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    • 6. 发明授权
    • Gallium nitride based semiconductor laser and image exposure device
    • 基于氮化镓的半导体激光器和图像曝光装置
    • US07113530B2
    • 2006-09-26
    • US10329511
    • 2002-12-27
    • Kenji MatsumotoToshiro Hayakawa
    • Kenji MatsumotoToshiro Hayakawa
    • H01S5/00
    • B41J2/45H01S5/32341
    • In order to obtain a visually high quality image with excellent sharpness using a silver halide photosensitive material, it is necessary to reduce the ratio of EL light in the light output from a GaN based laser diode to 20% or less. For example, when the light intensity measured on a sheet of photosensitive paper is 0.05 mW, the thickness of a waveguide is 3 nm and the width of the waveguide is 3 μm, this condition is satisfied with a length of a resonator being 1 mm or less. In other words, a waveguide width W1 and a resonator length L are set such that the product of the waveguide width W1 and the resonator length L (W1·L) becomes 0.003 mm2 or less. This reduces the output ratio of the EL light, and a high quality image with excellent sharpness can be obtained when a silver halide photosensitive material is exposed.
    • 为了使用卤化银感光材料获得具有优异清晰度的视觉上高质量的图像,需要将从GaN基激光二极管输出的光的EL光的比例降低到20%以下。 例如,当在一张感光纸上测量的光强度为0.05mW时,波导的厚度为3nm,波导的宽度为3μm,该条件满足谐振器的长度为1mm或 减。 换句话说,波导宽度W 1和谐振器长度L被设定为使得波导宽度W 1和谐振器长度L(W 1·L)的乘积成为0.003mm以下2以下 。 这降低了EL光的输出比,并且当曝光卤化银感光材料时可以获得具有优异清晰度的高质量图像。