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1. 发明授权

US08409940B2 Silicon crystallization apparatus and silicon crystallization method thereof 有权
标题翻译：硅结晶装置及其硅结晶方法
公开(公告)号：US08409940B2
公开(公告)日：2013-04-02
申请号：US12767407
申请日：2010-04-26
申请人： Yun Ho Jung , Young Joo Kim
发明人： Yun Ho Jung , Young Joo Kim
IPC分类号： H01L21/00
CPC分类号： H01L21/0268 , B23K26/0622 , B23K26/0823 , B23K26/0853 , B23K37/0461 , C30B11/005 , C30B29/06 , H01L21/2026 , H01L21/68
摘要： A silicon crystallization method renders it is possible to form alignment key without additional photolithography, and to adjust a substrate to a correct position by sensing a deviation of the substrate when the substrate is loaded. The silicon crystallization method includes aligning the substrate by sensing a fixed substrate with a sensing device, and moving and/or rotating a stage, wherein the sensing device faces toward an edge of the substrate to directly sense the edge of the substrate; forming alignment keys on predetermined portions of a non-display area of the substrate by correspondingly placing a mask for formation of an alignment key above the substrate; and crystallizing an amorphous silicon by correspondingly providing a mask for crystallization above the substrate.
摘要翻译：硅结晶方法使得可以在没有附加光刻的情况下形成对准键，并且通过在衬底被加载时感测衬底的偏差来将衬底调整到正确的位置。硅结晶方法包括通过感测固定基板与感测装置对基板进行定位，以及移动和/或旋转载物台，其中感测装置面向基板的边缘以直接感测基板的边缘; 通过相应地放置用于在基板上方形成对准键的掩模，在基板的非显示区域的预定部分上形成对准键; 并通过相应地在衬底上提供用于结晶的掩模来结晶非晶硅。

2. 发明申请

US20100200360A1 CAPACITY-LIMITED WASTE RECEIVING DEVICE FOR WASTE COLLECTION SYSTEM 审中-公开
标题翻译：容量有限的垃圾收集装置废物收集系统
公开(公告)号：US20100200360A1
公开(公告)日：2010-08-12
申请号：US12562586
申请日：2009-09-18
申请人： Seung-Hyun KANG , Jong-Kyu HWANG , Yun-Ho JUNG , Sang-Bong CHANG
发明人： Seung-Hyun KANG , Jong-Kyu HWANG , Yun-Ho JUNG , Sang-Bong CHANG
IPC分类号： B65G11/20 , B65G11/02 , B65G11/00
CPC分类号： B65F1/10 , B65F5/005
摘要： There is provided a capacity-limited waste receiving device for a waste collection system, in which a waste receiving device in a vacuum-conveyance waste collection system (which conveys waste along a line) automatically conveying the waste to a central collecting station is improved to be more efficient. The capacity-limited waste receiving device for a waste collection system in which the waste being put into a waste receiving device is automatically conveyed to a central collecting station through a conveying line, comprises: a cover to be opened/closed to open/close the waste receiving device; and a housing with an upper end and a lower end, the upper end on which the cover is installed and the lower end which is connected to the conveying line connected to the central collect storage, wherein the housing comprises: an inlet passage casing with an upper end to which the cover is attached; an under passage casing installed under the inlet passage casing; a damper installed between the inlet passage casing and the under passage casing; a chute connected to a lower end of the under passage casing, wherein a discharge valve for discharging the waste to the conveying pipe is installed under the chute; and an interlocker operatively connecting the cover and the damper, ensuring that either opening or closing of the cover is opposite to either opening or closing the damper.
摘要翻译：提供了一种用于废物收集系统的容量限制废物接收装置，其中将真空输送废物收集系统（其沿着线路传送废物）中的废物接收装置自动地将废物输送到中央收集站被改进为更有效率。用于废物收集系统的能力有限的废物接收装置，其中放入废物接收装置中的废物通过输送管线自动地传送到中央收集站，包括：打开/关闭以打开/关闭废物接收装置; 以及具有上端和下端的壳体，其上安装有盖的上端和连接到连接到中央收集存储器的输送线的下端，其中壳体包括：入口通道壳体，其具有上盖连接到上端; 安装在入口通道外壳下方的下通道壳体; 安装在入口通道外壳和下通道外壳之间的阻尼器; 连接到下通道壳体的下端的滑槽，其中用于将废物排出到输送管的排出阀安装在滑槽下方; 以及可操作地连接盖和阻尼器的互锁器，确保盖的打开或关闭与打开或关闭阻尼器相反。

3. 发明授权

US07569307B2 Laser mask and crystallization method using the same 有权
标题翻译：激光掩模和结晶法使用相同
公开(公告)号：US07569307B2
公开(公告)日：2009-08-04
申请号：US11016782
申请日：2004-12-21
申请人： Hyun Sik Seo , Yun Ho Jung , Young Joo Kim , JaeSung You
发明人： Hyun Sik Seo , Yun Ho Jung , Young Joo Kim , JaeSung You
IPC分类号： H01L21/84
CPC分类号： H01L21/0268 , B23K26/066 , H01L21/2026 , H01L27/1285 , H01L29/66757 , H01L29/78675
摘要： A laser mask includes a mask pattern with edges having inverted shapes to alleviate the effects of diffraction of laser beams to reduce overlap regions such that crystallization characteristics are improved. The laser mask includes a mask pattern that includes transmitting regions and a blocking region. The edges of the mask have shapes inverted to the shapes of the edges of a silicon thin film crystallized by the pattern.
摘要翻译：激光掩模包括具有倒置形状的边缘的掩模图案，以减轻激光束的衍射的影响，以减少重叠区域，从而提高结晶特性。激光掩模包括包括透射区域和阻挡区域的掩模图案。掩模的边缘具有与通过图案结晶的硅薄膜的边缘的形状相反的形状。

4. 发明授权

US07399685B2 Laser beam pattern mask and crystallization method using the same 有权
标题翻译：激光束图案掩模和结晶法使用相同
公开(公告)号：US07399685B2
公开(公告)日：2008-07-15
申请号：US11143586
申请日：2005-06-03
申请人： Yun Ho Jung
发明人： Yun Ho Jung
IPC分类号： H01L21/36 , H01L21/20
CPC分类号： H01L21/268 , H01L21/02532 , H01L21/0268 , H01L21/02691
摘要： A laser beam pattern mask includes an opaque substrate and a plurality of transmission portions formed in the substrate to transmit light, wherein each of the transmission portions extend in a first direction while being uniformly spaced apart from one another by a predetermined distance in a second direction perpendicular to the first direction, each of the transmission portions including hexagonal cells arranged in the first direction and in contact with one another.
摘要翻译：激光束图案掩模包括不透明基板和形成在基板中以透射光的多个透射部分，其中每个透射部分在第一方向上延伸，同时在第二方向上彼此均匀间隔开预定距离垂直于第一方向，每个传输部分包括沿第一方向布置并彼此接触的六边形单元。

5. 发明授权

US07132202B2 Mask for laser irradiation, method of manufacturing the same, and apparatus for laser crystallization using the same 有权
标题翻译：用于激光照射的掩模，其制造方法和使用其的激光结晶装置
公开(公告)号：US07132202B2
公开(公告)日：2006-11-07
申请号：US10704749
申请日：2003-11-12
申请人： Yun-Ho Jung
发明人： Yun-Ho Jung
IPC分类号： G01F9/00
CPC分类号： B23K26/066 , G03B27/00
摘要： A mask for laser irradiation includes a base substrate, a laser beam shielding pattern on a first surface of the base substrate, wherein the laser beam shielding pattern is made of an opaque metallic material and has laser beam transmitting portions spaced apart from each other, and an anti-thermal oxidation layer covering the laser beam shielding pattern, wherein a second surface of the base substrate is an incident surface of a laser beam.
摘要翻译：用于激光照射的掩模包括基底基板，在基底基板的第一表面上的激光束屏蔽图案，其中激光束屏蔽图案由不透明的金属材料制成并且具有彼此间隔开的激光束透射部分，以及覆盖激光束屏蔽图案的抗热氧化层，其中基底基板的第二表面是激光束的入射表面。

6. 发明申请

US20050028729A1 Laser annealing apparatus 有权
公开(公告)号：US20050028729A1
公开(公告)日：2005-02-10
申请号：US10885675
申请日：2004-07-08
申请人： Yun-Ho Jung
发明人： Yun-Ho Jung
IPC分类号： C30B13/00 , C30B13/24 , C30B23/00 , C30B25/00 , C30B28/12 , C30B28/14 , H01L21/26 , H01L21/324 , H01L21/42 , H01L21/477
CPC分类号： C30B29/06 , C30B13/24 , Y10S117/90 , Y10T117/10
摘要： A laser annealing apparatus for sequential lateral solidification (SLS) to uniformly crystallize silicon on an entire silicon substrate by minimizing the dislocation of the silicon substrate during laser beam irradiation is disclosed. During the laser annealing, a vacuum chuck holds the silicon substrate on a movable stage. The device includes a laser source, an optical system patterning the shape and energy of a laser beam irradiated from the laser source, a vacuum chuck supporting a silicon substrate, and a movable stage supporting the vacuum chuck as well as transferring the vacuum chuck in a predetermined direction. Accordingly, the apparatus improves the degree of crystallization because it is able to uniformly carry out SLS on an entire surface of the silicon substrate.

7. 发明授权

US06852162B2 Laser annealing apparatus 有权
标题翻译：激光退火装置
公开(公告)号：US06852162B2
公开(公告)日：2005-02-08
申请号：US10211570
申请日：2002-08-05
申请人： Yun-Ho Jung
发明人： Yun-Ho Jung
IPC分类号： C30B13/00 , C30B13/24 , C30B1/00
CPC分类号： C30B29/06 , C30B13/24 , Y10S117/90 , Y10T117/10
摘要： A laser annealing apparatus for sequential lateral solidification (SLS) to uniformly crystallize silicon on an entire silicon substrate by minimizing the dislocation of the silicon substrate during laser beam irradiation is disclosed. During the laser annealing, a vacuum chuck holds the silicon substrate on a movable stage. The device includes a laser source, an optical system patterning the shape and energy of a laser beam irradiated from the laser source, a vacuum chuck supporting a silicon substrate, and a movable stage supporting the vacuum chuck as well as transferring the vacuum chuck in a predetermined direction. Accordingly, the apparatus improves the degree of crystallization because it is able to uniformly carry out SLS on an entire surface of the silicon substrate.
摘要翻译：公开了一种用于顺序侧向固化（SLS）的激光退火装置，以通过在激光束照射期间使硅衬底的位错最小化来在整个硅衬底上均匀地结晶硅。在激光退火期间，真空吸盘将硅衬底保持在可动台上。该装置包括激光源，对从激光源照射的激光束的形状和能量进行图案化的光学系统，支撑硅基板的真空卡盘以及支撑真空卡盘的可移动台以及将真空卡盘传送到预定方向。因此，由于能够在硅基板的整个表面均匀地进行SLS，所以能够提高结晶度。

8. 发明授权

US06755909B2 Method of crystallizing amorphous silicon using a mask 有权
标题翻译：使用掩模使非晶硅结晶的方法
公开(公告)号：US06755909B2
公开(公告)日：2004-06-29
申请号：US10151880
申请日：2002-05-22
申请人： Yun-Ho Jung
发明人： Yun-Ho Jung
IPC分类号： C30B2504
CPC分类号： H01L21/0268 , C30B1/023 , C30B13/22 , C30B13/32 , C30B29/06 , H01L21/02532 , H01L21/02595 , H01L21/2026
摘要： A sequential lateral solidification mask having a first region with a plurality of first stripes that are separated by a plurality of first slits. The mask further includes a second region having a plurality of second stripes separated by a plurality of second slits. The second stripes are perpendicular to the first stripes. A third region having a plurality of third stripes separated by a plurality of third slits, with the third stripes being transversely arranged relative to the first stripes. A fourth region having a plurality of fourth stripes and a plurality of fourth slits between the fourth stripes, with the fourth stripes being transversely arranged relative to the second stripes. Sequential lateral solidification is performed using the mask by multiple movements of the mask and multiple, overlapping irradiations.
摘要翻译：一种顺序横向凝固掩模，具有第一区域和多个由多个第一狭缝分开的第一条纹。掩模还包括具有由多个第二狭缝分开的多个第二条纹的第二区域。第二条纹垂直于第一条纹。具有由多个第三狭缝分开的多个第三条纹的第三区域，其中第三条纹相对于第一条纹横向布置。第四区域，具有多个第四条纹和第四条纹之间的多个第四狭缝，第四条纹相对于第二条纹横向布置。使用掩模通过掩模的多次移动和多次重叠的照射进行顺序侧向固化。

9. 发明授权

US06736895B2 Silicon crystallization method 有权
公开(公告)号：US06736895B2
公开(公告)日：2004-05-18
申请号：US10157201
申请日：2002-05-30
申请人： Yun-Ho Jung
发明人： Yun-Ho Jung
IPC分类号： C30B2502
CPC分类号： H01L21/0268 , C30B1/023 , C30B29/06 , H01L21/02532 , H01L21/2026 , H01L29/66757 , H01L29/78675
摘要： A mask and its application in sequential lateral solidification (SLS) crystallization of amorphous silicon are provided. The mask includes a light absorptive portion for blocking a laser beam and a plurality of stripe-shaped light transmitting portions for passing the laser beam. Each stripe-shaped light transmitting portion is rectangular-shaped, and each light-transmitting portion includes triangular-shaped or semicircular-shaped edges on both sides. The distance between the adjacent light transmitting portions is less than the width of the light transmitting portion. The width of the light transmitting portions is less than or equal to twice the maximum length of lateral grain growth that is to be grown by sequential lateral solidification (SLS).

10. 发明授权

US06335509B1 Laser annealing apparatus 有权
标题翻译：激光退火装置
公开(公告)号：US06335509B1
公开(公告)日：2002-01-01
申请号：US09410093
申请日：1999-10-01
申请人： Yun Ho Jung
发明人： Yun Ho Jung
IPC分类号： B23K26067
CPC分类号： B23K26/0676 , B23K26/067 , H01L21/02532 , H01L21/02691
摘要： The present invention relates to a laser annealing apparatus having a plurality of optical systems to generate a plurality of laser beams. A process time is reduced because a laser scanning operation on a large substrate is completed in a shorter time. The present invention includes a laser oscillator generating and supplying a laser, at least one beam splitter separating the laser from the laser oscillator into at least one or more laser beam, a plurality of optical systems processing a laser beam to produce laser having energy and profile sufficient to use directly for sample irradiation. The optical systems arrange each processed laser beam to a length direction.
摘要翻译：本发明涉及具有多个光学系统以产生多个激光束的激光退火装置。由于在较短的时间内完成了对大型基板的激光扫描操作，所以处理时间缩短。本发明包括产生和提供激光的激光振荡器，将激光与激光振荡器分离成至少一个或多个激光束的至少一个分束器，处理激光束以产生具有能量和轮廓的激光器的多个光学系统足以直接用于样品照射。光学系统将每个经处理的激光束布置成长度方向。

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