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    • 1. 发明申请
    • METHOD TO FABRICATE A REDIRECTING MIRROR IN OPTICAL WAVEGUIDE DEVICES
    • 在光波导器件中制造重复反射镜的方法
    • US20110136063A1
    • 2011-06-09
    • US12966619
    • 2010-12-13
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • G03F7/20
    • G02B6/42G02B6/4214G02B2006/12104G03F7/2022G03F7/203G03F7/7045
    • A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
    • 一种制造用于光学器件的转向镜的方法包括以下步骤:在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。 其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束,其中电子束曝光的电子剂量根据第一部分在第一部分内变化 选择的图案,并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。 光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。 显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。 对衬底和光致抗蚀剂进行蚀刻,使得在衬底中形成与第三部分相对应的第二倾斜表面。 第二表面与传播方向形成一角度。
    • 2. 发明授权
    • Method to fabricate a redirecting mirror in optical waveguide devices
    • 在光波导器件中制造重定向镜的方法
    • US07871760B2
    • 2011-01-18
    • US11886770
    • 2005-03-31
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • G02B6/42G03F7/20
    • G02B6/42G02B6/4214G02B2006/12104G03F7/2022G03F7/203G03F7/7045
    • A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
    • 一种制造用于光学器件的转向镜的方法包括以下步骤:在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。 其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束,其中电子束曝光的电子剂量根据第一部分在第一部分内变化 选择的图案,并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。 光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。 显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。 对衬底和光致抗蚀剂进行蚀刻,使得在衬底中形成与第三部分相对应的第二倾斜表面。 第二表面与传播方向形成一角度。
    • 3. 发明授权
    • Method to fabricate a redirecting mirror in optical waveguide devices
    • 在光波导器件中制造重定向镜的方法
    • US08236481B2
    • 2012-08-07
    • US12966619
    • 2010-12-13
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • G02B6/42G03F7/20
    • G02B6/42G02B6/4214G02B2006/12104G03F7/2022G03F7/203G03F7/7045
    • A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
    • 一种制造用于光学器件的转向镜的方法包括以下步骤:在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。 其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束,其中电子束曝光的电子剂量根据第一部分在第一部分内变化 选择的图案,并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。 光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。 显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。 对衬底和光致抗蚀剂进行蚀刻,使得在衬底中形成与第三部分相对应的第二倾斜表面。 第二表面与传播方向形成一角度。
    • 4. 发明申请
    • Method to Fabricate a Redirecting Mirror in Optical Waveguide Devices
    • 在光波导器件中制造重定向镜的方法
    • US20090020499A1
    • 2009-01-22
    • US11886770
    • 2005-03-31
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • Alessandro NottolaUmberto ColomboGiorgio Cataldo MutinatiStefano Sardo
    • C23F1/00
    • G02B6/42G02B6/4214G02B2006/12104G03F7/2022G03F7/203G03F7/7045
    • A method of fabricating a turning mirror for an optical device includes the steps of depositing on a substrate, which defines a plane in which an optical signal propagates in a propagating direction, a photoresist layer sensitive to electrons and to UV radiation. The material in which the photoresist layer is formed, has a contrast not larger than 3. A first portion of the photoresist layer is exposed to an electron beam, wherein the electron dose of the electron beam exposure is varied within the first portion according to a selected pattern, and wherein the electron does to which a given region in the photoresist is exposed, depends on the resulting photoresist height in the given region after development. A second portion of the photoresist layer is exposed to UV radiation; the first and the second portions are overlapped at least in a third portion. The photoresist layer is developed so as to form in the third portion of the photoresist layer exposed to both electron beam and to UV radiation a first surface having an angle relative to the propagating direction. The substrate and the photoresist are etched so that a second angled surface is formed in the substrate in correspondence to the third portion. The second surface forms an angle with the propagating direction.
    • 一种制造用于光学器件的转向镜的方法包括以下步骤:在限定光学信号沿传播方向传播的平面的基板上沉积对电子敏感的光致抗蚀剂层和UV辐射。 其中形成光致抗蚀剂层的材料具有不大于3的对比度。光致抗蚀剂层的第一部分暴露于电子束,其中电子束曝光的电子剂量根据第一部分在第一部分内变化 选择的图案,并且其中光致抗蚀剂中给定区域暴露的电子取决于显影后给定区域中得到的光致抗蚀剂高度。 光致抗蚀剂层的第二部分暴露于紫外线辐射; 第一部分和第二部分至少在第三部分中重叠。 显影光致抗蚀剂层以便在暴露于电子束和UV辐射的光致抗蚀剂层的第三部分中形成相对于传播方向具有一角度的第一表面。 对衬底和光致抗蚀剂进行蚀刻,使得在衬底中形成与第三部分相对应的第二倾斜表面。 第二表面与传播方向形成一角度。
    • 6. 发明授权
    • System for evaluating the geometry of articles transported by a conveyor
    • 用于评估由输送机运输的物品的几何形状的系统
    • US06349755B1
    • 2002-02-26
    • US09610361
    • 2000-07-05
    • Stefano Sardo
    • Stefano Sardo
    • G01B520
    • B65C9/40B65C2009/401G01B5/10G01B7/125G01B7/287Y10T156/171
    • The system (14, 18) for evaluating the geometry of articles transported by a conveyor (12) includes a frame (20) adapted to be mounted facing the conveyor (12), feelers (22) carried by the frame and moved relative to the frame (20) by articles transported by the conveyor (12), each feeler (22) having an end (28) for tracking the exposed surface of an article, which tracking end (28) is adapted to rest on the article and to move the feeler (22) by an amount representative of the position of the point on the article to which the tracking end (28) of the feeler (22) is applied, means (32) for measuring the position of each feeler (22) relative to the frame (20), and means (18) for calculating the geometry of the articles according to the measured position of each feeler (22).
    • 用于评估由输送机(12)运送的物品的几何形状的系统(14,18)包括适于面向输送机(12)安装的框架(20),由框架承载的触发器(22)并相对于 框架(20)通过由输送机(12)运送的物品,每个触片(22)具有用于跟踪物品的暴露表面的端部(28),该跟踪端(28)适于搁置在物品上并移动 触发器(22)以代表触发器(22)的跟踪端(28)的物品上的点的位置的量的装置(32),用于测量每个触发器(22)的相对位置的装置 (20),以及用于根据每个探测器(22)的测量位置计算物品的几何形状的装置(18)。
    • 8. 发明申请
    • Method Of Making Grating Structures Having High Aspect Ratio
    • 制作具有高纵横比的光栅结构的方法
    • US20080038660A1
    • 2008-02-14
    • US11579167
    • 2004-05-21
    • Sergio DonedaRomano MorsonStefano Sardo
    • Sergio DonedaRomano MorsonStefano Sardo
    • G02B5/18G02B6/12G02B6/34
    • G02B6/124G02B5/1857
    • A method for realizing a grating structure including the steps of providing a layered structure having a substrate, a grating layer, a first masking layer of polysilicon, a dielectric layer and a second masking layer. Additionally, a resist layer is deposited on the second masking layer; the resist layer is exposed according to a selected pattern to an electron beam; the resist layer is developed according to the pattern; the second masking layer is etched using the developed resist layer as a mask to form a patterned second masking layer; the dielectric layer is etched using the patterned second masking layer as a hard mask to form a patterned dielectric layer; the first masking layer is etched using the patterned dielectric layer as a hard mask to form a patterned first masking layer; and the grating layer is etched using the patterned first masking layer as a hard mask to form the grating structure.
    • 一种实现光栅结构的方法,包括以下步骤:提供具有基底,光栅层,多晶硅的第一掩模层,电介质层和第二掩蔽层的层状结构。 另外,在第二掩模层上沉积抗蚀剂层; 根据所选择的图案将抗蚀剂层暴露于电子束; 抗蚀剂层根据图案显影; 使用显影的抗蚀剂层作为掩模来蚀刻第二掩模层以形成图案化的第二掩模层; 使用图案化的第二掩模层作为硬掩模来蚀刻电介质层以形成图案化的介电层; 使用图案化的介电层作为硬掩模蚀刻第一掩模层以形成图案化的第一掩模层; 并且使用图案化的第一掩模层作为硬掩模来蚀刻光栅层以形成光栅结构。
    • 9. 发明授权
    • Machine for the sorting by size of pear-shaped objects
    • 用于按梨形物体的大小排序的机器
    • US06547079B2
    • 2003-04-15
    • US09758217
    • 2001-01-12
    • Stefano Sardo
    • Stefano Sardo
    • B07C506
    • B07B13/075Y10S209/911
    • A machine for the sorting by size of pear-shaped objects including a conveyor (10) able to move essentially horizontally. The conveyor includes a first alignment of equidistant and parallel primary rollers (30) separated each from the next by an interval allowing one object to pass through. The conveyor (10) also has a second alignment of secondary rollers (44) each arranged in alignment with an interval. The machine has a device (42) for guiding the secondary rollers (44) along a sorting path (14) of the conveyor. The guide device (42) being such as to move the secondary rollers progressively away from the primary rollers along the length of the sorting path (14). The primary and secondary rollers do not rotate about their axis for the greater part of the sorting path (14).
    • 一种用于根据大小分类梨形物体的机器,包括能够基本水平移动的输送机(10)。 输送机包括等距和平行的初级辊(30)的第一对准,每个初级辊(30)每隔一个间隔开一个允许一个物体通过的间隔。 输送机(10)还具有与间隔对准布置的次级辊(44)的第二对准。 机器具有用于沿着输送机的分拣路径(14)引导辅助辊(44)的装置(42)。 引导装置(42)使得副辊沿着分拣路径(14)的长度逐渐地远离主辊。 主辊和次辊不围绕其轴线旋转,用于大部分分选路径(14)。