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1. 发明授权

US08359494B2 Parallel fault detection 有权
标题翻译：并行故障检测
公开(公告)号：US08359494B2
公开(公告)日：2013-01-22
申请号：US10323272
申请日：2002-12-18
申请人： Elfido Coss, Jr. , Ernest D. Adams, III , Robert J. Chong , Howard E. Castle , Thomas J. Sonderman , Alexander J. Pasadyn
发明人： Elfido Coss, Jr. , Ernest D. Adams, III , Robert J. Chong , Howard E. Castle , Thomas J. Sonderman , Alexander J. Pasadyn
IPC分类号： G06F11/00
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： A method and an apparatus are provided for parallel fault detection. The method comprises receiving data associated with processing of a workpiece by a first processing tool, receiving data associated with processing of a workpiece by a second processing tool and comparing at least a portion of the received data to a common fault model to determine if a fault associated with at least one of the processing of the workpiece by the first processing tool and processing of the workpiece by the second processing tool occurred.
摘要翻译：提供了用于并行故障检测的方法和装置。该方法包括接收与第一处理工具处理工件有关的数据，通过第二处理工具接收与工件的处理有关的数据，并将至少一部分接收到的数据与常见故障模型进行比较，以确定是否存在故障与通过第一处理工具处理工件和由第二处理工具处理工件的至少一个相关联。

2. 发明授权

US06912437B2 Method and apparatus for controlling a fabrication process based on a measured electrical characteristic 有权
标题翻译：基于测量的电气特性来控制制造工艺的方法和装置
公开(公告)号：US06912437B2
公开(公告)日：2005-06-28
申请号：US10262620
申请日：2002-09-30
申请人： Robert J. Chong , Jin Wang
发明人： Robert J. Chong , Jin Wang
IPC分类号： H01L21/66 , G06F19/00
CPC分类号： H01L22/20 , H01L22/12
摘要： A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.
摘要翻译：一种方法包括根据操作配方执行用于形成半导体器件的特征的至少一个处理。测量该特征的电气性能特征。将测量的电性能特性与电性能特性的目标值进行比较。基于比较确定操作配方的至少一个参数。系统包括处理工具，计量工具和控制器。处理工具被配置为执行根据操作配方形成半导体器件的特征的至少一个处理。测量工具被配置为测量该特征的电性能特征。控制器被配置为将测量的电性能特性与电性能特性的目标值进行比较，并且基于该比较确定操作配方的至少一个参数。

3. 发明授权

US06842661B2 Process control at an interconnect level 失效
标题翻译：互连级别的过程控制
公开(公告)号：US06842661B2
公开(公告)日：2005-01-11
申请号：US10260894
申请日：2002-09-30
申请人： Robert J. Chong , Eric O. Green
发明人： Robert J. Chong , Eric O. Green
IPC分类号： G05B19/418 , H01L21/66 , G06F19/00 , H01L21/00
CPC分类号： H01L22/20 , G05B19/4183 , G05B2219/32183 , G05B2219/36284 , G05B2219/45026 , G05B2219/45031 , H01L2223/54453 , H01L2924/0002 , Y02P90/10 , Y02P90/22 , H01L2924/00
摘要： A method and an apparatus for performing process control at an interconnect level. A process step upon a workpiece is performed. Manufacturing data relating to an interconnect location on the workpiece is acquired. An interconnect characteristic control process is performed based upon the manufacturing data. The interconnect characteristic control process includes controlling a process relating to a structure associated with the interconnect location on the workpiece to control a characteristic relating to the interconnect location.
摘要翻译：一种用于在互连级别执行过程控制的方法和装置。执行工件上的工艺步骤。获取与工件上的互连位置有关的制造数据。基于制造数据进行互连特性控制处理。互连特征控制处理包括控制与工件上的互连位置相关联的结构的处理，以控制与互连位置相关的特性。

4. 发明授权

US07774670B2 Method and apparatus for dynamically determining tester recipes 有权
标题翻译：用于动态确定测试仪配方的方法和设备
公开(公告)号：US07774670B2
公开(公告)日：2010-08-10
申请号：US11853304
申请日：2007-09-11
申请人： Richard J. Markle , Douglas C. Kimbrough , Eric O. Green , Robert J. Chong
发明人： Richard J. Markle , Douglas C. Kimbrough , Eric O. Green , Robert J. Chong
IPC分类号： G01R31/28 , G06F11/00
CPC分类号： G01R31/31707 , G01R31/31721
摘要： A method includes retrieving a group test parameter determined based on test results associated with a plurality of integrated circuit devices. A particular integrated circuit device is tested using a test program and the group test parameter.
摘要翻译：一种方法包括检索基于与多个集成电路装置相关联的测试结果确定的组测试参数。使用测试程序和组测试参数测试特定的集成电路设备。

5. 发明授权

US06961636B1 Method and apparatus for dynamically monitoring controller tuning parameters 有权
标题翻译：动态监控控制器调谐参数的方法和装置
公开(公告)号：US06961636B1
公开(公告)日：2005-11-01
申请号：US10126172
申请日：2002-04-19
申请人： Robert J. Chong , Alexander J. Pasadyn , Thomas J. Sonderman
发明人： Robert J. Chong , Alexander J. Pasadyn , Thomas J. Sonderman
IPC分类号： G05B13/02 , G05B19/418 , G06F19/00
CPC分类号： G05B19/41875 , G05B13/025 , G05B2219/32187 , Y02P90/20 , Y02P90/22
摘要： A method includes processing a plurality of workpieces in accordance with an operating recipe. Metrology data associated with the processing is collected. A control model including at least one tuning parameter having a default value is provided. A plurality of perturbations is introduced to shift the tuning parameter from its default value. Control actions are generated based on the metrology data and the perturbations to the tuning parameter in the control model to modify the operating recipe. An error signal associated with each of the perturbations is generated. The default value of the tuning parameter is modified based on the error signals.
摘要翻译：一种方法包括根据操作配方处理多个工件。收集与处理相关的计量数据。提供了包括具有默认值的至少一个调谐参数的控制模型。引入多个扰动以从其默认值移位调谐参数。基于测量数据和控制模型中的调谐参数的扰动来生成控制动作，以修改操作配方。产生与每个扰动相关联的误差信号。调整参数的默认值根据错误信号进行修改。

6. 发明授权

US07424392B1 Applying a self-adaptive filter to a drifting process 失效
标题翻译：将自适应滤波器应用于漂移过程
公开(公告)号：US07424392B1
公开(公告)日：2008-09-09
申请号：US10323502
申请日：2002-12-18
申请人： Jin Wang , Robert J. Chong , Christopher A. Bode , Si-Zhao J. Qin , Alexander J. Pasadyn
发明人： Jin Wang , Robert J. Chong , Christopher A. Bode , Si-Zhao J. Qin , Alexander J. Pasadyn
IPC分类号： G06F17/18 , G21C17/00
CPC分类号： G05B19/41875 , G05B2219/32135 , G05B2219/32182 , G05B2219/32184 , G05B2219/37224 , G05B2219/41146 , G05B2219/41147 , G05B2219/50065 , Y02P90/22
摘要： A method and an apparatus are provided for applying a self-adaptive filter to a drifting process. The method includes processing a workpiece, measuring an output characteristic of the processed workpiece and modifying a previous estimated process state based at least on the measured output characteristic. The method further includes estimating a next process state based at least on the modified previous estimated process state.
摘要翻译：提供了一种用于将自适应滤波器应用于漂移过程的方法和装置。该方法包括处理工件，测量被处理工件的输出特性，以及至少基于所测量的输出特性修改先前的估计过程状态。该方法还包括至少基于修改的先前估计的处理状态来估计下一处理状态。

7. 发明授权

US07186487B1 Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same 有权
标题翻译：通过监控光子水平来控制曝光过程的方法以及完成相同的系统
公开(公告)号：US07186487B1
公开(公告)日：2007-03-06
申请号：US10771109
申请日：2004-02-03
申请人： Robert J. Chong
发明人： Robert J. Chong
IPC分类号： G03C5/00
CPC分类号： G03F7/70558 , G03B7/00
摘要： The present invention is generally directed to various methods of controlling exposure processes by monitoring photon levels, and various systems for accomplishing same. In one embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, counting a number of photons incident on at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the counted number of photons. In another illustrative embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, determining a rate at which the photons impact at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the determined rate of the photons impacting the layer of photo-sensitive material.
摘要翻译：本发明一般涉及通过监控光子水平来控制曝光过程的各种方法以及用于实现其的各种系统。在一个实施例中，该方法包括通过产生由来自光源的多个光子组成的光来曝光光敏材料层的至少一部分，对入射在至少一部分上的光子计数的光敏材料层，并且基于计数的光子数来控制曝光过程的持续时间和光源的辐照度中的至少一个。在另一说明性实施例中，该方法包括通过产生由光源产生的多个光子的光进行曝光处理，以暴露光敏材料层的至少一部分，确定光子至少影响的速率光敏材料层的一部分，并且基于影响光敏材料层的光子的确定速率来控制曝光过程的持续时间和光源的辐照度中的至少一个。

8. 发明授权

US07100081B1 Method and apparatus for fault classification based on residual vectors 有权
标题翻译：基于残差向量的故障分类方法和装置
公开(公告)号：US07100081B1
公开(公告)日：2006-08-29
申请号：US10682019
申请日：2003-10-09
申请人： Matthew A. Purdy , Robert J. Chong , Gregory A. Cherry , Richard J. Markle
发明人： Matthew A. Purdy , Robert J. Chong , Gregory A. Cherry , Richard J. Markle
IPC分类号： G06F11/00 , G06F19/00
CPC分类号： G05B23/0254 , G05B19/41875 , G05B2219/37519 , G05B2219/45031 , Y02P90/22
摘要： A method includes receiving a current residual vector. The current residual vector is compared to a plurality of historical residual vectors. Each historical residual vector has an associated fault classification code. At least one of the historical residual vectors is selected responsive to determining that the current residual vector matches at least one of the historical residual vectors. A fault condition is classified based on the fault classification code associated with the selected historical residual vector.
摘要翻译：一种方法包括接收当前残差矢量。将当前残差向量与多个历史残差向量进行比较。每个历史残差向量都有相关的故障分类码。响应于确定当前残差向量与至少一个历史残差向量相匹配来选择至少一个历史残差向量。基于与所选择的历史残差向量相关联的故障分类码，对故障条件进行分类。

9. 发明授权

US06953697B1 Advanced process control of the manufacture of an oxide-nitride-oxide stack of a memory device, and system for accomplishing same 失效
标题翻译：存储器件的氧化物 - 氮化物 - 氧化物堆叠的制造的先进工艺控制和用于实现其的系统
公开(公告)号：US06953697B1
公开(公告)日：2005-10-11
申请号：US10277357
申请日：2002-10-22
申请人： Howard E. Castle , Robert J. Chong , Brian K. Cusson , Eric O. Green
发明人： Howard E. Castle , Robert J. Chong , Brian K. Cusson , Eric O. Green
IPC分类号： H01L21/66 , H01L21/8247
CPC分类号： H01L22/12 , Y10S438/954
摘要： The present invention is generally directed to an advanced process control of the manufacture of memory devices, and a system for accomplishing same. In one illustrative embodiment, the method comprises performing at least one process operation to form at least one layer of an oxide-nitride-oxide stack of a memory cell, the stack being comprised of a first layer of oxide positioned above a first layer of polysilicon, a layer of silicon nitride positioned above the first layer of oxide, and a second layer of oxide positioned above the layer of silicon nitride. The method further comprises measuring at least one characteristic of at least one of the first layer of polysilicon, the first oxide layer, the layer of silicon nitride, and the second layer of oxide and adjusting at least one parameter of at least one process operation used to form at least one of the first oxide layer, the layer of silicon nitride and the second oxide layer if the measured at least one characteristic is not within acceptable limits.
摘要翻译：本发明一般涉及存储器件的制造的高级过程控制和用于实现其的系统。在一个说明性实施例中，该方法包括执行至少一个处理操作以形成存储器单元的氧化物 - 氮化物 - 氧化物堆叠的至少一层，所述堆叠由位于第一多晶硅层之上的第一层氧化物位于第一氧化物层之上的氮化硅层和位于氮化硅层上方的第二层氧化物。该方法还包括测量第一多晶硅层，第一氧化物层，氮化硅层和第二氧化物层中的至少一个的至少一个特征，并且调整使用的至少一个工艺操作的至少一个参数如果所测量的至少一个特性不在可接受的限度内，则形成第一氧化物层，氮化硅层和第二氧化物层中的至少一个。

10. 发明授权

US06912433B1 Determining a next tool state based on fault detection information 有权
标题翻译：根据故障检测信息确定下一个工具状态
公开(公告)号：US06912433B1
公开(公告)日：2005-06-28
申请号：US10323554
申请日：2002-12-18
申请人： Robert J. Chong , Michael L. Miller , Alexander J. Pasadyn , Eric O. Green
发明人： Robert J. Chong , Michael L. Miller , Alexander J. Pasadyn , Eric O. Green
IPC分类号： G05B19/418 , G06F19/00
CPC分类号： G05B19/41875 , G05B2219/32182 , G05B2219/45031 , G05B2219/50065 , Y02P90/22
摘要： A method and apparatus are provided for determining a next tool state based on fault detection information. The method comprises receiving operational data associated with processing of a workpiece by a processing tool, determining at least a portion of noise associated with the processing of the workpiece based on analyzing the operational data and estimating a next state of the processing tool based on at least the determined portion of the noise.
摘要翻译：提供了一种基于故障检测信息来确定下一个工具状态的方法和装置。该方法包括：通过处理工具接收与工件的处理有关的操作数据，基于分析操作数据确定与工件的处理相关联的噪声的至少一部分，并基于至少基于估计处理工具的下一个状态确定的噪声部分。

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