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1. 发明申请

US20180233322A1 EMISSION NOISE CORRECTION OF A CHARGED PARTICLE SOURCE 审中-公开
公开(公告)号：US20180233322A1
公开(公告)日：2018-08-16
申请号：US15435018
申请日：2017-02-16
申请人： FEI Company
发明人： Ali Mohammadi Gheidari , Luigi Mele , Peter Christiaan Tiemeijer , Gerard Nicolaas Anne van Veen , Hendrik Nicolaas Slingerland
IPC分类号： H01J37/22 , H01J37/20 , H01J37/244
CPC分类号： H01J37/222 , H01J37/20 , H01J37/243 , H01J37/244 , H01J2237/2441 , H01J2237/24535
摘要： A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles that is subject to beam current fluctuations; Employing a beam current sensor, located between said source and specimen holder, to intercept a part of the beam and produce an intercept signal proportional to a current of the intercepted part of the beam, the beam current sensor comprising a hole arranged to pass a beam probe with an associated probe current; Scanning said probe over the specimen, thereby irradiating the specimen with a specimen current, with a dwell time associated with each scanned location on the specimen; Using a detector to detect radiation emanating from the specimen in response to irradiation by said probe, and producing an associated detector signal; Using said intercept signal as input to a compensator to suppress an effect of said current fluctuations in said detector signal, wherein: The beam current sensor is configured as a semiconductor device with a sensing layer that is oriented toward the source, in which: Each charged particle of said intercepted part of the beam generates electron/hole pairs in said sensing layer; Generated electrons are drawn to an anode of the semiconductor device; Generated holes are drawn to a cathode of the semiconductor device, thereby producing said intercept signal.

2. 发明授权

US09696435B2 Hybrid energy conversion and processing detector 有权
公开(公告)号：US09696435B2
公开(公告)日：2017-07-04
申请号：US14688081
申请日：2015-04-16
申请人： Gatan, Inc.
发明人： Alexander Jozef Gubbens , Paul Mooney , Matthew Lent
IPC分类号： G01T1/20 , H01J37/244
CPC分类号： G01T1/2018 , H01J37/244 , H01J2237/2441 , H01J2237/2443 , H01J2237/2446 , H01J2237/24485
摘要： There is disclosed a hybrid arrangement of more than one electron energy conversion mechanism in a detector arranged physically such that the electron image can be acquired from both energy converters in such a manner that selected high-illumination parts of the image can be imaged with an indirectly coupled scintillator detector and the remainder of the image acquired with the high-sensitivity/direct electron portion of the detector without readjustments in the beam position or mechanical positioning of the detector parts.Further, a mechanism to allow dynamically switchable or simultaneous linear and counted signal processing from each pixel of the image so that high-illumination areas can be acquired linearly without the severe dose rate limitation of counting and low-illumination regions can be acquired with counting, the switchover point determined by the dose rate at which signal quality breaks even between linear and counting modes.

3. 发明申请

US20160178543A1 ANALYZING AN OBJECT USING A PARTICLE BEAM APPARATUS 有权
标题翻译：使用颗粒光束装置分析对象
公开(公告)号：US20160178543A1
公开(公告)日：2016-06-23
申请号：US14972589
申请日：2015-12-17
申请人： Carl Zeiss Microscopy GmbH
发明人： Richard Schillinger , Wolfgang Berger
IPC分类号： G01N23/225 , G01N23/203
CPC分类号： G01N23/2208 , G01N23/203 , G01N23/223 , G01N23/225 , G01N23/2251 , G01N23/2252 , G01N23/2254 , H01J37/244 , H01J2237/2441 , H01J2237/2446
摘要： Described herein is a method for analyzing an object using a particle beam apparatus, for example an electron beam apparatus and/or an ion beam apparatus, or using an x-ray beam device and a particle beam apparatus or an x-ray beam device, by means of which the method is carried out. In the method, information about the object is loaded from a data memory into a control device. Furthermore, a group of detection units from the multiplicity of detection units is identified using the information loaded into the control device. A first detector segment is formed from the group of detection units using the control device. Interaction particles and/or interaction radiation, which is/are detected, is/are generated by guiding a particle beam onto the object and scanning the object using the particle beam, where a detector segment signal is read from the detector segment.
摘要翻译：本文描述了使用粒子束装置，例如电子束装置和/或离子束装置，或者使用x射线束装置和粒子束装置或X射线束装置来分析物体的方法，通过该方法进行该方法。在该方法中，关于对象的信息从数据存储器加载到控制设备中。此外，使用加载到控制装置中的信息来识别来自多个检测单元的一组检测单元。使用控制装置的一组检测单元形成第一检测器段。通过将粒子束引导到物体上并使用粒子束扫描物体来生成被检测的相互作用粒子和/或相互作用辐射，其中从检测器段读取检测器段信号。

4. 发明申请

US20160056015A1 Radiation Sensor, and its Application in a Charged-Particle Microscope 审中-公开
标题翻译：辐射传感器及其在带电粒子显微镜中的应用
公开(公告)号：US20160056015A1
公开(公告)日：2016-02-25
申请号：US14833947
申请日：2015-08-24
申请人： FEI Company
发明人： Gerard Nicolaas Anne van Veen , Cornelis Sander Kooijman , Luc Roger Simonne Haspeslagh
IPC分类号： H01J37/244 , H01J37/04 , H01J37/285
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2447 , H01J2237/2802 , H01L27/1461 , H01L27/14643 , H01L31/105
摘要： A pixelated CMOS radiation sensor (e.g. in a 4T pinned photodiode device) that comprises a layered structure including: A p-type Si substrate; An n-doped region within said substrate; A p+-doped pinning layer that overlies said n-doped region; An SiOx layer that overlies said p+-doped pinning layer and serves as a Pre-Metal Dielectric or Inter-Metal Dielectric layer, in which a Boron film is deposited between said p+-doped pinning layer and said SiOx layer. Application of such a (pure) Boron film serves to reduce leakage current by one or more orders of magnitude. Even a relatively thin Boron film (e.g. thickness 1-2 nm) can produce this effect.
摘要翻译：包括层状结构的像素化CMOS辐射传感器（例如在4T钉扎光电二极管器件中）包括：P型Si衬底; 所述衬底内的n掺杂区域; 覆盖所述n掺杂区域的p +掺杂的钉扎层; 覆盖所述p +掺杂的钉扎层并用作预金属介电或金属间介电层的SiO x层，其中硼膜沉积在所述p +掺杂的钉扎层和所述SiO x层之间。这种（纯）硼膜的应用用于将泄漏电流减少一个或多个数量级。即使是相对薄的硼膜（例如厚度为1-2nm）也可以产生这种效果。

5. 发明申请

US20140166879A1 Backscatter Reduction in Thin Electron Detectors 审中-公开
标题翻译：薄电子探测器的后向散射减少
公开(公告)号：US20140166879A1
公开(公告)日：2014-06-19
申请号：US14035486
申请日：2013-09-24
申请人： FEI Company
发明人： Michael Alwin William Stekelenburg , Gerrit Cornelis Van Hoften , Richard Henderson , Gregory James McMullan , Abdul Raffey Faruqi , Renato Andrea Danilo Turchetta , Nicola Carlo Guerrini , Joeri Lof , Frank Jeroen Pieter Schuurmans
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/22 , H01J37/26 , H01J37/263 , H01J2237/2441 , H01J2237/24455 , H01J2237/2446 , H01J2237/2447 , H01J2237/24578 , H01J2237/26 , H01J2237/2802
摘要： In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor.
摘要翻译：在直接电子检测器中，防止电子从传感器下方向检测器体积的后向散射。在一些实施例中，在传感器下面保持空的空间。在其他实施例中，传感器下面的结构包括几何，例如多个高方面比例的通道，延伸到传感器或从传感器捕获电子，或倾斜表面的结构以偏转通过传感器的电子。

6. 发明授权

US08669525B2 Sample inspection methods, systems and components 有权
标题翻译：样品检验方法，系统和组件
公开(公告)号：US08669525B2
公开(公告)日：2014-03-11
申请号：US12997686
申请日：2009-05-26
申请人： Sybren Sijbrandij , John Notte, IV , William B. Thompson
发明人： Sybren Sijbrandij , John Notte, IV , William B. Thompson
IPC分类号： H01J37/26
CPC分类号： G01N23/2251 , G01N23/2208 , G01N23/2258 , H01J37/244 , H01J37/28 , H01J2237/0807 , H01J2237/2441 , H01J2237/2444 , H01J2237/2445 , H01J2237/24475 , H01J2237/24485 , H01J2237/2449 , H01J2237/24585 , H01J2237/24592 , H01J2237/2803 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The disclosure relates to sample inspection using an ion-beam microscope. In some embodiments, the disclosure involves the use of multiple detectors, each of which provides different information about a sample.
摘要翻译：本公开涉及使用离子束显微镜的样品检查。在一些实施例中，本公开涉及多个检测器的使用，每个检测器提供关于样品的不同信息。

7. 发明授权

US08618500B2 Multi channel detector, optics therefor and method of operating thereof 有权
标题翻译：多通道检测器，光学器件及其操作方法
公开(公告)号：US08618500B2
公开(公告)日：2013-12-31
申请号：US13543608
申请日：2012-07-06
申请人： Pavel Adamec
发明人： Pavel Adamec
IPC分类号： H01J37/244 , H01J37/05 , G01R31/305
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2449 , H01J2237/24592
摘要： A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap, a particle optics configured for separating the signal beam in a first portion of the signal beam and in at least one second portion of the signal beam, configured for focusing the first portion of the signal beam, and configured for deflecting and focusing the at least one second portion of the signal beam, wherein the particle optics includes a first electrode and at least one second electrode. Therein, the first electrode is an inner electrode and the at least one second electrode is provided radially outward of the first electrode.
摘要翻译：描述了用于检测信号光束的二次带电粒子检测装置。所述装置包括具有至少两个具有主动检测区域的检测元件的检测器装置，其中所述主动检测区域被间隙分开，所述粒子光学器件被配置用于在所述信号束的第一部分中和在至少一个所述信号光束的第二部分被配置用于聚焦所述信号光束的所述第一部分，并且被配置为偏转和聚焦所述信号光束的所述至少一个第二部分，其中所述粒子光学器件包括第一电极和至少一个第二电极。其中，第一电极是内电极，并且至少一个第二电极设置在第一电极的径向外侧。

8. 发明授权

US08415633B2 Method and device for monitoring the intensity of an electron beam 有权
标题翻译：用于监测电子束强度的方法和装置
公开(公告)号：US08415633B2
公开(公告)日：2013-04-09
申请号：US13133749
申请日：2010-04-20
申请人： Gernot Keil , Alois Monzel
发明人： Gernot Keil , Alois Monzel
IPC分类号： G01T1/24
CPC分类号： H01J37/244 , A61L2/087 , H01J37/304 , H01J2237/164 , H01J2237/2441 , H01J2237/24507
摘要： The method and the device are used to monitor the intensity of an electron beam. In order to detect changes in intensity of the electron beam, electromagnetic radiation directly or indirectly emitted by the electron beam is detected and evaluated. This particularly refers to the evaluation of ultraviolet radiation and/or radiation in the range of visible light.
摘要翻译：该方法和装置用于监测电子束的强度。为了检测电子束强度的变化，检测并评估由电子束直接或间接发射的电磁辐射。这特别涉及在可见光范围内的紫外线辐射和/或辐射的评估。

9. 发明申请

US20120298864A1 Charged Particle Beam Apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US20120298864A1
公开(公告)日：2012-11-29
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/26
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

10. 发明授权

US08237125B2 Particle detection system 有权
标题翻译：粒子检测系统
公开(公告)号：US08237125B2
公开(公告)日：2012-08-07
申请号：US12764890
申请日：2010-04-21
申请人： Yi-Xiang Wang , Joe Wang
发明人： Yi-Xiang Wang , Joe Wang
IPC分类号： G01T1/28
CPC分类号： H01J37/244 , H01J2237/2441 , H01J2237/2444 , H01J2237/2445 , H01J2237/2448 , H01J2237/2449
摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level.
摘要翻译：本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。

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