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    • 2. 发明授权
    • Pattern measuring method and electron microscope
    • 图案测量方法和电子显微镜
    • US07795581B2
    • 2010-09-14
    • US12038116
    • 2008-02-27
    • Shuichi NakagawaSho Takami
    • Shuichi NakagawaSho Takami
    • G01N21/00G01N23/00G21K7/00
    • H01J37/28H01J37/1472H01J37/265H01J37/3045H01J2237/22H01J2237/2816H01J2237/2817
    • An object of the present invention is to provide a pattern measuring method and an electron microscope that achieve truly high measurement throughput by achieving both precise location of a measurement target position and high-speed movement of the scanning position of an electron beam to the measurement target position. In order to attain the object described above, according to an aspect of the present invention, there is provided a pattern measuring method and an apparatus that move the scanning position of an electron beam based on coordinate information about a first pattern, which is a target to be measured with the electron beam, move the scanning position of the electron beam to a region comprising a second pattern, the relative distance of which from the first pattern is previously registered, in a case where detection of the first pattern at the point of arrival fails, and move the scanning position of the electron beam based on detection of the second pattern and information about the relative distance.
    • 本发明的目的是提供一种图形测量方法和电子显微镜,其通过实现测量目标位置的精确定位和电子束的扫描位置的高速移动到测量目标而实现真正高的测量吞吐量 位置。 为了实现上述目的,根据本发明的一个方面,提供了一种图案测量方法和装置,其基于关于作为目标的第一图案的坐标信息来移动电子束的扫描位置 要用电子束测量,将电子束的扫描位置移动到包括第一图案的第一图案在第一图案的检测的情况下包括第二图案的区域,该第二图案的距离与第一图案的相对距离被预先登记 到达失败,并且基于第二图案的检测和关于相对距离的信息移动电子束的扫描位置。
    • 3. 发明申请
    • SAMPLE STAGE APPARATUS AND METHOD OF CONTROLLING THE SAME
    • 样品台装置及其控制方法
    • US20090251091A1
    • 2009-10-08
    • US12420358
    • 2009-04-08
    • Masashi FUJITAShuichi NAKAGAWATakashi KOBAYASHI
    • Masashi FUJITAShuichi NAKAGAWATakashi KOBAYASHI
    • G05B11/18
    • H01J37/20H01J2237/20228H01J2237/20285H01J2237/20292
    • The present invention provides a stage apparatus capable of reducing a positioning time without increasing a positional deviation. A positioning control method of a sample stage apparatus includes: a high-speed movement step of moving a table to a high-speed movement target position at a first movement speed; a positional deviation correcting step of moving the table to a low-speed positioning step start position at a second movement speed that is lower than the first movement speed; a low-speed positioning step of moving the table to a target position at a third movement speed that is lower than the second movement speed. After the low-speed positioning step is completed, a rod connected to a motor returns to its original position to separate a pin of the rod side from a concave portion of the table side.
    • 本发明提供一种能够在不增加位置偏差的情况下减少定位时间的舞台装置。 采样台装置的定位控制方法包括:以第一移动速度将桌子移动到高速移动目标位置的高速移动步骤; 位置偏差校正步骤,以低于第一移动速度的第二移动速度将桌子移动到低速定位步骤开始位置; 低速定位步骤,以低于第二移动速度的第三移动速度将桌子移动到目标位置。 在低速定位步骤完成之后,连接到电动机的杆返回到其初始位置,以将杆侧的销与台侧的凹部分开。
    • 4. 发明授权
    • Foot volume pedal systems and methods
    • 脚踏体积踏板系统和方法
    • US07498506B2
    • 2009-03-03
    • US11527910
    • 2006-09-27
    • Shuichi Nakagawa
    • Shuichi Nakagawa
    • G10H3/00
    • G10H1/348
    • A pedal system and method for a musical instrument includes a supporting pedestal operatively connected to a foot pedal such that the foot pedal is pivotal to allow a user to control a musical tone in conformance with the angle of the foot pedal relative to the supporting pedestal. A rotating section is operatively connected to the foot pedal. A pressing member presses upon a contact surface of the rotating section. A leaf spring (or similar bias member) applies pressure on the pressing member causing it to press upon the contact surface of the rotating section. A pressing force adjusting structure to adjust the elastic force with which the leaf spring forces the pressing member upon the contact surface of the rotating section. The rotating section rotates about a central axis of rotation, and the rotating section rotates relative to the supporting pedestal. The rotating section has a contact surface parallel to the central axis of rotation.
    • 用于乐器的踏板系统和方法包括可操作地连接到脚踏板的支撑座,使得脚踏板枢转以允许用户根据脚踏板相对于支撑座的角度来控制乐音。 旋转部分可操作地连接到脚踏板。 按压部件按压在旋转部的接触面上。 板簧(或类似的偏压构件)对按压构件施加压力,使其按压在旋转部分的接触表面上。 一种按压力调节结构,用于调节弹簧力使所述按压构件在所述旋转部的接触面上受力。 旋转部分围绕中心旋转轴线旋转,并且旋转部分相对于支撑基座旋转。 旋转部分具有平行于中心旋转轴线的接触表面。
    • 5. 发明申请
    • Foot volume pedal systems and methods
    • 脚踏体积踏板系统和方法
    • US20070074623A1
    • 2007-04-05
    • US11527910
    • 2006-09-27
    • Shuichi Nakagawa
    • Shuichi Nakagawa
    • G10H1/32G10H3/00
    • G10H1/348
    • A pedal system and method for a musical instrument includes a supporting pedestal operatively connected to a foot pedal such that the foot pedal is pivotal to allow a user to control a musical tone in conformance with the angle of the foot pedal relative to the supporting pedestal. A rotating section is operatively connected to the foot pedal. A pressing member presses upon a contact surface of the rotating section. A leaf spring (or similar bias member) applies pressure on the pressing member causing it to press upon the contact surface of the rotating section. A pressing force adjusting structure to adjust the elastic force with which the leaf spring forces the pressing member upon the contact surface of the rotating section. The rotating section rotates about a central axis of rotation, and the rotating section rotates relative to the supporting pedestal. The rotating section has a contact surface parallel to the central axis of rotation.
    • 用于乐器的踏板系统和方法包括可操作地连接到脚踏板的支撑座,使得脚踏板枢转以允许用户根据脚踏板相对于支撑座的角度来控制乐音。 旋转部分可操作地连接到脚踏板。 按压部件按压在旋转部的接触面上。 板簧(或类似的偏压构件)对按压构件施加压力,使其按压在旋转部分的接触表面上。 一种按压力调节结构,用于调节弹簧力使所述按压构件在所述旋转部的接触面上受力。 旋转部分围绕中心旋转轴线旋转,并且旋转部分相对于支撑基座旋转。 旋转部分具有平行于中心旋转轴线的接触表面。
    • 8. 发明授权
    • Developing device and regulating member
    • 显影装置和调节构件
    • US5870658A
    • 1999-02-09
    • US69171
    • 1998-04-29
    • Hiroshi GotoShuichi NakagawaYoichi FujiedaRyuji Inoue
    • Hiroshi GotoShuichi NakagawaYoichi FujiedaRyuji Inoue
    • G03G15/08
    • G03G15/0812
    • The present invention is directed to a developing device using a developer carrying member in which an insulating layer is formed on the surface of a conductive base substrate for regulating, in conveying a developer to a developing area opposite to an image carrying member with it being held on the surface of the developer carrying member, the amount of the developer conveyed to the developing area upon pressing a regulating member against the surface of the developer carrying member, wherein a regulating member in which a dielectric layer satisfying the following relationship (1) is formed on an electrical conductive member is used as the regulating member, to press the dielectric layer against the developer carrying member:t/.epsilon..gtoreq.10 (1)where t (.mu.m) is the thickness of the dielectric layer, and .epsilon. is the relative dielectric constant of the dielectric layer.
    • 本发明涉及一种使用显影剂承载构件的显影装置,其中在导电基底基板的表面上形成绝缘层,用于在将显影剂传送到与图像承载构件相对的显影区域时进行调节 在显影剂承载构件的表面上,在将调节构件压靠在显影剂承载构件的表面上时,传送到显影区域的显影剂的量,其中满足以下关系式(1)的介电层的调节构件是 形成在导电构件上的电介质层被用作调节构件,以将电介质层压在显影剂承载构件上:t /ε= 10(1)其中t(μm)是电介质层的厚度,ε 是介电层的相对介电常数。