama , Mari Nozoe
发明人： Hidetoshi Nishiyama , Mari Nozoe
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： H01J37/026 , H01J37/226 , H01J37/28 , H01J2237/047 , H01J2237/2594 , H01J2237/2817
摘要： An electron beam system using a scanning electron microscope equipped with a function for controlling a charged state of a sample to be observed includes electron optics for obtaining image data of the scanning electron microscope, and a monitor that displays a relationship between an equation for determining a degree of separation of peaks which appear in a histogram obtained on a basis of the image data and at least one parameter among parameters for controlling the charged state of the sample. An optimized parameter for controlling the charged stage of the sample can be visually distinguished on the monitor.
摘要翻译：使用具有用于控制要观察的样品的带电状态的功能的扫描电子显微镜的电子束系统包括用于获得扫描电子显微镜的图像数据的电子光学器件和显示用于确定扫描电子显微镜的方程之间的关系的监视器基于图像数据获得的直方图中出现的峰的分离度和用于控制样品的充电状态的参数中的至少一个参数。用于控制样品充电阶段的优化参数可以在显示器上进行目视辨别。

8. 发明授权

US07514681B1 Electrical process monitoring using mirror-mode electron microscopy 有权
标题翻译：使用镜面电子显微镜进行电气过程监控
公开(公告)号：US07514681B1
公开(公告)日：2009-04-07
申请号：US11451698
申请日：2006-06-13
申请人： Paul F. Marella , Mark A. McCord , Marian Mankos , David L. Adler
发明人： Paul F. Marella , Mark A. McCord , Marian Mankos , David L. Adler
IPC分类号： H01L21/02 , H01J37/145 , G21K7/00
CPC分类号： H01J37/244 , H01J37/05 , H01J37/292 , H01J2237/24485 , H01J2237/24592 , H01J2237/2594 , H01J2237/2817
摘要： One embodiment relates to a method of inspecting a substrate using electrons. Mirror-mode electron-beam imaging is performed on a region of the substrate at multiple voltage differences between an electron source and a substrate, and image data is stored corresponding to the multiple voltage differences. A calculation is made of a measure of variation of an imaged aspect of a feature in the region with respect to the voltage difference between the electron source and the substrate. Other embodiments and features are also disclosed.
摘要翻译：一个实施例涉及使用电子检查衬底的方法。在电子源和衬底之间的多个电压差的基板的区域上执行镜像电子束成像，并且对应于多个电压差存储图像数据。计算相对于电子源和基板之间的电压差的该区域中特征的成像方面的变化的度量。还公开了其它实施例和特征。

9. 发明申请

US20090050802A1 METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 审中-公开
标题翻译：检测样品表面的方法和装置
公开(公告)号：US20090050802A1
公开(公告)日：2009-02-26
申请号：US12162067
申请日：2007-01-24
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： G01N23/00
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy.Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.
摘要翻译：提供了一种用于高精度地检查样品表面的方法和装置。提供了一种使用电子束法样品表面检查装置检查样品表面的方法，其中由电子束法样品表面检查装置的电子枪产生的电子束照射到样品表面上，并且发射二次电子从样品表面形成为检测样品表面的检测器的电子检测面的图像，其特征在于，将检测器的检测面上的二次电子形成为图像的条件进行控制，使得样品表面的电位根据照射到样品表面上的电子束的量而变化。

10. 发明申请

US20090039264A1 ELECTRON MICROSCOPE 有权
标题翻译：电子显微镜
公开(公告)号：US20090039264A1
公开(公告)日：2009-02-12
申请号：US12188870
申请日：2008-08-08
申请人： Akira IKEGAMI , Minoru Yamazaki , Hideyuki Kazumi , Koichiro Takeuchi , Hisaya Murakoshi
发明人： Akira IKEGAMI , Minoru Yamazaki , Hideyuki Kazumi , Koichiro Takeuchi , Hisaya Murakoshi
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/21 , H01J37/28 , H01J37/3045 , H01J2237/24564 , H01J2237/2594 , H01J2237/28 , H01J2237/2816 , H01J2237/30461
摘要： Disclosed herein are a method for applying, while a charged particle beam is in a state being irradiated toward the sample, a voltage to the sample so that the charged particle beam does not reach the sample (hereafter such state may be referred to as a mirror state) and detecting information on a potential of a sample using a signal obtained then, and a device for automatically adjusting conditions of the device based on the result of measuring.
摘要翻译：本文公开了一种在带电粒子束处于向样品照射的状态下施加电压给样品的方法，使得带电粒子束不到达样品（此后，这种状态可以称为反射镜状态），并且使用随后获得的信号检测样品的电位的信息，以及用于基于测量结果自动调整装置的状态的装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式