专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07742889B2 Designing an optical metrology system optimized with signal criteria 失效
标题翻译：设计采用信号标准优化的光学计量系统
公开(公告)号：US07742889B2
公开(公告)日：2010-06-22
申请号：US12057316
申请日：2008-03-27
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
IPC分类号： G06F19/00 , G01B11/24 , H01L21/66
CPC分类号： G01N21/956 , G01B2210/56
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to the one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据与一个或多个信号标准相比较来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

2. 发明授权

US07734437B2 Apparatus for designing an optical metrology system optimized with signal criteria 失效
标题翻译：用于设计用信号标准优化的光学测量系统的装置
公开(公告)号：US07734437B2
公开(公告)日：2010-06-08
申请号：US12057332
申请日：2008-03-27
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01B11/24 , G01B2210/56 , G01N21/956
摘要： Provided is an apparatus for designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for stand alone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种用于设计用于测量工件上的结构的光学测量系统的设备，其中光学测量系统被配置为满足一个或多个信号标准。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

3. 发明授权

US07589845B1 Process control using an optical metrology system optimized with signal criteria 失效
标题翻译：使用信号标准优化的光学测量系统进行过程控制
公开(公告)号：US07589845B1
公开(公告)日：2009-09-15
申请号：US12057346
申请日：2008-03-27
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihalov
IPC分类号： G01B11/02 , G01B11/24 , G06F19/00
CPC分类号： G01B11/02 , G01B11/24 , G03F7/70625
摘要： Provided is system and method for controlling a fabrication cluster using at least one parameter of a structure measured with an optical metrology system designed and configured to meet one or more signal criteria. The design of the optical metrology system is optimized by using collected signal data in comparison to set one or more signal criteria. In one embodiment, the optical metrology system is used for standalone systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a signal measured using the optical metrology system is transmitted to a fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了用于使用被设计和配置为满足一个或多个信号标准的光学测量系统测量的结构的至少一个参数来控制制造集群的系统和方法。通过使用收集的信号数据来比较设置一个或多个信号标准来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

4. 发明授权

US07761250B2 Optical metrology system optimized with design goals 失效
标题翻译：光学计量系统优化设计目标
公开(公告)号：US07761250B2
公开(公告)日：2010-07-20
申请号：US12141754
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01B21/042
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet two or more design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set two or more design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足两个或更多个设计目标。与设定的两个或多个设计目标相比，通过使用收集的设计目标数据来优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

5. 发明授权

US07761178B2 Automated process control using an optical metrology system optimized with design goals 失效
标题翻译：使用优化设计目标的光学计量系统进行自动化过程控制
公开(公告)号：US07761178B2
公开(公告)日：2010-07-20
申请号：US12141892
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G06F19/00 , G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8416 , G03F1/84 , G03F7/705 , G03F7/70625 , H01L22/12
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece wherein the optical metrology system is configured to meet a plurality of design goals. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing. At least one parameter determined from a diffraction signal measured using the optical metrology system is transmitted to the fabrication cluster. The at least one parameter is used to modify at least one process variable or equipment setting of the fabrication cluster.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。从使用光学测量系统测量的衍射信号确定的至少一个参数被传送到制造集群。至少一个参数用于修改制造集群的至少一个过程变量或设备设置。

6. 发明授权

US07595869B1 Optical metrology system optimized with a plurality of design goals 失效
标题翻译：光学计量系统用多个设计目标优化
公开(公告)号：US07595869B1
公开(公告)日：2009-09-29
申请号：US12141867
申请日：2008-06-18
申请人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
发明人： Xinkang Tian , Manuel Madriaga , Ching-Ling Meng , Mihail Mihaylov
IPC分类号： G01N21/00
CPC分类号： G01N21/95607 , G01N21/4788 , G01N21/9501 , G01N2021/95615 , G03F7/70625
摘要： Provided is a method of designing an optical metrology system for measuring structures on a workpiece where the optical metrology system is configured to meet a plurality of design goals. Primary components of the optical metrology system affecting the design goals are determined and used in the initial design. The design of the optical metrology system is optimized by using collected design goal data in comparison to the set plurality of design goals. In one embodiment, the optical metrology system is used for stand alone metrology systems. In another embodiment, the optical metrology system is integrated with a fabrication cluster in semiconductor manufacturing.
摘要翻译：提供了一种设计用于测量工件上的结构的光学测量系统的方法，其中光学测量系统被配置为满足多个设计目标。影响设计目标的光学计量系统的主要组件在初始设计中得到确定和使用。与设定的多个设计目标相比，通过使用收集的设计目标数据优化光学测量系统的设计。在一个实施例中，光学测量系统用于独立测量系统。在另一个实施例中，光学计量系统与半导体制造中的制造集成集成。

7. 发明授权

US07420681B1 Gas purge system and methods 有权
标题翻译：气体净化系统和方法
公开(公告)号：US07420681B1
公开(公告)日：2008-09-02
申请号：US11457524
申请日：2006-07-14
申请人： Ning-Yi Wang , Ching-Ling Meng , Anthony Tang
发明人： Ning-Yi Wang , Ching-Ling Meng , Anthony Tang
IPC分类号： G01N21/00 , G01J4/00
CPC分类号： G01N21/211 , G01J3/02 , G01J3/0205 , G01J3/0286 , G01J3/447 , G01J4/00 , G01N21/15 , G01N21/8422 , G01N2021/151 , G01N2021/213
摘要： Gas purge systems and methods and a spectroscopic ellipsometer are disclosed. A purge gas system may include an input beam optics housing, a collection optics housing and a gas purge manifold. The input beam optics housing may include a first gas flow path between a first gas inlet and an aperture in a first nose cone proximate a measurement position. The collection optics housing may include a second gas flow path between a second gas inlet and an aperture in a second nose cone proximate the measurement position. The gas purge manifold may be disposed between the input beam optics housing and the collection optics housing. The gas purge manifold has a third gas flow path between a third gas inlet and an aperture in the gas manifold proximate the measurement position. The ellipsometer may include input beam optics in the input beam optics housing and collection optics in the collection optics housing. First, second, and third flows of purge gas may be supplied through the input beam optics housing, collection optics housing and gas purge manifold respectively. The purge gas is delivered directly to a measurement position of a surface of a substrate through the gas purge manifold, the first nosecone and the second nose cone.
摘要翻译：公开了气体吹扫系统和方法以及分光椭偏仪。吹扫气体系统可以包括输入光束光学器件壳体，收集光学器件壳体和气体吹扫歧管。输入光束光学器件壳体可以包括在第一气体入口和靠近测量位置的第一鼻锥中的孔之间的第一气体流动路径。收集光学器件壳体可以包括在第二气体入口和靠近测量位置的第二鼻锥中的孔之间的第二气体流动路径。气体吹扫歧管可以设置在输入光束光学器件壳体和收集光学器件壳体之间。气体吹扫歧管在靠近测量位置的第三气体入口和气体歧管中的孔之间具有第三气体流动路径。椭偏仪可以包括输入光束光学器件中的输入光束，并且在收集光学器件壳体中收集光学元件。吹扫气体的第一，第二和第三流动可以分别通过输入光束光学器件壳体，收集光学器件壳体和气体吹扫歧管提供。净化气体通过气体净化歧管，第一鼻锥和第二鼻锥直接输送到衬底的表面的测量位置。

8. 发明授权

US07281862B2 Optical device latching mechanism 有权
标题翻译：光学装置锁定机构
公开(公告)号：US07281862B2
公开(公告)日：2007-10-16
申请号：US11095676
申请日：2005-03-31
申请人： Joshua T. Oen , Daehwan D. Kim , Ching-Ling Meng
发明人： Joshua T. Oen , Daehwan D. Kim , Ching-Ling Meng
IPC分类号： G02B6/36
CPC分类号： G02B6/4201 , G02B6/4261 , G02B6/4269
摘要： An apparatus including a heat sink compatible with a rail, the heat sink including two engagement windows that align with a corresponding pair of rail engagement windows when the apparatus is positioned in the rail. A handle engaged with the heat sink, the handle to enable a retention position and a retraction position of the apparatus. A first latch and a second latch laterally opposed and positioned within a first cavity and a second cavity, respectively, of the heat sink. A first spring and a second spring laterally opposed and positioned within the first and second cavities, respectively, of the heat sink, the first and second springs engaged with the handle and the first and second latches, wherein the first and second springs to push a first latch end of each latch into the rail engagement window when the apparatus is in a retention position, wherein the first and second springs to actuate the retraction of the first latch end of each latch when the handle is used to place the apparatus in a retraction position.
摘要翻译：一种包括与轨道兼容的散热器的装置，所述散热器包括两个接合窗口，当所述设备位于所述导轨中时，所述接合窗口与对应的一对导轨接合窗口对准。与散热器接合的手柄，手柄能够实现装置的保持位置和缩回位置。横向对置并分别位于散热器的第一腔和第二腔内的第一闩锁和第二闩锁。第一弹簧和第二弹簧分别横向对置并定位在散热器的第一和第二腔内，第一和第二弹簧与手柄和第一和第二闩锁接合，其中第一和第二弹簧推动当装置处于保持位置时，每个闩锁的第一闩锁端部进入轨道接合窗口，其中当手柄用于将装置放回缩回时，第一和第二弹簧致动每个闩锁的第一闩锁端部的缩回位置。

9. 发明授权

US06312319B1 Polishing media magazine for improved polishing 失效
标题翻译：抛光媒体杂志，以改善抛光
公开(公告)号：US06312319B1
公开(公告)日：2001-11-06
申请号：US09402596
申请日：2000-04-10
申请人： Timothy J. Donohue , Roger O. Williams , John A. Barber , Jon A. Hoshizaki , Lawrence Lee , Ching-Ling Meng , Phil R. Sommer
发明人： Timothy J. Donohue , Roger O. Williams , John A. Barber , Jon A. Hoshizaki , Lawrence Lee , Ching-Ling Meng , Phil R. Sommer
IPC分类号： B24B100
CPC分类号： B24B53/017 , B24B21/04 , B24B37/04 , B24B53/10
摘要： A polishing media magazine for improved polishing. The polishing media magazine may include a conditioning element for rapid, uniform conditioning and cleaning of the polishing media. The polishing media magazine may include polishing media having sections of raised elevation to contain the fluid and may include a polishing support platen having features adapted to urge the edges of the polishing media upwards. The polishing media may be roll fed from a supply roll across a support platen and onto a take-up roll.
摘要翻译：用于改进抛光的抛光介质盒。抛光介质盒可以包括用于对抛光介质进行快速，均匀调节和清洁的调节元件。抛光介质盒可以包括具有升高高度的部分的抛光介质以容纳流体，并且可以包括具有适于将抛光介质的边缘向上推动的特征的抛光支撑压板。抛光介质可以从供给辊穿过支撑压板卷到卷取辊上。

10. 发明授权

US07789541B2 Method and system for lamp temperature control in optical metrology 有权
标题翻译：光度计中灯温控制的方法和系统
公开(公告)号：US07789541B2
公开(公告)日：2010-09-07
申请号：US12059610
申请日：2008-03-31
申请人： Ching-Ling Meng , Mihail Mihaylov
发明人： Ching-Ling Meng , Mihail Mihaylov
IPC分类号： F21V29/00 , H01J13/14
CPC分类号： F21V29/67 , F21V23/0442 , F21V23/0457 , F21V29/02 , F21V29/74
摘要： A method and system are provided for lamp temperature control for optical metrology. Precise control of the lamp temperature provides the improved signal-to-noise ratios required for accurately determining the profile of nanometer sized structures using optical metrology.
摘要翻译：提供了用于光学测量的灯温度控制的方法和系统。灯温度的精确控制提供了使用光学测量精确地确定纳米尺寸结构的轮廓所需的改善的信噪比。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式