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    • 9. 发明授权
    • Particle beam biaxial orientation of a substrate for epitaxial crystal growth
    • 用于外延晶体生长的衬底的粒子束双轴取向
    • US06821338B2
    • 2004-11-23
    • US09739391
    • 2000-12-15
    • Ronald P. ReadePaul H. BerdahlRichard E. Russo
    • Ronald P. ReadePaul H. BerdahlRichard E. Russo
    • C30B106
    • H01L39/2461C30B23/02C30B25/02C30B25/18C30B33/04
    • The invention provides a method of increasing the extent of a desired biaxial orientation of a previously formed non-single-crystal structure by contacting said structure with an oblique particle beam thereby forming in the structure a nucleating surface having increased desired biaxial orientation. The method can further include a step of epitaxially growing the crystalline formation using the nucleating surface to promote the epitaxial growth. The invention also provides a crystalline structure containing a nucleating surface formed by contacting a previously formed non-single-crystal structure with an oblique particle beam, from 0 to 10 adjacent orientation-transmitting layers, and a crystalline active layer. In this structure, the active layer is oriented in registry with the nucleating surface.
    • 本发明提供了一种通过使所述结构与倾斜粒子束接触而增加预先形成的非单晶结构的所需双轴取向程度的方法,从而在结构中形成具有增加的所需双轴取向的成核面。 该方法还可以包括使用成核表面外延生长晶体结构以促进外延生长的步骤。 本发明还提供一种晶体结构,其包含通过使预先形成的非单晶结构与倾斜粒子束,0至10个相邻取向透射层和结晶活性层接触而形成的成核表面。 在该结构中,活性层与成核面对准。