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1. 发明授权

US09709506B2 Substrate damage inspection apparatus, production system and inspection method 有权
公开(公告)号：US09709506B2
公开(公告)日：2017-07-18
申请号：US14912577
申请日：2015-08-11
申请人： BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Zhiqiang Wang , Bin Wu , Guangzhi Li , Xing Yue , Xuequan Yu , Jiajia Liu
IPC分类号： G01N21/00 , G01N21/88 , G01N21/55 , H01L21/67
CPC分类号： G01N21/88 , G01N21/55 , G01N21/95 , G01N2021/9513 , G01N2201/0853 , G01N2201/088 , H01L21/67288
摘要： The present invention relates to the technical field of display, and particularly relates to a substrate damage inspection apparatus, a production system and an inspection method. The substrate damage inspection apparatus comprises a drive unit, support rods, sensors and a controller, wherein the drive unit is connected with the support rods so as to drive the support rods to ascend or descend below a substrate to be detected; and the sensors are disposed on the support rods and communicatively connect with the controller, so as to emit light beams to the substrate to be detected, receive the light beams reflected by the substrate to be detected, and feed them back to the controller. By means of the drive unit and the support rods with the sensors, the substrate damage inspection apparatus realizes damage inspection for the substrate to be detected in a vertical direction. That is, a technical solution provided by the present invention allows for damage inspection for the substrate to be detected when it vertically moves. In addition, the substrate damage inspection apparatus is simple in structure and convenient to operate, thereby having strong utility value and significance of generalization.

2. 发明申请

US20170038306A1 SUBSTRATE DAMAGE INSPECTION APPARATUS, PRODUCTION SYSTEM AND INSPECTION METHOD 有权
标题翻译：基板损坏检查装置，生产系统和检查方法
公开(公告)号：US20170038306A1
公开(公告)日：2017-02-09
申请号：US14912577
申请日：2015-08-11
申请人： BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Zhiqiang Wang , Bin Wu , Guangzhi Li , Xing Yue , Xuequan Yu , Jiajia Liu
IPC分类号： G01N21/88 , H01L21/67 , G01N21/55
CPC分类号： G01N21/88 , G01N21/55 , G01N21/95 , G01N2021/9513 , G01N2201/0853 , G01N2201/088 , H01L21/67288
摘要： The present invention relates to the technical field of display, and particularly relates to a substrate damage inspection apparatus, a production system and an inspection method. The substrate damage inspection apparatus comprises a drive unit, support rods, sensors and a controller, wherein the drive unit is connected with the support rods so as to drive the support rods to ascend or descend below a substrate to be detected; and the sensors are disposed on the support rods and communicatively connect with the controller, so as to emit light beams to the substrate to be detected, receive the light beams reflected by the substrate to be detected, and feed them back to the controller. By means of the drive unit and the support rods with the sensors, the substrate damage inspection apparatus realizes damage inspection for the substrate to be detected in a vertical direction. That is, a technical solution provided by the present invention allows for damage inspection for the substrate to be detected when it vertically moves. In addition, the substrate damage inspection apparatus is simple in structure and convenient to operate, thereby having strong utility value and significance of generalization.
摘要翻译：本发明涉及显示技术领域，特别涉及基板损伤检查装置，生产系统和检查方法。基板损伤检查装置包括驱动单元，支撑杆，传感器和控制器，其中驱动单元与支撑杆连接，以驱动支撑杆上升或下降到待检测基板下方; 并且传感器设置在支撑杆上并且与控制器通信地连接，以将光束发射到待检测的基板，接收由待检测的基板反射的光束，并将其馈送到控制器。通过驱动单元和具有传感器的支撑杆，基板损伤检查装置对垂直方向上要检测的基板实现损伤检查。也就是说，本发明提供的技术方案允许当垂直移动时要检测的基板的损伤检查。另外，基板损伤检查装置结构简单，操作方便，具有很强的实用价值和泛化意义。

3. 发明授权

US10201828B2 Coating system and coating method 有权
公开(公告)号：US10201828B2
公开(公告)日：2019-02-12
申请号：US15127692
申请日：2015-10-29
申请人： BOE Technology Group Co., Ltd. , HEFEI BOE Optoelectronics Technology Co., Ltd.
发明人： Xiaomei Zhang , Zhiqiang Wang
IPC分类号： B05C11/02 , B05C5/02 , B05C9/00 , B05C21/00
摘要： A coating system and a coating method are provided. The coating system includes: a coating device, a detecting device, and an adjusting device, wherein, the coating device is configured for applying a coating material on a substrate; the detecting device is configured for detecting a film thickness of the coating material at a measuring point when the coating device is applying the coating material and sending the detected film thickness to the adjusting device; the adjusting device is configured for selectively generating a preset feeding speed according to the film thickness and sends the preset feeding speed to the coating device. The coating system and the coating method are capable of adjusting film thickness in real time.

4. 发明授权

US10562175B2 Apparatus and method for installing pins on a base 有权
公开(公告)号：US10562175B2
公开(公告)日：2020-02-18
申请号：US15097518
申请日：2016-04-13
申请人： BOE TECHNOLOGY GROUP CO., LTD. , HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
发明人： Yongzeng Ma , Zhiqiang Wang , Wei Zhang , Qinghe Shen , Jiajia Liu , Xing Yue
IPC分类号： B23P19/00 , B25H7/02 , G02F1/13 , G02F1/1335
摘要： An apparatus for installing pins on a base is provided. The apparatus includes an upper positioning plate provided with a plurality of first pin holes through which pins can pass, a lower positioning plate arranged opposite the upper positioning plate and provided with a plurality of second pin holes through which pins can pass, wherein the plurality of second pin holes correspond to pin marks on the base, and a move assembly which is arranged between the upper positioning plate and the lower positioning plate, the move assembly configured to cause the upper positioning plate and the lower positioning plate to move relative to one another, such that at least some of the plurality of first pin holes align with target pin marks on the base.

5. 发明授权

US09946170B2 Method for exposure and development, system for controlling exposure and system for exposure and development 有权
公开(公告)号：US09946170B2
公开(公告)日：2018-04-17
申请号：US15129507
申请日：2015-06-05
申请人： BOE Technology Group Co., Ltd. , Hefei BOE Optoelectronics Technology Co., Ltd.
发明人： Xuequan Yu , Xianhua Xu , Zhi Liu , Zhiqiang Wang , Wei Zhang , Xuepei Cheng
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G03F1/00 , G03F7/20 , G03F7/70475 , G03F7/7085 , G03F9/7046 , G03F9/7088 , H01L21/027
摘要： The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.

6. 发明申请

US20170176873A1 METHOD FOR EXPOSURE AND DEVELOPMENT, SYSTEM FOR CONTROLLING EXPOSURE AND SYSTEM FOR EXPOSURE AND DEVELOPMENT 有权
公开(公告)号：US20170176873A1
公开(公告)日：2017-06-22
申请号：US15129507
申请日：2015-06-05
申请人： BOE Technology Group Co., Ltd. , Hefei BOE Optoelectronics Technology Co., Ltd.
发明人： Xuequan Yu , Xianhua Xu , Zhi Liu , Zhiqiang Wang , Wei Zhang , Xuepei Cheng
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G03F1/00 , G03F7/20 , G03F7/70475 , G03F7/7085 , G03F9/7046 , G03F9/7088 , H01L21/027
摘要： The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.

7. 发明授权

US11960333B2 Display panel, method for manufacturing the same and display device 有权
公开(公告)号：US11960333B2
公开(公告)日：2024-04-16
申请号：US17430686
申请日：2021-01-07
申请人： Chengdu BOE Optoelectronics Technology Co., Ltd. , BOE Technology Group Co., Ltd.
发明人： Zhiqiang Wang , Bing Zhang
IPC分类号： G06F1/16
CPC分类号： G06F1/1683 , G06F1/1616 , G06F1/1652
摘要： A display panel, a method for manufacturing the display panel and a display device are provided. The display panel includes a display region and a bezel region, the display region includes at least one first bending region extending in a first direction, and the bezel region includes a second bending region extending in a second direction crossing the first direction. At least one position where an extension line of the at least one first bending region crosses an extension line of the second bending region forms at least one overlapping region, and the display panel further includes a hollowed-out structure formed in the at least one overlapping region and penetrating a display surface and a non-display surface of the display panel.

8. 发明授权

US11635656B2 Backlight module and display apparatus 有权
公开(公告)号：US11635656B2
公开(公告)日：2023-04-25
申请号：US17344054
申请日：2021-06-10
申请人： Beijing BOE Optoelectronics Technology Co., Ltd. , BOE Technology Group Co., Ltd.
发明人： Qiuli Wang , Lei Chen , Zhiqiang Wang , Xin Ma , Chuan Sun , Jianfeng Yao , Xinyu Wang , Dingyang Tan
IPC分类号： G02F1/1335 , F21V8/00
摘要： The present disclosure discloses a backlight module and a display apparatus. A microprism film layer is further arranged on a light emitting side of a light guide plate, and the microprism film layer is located in a range of a preset distance by which the light guide plate extends from a side close to a light source to a side away from the light source; and the microprism film layer includes a plurality of first microprism structures, and the first microprism structures are configured to make an incident angle of light at a first interface when entering the first microprism structures greater than an emitting angle of the light at the first interface when exiting from the first microprism structures when the light in the light guide plate enters the first microprism structures from the light guide plate and then enters the light guide plate from the first microprism structures.

9. 发明授权

US11276712B2 Array substrate, method of fabricating array substrate, display device, and method of fabricating display device 有权
公开(公告)号：US11276712B2
公开(公告)日：2022-03-15
申请号：US16315311
申请日：2018-06-13
申请人： ORDOS YUANSHENG OPTOELECTRONICS CO., LTD. , BOE TECHNOLOGY GROUP CO., LTD.
发明人： Peng Luo , Xinchao Cui , Delong Zhong , Zhiqiang Wang
IPC分类号： H01L27/12 , H01L29/786 , G09G3/3225 , G09G3/3266
摘要： A display panel has a display area; and a peripheral area surrounding the display area, the peripheral area comprising a first area, a second area, a third area opposite to the first area, and a fourth area opposite to the second area. The display panel may further include a data driving integrated circuit provided in the first area; a gate drive circuit provided in the third area; and a plurality of signal transmission lines arranged in at least one of the second area and the fourth area. The configuration of the data driving integrated circuit and the gate drive circuit makes it possible to manufacture a display panel with a narrow bezel.

10. 发明申请

US20150380203A1 ELECTRODE FOR USE IN ION IMPLANTATION APPARATUS AND ION IMPLANTATION APPARATUS 有权
标题翻译：用于离子植入装置和离子植入装置的电极
公开(公告)号：US20150380203A1
公开(公告)日：2015-12-31
申请号：US14500160
申请日：2014-09-29
申请人： Boe Technology Group Co., Ltd. , Ordos Yuansheng Optoelectronics Co., Ltd.
发明人： Zhiqiang Wang , Feng Kang , Bo Yang , Jingyi Xu
IPC分类号： H01J37/08 , H01J37/05 , H01J37/317
CPC分类号： H01J37/08 , H01J27/024 , H01J37/3171 , H01J2237/0206 , H01J2237/065
摘要： An electrode for use in an ion implantation system includes a body portion and a penetration portion. The penetration portion includes penetration holes which are closely and regularly arranged. The penetration holes have the shape of a circle or a regular polygon with at least four sides. The electrode has an increased aperture ratio which, in turn, increases the density of the ion beam, thereby improving the efficiency of the ion implantation process.
摘要翻译：用于离子注入系统的电极包括主体部分和穿透部分。穿透部分包括紧密且规则地布置的穿透孔。穿透孔具有至少四边的圆形或正多边形的形状。电极具有增加的孔径比，这又增加了离子束的密度，从而提高了离子注入过程的效率。

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