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1. 发明授权

US08236481B2 Method to fabricate a redirecting mirror in optical waveguide devices 有权
标题翻译：在光波导器件中制造重定向镜的方法
公开(公告)号：US08236481B2
公开(公告)日：2012-08-07
申请号：US12966619
申请日：2010-12-13
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： G02B6/42 , G03F7/20
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

2. 发明申请

US20090020499A1 Method to Fabricate a Redirecting Mirror in Optical Waveguide Devices 有权
标题翻译：在光波导器件中制造重定向镜的方法
公开(公告)号：US20090020499A1
公开(公告)日：2009-01-22
申请号：US11886770
申请日：2005-03-31
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： C23F1/00
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

3. 发明授权

US07871760B2 Method to fabricate a redirecting mirror in optical waveguide devices 有权
标题翻译：在光波导器件中制造重定向镜的方法
公开(公告)号：US07871760B2
公开(公告)日：2011-01-18
申请号：US11886770
申请日：2005-03-31
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： G02B6/42 , G03F7/20
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

4. 发明授权

US3649186A Continuous process for obtaining high-grade zinc oxide from zinc-containing minerals 失效
标题翻译：从含锌矿物中获得高级氧化锌的连续工艺
公开(公告)号：US3649186A
公开(公告)日：1972-03-14
申请号：US3649186D
申请日：1968-01-25
申请人： MONTEDISON SPA , MONTIPONI E MONTEVECCHIO SPA , GIUSEPPE SIRONT , AMOS VASCHETTI , UMBERTO COLOMBO , GIOVANNI SCACCIATI
发明人： COLOMBO UMBERTO , SCACCIATI GIOVANNI , SIRONI GIUSEPPE , VASCHETTI AMOS
IPC分类号： C01G9/02 , C22B19/04 , C22B19/34 , B01D51/00 , B01D59/28
CPC分类号： C22B19/04 , C01G9/02 , C22B19/34 , Y02P20/129
摘要： A continuous process for obtaining zinc oxide of a grade higher than 75 percent from oxidized zinciferous ores, which comprises: Preheating the zinc-containing mineral and calcining it at temperatures above 800* C. (preferably at 900*-1,000* C.) by the combustion products of the gases leaving the reducing reactor. Treating the calcined ore in a fluidized bed at a temperature of from 1,000 to 1,200* C. with reducing gases obtained by direct injection of a hydrocarbon fuel and of an amount of air less than stoichiometric into the fluid bed and discharging the zinc-free residues. Burning the reducing gas of the reduction stage containing the metallic zinc vapors with air to produce a burnt gas containing CO2, H2O and ZnO. Using the burnt gas to preheat the air necessary for the partial combustion of the fuel by indirect heat exchange and the incoming zinciferous ore by direct heat exchange. Subjecting the off gases, after having released part of their heat to the air and to the ore, to separation in order to recover the zinc oxide.
摘要翻译：从氧化的含锌矿石中获得高于75％的氧化锌的连续方法，其包括：将含锌矿物预加热并在高于800℃（优选在900℃-1000℃）下煅烧，由离开还原反应器的气体的燃烧产物。在流化床中在1000至1200℃的温度下处理煅烧的矿石，通过直接将烃燃料和少于化学计量的空气量直接注入流化床而获得的还原气体并排出无锌残渣。用空气燃烧含有金属锌蒸汽的还原阶段的还原气体，产生含有CO 2，H 2 O和ZnO的燃烧气体。使用燃烧气体通过间接热交换预热燃料部分燃烧所需的空气，并通过直接热交换预热进入的含锌矿石。在将部分热量释放到空气和矿石之后，将废气进行分离以回收氧化锌。

5. 发明申请

US20110136063A1 METHOD TO FABRICATE A REDIRECTING MIRROR IN OPTICAL WAVEGUIDE DEVICES 有权
标题翻译：在光波导器件中制造重复反射镜的方法
公开(公告)号：US20110136063A1
公开(公告)日：2011-06-09
申请号：US12966619
申请日：2010-12-13
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： G03F7/20
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

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