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1. 发明授权

US06955836B2 Silicon oxide film formation method 失效
标题翻译：氧化硅膜形成方法
公开(公告)号：US06955836B2
公开(公告)日：2005-10-18
申请号：US10326092
申请日：2002-12-23
申请人： Akira Kumagai , Keiji Ishibashi , Shigeru Mori
发明人： Akira Kumagai , Keiji Ishibashi , Shigeru Mori
IPC分类号： C23C16/40 , C23C16/44 , C23C16/452 , C23C16/455 , H01L21/316
CPC分类号： C23C16/45565 , C23C16/401 , C23C16/452 , C23C16/45591
摘要： A silicon oxide film formation method enhances the efficiency of generating atomic oxygen and improves film quality of a silicon film (SiO2 film) in forming the silicon oxide film using an RS-CVD system. Nitrogen atom containing gas (N2 gas, NO gas, N2O gas, NO2 gas or the like) is added to oxygen atom containing gas (O2 gas, O3 gas or the like) introduced into a plasma generating space in a vacuum container to produce plasmas with these gases and to thereby increase the quantity of atomic oxygen generated by the plasmas in the plasma generating space.
摘要翻译：在使用RS-CVD系统形成氧化硅膜时，氧化硅膜形成方法提高了产生原子氧的效率并提高了硅膜（SiO 2膜）的膜质量。将含氮原子的气体（N 2气体，NO气体，N 2 O气体，NO 2气体等）加入氧原子将含有气体（O 2 O 2气体，O 3气体等）引入到真空容器中的等离子体产生空间中以产生具有这些气体的等离子体，从而增加数量由等离子体产生空间中的等离子体产生的原子氧。

2. 发明申请

US20100037822A1 VACUUM PROCESSING APPARATUS 审中-公开
标题翻译：真空加工设备
公开(公告)号：US20100037822A1
公开(公告)日：2010-02-18
申请号：US12566232
申请日：2009-09-24
申请人： Keiji ISHIBASHI , Masahiko Tanaka , Akira Kumagai
发明人： Keiji ISHIBASHI , Masahiko Tanaka , Akira Kumagai
IPC分类号： C23C16/50 , C23C16/00
CPC分类号： C23C16/45591 , C23C16/452 , C23C16/45565 , C23C16/45574 , H01J37/32357 , H01J37/3244 , H01J37/32486 , H01L21/02164 , H01L21/02274 , H01L21/31608
摘要： A substrate processing apparatus includes a vacuum processing vessel, a partition which is made of a conductive material, and partitions the interior of the vacuum processing vessel into a first space for generating a plasma, and a second space for processing a substrate by the plasma, a high-frequency electrode for plasma generation installed in the first space, and a substrate holding mechanism which is installed in the second space and holds the substrate. The partition has a plurality of through holes which allow the first and second spaces to communicate with each other. The through holes are covered with a covering material having a recombination coefficient higher than that of the conductive material.
摘要翻译：基板处理装置包括真空处理容器，由导电材料制成的隔板，将真空处理容器的内部分隔成用于产生等离子体的第一空间，以及通过等离子体处理基板的第二空间，安装在第一空间中的用于等离子体产生的高频电极，以及安装在第二空间中并保持基板的基板保持机构。隔板具有允许第一和第二空间彼此连通的多个通孔。通孔覆盖有复合系数高于导电材料的复合系数的覆盖材料。

3. 发明申请

US20100126669A1 VACUUM TREATMENT APPARATUS 审中-公开
标题翻译：真空处理设备
公开(公告)号：US20100126669A1
公开(公告)日：2010-05-27
申请号：US12597804
申请日：2008-04-24
申请人： Akira Kumagai , Keiji Ishibashi
发明人： Akira Kumagai , Keiji Ishibashi
IPC分类号： C23C14/50 , C23C16/458 , H01L21/306
CPC分类号： C23C14/50 , C23C16/4583
摘要： Provided is a vacuum treatment device capable of uniformly treating the whole of a substrate in a vacuum container. In the vacuum treatment device in which the substrate is placed and held in the recess of a substrate holder, the difference between the heights of the surface of the substrate holder and the surface of the substrate to be treated is set to be equal to or shorter than 0.2 mm, and the distance between the side surface of the substrate and the inner surface of the recess of the substrate holder is set to be equal to or shorter than 5 mm.
摘要翻译：提供一种能够在真空容器中均匀地处理基板的真空处理装置。在将基板放置并保持在基板保持件的凹部中的真空处理装置中，将基板保持件的表面的高度与待处理的基板的表面之间的差设定为等于或更短基板的侧面与基板保持架的凹部的内表面之间的距离设定为5mm以下。

4. 发明授权

US07981216B2 Vacuum processing apparatus 有权
标题翻译：真空加工设备
公开(公告)号：US07981216B2
公开(公告)日：2011-07-19
申请号：US10907023
申请日：2005-03-16
申请人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
发明人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
IPC分类号： C23C16/505
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565
摘要： A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.
摘要翻译：一种真空处理装置，包括反应器和具有多个通孔的分隔板，通过该通孔使自由基通过所述通孔并将反应器分离成等离子体产生空间和基板处理空间，所述方法如成膜方法通过将气体输送到等离子体产生空间中以产生等离子体，在由此产生的等离子体产生自由基的同时在放置在基板处理空间中的基板上进行，并且通过分隔板上的多个通孔输送自由基进入基板工艺空间。分隔板包括具有多个通孔的分隔体和设置在分隔体的等离子体产生空间侧的控制板，并且在与分隔板上的多个通孔对应的位置具有自由通过孔。

5. 发明申请

US20090126629A1 Film-forming system and film-forming method 审中-公开
标题翻译：成膜系统和成膜方法
公开(公告)号：US20090126629A1
公开(公告)日：2009-05-21
申请号：US12285566
申请日：2008-10-08
申请人： Akira Kumagai , Keiji Ishibashi , Masahiko Tanaka
发明人： Akira Kumagai , Keiji Ishibashi , Masahiko Tanaka
IPC分类号： B05C11/00 , C23C16/54
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565 , C23C16/509 , H01J37/32082 , H01J37/32449
摘要： A film-forming system comprising a vacuum chamber and an electroconductive partition plate dividing said vacuum chamber into a plasma generating space provided with a high-frequency electrode and a film-forming treatment space provided with a substrate-retaining mechanism for holding a substrate mounted thereon. A gas for generating desired active species by discharge plasma is introduced into the plasma generating space. Said desired active species are supplied to the film-forming treatment space through a plurality of penetration holes formed in the electroconductive partition plate for communicating the plasma generating space with the film-forming treatment space. Said electroconductive partition plate has a first internal space separated from the plasma generating space and communicating with the film-forming treatment space via a plurality of material gas diffusion holes. A material gas is introduced from the outside into said first internal space and supplied into the film-forming treatment space through a plurality of said material gas diffusion holes. Said electroconductive partition plate further has a second internal space separated from said first internal space and communicating with said film-forming treatment space via a plurality of gas diffusion holes. A gas other than said material gas is introduced from the outside into said second internal space. A film is deposited on the substrate by a reaction between said active species and said material gas supplied to said film-forming treatment space.
摘要翻译：一种膜形成系统，包括真空室和将所述真空室分成具有高频电极的等离子体产生空间和成膜处理空间的导电隔板，所述膜形成处理空间设置有用于保持其上安装的基板的基板保持机构。用于通过放电等离子体产生所需活性物质的气体被引入到等离子体产生空间中。所述活性物质通过形成在导电隔板中的多个穿透孔供给到成膜处理空间，用于使等离子体产生空间与成膜处理空间连通。所述导电隔板具有与等离子体产生空间分离的第一内部空间，并经由多个原料气体扩散孔与成膜处理空间连通。原材料气体从外部引入到所述第一内部空间中，并通过多个所述原料气体扩散孔供入到成膜处理空间中。所述导电隔板还具有与所述第一内部空间分离的第二内部空间，并且经由多个气体扩散孔与所述成膜处理空间连通。除了所述材料气体以外的气体从外部引入到所述第二内部空间。通过所述活性物质与供应到所述成膜处理空间的所述原料气体之间的反应将膜沉积在基底上。

6. 发明申请

US20060127600A1 Film-forming system and film-forming method 审中-公开
公开(公告)号：US20060127600A1
公开(公告)日：2006-06-15
申请号：US11350107
申请日：2006-02-09
申请人： Akira Kumagai , Keiji Ishibashi , Masahiko Tanaka
发明人： Akira Kumagai , Keiji Ishibashi , Masahiko Tanaka
IPC分类号： C23C16/00
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565 , C23C16/509 , H01J37/32082 , H01J37/32449
摘要： A film-forming system comprising a vacuum chamber and an electroconductive partition plate dividing said vacuum chamber into a plasma generating space provided with a high-frequency electrode and a film-forming treatment space provided with a substrate-retaining mechanism for holding a substrate mounted thereon. A gas for generating desired active species by discharge plasma is introduced into the plasma generating space. Said desired active species are supplied to the film-forming treatment space through a plurality of penetration holes formed in the electroconductive partition plate for communicating the plasma generating space with the film-forming treatment space. Said electroconductive partition plate has a first internal space separated from the plasma generating space and communicating with the film-forming treatment space via a plurality of material gas diffusion holes. A material gas is introduced from the outside into said first internal space and supplied into the film-forming treatment space through a plurality of said material gas diffusion holes. Said electroconductive partition plate further has a second internal space separated from said first internal space and communicating with said film-forming treatment space via a plurality of gas diffusion holes. A gas other than said material gas is introduced from the outside into said second internal space. A film is deposited on the substrate by a reaction between said active species and said material gas supplied to said film-forming treatment space.

7. 发明申请

US20050217576A1 Vacuum Processing Apparatus 有权
标题翻译：真空处理设备
公开(公告)号：US20050217576A1
公开(公告)日：2005-10-06
申请号：US10907023
申请日：2005-03-16
申请人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
发明人： Keiji Ishibashi , Masahiko Tanaka , Akira Kumagai , Manabu Ikemoto , Katsuhisa Yuda
IPC分类号： C23C16/505 , C23C16/44 , C23C16/452 , C23C16/455 , H01J37/32 , H01L21/31 , C23C16/00
CPC分类号： C23C16/45574 , C23C16/452 , C23C16/45565
摘要： A vacuum processing apparatus, including a reactor and a partitioning plate having a plurality of through-holes through which radicals are allowed to pass and separating the reactor into a plasma generating space and a substrate process space, the process, such as a film deposition process, being carried out on a substrate placed in the substrate process space by delivering a gas into the plasma generating space for generating a plasma, producing radicals with the plasma thus generated, and delivering the radicals through the plurality of through-holes on the partitioning plate into the substrate process space. The partitioning plate includes a partitioning body having a plurality of through-holes and a control plate disposed on the plasma generating space side of the partitioning body and having radical passage holes in the positions corresponding to the plurality of through-holes on the partitioning plate.
摘要翻译：一种真空处理装置，包括反应器和具有多个通孔的分隔板，通过该通孔使自由基通过所述通孔并将反应器分离成等离子体产生空间和基板处理空间，所述方法如成膜方法通过将气体输送到等离子体产生空间中以产生等离子体，在由此产生的等离子体产生自由基的同时在放置在基板处理空间中的基板上进行，并且通过分隔板上的多个通孔输送自由基进入基板工艺空间。分隔板包括具有多个通孔的分隔体和设置在分隔体的等离子体产生空间侧的控制板，并且在与分隔板上的多个通孔对应的位置具有自由通过孔。

8. 发明授权

US08356167B2 Information device, storing predetermined state restoration software 有权
标题翻译：信息装置，存储预定的状态恢复软件
公开(公告)号：US08356167B2
公开(公告)日：2013-01-15
申请号：US12889303
申请日：2010-09-23
申请人： Akira Kumagai
发明人： Akira Kumagai
IPC分类号： G06F9/00 , G06F9/24 , G06F15/177
CPC分类号： G06F11/1438 , G06F3/0619 , G06F3/0647 , G06F3/0689 , G06F9/441 , G06F11/1417 , G06F11/1469
摘要： An information device has a storage medium storing information items which includes a first program provided on a first partition, a second program and data provided on a second partition to restore the first program on the first partition to a predetermined state, a boot block which causes system activation from one of the first partition and the second partition, and an active-partition switching program which indicates, to the boot block, one of the first and second partitions. An input/output system activates the active-partition switching program when a specific operation is performed. The active-partition switching program indicates to the boot block that system activation is to be executed from the second partition.
摘要翻译：信息装置具有存储信息项目的存储介质，该信息项目包括在第一分区上提供的第一程序，第二程序和第二分区上提供的数据，以将第一分区上的第一程序恢复到预定状态;引导块，其导致从第一分区和第二分区中的一个分区进行系统激活;以及活动分区切换程序，其向引导块指示第一分区和第二分区之一。当执行特定操作时，输入/输出系统激活活动分区切换程序。活动分区切换程序向引导块指示要从第二分区执行系统激活。

9. 发明申请

US20120273979A1 EXHAUST GAS TREATMENT APPARATUS 有权
标题翻译：排气处理设备
公开(公告)号：US20120273979A1
公开(公告)日：2012-11-01
申请号：US13503917
申请日：2010-10-21
申请人： Noboru Takei , Sohsuke Kido , Naohiro Kaji , Akira Kumagai
发明人： Noboru Takei , Sohsuke Kido , Naohiro Kaji , Akira Kumagai
IPC分类号： B01D53/14
CPC分类号： B01D53/504 , B01D53/78 , B01D2251/404 , B01D2251/606 , B01D2257/302 , B01D2258/0283 , F23J15/02 , F23J2219/40
摘要： The exhaust gas treatment apparatus has a sealed vessel which is vertically partitioned into two spaces by a partition. The partition is provided with a gas riser for deriving treated exhaust gas from an upper space of the absorbing liquid storage portion. A large number of sparger pipes are provided in a effective region, so as to reach inside an absorbing liquid stored in the absorbing liquid storage portion. A non-jet region is provided in the effective region. The froth layer is not formed in the non-jet region, and the absorbing liquid in a foamed state flows down from the froth layer therearound to circulate the absorbing liquid.
摘要翻译：排气处理装置具有通过分隔件而被垂直分隔成两个空间的密封容器。隔板设置有用于从吸收液体储存部分的上部空间导出经处理的废气的气体提升管。在有效区域中设置有大量的喷射管，以便到达存储在吸收液体储存部分中的吸收液体的内部。在有效区域中设置非喷射区域。泡沫层不形成在非喷射区域中，并且发泡状态的吸收液体从其周围的泡沫层向下流动以使吸收液体循环。

10. 发明申请

US20120087576A1 IMAGE PROCESSING DEVICE 审中-公开
标题翻译：图像处理装置
公开(公告)号：US20120087576A1
公开(公告)日：2012-04-12
申请号：US13181635
申请日：2011-07-13
申请人： Hiroshi Abe , Akira Kumagai
发明人： Hiroshi Abe , Akira Kumagai
IPC分类号： G06K9/00
CPC分类号： G06T1/00 , G06K9/4642 , G06K9/4652 , H04N1/46 , H04N1/60
摘要： An image processing device has a classification unit that generates a lookup table by dividing color palettes correlating RGB data with indices into a plurality of groups based on a relationship among R values, G values and B values of the RGB data; a storage unit that stores the lookup table; and a conversion unit that determines to which of the plurality of groups pixel data having the RGB data corresponds based on a relationship among R values, G values and B values of the pixel data, and searches for RGB data that is similar to the RGB data of the pixel data in the determined group, and outputs an index corresponding to the searched RGB data as pixel data.
摘要翻译：图像处理装置具有分类单元，其基于RGB数据的R值，G值和B值之间的关系，将通过将RGB数据与索引相关联的调色板分成多个组来生成查找表; 存储单元，存储查找表; 以及转换单元，其基于像素数据的R值，G值和B值之间的关系确定具有RGB数据的多个组中的哪个像素数据对应，并且搜索类似于RGB数据的RGB数据并且将与搜索到的RGB数据相对应的索引作为像素数据输出。

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