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1. 发明授权

US09964673B2 Optical system with aperture device having plurality of aperture elements 有权
公开(公告)号：US09964673B2
公开(公告)日：2018-05-08
申请号：US13021583
申请日：2011-02-04
申请人： Benjamin Sigel , Sascha Bleidistel
发明人： Benjamin Sigel , Sascha Bleidistel
IPC分类号： G03B27/72 , G02B5/00 , G03F7/20
CPC分类号： G02B5/005 , G03F7/70091 , G03F7/7025
摘要： An optical system has an aperture device having a multiplicity of aperture elements for the delimitation of the cross section of a ray bundle running through the optical system. The aperture device has a first aperture element, which is pivotable about a first rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a first aperture opening delimited by a first aperture edge. The aperture device also has at least one second aperture element, which is pivotable about a second rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a second aperture opening delimited by a second aperture edge. The second aperture opening is smaller than the first aperture opening. The aperture elements pivoted into the engagement position form an effective aperture opening. The aperture edges of aperture elements pivoted into the engagement position do not lie in a common plane.

2. 发明授权

US08767176B2 Microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置
公开(公告)号：US08767176B2
公开(公告)日：2014-07-01
申请号：US13052265
申请日：2011-03-21
申请人： Sascha Bleidistel , Yim-Bun Patrick Kwan , Florian Bach , Daniel Benz , Severin Waldis , Armin Werber
发明人： Sascha Bleidistel , Yim-Bun Patrick Kwan , Florian Bach , Daniel Benz , Severin Waldis , Armin Werber
IPC分类号： G03B27/42
CPC分类号： G03F7/702 , G02B7/1827 , G02B17/002 , G02B26/0833 , G03F7/70116 , G03F7/70291 , G03F7/70891
摘要： A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.
摘要翻译：微光刻投影曝光装置具有具有基体和多个反射镜单元的反射镜阵列。每个反射镜单元包括反射镜和固态关节，其具有将反射镜连接到基体的至少一个铰接部分。控制装置可以改变相应镜子相对于基体的对准。反射镜和基体相互相对的表面或连接到其的反射镜支撑体相互相对的表面被设计成滑动轴承的相应的滑动表面。

3. 发明申请

US20110194089A1 OPTICAL SYSTEM WITH APERTURE DEVICE 有权
标题翻译：光学设备光学系统
公开(公告)号：US20110194089A1
公开(公告)日：2011-08-11
申请号：US13021583
申请日：2011-02-04
申请人： Benjamin Sigel , Sascha Bleidistel
发明人： Benjamin Sigel , Sascha Bleidistel
IPC分类号： G03B27/54 , G02B26/02
CPC分类号： G02B5/005 , G03F7/70091 , G03F7/7025
摘要： An optical system has an aperture device having a multiplicity of aperture elements for the delimitation of the cross section of a ray bundle running through the optical system. The aperture device has a first aperture element, which is pivotable about a first rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a first aperture opening delimited by a first aperture edge. The aperture device also has at least one second aperture element, which is pivotable about a second rotation axis between an engagement position in the beam path of the optical system and a neutral position outside the beam path of the optical system and has a second aperture opening delimited by a second aperture edge. The second aperture opening is smaller than the first aperture opening. The aperture elements pivoted into the engagement position form an effective aperture opening. The aperture edges of aperture elements pivoted into the engagement position do not lie in a common plane.
摘要翻译：光学系统具有孔径装置，其具有多个孔径元件，用于限定穿过光学系统的射线束的横截面。光圈装置具有第一光圈元件，该第一光圈元件围绕光学系统的光束路径中的接合位置与光学系统的光束路径外的中性位置之间的第一旋转轴线枢转，并且具有由第一个孔边缘。所述光圈装置还具有至少一个第二光圈元件，所述第二光圈元件可在所述光学系统的光束路径中的接合位置与所述光学系统的光束路径之外的中性位置之间围绕第二旋转轴线枢转，并具有第二孔径开口由第二孔边限定。第二开口开口小于第一开口开口。枢转到接合位置的孔元件形成有效的孔口。枢转到接合位置的孔元件的孔眼边缘不位于公共平面中。

4. 发明授权

US07830611B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07830611B2
公开(公告)日：2010-11-09
申请号：US11971328
申请日：2008-01-09
申请人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
发明人： Olaf Conradi , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati , Boris Bittner
IPC分类号： G02B1/06 , G02B3/02 , G02B27/02
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

5. 发明申请

US20100231883A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20100231883A1
公开(公告)日：2010-09-16
申请号：US12727482
申请日：2010-03-19
申请人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
发明人： Aurelian Dodoc , Sascha Bleidistel , Olaf Conradi , Arif Kazi
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70308
摘要： A microlithographic projection exposure apparatus includes a primary illumination system producing projection light, a projection objective and a correction optical system. The correction optical system includes a secondary illumination system, which produces an intensity distribution of correction light in a reference surface, and a correction element which includes a heating material and is arranged in a plane that is at least substantially optically conjugate to the reference surface such that the correction light and the projection light pass through at least one lens contained in the projection objective before they impinge on the correction element. All lenses through which both the correction light and the projection light pass are made of a lens material which has a lower coefficient of absorption for the correction light than the heating material contained in the correction element.
摘要翻译：微光刻投影曝光装置包括产生投影光的一次照明系统，投射物镜和校正光学系统。校正光学系统包括二次照明系统，其产生参考表面中的校正光的强度分布;以及校正元件，其包括加热材料，并且被布置在与参考表面至少基本上光学共轭的平面中，校正光和投射光在撞击在校正元件上之前通过包含在投影物镜中的至少一个透镜。校正光和投影光通过的所有透镜由透镜材料制成，该透镜材料与校正元件中包含的加热材料相比具有较低的校正光吸收系数。

6. 发明授权

US10146137B2 Catadioptric projection objective including a reflective optical component and a measuring device 有权
公开(公告)号：US10146137B2
公开(公告)日：2018-12-04
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03F7/20 , G02B13/14 , G02B17/08
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

7. 发明申请

US20130182264A1 Projection Exposure Tool for Microlithography and Method for Microlithographic Exposure 审中-公开
标题翻译：用于微光刻的投影曝光工具和微光刻曝光方法
公开(公告)号：US20130182264A1
公开(公告)日：2013-07-18
申请号：US13788042
申请日：2013-03-07
申请人： Jochen Hetzler , Sascha Bleidistel , Toralf Gruner , Joachim Hartjes
发明人： Jochen Hetzler , Sascha Bleidistel , Toralf Gruner , Joachim Hartjes
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70608 , G03F7/70733 , G03F9/7003 , G03F9/7034 , G03F9/7049
摘要： A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.
摘要翻译：公开了一种用于曝光衬底的用于微光刻的投影曝光工具。该工具包括投影物镜。该工具还包括用于在衬底暴露之前确定衬底的表面形貌的光学测量装置。测量装置具有延伸到投影物镜外部的测量光束路径。所述测量装置是波面测量装置，其被配置为在所述基板表面上的多个点处同时确定地形测量值。

8. 发明申请

US20120218536A1 CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
标题翻译：反射光学元件和测量装置的目标投影目标
公开(公告)号：US20120218536A1
公开(公告)日：2012-08-30
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G02B13/143 , G02B17/0856 , G02B17/0892 , G03F7/70225 , G03F7/706
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.
摘要翻译：用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。投影物镜包括至少一个反射光学部件和测量装置。在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。成像辐射的反射的第一部分至少部分地有助于对象场的成像。成像辐射的透射的第二部分至少部分地被馈送到测量装置。这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。

9. 发明授权

US07782440B2 Projection lens system of a microlithographic projection exposure installation 有权
标题翻译：投影透镜系统的微光刻投影曝光装置
公开(公告)号：US07782440B2
公开(公告)日：2010-08-24
申请号：US11719074
申请日：2005-11-17
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译：微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

10. 发明申请

US20100128367A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译：一种微电脑设备和方法的投影目标
公开(公告)号：US20100128367A1
公开(公告)日：2010-05-27
申请号：US12403526
申请日：2009-03-13
申请人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译：提供了具有改善的成像特性的微光刻设备的投影物镜。提供了一种用于投影物镜的操纵器。提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。提供了一种用于改善投影物镜的成像特性的方法。

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