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1. 发明授权

US09081304B2 Substrate, an inspection apparatus, and a lithographic apparatus 有权
标题翻译：基板，检查装置和光刻设备
公开(公告)号：US09081304B2
公开(公告)日：2015-07-14
申请号：US13059408
申请日：2009-07-09
申请人： Hendrik Jan Hidde Smilde , Willem Marie Julia Marcel Coene
发明人： Hendrik Jan Hidde Smilde , Willem Marie Julia Marcel Coene
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70683 , G03F7/70625 , G03F7/70633 , Y10T428/24802
摘要： A target for measuring an overlay error or a critical dimension of a substrate comprises a grating. In one example, lines of the grating are arranged at an angle of about 45° with respect to edges of the target. As a consequence, the diffraction order of the grating reflection has its sub-maxima not aligned along the line on which the other diffraction orders are positioned, and overlap of intensity with other diffraction orders is reduced.
摘要翻译：用于测量衬底的重叠误差或临界尺寸的目标包括光栅。在一个示例中，光栅的线相对于目标的边缘以大约45°的角度布置。因此，光栅反射的衍射级别具有沿其它衍射级所在的线不对准的亚极大值，并且强度与其他衍射级的重叠减小。

2. 发明申请

US20110178785A1 Calibration Method and Apparatus 有权
标题翻译：校准方法和装置
公开(公告)号：US20110178785A1
公开(公告)日：2011-07-21
申请号：US12973248
申请日：2010-12-20
申请人： Patricius Aloysius Jacobus TINNEMANS , Henricus Petrus Maria Pellemans , Gerbrand Van Der Zouw , Willem Marie Julia Marcel Coene
发明人： Patricius Aloysius Jacobus TINNEMANS , Henricus Petrus Maria Pellemans , Gerbrand Van Der Zouw , Willem Marie Julia Marcel Coene
IPC分类号： G06F17/10
CPC分类号： G01N21/93 , G01N21/4785 , G01N21/4788
摘要： Calibration of an angularly resolved scatterometer is performed by measuring a target in two or more different arrangements. The different arrangements cause radiation being measured in an outgoing direction to be different combinations of radiation illuminating the target from ingoing directions. A reference mirror measurement may also be performed. The measurements and modeling of the difference between the first and second arrangements is used to estimate separately properties of the ingoing and outgoing optical systems. The modeling may account for symmetry of the respective periodic target. The modeling typically accounts for polarizing effects of the ingoing optical elements, the outgoing optical elements and the respective periodic target. The polarizing effects may be described in the modeling by Jones calculus or Mueller calculus. The modeling may include a parameterization in terms of basis functions such as Zernike polynomials.
摘要翻译：角度分辨散射仪的校准是通过以两种或多种不同布置测量目标进行的。不同的布置导致在输出方向上测量的辐射是将目标与入射方向照射的辐射的不同组合。还可以执行参考镜测量。使用第一和第二布置之间的差异的测量和建模来分别估计输入和输出光学系统的特性。建模可以考虑相应周期性目标的对称性。该模型通常考虑入射光学元件，输出光学元件和相应周期性靶的偏振效应。极化效应可以在由琼斯微积分或米勒微积分建模中描述。该建模可以包括基于诸如Zernike多项式的基函数的参数化。

3. 发明申请

US20110043791A1 Metrology Method and Apparatus, Lithographic Apparatus, Device Manufacturing Method and Substrate 有权
标题翻译：计量方法和装置，平版印刷装置，装置制造方法和基板
公开(公告)号：US20110043791A1
公开(公告)日：2011-02-24
申请号：US12855394
申请日：2010-08-12
申请人： Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
发明人： Hendrik Jan Hidde Smilde , Arno Jan Bleeker , Arie Jeffrey Den Boef , Armand Eugene Albert Koolen , Henricus Petrus Maria Pellemans , Reinder Teun Plug , Willem Marie Julia Marcel Coene
IPC分类号： G01N21/41
CPC分类号： G03F7/70633 , G03F7/70616
摘要： A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.
摘要翻译：计量装置被布置成以离轴照明模式照亮多个目标。仅使用一个一阶衍射光束获得目标图像。在目标是复合光栅的地方，可以从不同光栅的图像的强度获得覆盖测量。可以对由图像场中的光栅位置的变化引起的误差来校正叠加测量。

4. 发明申请

US20110001978A1 Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 失效
标题翻译：检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法
公开(公告)号：US20110001978A1
公开(公告)日：2011-01-06
申请号：US12822422
申请日：2010-06-24
申请人： Hendrik Jan Hidde SMILDE , Willem Marie Julia Marcel Coene
发明人： Hendrik Jan Hidde SMILDE , Willem Marie Julia Marcel Coene
IPC分类号： G01N21/47
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70516
摘要： A method of determining an overlay error between two successive layers produced by a lithographic process on a substrate, including using the lithographic process to form a calibration structure including a periodic structure of the same pitch on each of the layers, such that an overlaid pair of periodic structures is formed, the structures being parallel, but offset relative to each other by an overlay amount. A spectrum produced by directing a beam of radiation onto the calibration structure is measured and compared with one or more modeled spectra so as to determine values of the grating parameters for the calibration structure from the measured spectrum. The lithographic process is used to form further overlaid periodic structures on the same or one or more subsequent substrates, the determined grating parameter values for the calibration structure being used to determine overlay amounts for the further overlaid periodic structures.
摘要翻译：一种确定由光刻工艺在衬底上产生的两个连续层之间的重叠误差的方法，包括使用光刻工艺形成包括在每个层上的相同间距的周期性结构的校准结构，使得重叠的一对形成周期性结构，结构是平行的，但是相对于彼此偏移了重叠量。测量通过将辐射束引导到校准结构上产生的光谱，并将其与一个或多个建模光谱进行比较，以便根据测量的光谱确定校准结构的光栅参数的值。光刻工艺用于在相同或一个或多个后续衬底上形成进一步覆盖的周期性结构，所确定的校准结构的光栅参数值用于确定进一步覆盖的周期性结构的重叠量。

5. 发明申请

US20100085849A1 OPTICAL DISC DRIVE AND METHOD FOR PREPROCESSING A DISC READ OUT SIGNAL 审中-公开
标题翻译：光盘驱动器和用于预处理光盘读出信号的方法
公开(公告)号：US20100085849A1
公开(公告)日：2010-04-08
申请号：US12444700
申请日：2007-10-04
申请人： Bin Yin , Ruud Vlutters , Willem Marie Julia Marcel Coene , Theodorus Petrus Henricus Gerardus Jansen
发明人： Bin Yin , Ruud Vlutters , Willem Marie Julia Marcel Coene , Theodorus Petrus Henricus Gerardus Jansen
IPC分类号： G11B20/00
CPC分类号： G11B20/10009 , G11B20/10046 , G11B20/10055 , G11B2220/2537 , G11B2220/2541
摘要： The present invention discloses an optical drive and a method for preprocessing a disc readout signal rk of an optical drive on the basis of a set of low-pass filters. The cutoff frequency fC of the filters wk, more particularly, can be set within the optical bandwidth, which improves the Viterbi detection performance in the case of high speed drive operations. Three types of filters are described, in which a Type I shaping filter performs best given a limited hardware cost for the bit detector. Compared to other more advanced noise-whitening techniques, it is only speed dependent and requires little prior knowledge of the channel and noise, thus cheap and easy to design. The invention can be applied in connection with optical disc drives, in particular when high frequency noises are dominant, for example, in the case of high speed operations.
摘要翻译：本发明公开了一种基于一组低通滤波器对光盘驱动器的盘读出信号rk进行预处理的光驱动器和方法。滤波器wk的截止频率fC更具体地可以设置在光学带宽内，这提高了在高速驱动操作的情况下的维特比检测性能。描述了三种类型的滤波器，其中在给定位检测器的有限硬件成本的情况下，I型整形滤波器性能最佳。与其他更先进的噪声增白技术相比，它只是速度依赖性，并且对通道和噪声几乎没有先前的了解，因此便宜且易于设计。本发明可以与光盘驱动器结合使用，特别是当高频噪声占主导地位时，例如在高速操作的情况下。

6. 发明授权

US07660224B2 DC-controlled encoding for optical storage system 失效
标题翻译：用于光存储系统的直流控制编码
公开(公告)号：US07660224B2
公开(公告)日：2010-02-09
申请号：US10599836
申请日：2005-04-08
申请人： Willem Marie Julia Marcel Coene , Bin Yin
发明人： Willem Marie Julia Marcel Coene , Bin Yin
IPC分类号： G11B7/00
CPC分类号： G11B20/1426 , G11B20/10203 , G11B2020/1288 , G11B2020/1457 , G11B2220/2541 , H03M5/145
摘要： A loss of performance of slicer adaptation at high capacities due to the mismatch between the exact bits used in the computation of the RDS for the DC-control on the one hand and the often erroneous threshold decisions that are preliminarily made based on the HF waveform on the other hand, is resolved by performing a new method of DC-control at the encoder: the RDS is modified such that it is not based on the exact channel bits, but on the threshold decisions from a synthetic HF signal waveform that is generated based on a nominal MTF (modulation transfer function) or its IRF (impulse response function) of the channel. In this way, the impact of the erroneous threshold decisions in the receiver are already taken into account at the encoder, and the slicer control is no longer negatively affected thereby.
摘要翻译：由于用于直流控制的RDS的计算中使用的精确位与一般基于HF波形预先进行的错误阈值判定之间的不匹配，导致高容量的限幅器适应性能丧失另一方面，通过在编码器处执行DC控制的新方法来解决：RDS被修改为使得它不是基于精确的信道位，而是基于从基于生成的合成HF信号波形的阈值决定在标称MTF（调制传递函数）或其IRF（脉冲响应函数）的信道上。以这种方式，在编码器处已经考虑了接收器中的错误阈值判定的影响，并且限幅器控制不再受到负面影响。

7. 发明申请

US20090018410A1 BODY PARAMETER SENSING 审中-公开
标题翻译：身体参数感应
公开(公告)号：US20090018410A1
公开(公告)日：2009-01-15
申请号：US12280994
申请日：2007-02-26
申请人： Willem Marie Julia Marcel Coene , Martin Ouwerkerk
发明人： Willem Marie Julia Marcel Coene , Martin Ouwerkerk
IPC分类号： A61B5/00
CPC分类号： A61B5/0245 , A61B5/02438 , A61B5/04085 , A61B5/6804
摘要： A body parameter sensing arrangement comprising clothing (10) and a plurality of sensors (12, 20) for sensing body signals, located at mutually movable relative positions in the clothing (10). Processing circuit (26) coupled to the plurality of sensors (12, 20), is configured to identify selected ones of the sensors (12, 20) that carry valid body signals. The identification by clustering the sensors (12, 20) according to similarity between signals from the sensors (12, 20). A cluster of sensors (12, 20) is determined with a maximal count of sensors (12, 20) within a minimal cluster diameter A cluster diameter defined by a measure of similarity or distance between signals form the sensors is used. The cluster is used to select sensors (12, 20) to identify the selected ones of the sensors (12, 20) that carries valid body signals on the basis of membership of the cluster
摘要翻译：一种身体参数感测装置，其包括衣物（10）和用于感测身体信号的多个传感器（12,20），所述传感器位于衣物（10）中相互移动的相对位置。耦合到多个传感器（12,20）的处理电路（26）被配置为识别携带有效身体信号的传感器（12,20）中选择的传感器（12,20）。根据来自传感器（12,20）的信号之间的相似性对传感器（12,20）进行聚类的识别。一组传感器（12,20）由最小聚簇直径A内的传感器（12,20）的最大计数确定。集群直径由使用的传感器形成的相似度或信号距离所确定。群集用于选择传感器（12,20），以识别基于群集成员身份携带有效身体信号的所选择的传感器（12,20）

8. 发明授权

US07116250B2 Method and apparatus for multi-dimensionally encoding and decoding 失效
标题翻译：用于多维编码和解码的方法和装置
公开(公告)号：US07116250B2
公开(公告)日：2006-10-03
申请号：US10512117
申请日：2003-04-01
申请人： Willem Marie Julia Marcel Coene
发明人： Willem Marie Julia Marcel Coene
IPC分类号： H03M5/06
CPC分类号： G11B20/14 , G11B20/1496
摘要： In a method of multi-dimensionally encoding a user data stream of user words into a channel data stream of channel words evolving in a one-dimensional direction of infinite extent, a user word is encoded into an NRZ channel word by selecting a NRZ channel word from a code table depending on the user word and the current state of an underlying finite-state-machine. A NRZ channel word comprises a sequence of NRZ channel symbols of NRZ channel bits having a one-dimensional interpretation along said one-dimensional direction and wherein states of an underlying finite-state-machine describing the characteristics of the multi-dimensional code are defined by NRZI channel bits of the previous channel work and by NRZ channel symbols of the current channel word. The NRZ channel symbols are transcoded into NRZI channel symbols by a one-dimensional 1T-precoding operation including an intergration modulo 2, said 1T-precoding operation being carried out along said one-dimensional direction of infinite extent. The finite-state-machine is put into a new state selected from the code table depending on said user word and the current state of said finite-state-machine together with encoding a user word into a channel word.
摘要翻译：在将用户字的用户数据流多维编码为在无限大的一维方向上演进的频道字的频道数据流的方法中，通过选择NRZ频道字来将用户字编码成NRZ频道字来自代码表，取决于用户字和底层有限状态机的当前状态。 NRZ信道字包括沿着所述一维方向具有一维解释的NRZ信道比特的NRZ信道符号序列，并且其中描述多维码的特征的底层有限状态机的状态由前一个通道的NRZI通道位工作，以及当前通道字的NRZ通道符号。 NRZ信道符号通过包括积分模2的一维1T预编码操作被转码成NRZI信道符号，所述1T预编码操作沿着无限大程度的所述一维方向执行。根据所述用户字和所述有限状态机的当前状态，将有限状态机置于从代码表中选择的新状态以及将用户字编码为通道字。

9. 发明申请

US20120123581A1 Metrology Method and Inspection Apparatus, Lithographic System and Device Manufacturing Method 有权
标题翻译：计量方法和检验仪器，平版印刷系统和器件制造方法
公开(公告)号：US20120123581A1
公开(公告)日：2012-05-17
申请号：US13294057
申请日：2011-11-10
申请人： Hendrik Jan Hidde SMILDE , Arno Jan BLEEKER , Patrick WARNAAR , Willem Marie Julia Marcel COENE , Michael KUBIS
发明人： Hendrik Jan Hidde SMILDE , Arno Jan BLEEKER , Patrick WARNAAR , Willem Marie Julia Marcel COENE , Michael KUBIS
IPC分类号： G06F17/00 , G06F15/18 , G01N21/55
CPC分类号： G03F7/70633 , G03F7/70483 , G03F7/70625 , G03F7/70641 , G06N99/005
摘要： Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus.
摘要翻译：公开了用于测量由基板上的光刻工艺形成的目标结构的方法。目标内的光栅结构小于测量光学系统的照明点和视场。光学系统具有通向光瞳平面成像传感器的第一分支和通向基板平面成像传感器的第二分支。空间光调制器被布置在光学系统的第二分支的中间光瞳平面中。 SLM赋予可编程的衰减模式，其可用于校正第一和第二照明模式或成像之间的不对称性。通过使用特定的目标设计和机器学习过程，衰减模式也可以被编程为充当滤波器功能，增强对诸如焦点的特定参数的敏感性。

10. 发明申请

US20100284008A1 Method of Determining Overlay Error and a Device Manufacturing Method 有权
标题翻译：确定覆盖误差的方法和器件制造方法
公开(公告)号：US20100284008A1
公开(公告)日：2010-11-11
申请号：US12760784
申请日：2010-04-15
申请人： Willem Marie Julia Marcel COENE , Karel Diederick VAN DER MAST , Maurits VAN DER SCHAAR
发明人： Willem Marie Julia Marcel COENE , Karel Diederick VAN DER MAST , Maurits VAN DER SCHAAR
IPC分类号： G01B11/00 , G03F7/20
CPC分类号： G03F7/70633
摘要： A method of determining an overlay error in which asymmetry of a first order of a diffraction pattern is modeled as being a weighted sum of harmonics. Both the first order harmonic and higher order harmonics are non-negligible and weights for both are calculated. The weights are calculated using three or more of sets of superimposed patterns using a least mean square method.
摘要翻译：一种确定重叠误差的方法，其中衍射图案的一阶的不对称性被建模为加权和谐和。一阶谐波和高次谐波都不可忽略，两者的权重都被计算出来。使用最小均方法，使用三个或更多个叠加图案来计算权重。

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