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1. 发明授权

US09412559B2 Automated slice milling for viewing a feature 有权
公开(公告)号：US09412559B2
公开(公告)日：2016-08-09
申请号：US14311614
申请日：2014-06-23
申请人： FEI Company
发明人： Ryan Tanner
IPC分类号： H01J37/304 , H01J37/30 , H01J37/28 , H01J37/305 , H01J37/26 , G01N1/28
CPC分类号： H01J37/3005 , G01N1/286 , H01J37/26 , H01J37/265 , H01J37/28 , H01J37/30 , H01J37/3045 , H01J37/3056 , H01J2237/2611 , H01J2237/28 , H01J2237/2803 , H01J2237/2814 , H01J2237/30472 , H01J2237/3174 , H01J2237/31745 , H01J2237/31749
摘要： A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. The FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest.

2. 发明申请

US20160173852A1 DISPARITY COMPUTATION METHOD THROUGH STEREO MATCHING BASED ON CENSUS TRANSFORM WITH ADAPTIVE SUPPORT WEIGHT AND SYSTEM THEREOF 有权
标题翻译：基于具有自适应支持权重的系统的CENSUS变换的立体匹配的差异性计算方法及其系统
公开(公告)号：US20160173852A1
公开(公告)日：2016-06-16
申请号：US14587620
申请日：2014-12-31
申请人： KYUNGPOOK NATIONAL UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION
发明人： Byung In MOON , Kyeong Ryeol BAE , Hyeon Sik SON , Seung Ho OK
IPC分类号： H04N13/00
CPC分类号： G06T7/593 , H01J37/222 , H01J2237/226 , H01J2237/2611 , H04N2013/0081
摘要： Provided is a method of computing precise disparity using a stereo matching method based on developed census transform with an adaptive support weight method in area based stereo matching. The method includes a step of setting an adaptive support weight window centered on a specific point of a left image and setting adaptive support weight windows with the same size with respect to one point positioned within a maximum disparity prediction value about a specific point of the left image in a right image.
摘要翻译：提供了一种基于基于区域的立体匹配中基于自适应支持加权方法的开发的普查变换的立体匹配方法来计算精确差异的方法。该方法包括设置以左图像的特定点为中心的自适应支持权重窗口，并且相对于位于关于左侧特定点的最大视差预测值内的一个点设置相同大小的自适应支持权重窗口图像在正确的图像。

3. 发明申请

US20150124077A1 CHARGED PARTICLE BEAM ADJUSTMENT ASSISTANCE DEVICE AND METHOD 审中-公开
标题翻译：充电颗粒束调整辅助装置和方法
公开(公告)号：US20150124077A1
公开(公告)日：2015-05-07
申请号：US14397475
申请日：2013-04-04
申请人： Hitachi High-Technologies Corporation
发明人： Naohiko Fukaya , Kenji Kitagawa , Masakazu Yagi , Yukie Hiratsuka , Wataru Kotake
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J2237/1504 , H01J2237/216 , H01J2237/2485 , H01J2237/2611
摘要： A charged particle beam adjustment assistance device that can assist work to adjust a charged particle beam apparatus having a three-dimensional observing function and reduce human labor and man-hours required for adjustment value inputting is provided.An adjustment value acquiring unit generates optimal three-dimensional adjustment value information on the basis of two-dimensional adjustment value information and two/three-dimensional adjustment value correspondence information generated according to information inputted from a charged particle beam adjuster terminal, transmits the three-dimensional adjustment value information to the charged particle beam apparatus, and sets the three-dimensional adjustment value information therein. Therefore, the charged particle beam adjuster can reduce adjusting work required for three-dimensional observation and facilitate the work of observing three-dimensional images.
摘要翻译：提供一种带电粒子束调节辅助装置，其能够辅助工作来调整具有三维观察功能的带电粒子束装置，并减少调节值输入所需的人力和工时。调整值获取单元基于二维调整值信息和根据从带电粒子束调节器终端输入的信息生成的二维/三维调整值对应信息生成最佳三维调整值信息，将三维调整值信息设置在带电粒子束装置中，并设定三维调整值信息。因此，带电粒子束调节器可以减少三维观察所需的调整工作，便于观察三维图像的工作。

4. 发明申请

US20150001393A1 CHARGED PARTICLE BEAM DEVICE AND INCLINED OBSERVATION IMAGE DISPLAY METHOD 有权
标题翻译：充电颗粒光束装置和内置观察图像显示方法
公开(公告)号：US20150001393A1
公开(公告)日：2015-01-01
申请号：US14370736
申请日：2012-12-20
申请人： Hitachi High-Technologies Corporation
发明人： Wataru Kotake , Shigeru Kawamata , Sukehiro Ito
IPC分类号： H01J37/24 , H01J37/28 , H01J37/26
CPC分类号： H01J37/24 , H01J37/1478 , H01J37/21 , H01J37/261 , H01J37/28 , H01J2237/2611
摘要： A control device (50) for a charged particle beam device (100) tilts the irradiation axis of a primary electron beam (4) to the left, straight, or to the right via tilting coils (11, 12) each time the primary electron beam (4) scans the surface of a sample (15) over a single scanning line. When the irradiation axis is changed, the focal point of the primary electron beam (4) is adjusted by a focal point-adjusting coil (14) based on the tilt of the irradiation axis in order to take a left-tilted observation image, a non-tilted observation image or a right-tilted observation image of the surface of a sample (15) for each scanning line. The left-tilted observation images, non-tilted observation images and right-tilted observation images for the scanning lines obtained up to this point are simultaneously displayed on the same display device (31). In this way, focused non-tilted observation images and focused tilted observation images can be taken and displayed nearly simultaneously.
摘要翻译：用于带电粒子束装置（100）的控制装置（50）每次通过倾斜线圈（11,12）将一次电子束（4）的照射轴向左，向右或向右倾斜，光束（4）通过单个扫描线扫描样品（15）的表面。当照射轴改变时，基于照射轴的倾斜度，通过焦点调节线圈（14）调节一次电子束（4）的焦点，以便进行左倾斜的观察图像，每个扫描线的样品（15）的表面的非倾斜观察图像或右倾斜观察图像。在同一显示装置（31）上同时显示直到此为止的扫描线的左倾斜观察图像，非倾斜观察图像和右倾斜观察图像。以这种方式，可以同时拍摄和显示聚焦的非倾斜观察图像和聚焦的倾斜观察图像。

5. 发明授权

US08878130B2 Scanning electron microscope and scanning transmission electron microscope 有权
标题翻译：扫描电子显微镜和扫描透射电子显微镜
公开(公告)号：US08878130B2
公开(公告)日：2014-11-04
申请号：US14232526
申请日：2012-07-19
申请人： Hiromi Inada , Kuniyasu Nakamura
发明人： Hiromi Inada , Kuniyasu Nakamura
IPC分类号： H01J37/26 , H01J37/28 , H01J37/244 , H01J37/153 , H01J37/21 , G01N23/22
CPC分类号： H01J37/263 , G01N23/2206 , H01J37/153 , H01J37/21 , H01J37/244 , H01J37/28 , H01J2237/0455 , H01J2237/0492 , H01J2237/153 , H01J2237/1532 , H01J2237/21 , H01J2237/221 , H01J2237/225 , H01J2237/226 , H01J2237/24475 , H01J2237/2448 , H01J2237/2611 , H01J2237/2802
摘要： A scanning transmission electron microscope according to the present invention includes an electron lens system having a small spherical aberration coefficient for enabling three-dimensional observation of a 0.1 nm atomic size structure. The scanning transmission electron microscope according to the present invention also includes an aperture capable of changing an illumination angle; an illumination electron lens system capable of changing the probe size of an electron beam probe and the illumination angle; a secondary electron detector (9); a transmission electron detector (13); a forward scattered electron beam detector (12); a focusing unit (16); an image processor for identifying image contrast; an image processor for computing image sharpness; a processor for three-dimensional reconstruction of an image; and a mixer (18) for mixing a secondary electron signal and a specimen forward scattered electron signal.
摘要翻译：根据本发明的扫描透射电子显微镜包括具有小球面像差系数的电子透镜系统，用于实现0.1nm原子尺寸结构的三维观察。根据本发明的扫描透射电子显微镜还包括能够改变照明角度的孔; 能够改变电子束探头的探头尺寸和照明角度的照明电子透镜系统; 二次电子检测器（9）; 透射电子检测器（13）; 前向散射电子束检测器（12）; 聚焦单元（16）; 用于识别图像对比度的图像处理器; 用于计算图像清晰度的图像处理器; 用于图像的三维重建的处理器; 以及用于混合二次电子信号和样本前向散射电子信号的混合器（18）。

6. 发明授权

US08866102B2 Electron beam device with tilting and dispersion compensation, and method of operating same 有权
标题翻译：具有倾斜和色散补偿的电子束装置及其操作方法
公开(公告)号：US08866102B2
公开(公告)日：2014-10-21
申请号：US13177957
申请日：2011-07-07
申请人： Jürgen Frosien
发明人： Jürgen Frosien
IPC分类号： H01J1/50 , H01J37/147 , H01J37/153 , H01J37/28
CPC分类号： H01J37/153 , H01J37/1471 , H01J37/1478 , H01J37/28 , H01J2237/1523 , H01J2237/1534 , H01J2237/2611
摘要： An electron beam device 100 includes: a beam emitter 102 for emitting a primary electron beam 101; an objective electron lens 127 for focusing the primary electron beam 101 onto a specimen 130, the objective lens defining an optical axis 126; a beam tilting arrangement 103 configured to direct the primary electron beam 101 to the electron lens 127 at an adjustable offset from the optical axis 126 such that the objective electron lens 127 directs the electron beam 101 to strike the specimen 130 at an adjustable oblique beam landing angle, whereby a chromatic aberration is caused; a beam separator 115 having a first dispersion for separating a signal electron beam 135 from the primary electron beam 101; and a dispersion compensation element 104 adapted to adjust a compensation dispersion of the primary electron beam 101 so as to compensate for a beam aberration resulting from the first dispersion and from the chromatic aberration.
摘要翻译：电子束装置100包括：用于发射一次电子束101的光束发射器102; 用于将一次电子束101聚焦到样本130上的目标电子透镜127，物镜限定光轴126; 梁倾斜装置103，其构造成将一次电子束101引导到与光轴126可调偏移的电子透镜127，使得物镜电子透镜127引导电子束101以可调节的斜射束着陆角度，由此产生色差; 具有用于从一次电子束101分离信号电子束135的第一色散的光束分离器115; 以及色散补偿元件104，其适于调整一次电子束101的补偿色散，以补偿由第一色散引起的光束像差和色差。

7. 发明授权

US08816277B2 Pattern evaluation method, device therefor, and electron beam device 有权
标题翻译：图案评估方法，装置和电子束装置
公开(公告)号：US08816277B2
公开(公告)日：2014-08-26
申请号：US13386540
申请日：2010-07-26
申请人： Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda , Toru Yamanashi
发明人： Hiromasa Yamanashi , Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： H01J37/28 , G06T7/74 , G06T2207/10061 , G06T2207/30148 , G06T2207/30204 , H01J37/1478 , H01J2237/24578 , H01J2237/2611 , H01J2237/2817
摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.
摘要翻译：通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

8. 发明授权

US08754935B2 Microstructure inspection method, microstructure inspection apparatus, and microstructure inspection program 失效
标题翻译：微观结构检查方法，微观结构检查装置和微观结构检查程序
公开(公告)号：US08754935B2
公开(公告)日：2014-06-17
申请号：US12736157
申请日：2009-03-19
申请人： Isao Yonekura , Hidemitsu Hakii
发明人： Isao Yonekura , Hidemitsu Hakii
IPC分类号： G01B15/00 , G01N23/00 , G21K7/00 , G01B15/04
CPC分类号： G01B15/04 , G01B2210/56 , G01N23/00 , G06T7/0006 , G06T7/13 , G06T2207/10061 , G06T2207/10152 , G06T2207/30148 , G21K7/00 , H01J2237/221 , H01J2237/2611 , H01J2237/2809 , H01J2237/2817
摘要： A microstructure inspection method which inspects an angle of a sidewall of a sample microstructure pattern, the method including: taking SEM photographs of the sample microstructure pattern under plural SEM conditions; measuring a width of a white band at an edge portion of the sample microstructure pattern in the SEM photographs; and calculating the angle of the sidewall of the sample microstructure pattern on the basis of an amount of change in the width of the white band due to the change between the plural SEM conditions.
摘要翻译：一种微观结构检查方法，其检查样品微观结构图案的侧壁的角度，所述方法包括：在多个SEM条件下取样品微结构图案的SEM照片; 在SEM照片中测量样品微结构图案的边缘部分处的白色带宽度; 并且基于由于多个SEM条件之间的变化引起的白带宽度的变化量，计算样品微结构图案的侧壁的角度。

9. 发明授权

US08748816B2 Clustering of multi-modal data 有权
标题翻译：多模态数据的聚类
公开(公告)号：US08748816B2
公开(公告)日：2014-06-10
申请号：US13546863
申请日：2012-07-11
申请人： Cornelis Sander Kooijman , Sander Richard Marie Stoks
发明人： Cornelis Sander Kooijman , Sander Richard Marie Stoks
IPC分类号： H01J37/28 , H01J37/244
CPC分类号： G01N23/203 , G01N23/2206 , G01N23/2252 , G01N2223/402 , G01N2223/418 , G01N2223/616 , H01J37/28 , H01J2237/221 , H01J2237/2445 , H01J2237/24475 , H01J2237/2611
摘要： Information from multiple detectors acquiring different types of information is combined to determine one or more properties of a sample more efficiently than the properties could be determined using a single type of information from a single type of detector. In some embodiments, information is collected simultaneously from the different detectors which can greatly reduce data acquisition time. In some embodiments, information from different points on the sample are grouped based on information from one type of detector and information from the second type of detector related to these points is combined, for example, to create a single spectrum from a second detector of a region of common composition as determined by the first detector. In some embodiments, the data collection is adaptive, that is, the data is analyzed during collection to determine whether sufficient data has been collected to determine a desired property with the desired confidence.
摘要翻译：获取不同类型信息的多个检测器的信息被组合以确定样本的一个或多个属性，而不是使用来自单一类型的检测器的单一类型的信息来确定属性。在一些实施例中，从不同的检测器同时收集信息，这可以大大减少数据采集时间。在一些实施例中，来自样本上不同点的信息基于来自一种类型的检测器的信息被分组，并且来自与这些点相关的第二类型的检测器的信息被组合，例如，从第二检测器由第一检测器确定的共同组成的区域。在一些实施例中，数据收集是自适应的，即，在收集期间分析数据以确定是否已经收集了足够的数据以确定具有期望置信度的所需属性。

10. 发明授权

US08624186B2 Movable detector for charged particle beam inspection or review 有权
标题翻译：用于带电粒子束检测或检查的可移动检测器
公开(公告)号：US08624186B2
公开(公告)日：2014-01-07
申请号：US12787139
申请日：2010-05-25
申请人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
发明人： Yi-Xiang Wang , Joe Wang , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/244
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/024 , H01J2237/24465 , H01J2237/24475 , H01J2237/2448 , H01J2237/24495 , H01J2237/2611 , H01J2237/2817
摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.
摘要翻译：本发明一般涉及带电粒子成像系统的检测单元。更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统。仅作为示例，本发明已经应用于扫描电子束检查系统。但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

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