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1. 发明授权

US07871760B2 Method to fabricate a redirecting mirror in optical waveguide devices 有权
标题翻译：在光波导器件中制造重定向镜的方法
公开(公告)号：US07871760B2
公开(公告)日：2011-01-18
申请号：US11886770
申请日：2005-03-31
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： G02B6/42 , G03F7/20
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

2. 发明申请

US20110136063A1 METHOD TO FABRICATE A REDIRECTING MIRROR IN OPTICAL WAVEGUIDE DEVICES 有权
标题翻译：在光波导器件中制造重复反射镜的方法
公开(公告)号：US20110136063A1
公开(公告)日：2011-06-09
申请号：US12966619
申请日：2010-12-13
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： G03F7/20
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

3. 发明授权

US08236481B2 Method to fabricate a redirecting mirror in optical waveguide devices 有权
标题翻译：在光波导器件中制造重定向镜的方法
公开(公告)号：US08236481B2
公开(公告)日：2012-08-07
申请号：US12966619
申请日：2010-12-13
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： G02B6/42 , G03F7/20
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

4. 发明申请

US20090020499A1 Method to Fabricate a Redirecting Mirror in Optical Waveguide Devices 有权
标题翻译：在光波导器件中制造重定向镜的方法
公开(公告)号：US20090020499A1
公开(公告)日：2009-01-22
申请号：US11886770
申请日：2005-03-31
申请人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
发明人： Alessandro Nottola , Umberto Colombo , Giorgio Cataldo Mutinati , Stefano Sardo
IPC分类号： C23F1/00
CPC分类号： G02B6/42 , G02B6/4214 , G02B2006/12104 , G03F7/2022 , G03F7/203 , G03F7/7045
摘要： A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
摘要翻译：一种制造用于光学器件的转向镜的方法包括以下步骤：在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束，其中电子束曝光的电子剂量根据第一部分在第一部分内变化选择的图案，并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。对衬底和光致抗蚀剂进行蚀刻，使得在衬底中形成与第三部分相对应的第二倾斜表面。第二表面与传播方向形成一角度。

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