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    • 1. 发明授权
    • Programmable integrated circuit with thin-oxide passgates
    • 可编程集成电路与薄氧化物通风门
    • US08633731B1
    • 2014-01-21
    • US13206401
    • 2011-08-09
    • Irfan RahimMao DuJeffrey Xiaoqi TungJun LiuQi Xiang
    • Irfan RahimMao DuJeffrey Xiaoqi TungJun LiuQi Xiang
    • G06F7/38
    • H03K19/1733G11C8/16G11C11/419
    • Integrated circuits such as programmable integrated circuits may have configuration random-access memory elements. The configuration random-access memory elements may be loaded with configuration data to customize programmable circuitry on the integrated circuits. Each memory element may have a bistable element that is powered using a positive power supply voltage and a negative power supply voltage. Programmable transistors in the programmable circuitry may have gates coupled to outputs of the bistable elements. The programmable transistors may have gate insulators that are thinner than gate insulators in the transistors of the bistable elements and may have threshold voltages of about zero volts. During operation, some of the configuration random-access memory elements may supply negative voltages to their associated programmable transistors so that the programmable transistors are provided with gate-source voltages of less than zero volts.
    • 诸如可编程集成电路的集成电路可以具有配置随机存取存储器元件。 配置随机存取存储器元件可以被加载配置数据以定制集成电路上的可编程电路。 每个存储元件可以具有使用正电源电压和负电源电压供电的双稳态元件。 可编程电路中的可编程晶体管可以具有耦合到双稳态元件的输出的栅极。 可编程晶体管可以具有比双稳态元件的晶体管中的栅极绝缘体更薄的栅极绝缘体,并且可以具有约零伏特的阈值电压。 在操作期间,一些配置随机存取存储器元件可以向其相关联的可编程晶体管提供负电压,使得可编程晶体管具有小于零伏的栅极 - 源极电压。
    • 5. 发明授权
    • Apparatus for configuring performance of field programmable gate arrays and associated methods
    • 用于配置现场可编程门阵列性能和相关方法的装置
    • US08461869B1
    • 2013-06-11
    • US13214147
    • 2011-08-19
    • Irfan RahimAndy L. LeeBruce B. PedersenJeffrey T. WattMao DuRichard G. Cliff
    • Irfan RahimAndy L. LeeBruce B. PedersenJeffrey T. WattMao DuRichard G. Cliff
    • H03K19/003
    • H03K19/003H03K19/17784
    • An apparatus includes a temperature sensor, a voltage regulator, and a field programmable gate array (FPGA). The temperature sensor and the voltage regulator are adapted, respectively, to provide a temperature signal, and to provide at least one output voltage. The FPGA includes at least one circuit adapted to receive the at least one output voltage of the voltage regulator, and a set of monitor circuits adapted to provide indications of process and temperature for the at least one circuit. The FPGA further includes a controller adapted to derive a body-bias signal and a voltage-level signal from the temperature signal, from the indications of process and temperature for the at least one circuit, and from the at least one output voltage of the voltage regulator. The controller is further adapted to provide the body-bias signal to at least one transistor in the at least one circuit, and to provide the voltage-level signal to the voltage regulator.
    • 一种装置包括温度传感器,电压调节器和现场可编程门阵列(FPGA)。 温度传感器和电压调节器分别适于提供温度信号,并提供至少一个输出电压。 FPGA包括适于接收电压调节器的至少一个输出电压的至少一个电路,以及适于提供至少一个电路的过程和温度指示的一组监视器电路。 FPGA还包括控制器,其适于从温度信号,从至少一个电路的处理和温度指示以及电压的至少一个输出电压导出体偏置信号和电压电平信号 调节器 所述控制器还适于将所述体偏置信号提供给所述至少一个电路中的至少一个晶体管,并且向所述电压调节器提供所述电压电平信号。
    • 7. 发明授权
    • Integrated circuits with asymmetric pass transistors
    • 具有不对称传输晶体管的集成电路
    • US08921170B1
    • 2014-12-30
    • US13408959
    • 2012-02-29
    • Jun LiuAlbert RatnakumarMark T. ChanIrfan Rahim
    • Jun LiuAlbert RatnakumarMark T. ChanIrfan Rahim
    • H01L21/338
    • H01L21/823418H01L21/324H01L21/823814H01L27/082H01L27/088H01L29/1083H01L29/6653H01L29/66659
    • Asymmetric transistors such as asymmetric pass transistors may be formed on an integrated circuit. The asymmetric transistors may have gate structures. Symmetric pocket implants may be formed in source-drains on opposing sides of each transistor gate structure. Selective heating may be used to asymmetrically diffuse the implants. Selective heating may be implemented by patterning the gate structures on a semiconductor substrate so that the spacing between adjacent gate structures varies. A given gate structure may be located between first and second adjacent gate structures spaced at different respective distances from the given gate structure. A larger gate structure spacing leads to a greater substrate temperature rise than a smaller gate structure spacing. The pocket implant diffuses more in portions of the substrate with the greater temperature rise, producing asymmetric transistors. Asymmetric pass transistors may be controlled by static control signals from memory elements to implement circuits such as programmable multiplexers.
    • 不对称晶体管,例如不对称传输晶体管可以形成在集成电路上。 不对称晶体管可以具有栅极结构。 可以在每个晶体管栅极结构的相对侧上的源极漏极中形成对称的袋状植入物。 选择性加热可用于不对称地扩散植入物。 可以通过在半导体衬底上图案化栅极结构来实现选择性加热,使得相邻栅极结构之间的间隔变化。 给定的栅极结构可以位于与给定栅极结构不同的相应距离处间隔开的第一和第二相邻栅极结构之间。 较大的栅极结构间隔导致比较小栅极结构间隔更大的衬底温度升高。 在较大的温度上升的情况下,口袋植入物在衬底的部分扩散,产生不对称晶体管。 不对称传输晶体管可以由来自存储器元件的静态控制信号来控制,以实现诸如可编程多路复用器之类的电路。
    • 8. 发明授权
    • Integrated circuits with asymmetric pass transistors
    • 具有不对称传输晶体管的集成电路
    • US08138797B1
    • 2012-03-20
    • US12790660
    • 2010-05-28
    • Jun LiuAlbert RatnakumarMark T. ChanIrfan Rahim
    • Jun LiuAlbert RatnakumarMark T. ChanIrfan Rahim
    • H01L25/00H03K19/00
    • H01L21/823418H01L21/324H01L21/823814H01L27/082H01L27/088H01L29/1083H01L29/6653H01L29/66659
    • Asymmetric transistors such as asymmetric pass transistors may be formed on an integrated circuit. The asymmetric transistors may have gate structures. Symmetric pocket implants may be formed in source-drains on opposing sides of each transistor gate structure. Selective heating may be used to asymmetrically diffuse the implants. Selective heating may be implemented by patterning the gate structures on a semiconductor substrate so that the spacing between adjacent gate structures varies. A given gate structure may be located between first and second adjacent gate structures spaced at different respective distances from the given gate structure. A larger gate structure spacing leads to a greater substrate temperature rise than a smaller gate structure spacing. The pocket implant diffuses more in portions of the substrate with the greater temperature rise, producing asymmetric transistors. Asymmetric pass transistors may be controlled by static control signals from memory elements to implement circuits such as programmable multiplexers.
    • 不对称晶体管,例如不对称传输晶体管可以形成在集成电路上。 不对称晶体管可以具有栅极结构。 可以在每个晶体管栅极结构的相对侧上的源极漏极中形成对称的袋状植入物。 选择性加热可用于不对称地扩散植入物。 可以通过在半导体衬底上图案化栅极结构来实现选择性加热,使得相邻栅极结构之间的间隔变化。 给定的栅极结构可以位于与给定栅极结构不同的相应距离处间隔开的第一和第二相邻栅极结构之间。 较大的栅极结构间隔导致比较小栅极结构间隔更大的衬底温度升高。 在较大的温度上升的情况下,口袋植入物在衬底的部分扩散,产生不对称晶体管。 不对称传输晶体管可以由来自存储器元件的静态控制信号来控制,以实现诸如可编程多路复用器之类的电路。