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1. 发明申请

US20130043388A1 CHARGED PARTICLE RADIATION DEVICE 有权
标题翻译：充电颗粒辐射装置
公开(公告)号：US20130043388A1
公开(公告)日：2013-02-21
申请号：US13521092
申请日：2010-08-11
申请人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
发明人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
IPC分类号： H01J37/26
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2448
摘要： Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
摘要翻译：公开了一种具有带电粒子源的带电粒子辐射装置，其产生作为探针的带电粒子，带电粒子光学系统，样品台，真空放电系统，限制探针的孔，导电膜和带电粒子粒子检测器，其中所述导电膜设置在除了所述样品台和所述孔之间的所述光学系统的光轴之外的位置处; 并且带电粒子检测器的表面的感测表面与样品台之间的距离大于样品台和导电膜之间的距离，使得导电膜的表面和检测器的感测表面倾斜。

2. 发明授权

US07755045B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US07755045B2
公开(公告)日：2010-07-13
申请号：US11768291
申请日：2007-06-26
申请人： Michio Hatano , Sukehiro Ito , Shinichi Tomita , Junichi Katane
发明人： Michio Hatano , Sukehiro Ito , Shinichi Tomita , Junichi Katane
IPC分类号： H01J37/26
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2444 , H01J2237/24445 , H01J2237/24495 , H01J2237/2605 , H01J2237/28
摘要： In a scanning electron microscope, a reflection plate at ground potential is provided in a specimen chamber and backscattering electrons given off from a specimen impinge on the reflection plate to generate subsidiary electrons. An electric field supply electrode applied with a positive voltage of +100 to +500V is arranged in a gap defined by the reflection plate and a specimen stage. A first detection electrode is arranged to detect ion current attributable to backscattering electrons and a second detection electrode is arranged to detect current representative of coexistence of ion currents attributable to secondary electron and backscattering electron. The scanning electron microscope constructed as above can achieve simultaneous separation/detection of secondary electron and backscattering electron.
摘要翻译：在扫描型电子显微镜中，在试样室内设置接地电位的反射板，反射散射从试样射出的电子撞击在反射板上，产生副电子。施加+100〜+ 500V的正电压的电场供给电极被配置在由反射板和样本台所限定的间隙中。布置第一检测电极以检测归因于后向散射电子的离子电流，并且布置第二检测电极以检测代表归属于二次电子和后向散射电子的离子电流共存的电流。如上构造的扫描电子显微镜可以实现二次电子和后向散射电子的同时分离/检测。

3. 发明授权

US07504624B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US07504624B2
公开(公告)日：2009-03-17
申请号：US11341663
申请日：2006-01-30
申请人： Takeshi Kawasaki , Tomonori Nakano , Michio Hatano , Momoyo Enyama
发明人： Takeshi Kawasaki , Tomonori Nakano , Michio Hatano , Momoyo Enyama
IPC分类号： G21K7/00
CPC分类号： H01J37/153 , H01J2237/0453
摘要： A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a SEM image by using a stop having plural openings and the judgment result is fed back to the adjustment of the aberration correction means. A stop of a nearly orbicular zone shape is used in combination with the aberration correction means.
摘要翻译：便于调整的扫描带电粒子显微镜具有深的焦深，并且设置有像差校正装置。通过使用具有多个开口的停止来从SEM图像判断像差校正的状态，并且将判断结果反馈到像差校正装置的调整。与像差校正装置组合使用几乎轮状的区域形状的停止。

4. 发明申请

US20060186337A1 Scanning electron microscope 有权
公开(公告)号：US20060186337A1
公开(公告)日：2006-08-24
申请号：US11230642
申请日：2005-09-21
申请人： Michio Hatano , Sukehiro Ito , Shinichi Tomita , Junichi Katane
发明人： Michio Hatano , Sukehiro Ito , Shinichi Tomita , Junichi Katane
IPC分类号： H01J37/28
CPC分类号： H01J37/256 , H01J37/244 , H01J2237/2444 , H01J2237/2448 , H01J2237/2605 , H01J2237/2806
摘要： A scanning electron microscope includes an irradiation optical system for irradiating an electron beam to a sample; a sample holder for supporting the sample, arranged inside a sample chamber; at least one electric field supply electrode arranged around the sample holder; and an ion current detection electrode.

5. 发明授权

US09202667B2 Charged particle radiation device with bandpass detection 有权
标题翻译：带通滤波器的带电粒子辐射装置
公开(公告)号：US09202667B2
公开(公告)日：2015-12-01
申请号：US13521092
申请日：2010-08-11
申请人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
发明人： Michio Hatano , Tetsuya Sawahata , Yasuko Watanabe , Mitsugu Sato , Sukehiro Ito , Takashi Ohshima , Hiroyuki Honda
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2448
摘要： Disclosed is a charged particle radiation device having a charged particle source which generates a charged particle as a probe, a charged particle optical system, a sample stage, a vacuum discharge system, an aperture which restricts a probe, a conductive film, and a charged particle detector, wherein the conductive film is provided at a position excluding the optical axis of the optical system between the sample stage and the aperture; and the distance between the sensing surface of the surface of the charged particle detector and the sample stage is larger than the distance between the sample stage and the conductive film, so that the surface of the conductive film and the sensing surface of the detector are inclined.
摘要翻译：公开了一种具有带电粒子源的带电粒子辐射装置，其产生作为探针的带电粒子，带电粒子光学系统，样品台，真空放电系统，限制探针的孔，导电膜和带电粒子粒子检测器，其中所述导电膜设置在除了所述样品台和所述孔之间的所述光学系统的光轴之外的位置处; 并且带电粒子检测器的表面的感测表面与样品台之间的距离大于样品台和导电膜之间的距离，使得导电膜的表面和检测器的感测表面倾斜。

6. 发明申请

US20130146766A1 Electron Beam Apparatus 有权
标题翻译：电子束装置
公开(公告)号：US20130146766A1
公开(公告)日：2013-06-13
申请号：US13817086
申请日：2011-07-07
申请人： Takashi Ohshima , Michio Hatano , Hideo Morishita
发明人： Takashi Ohshima , Michio Hatano , Hideo Morishita
IPC分类号： H01J37/26
CPC分类号： H01J37/261 , H01J37/265 , H01J37/28 , H01J2237/153 , H01J2237/202 , H01J2237/20207 , H01J2237/20221
摘要： The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2,3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
摘要翻译：本发明提供了一种电子束装置，包括用于使延迟电场的轴向位移可视化的装置和用于调节轴向位移的装置。轴向位移可视化装置包括反射板（6）和用于会聚反射板（6）上的二次电子束（9）的光学系统（2,3），并且轴向位移调节装置包括倾斜旋转机构（8）用于样品台（5）。利用这种结构，在诸如SEM等的电子束装置中，存在由物镜（3）和样品（4）之间的电场的轴对称位移引起的视野位移的问题，并且不能测量次级可以消除提供所需信息的电子和反射电子。

7. 发明授权

US09208994B2 Electron beam apparatus for visualizing a displacement of an electric field 有权
标题翻译：用于可视化电场位移的电子束装置
公开(公告)号：US09208994B2
公开(公告)日：2015-12-08
申请号：US13817086
申请日：2011-07-07
申请人： Takashi Ohshima , Michio Hatano , Hideo Morishita
发明人： Takashi Ohshima , Michio Hatano , Hideo Morishita
IPC分类号： G01N23/00 , H01J37/26 , H01J37/28
CPC分类号： H01J37/261 , H01J37/265 , H01J37/28 , H01J2237/153 , H01J2237/202 , H01J2237/20207 , H01J2237/20221
摘要： The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
摘要翻译：本发明提供了一种电子束装置，包括用于使延迟电场的轴向位移可视化的装置和用于调节轴向位移的装置。轴向位移可视化装置包括反射板（6）和用于会聚反射板（6）上的二次电子束（9）的光学系统（2,3），并且轴向位移调节装置包括倾斜旋转机构（8）用于样品台（5）。利用这种结构，在诸如SEM等的电子束装置中，存在由物镜（3）和样品（4）之间的电场的轴对称位移引起的视野位移的问题，并且不能测量次级可以消除提供所需信息的电子和反射电子。

8. 发明授权

US09029766B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US09029766B2
公开(公告)日：2015-05-12
申请号：US14241121
申请日：2012-05-28
申请人： Hideo Morishita , Takashi Ohshima , Michio Hatano , Sukehiro Ito
发明人： Hideo Morishita , Takashi Ohshima , Michio Hatano , Sukehiro Ito
IPC分类号： H01J37/244 , H01J37/28 , H01J37/04
CPC分类号： H01J37/28 , H01J37/04 , H01J37/244 , H01J2237/2443 , H01J2237/2444 , H01J2237/24475 , H01J2237/2448 , H01J2237/2804 , H01J2237/2806
摘要： To provide a low acceleration scanning electron microscope that can discriminate and detect reflected electrons and secondary electrons even with a low probe current, this scanning electron microscope is provided with an electron gun (29), an aperture (26), a sample table (3), an electron optical system (4-1) for making an electron beam (31) converge on a sample (2), a deflection means (10), a secondary electron detector (8), a reflected electron detector (9), and a cylindrical electron transport means (5) in a position between the electron gun (29) and sample (2). The reflected electron detector (9) is provided within the electron transport means (5) and on a side further away from the electron gun (29) than the secondary electron detector (8) and the deflection means (10). The reception surface (9-1) of the reflected electron detector (9) is electrically wired so as to have the same potential as the electron transport means (5).
摘要翻译：为了提供即使在低探针电流下能够区分和检测反射电子和二次电子的低加速度扫描电子显微镜，该扫描电子显微镜设置有电子枪（29），孔（26），样品台（3 ），用于使电子束（31）会聚在样品（2）上的电子光学系统（4-1），偏转装置（10），二次电子检测器（8），反射电子检测器（9）以及在电子枪（29）和样品（2）之间的位置的圆柱形电子传输装置（5）。反射电子检测器（9）设置在电子传输装置（5）内并且比二次电子检测器（8）和偏转装置（10）更远离电子枪（29）的一侧。反射电子检测器（9）的接收表面（9-1）被电连接以具有与电子传输装置（5）相同的电位。

9. 发明申请

US20090101817A1 CHARGED PARTICLE APPLICATION APPARATUS 审中-公开
标题翻译：充电颗粒应用设备
公开(公告)号：US20090101817A1
公开(公告)日：2009-04-23
申请号：US12252862
申请日：2008-10-16
申请人： Takashi OHSHIMA , Michio Hatano , Hideyuki Nagaishi , Mitsugu Sato , Muneyuki Fukuda
发明人： Takashi OHSHIMA , Michio Hatano , Hideyuki Nagaishi , Mitsugu Sato , Muneyuki Fukuda
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/28 , H01J37/3056 , H01J2237/2441 , H01J2237/2443 , H01J2237/2444 , H01J2237/2445 , H01J2237/2482
摘要： The present invention provides a highly sensitive, thin detector useful for observing low-voltage, high-resolution SEM images, and provides a charged particle beam application apparatus based on such a detector. The charged particle beam application apparatus includes a charged particle irradiation source, a charged particle optics for irradiating a sample with a charged particle beam emitted from the charged particle irradiation source, and an electron detection section for detecting electrons that are secondarily generated from the sample. The electron detection section includes a diode device that is a combination of a phosphor layer, which converts the electrons to an optical signal, and a device for converting the optical signal to electrons and subjecting the electrons to avalanche multiplication, or includes a diode device having an electron absorption region that is composed of at least a wide-gap semiconductor substrate with a bandgap greater than 2 eV.
摘要翻译：本发明提供了一种用于观察低电压，高分辨率SEM图像的高灵敏度，薄的检测器，并提供了基于这种检测器的带电粒子束施加装置。带电粒子束施加装置包括带电粒子照射源，用于从带电粒子照射源发射的带电粒子束照射样品的带电粒子光学器件和用于检测从样品二次产生的电子的电子检测部分。电子检测部分包括二极管器件，其是将电子转换成光信号的荧光体层的组合，以及用于将光信号转换为电子并使电子进行雪崩倍增的器件，或包括具有至少由带隙大于2eV的宽间隙半导体衬底构成的电子吸收区域。

10. 发明申请

US20060255269A1 Charged particle beam device 有权
公开(公告)号：US20060255269A1
公开(公告)日：2006-11-16
申请号：US11341663
申请日：2006-01-30
申请人： Takeshi Kawasaki , Tomonori Nakano , Michio Hatano , Momoyo Enyama
发明人： Takeshi Kawasaki , Tomonori Nakano , Michio Hatano , Momoyo Enyama
IPC分类号： G21K7/00
CPC分类号： H01J37/153 , H01J2237/0453
摘要： A scanning charged particle microscope which facilitates adjustment, has a deep focal depth, and is provided with an aberration correction means. The state of aberration correction is judged from a SEM image by using a stop having plural openings and the judgment result is fed back to the adjustment of the aberration correction means. A stop of a nearly orbicular zone shape is used in combination with the aberration correction means.

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