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    • 1. 发明授权
    • Thin film transistor
    • 薄膜晶体管
    • US09112042B2
    • 2015-08-18
    • US13611279
    • 2012-09-12
    • Wei-Chou LanTed-Hong ShinnHenry WangChia-Chun Yeh
    • Wei-Chou LanTed-Hong ShinnHenry WangChia-Chun Yeh
    • H01L29/786H01L29/49
    • H01L29/78696H01L29/4908
    • A thin film transistor suitable for being disposed on a substrate is provided. The thin film transistor includes a gate electrode, an organic gate dielectric layer, a metal oxide semiconductor layer, a source electrode and a drain electrode. The gate electrode is disposed on the substrate. The organic gate dielectric layer is disposed on the substrate to cover the gate electrode. The source electrode, the drain electrode and the metal oxide semiconductor layer are disposed above the organic gate dielectric layer, and the metal oxide semiconductor layer contacts with the source electrode and the drain electrode. Because the channel layer of the thin film transistor is a layer of metal oxide semiconductor formed at a lower temperature, thus the thin film transistor can be widely applied into various display applications such as flexible display devices.
    • 提供了适合于设置在基板上的薄膜晶体管。 薄膜晶体管包括栅电极,有机栅介质层,金属氧化物半导体层,源电极和漏电极。 栅电极设置在基板上。 有机栅极介电层设置在基板上以覆盖栅电极。 源电极,漏电极和金属氧化物半导体层设置在有机栅极电介质层的上方,金属氧化物半导体层与源电极和漏电极接触。 由于薄膜晶体管的沟道层是在较低温度下形成的金属氧化物半导体层,因此薄膜晶体管可以广泛地应用于诸如柔性显示器件的各种显示应用中。
    • 3. 发明授权
    • Compensation method and apparatus for light emitting diode circuit
    • 发光二极管电路的补偿方法和装置
    • US08952618B2
    • 2015-02-10
    • US13157398
    • 2011-06-10
    • Chuan-I HuangChin-Wen LinHsing-Yi WuTed-Hong Shinn
    • Chuan-I HuangChin-Wen LinHsing-Yi WuTed-Hong Shinn
    • G09G3/10G09G3/32
    • G09G3/3233G09G3/3283G09G2300/0819G09G2300/0857
    • A compensation method for a light emitting diode (LED) circuit including a first transistor, a second transistor, a capacitor, and a LED is illustrated. A first end as a control end of the first transistor is connected to one end of the second transistor and the capacitor, and a second end of the first transistor is connected to the LED. A width to length (W/L) ratio of the second transistor is less than one. An initial control voltage is applied to a control end of the second transistor, and the current output voltage of the LED is correspondingly measured. If a difference between the current output voltage and an initial output voltage exceeds a predetermined value, a compensation voltage, which is a summation of the initial control voltage and the difference, is applied to the control end of the second transistor.
    • 示出了包括第一晶体管,第二晶体管,电容器和LED的发光二极管(LED)电路的补偿方法。 作为第一晶体管的控制端的第一端连接到第二晶体管和电容器的一端,并且第一晶体管的第二端连接到LED。 第二晶体管的宽比(W / L)比小于1。 将初始控制电压施加到第二晶体管的控制端,并相应地测量LED的电流输出电压。 如果电流输出电压和初始输出电压之间的差超过预定值,则将作为初始控制电压和差值的总和的补偿电压施加到第二晶体管的控制端。
    • 8. 发明授权
    • Display panel
    • 显示面板
    • US08791909B2
    • 2014-07-29
    • US12853926
    • 2010-08-10
    • Yao-Chou TsaiSung-Hui HuangPo-Wen HsiaoTed-Hong Shinn
    • Yao-Chou TsaiSung-Hui HuangPo-Wen HsiaoTed-Hong Shinn
    • G06F3/041G06F3/043
    • G06F3/0414
    • A display panel is provided. The display panel comprises a first substrate, a second substrate, a display control circuit and a force sensing circuit. The display control circuit is disposed on the first substrate between the first substrate and the second substrate for controlling the display panel to display an image through the second substrate. The force sensing circuit is disposed side by side with the display control circuit on the first substrate between the first substrate and second substrate, wherein the force sensing circuit comprises a plurality of force sensing elements for sensing at least one external force and correspondingly generate a plurality of force signals respectively to transform at least one touch signal corresponding to the at least one external force.
    • 提供显示面板。 显示面板包括第一基板,第二基板,显示控制电路和力感测电路。 显示控制电路设置在第一基板和第二基板之间,用于控制显示面板通过第二基板显示图像。 所述力感测电路与所述第一基板上的所述显示控制电路并排设置在所述第一基板和所述第二基板之间,其中所述力感测电路包括用于感测至少一个外力的多个力传感元件,并相应地产生多个 的力信号分别转换与至少一个外力对应的至少一个触摸信号。
    • 9. 发明授权
    • Method for forming oxide thin film transistor
    • 氧化物薄膜晶体管的形成方法
    • US08748222B2
    • 2014-06-10
    • US12774562
    • 2010-05-05
    • Ted-Hong ShinnHenry WangFang-An ShuYao-Chou Tsai
    • Ted-Hong ShinnHenry WangFang-An ShuYao-Chou Tsai
    • H01L21/00H01L29/786H01L29/10H01L21/34
    • H01L29/78693H01L21/34H01L29/1083H01L29/78609
    • A method for manufacturing oxide thin film transistors includes steps of: forming a gate, a drain electrode, a source electrode, and an oxide semiconductor layer respectively. The oxide semiconductor layer is formed on the gate electrode; the drain electrode and the source electrode are formed at two opposite sides of the oxide semiconductor layer. The method further includes a step of depositing a dielectric layer of silicon oxide, and a reacting gas for depositing the silicon oxide includes silane and nitrous oxide. A flow rate of nitrous oxide is in a range from 10 to 200 standard cubic centimeters per minute (SCCM). Oxide thin film transistors manufactured by above method has advantages of low leakage, high mobility, and other integrated circuit member can be directly formed on the thin film transistor array substrate of a display device.
    • 制造氧化物薄膜晶体管的方法包括以下步骤:分别形成栅极,漏极,源电极和氧化物半导体层。 氧化物半导体层形成在栅电极上; 漏电极和源电极形成在氧化物半导体层的两个相对侧。 该方法还包括沉积氧化硅的介电层的步骤,并且用于沉积氧化硅的反应气体包括硅烷和一氧化二氮。 一氧化二氮的流量在10至200标准立方厘米每分钟(SCCM)的范围内。 通过上述方法制造的氧化物薄膜晶体管具有漏电流低,迁移率高的优点,其他集成电路元件可以直接形成在显示器件的薄膜晶体管阵列基板上。