专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07732504B2 Functionalized photoinitiators 有权
标题翻译：官能化光引发剂
公开(公告)号：US07732504B2
公开(公告)日：2010-06-08
申请号：US10587584
申请日：2005-01-24
申请人： Kurt Dietliker , Rinaldo Hüsler , Jean-Luc Birbaum , Jean-Pierre Wolf
发明人： Kurt Dietliker , Rinaldo Hüsler , Jean-Luc Birbaum , Jean-Pierre Wolf
IPC分类号： C08F2/50
CPC分类号： C08F2/50 , B33Y70/00 , G03F7/0007 , G03F7/001 , G03F7/0037 , G03F7/031
摘要： The invention relates to novel photoinitiators of formula (I) wherein each of the substituents is given the definition as set forth in the Specification and the claims. The photoinitiators can be used to prepare multifunctional photoinitiators.
摘要翻译：本发明涉及式（I）的新型光引发剂，其中每个取代基都给出如本说明书和权利要求书中所阐述的定义。光引发剂可用于制备多功能光引发剂。

2. 发明申请

US20100022676A1 PHOTOCURABLE COMPOSITIONS COMPRISING A PHOTOINITIATOR OF THE PHENYLGLYOXYLATE TYPE 审中-公开
标题翻译：含有苯甲酸酯类型的光敏剂的可光性组合物
公开(公告)号：US20100022676A1
公开(公告)日：2010-01-28
申请号：US12442779
申请日：2007-09-24
申请人： Jonathan Rogers , Johannes Benkhoff , Karin Powell , Tunja Jung , Kurt Dietliker , Pascal Hayoz , Jean-Luc Birbaum , Thomas Vogel , Rinaldo Hüsler
发明人： Jonathan Rogers , Johannes Benkhoff , Karin Powell , Tunja Jung , Kurt Dietliker , Pascal Hayoz , Jean-Luc Birbaum , Thomas Vogel , Rinaldo Hüsler
IPC分类号： C08F2/46 , C08J7/18 , C07C69/67
CPC分类号： G03F7/031 , C07C59/90 , C07C69/738 , C07C2601/10 , C07C2601/14 , C08F2/50 , G03F7/0045 , G03F7/038
摘要： The invention provides a uv-curable colored composition, comprising (a) at least one selected ethylenically unsaturated photopolymerizable compound; (b) at least one selected curing agent; and (c) at least one selected colorant.
摘要翻译：本发明提供了一种紫外线固化着色组合物，其包含（a）至少一种选择的烯属不饱和光聚合化合物; （b）至少一种选择的固化剂; 和（c）至少一种选择的着色剂。

3. 发明申请

US20080021126A1 Functionalized Photoinitiators 有权
标题翻译：功能化光引发剂
公开(公告)号：US20080021126A1
公开(公告)日：2008-01-24
申请号：US10587584
申请日：2005-01-24
申请人： Kurt Dietliker , Rinaldo Husler , Jean-Luc Birbaum , Jean-Pierre Wolf
发明人： Kurt Dietliker , Rinaldo Husler , Jean-Luc Birbaum , Jean-Pierre Wolf
IPC分类号： C07C211/50 , C07C211/43 , C07C211/51 , C07C211/54 , C07D251/30 , C07D265/30 , C07F7/10 , C08F2/50 , C08J3/28
CPC分类号： C08F2/50 , B33Y70/00 , G03F7/0007 , G03F7/001 , G03F7/0037 , G03F7/031
摘要： The invention relates to novel photoinitiators of formula (I) wherein each of the substituents is given the definition as set forth in the Specification and the claims. The photoinitiators can be used to prepare multifunctional photoinitiators.
摘要翻译：本发明涉及式（I）的新型光引发剂，其中每个取代基被给出如本说明书和权利要求书中所阐述的定义。光引发剂可用于制备多功能光引发剂。

4. 发明授权

US06596445B1 O-acyloxime photoinitiators 有权
标题翻译： O-酰基肟光引发剂
公开(公告)号：US06596445B1
公开(公告)日：2003-07-22
申请号：US09338152
申请日：1999-06-23
申请人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： C07C25164
CPC分类号： C07C251/66 , B33Y70/00 , C07C251/68 , C07C323/47 , C07D295/135 , C07D335/18 , C08F2/50 , G03F7/0007 , G03F7/002 , G03F7/0045 , G03F7/031 , G03F7/0388
摘要： Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
摘要翻译：式I，II，III和IV其中R 1的肟酯化合物是苯基，任选被-O - ，C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基，或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基，或R1'是苯氧基羰基，或R1'是-CONR10R11或CN; R2是C2-C12烷酰基，C4-C6链烯酰基，苯甲酰基，C2-C6烷氧基羰基或苯氧基羰基; R3，R4，R5，R6和R7是氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12烷酰基，C2-C12烷氧基羰基，苯氧基羰基或OR8，SR9，SOR9，SO2R9或NR10R11; R4'，R5'和R6'为氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12-烷酰基，C2-C12烷氧基羰基，苯氧基羰基，或为OR8，SR9，SOR9，SO2R9 ，NR10R11; 条件是R3，R4，R5，R6，R7，R'4，R'5和R'6中的至少一个是OR8，SR9或NR10R

5. 发明授权

US06261738B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06261738B1
公开(公告)日：2001-07-17
申请号：US09533952
申请日：2000-03-23
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： G03G7004
CPC分类号： G03F7/039 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22 , G03F7/0045 , Y10S430/12
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合作为光敏酸供体。

6. 发明授权

US6004724A Oxime sulfonates and the use thereof as latent sulfonic acids 失效
标题翻译：肟磺酸盐及其作为潜在磺酸的用途
公开(公告)号：US6004724A
公开(公告)日：1999-12-21
申请号：US104676
申请日：1998-06-25
申请人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
发明人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
IPC分类号： C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D207/44 , C07D213/90 , C07D333/34 , C07D333/36 , C07D333/44 , G03F7/004 , G03C1/725 , C07C249/04 , C07C251/32 , G03C1/72
CPC分类号： C07D207/44 , C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D213/90 , C07D333/44 , G03F7/0045 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.
摘要翻译：式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基，亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。

7. 发明授权

US06512020B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06512020B1
公开(公告)日：2003-01-28
申请号：US09820115
申请日：2001-03-28
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： C08J328
CPC分类号： G03F7/0045 , B33Y70/00 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

8. 发明授权

US06485886B1 Oxime derivatives and the use thereof as latent acids 失效
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06485886B1
公开(公告)日：2002-11-26
申请号：US09830248
申请日：2001-04-24
申请人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： G03C173
CPC分类号： C07C255/64 , B33Y70/00 , C07D333/36 , Y10S430/114 , Y10S430/117 , Y10S430/12
摘要： New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
摘要翻译：式（I）的新肟衍生物或。（II），其中m为0或1; R1特别是苯基，萘基，蒽基，菲基或杂芳基; R'1例如为C 2 -C 12亚烷基，亚苯基，亚萘基; R2为CN; R3是C2-C6卤代烷酰基，卤代苯甲酰基，磷酰基或有机甲硅烷基; R4，R5，R10和R11尤其是氢，C1-C6烷基，C1-C6烷氧基; R6尤其是氢苯基，C1-C12烷基; R 7和R 8尤其是氢，C 1 -C 12烷基; 或R 7和R 8与它们所键合的氮原子一起形成5-，6-或7-元环; R 9为例如C 1 -C 12烷基; A特别是S，O，NR7a; 可用作潜酸，特别是在光致抗蚀剂中。

9. 发明授权

US09199934B2 Alpha-hydroxyketones 有权
标题翻译： α-羟基酮
公开(公告)号：US09199934B2
公开(公告)日：2015-12-01
申请号：US12593025
申请日：2008-03-25
申请人： Kurt Dietliker , Peter Murer , Rinaldo Hüsler , Tunja Jung
发明人： Kurt Dietliker , Peter Murer , Rinaldo Hüsler , Tunja Jung
IPC分类号： G03F7/004 , C07C69/95 , C07D307/00 , C07D211/32 , G03F7/38 , G03F7/40 , C07C49/83 , C07C49/835 , C07C49/84 , C07C62/38 , C07C69/757 , C07C219/12 , C07C235/82 , C07D295/185 , C07D305/12 , C07F7/08 , C07F7/18
CPC分类号： C07D211/32 , C07C49/83 , C07C49/835 , C07C49/84 , C07C62/38 , C07C69/757 , C07C219/12 , C07C235/82 , C07C2601/14 , C07D295/185 , C07D305/12 , C07F7/0836 , C07F7/0838 , C07F7/1804 , G03F7/004 , G03F7/38 , G03F7/40
摘要： Compounds of the Formula (I) wherein x is an integer from 1-4; p is an integer from 1-3; q is an integer from 0-3; Ar is phenyl, naphthyl, anthryl or phenanthryl each of which optionally is substituted by one or more Cl, CN, OR5, C3-C5alkenyl or C1-C6alkyl which optionally is substituted by one or more OR6, COOR or halogen; R1 if x is 1, is OR7, O—X+, NR8R9, C1-C20alkyl optionally substituted by one or more COOR10, or is C2-C20alkyl interrupted by one ore more O, or is C2-C5alkenyl or phenyl-C1-C4alkyl; R1 if x is 2, is for example C1-C20alkylene; R1 if x is 3, is for example a tri-valent radical; R1 if x is 4, is for example a tetravalent radical; R2 and R3 are hydrogen or C1-C8alkyl, or R2 and R3 together are O, C1-C3alkylene or CH═CH; R4 is C1-C4alkyl; R5, R6, R7, R8, R9 and R10 are for example hydrogen or C1-C4alkyl; and X is a x-valent cationic counter ion; are in particular suitable as photoinitiators for the curing with UV-A light (320-450 nm).
摘要翻译：式（I）的化合物，其中x为1-4的整数; p是1-3的整数; q是0-3的整数; Ar是苯基，萘基，蒽基或菲基，其各自任选被一个或多个被一个或多个OR 6，COOR或卤素取代的C 1，CN，OR 5，C 3 -C 5链烯基或C 1 -C 6烷基取代; R 1如果x是1，是OR 7，O-X +，NR 8 R 9，任选被一个或多个COOR 10取代的C 1 -C 20烷基，或者是被一个或多个O取代的C 2 -C 20烷基，或者是C 2 -C 5烯基或苯基-C 1 -C 4烷基; R1如果x为2，例如为C 1 -C 20亚烷基; 如果x是3，则R1是例如三价基; R1如果x为4，则为例如四价基团; R 2和R 3是氢或C 1 -C 8烷基，或者R 2和R 3一起是O，C 1 -C 3亚烷基或CH = CH; R4是C1-C4烷基; R5，R6，R7，R8，R9和R10是例如氢或C1-C4烷基; X为x-阳离子抗衡离子; 特别适用于用UV-A光（320-450nm）固化的光引发剂。

10. 发明申请

US20100104979A1 ALPHA-HYDROXYKETONES 有权
标题翻译：阿尔法羟基酮
公开(公告)号：US20100104979A1
公开(公告)日：2010-04-29
申请号：US12593025
申请日：2008-03-25
申请人： Kurt Dietliker , Peter Murer , Rinaldo Hüsler , Tunja Jung
发明人： Kurt Dietliker , Peter Murer , Rinaldo Hüsler , Tunja Jung
IPC分类号： G03F7/20 , C07C59/76 , C07D307/00 , C07D305/12 , C07F7/08 , C07D265/30 , C07C69/95 , C07D211/06 , C07C233/00 , G03F7/004 , C08F2/46
CPC分类号： C07D211/32 , C07C49/83 , C07C49/835 , C07C49/84 , C07C62/38 , C07C69/757 , C07C219/12 , C07C235/82 , C07C2601/14 , C07D295/185 , C07D305/12 , C07F7/0836 , C07F7/0838 , C07F7/1804 , G03F7/004 , G03F7/38 , G03F7/40
摘要： Compounds of the Formula (I) wherein x is an integer from 1-4; p is an integer from 1-3; q is an integer from 0-3; Ar is phenyl, naphthyl, anthryl or phenanthryl each of which optionally is substituted by one or more Cl, CN, OR5, C3-C5alkenyl or C1-C6alkyl which optionally is substituted by one or more OR6, COOR or halogen; R1 if x is 1, is ORS, O—X+, NR8R9, C1-C20alkyl optionally substituted by one or more COOR10, or is C2-C20alkyl interrupted by one ore more O, or is C2-C5alkenyl or phenyl-C1-C4alkyl; R1 if x is 2, is for example C1-C20alkylene; R1 if x is 3, is for example a tri-valent radical; R1if x is 4, is for example a tetravalent radical; R2and R3are hydrogen or C1-C8alkyl, or R2and R3 together are O, C1-C3alkylene or CH═CH; R4 is C1-C4alkyl; R5, R6, R7, R8, R9 and R10 are for example hydrogen or C1-C4alkyl; and X is a x-valent cationic counter ion; are in particular suitable as photoinitiators for the curing with UV-A light (320-450 nm).
摘要翻译：式（I）的化合物，其中x是1-4的整数; p是1-3的整数; q是0-3的整数; Ar是苯基，萘基，蒽基或菲基，其各自任选被一个或多个被一个或多个OR 6，COOR或卤素取代的C 1，CN，OR 5，C 3 -C 5链烯基或C 1 -C 6烷基取代; R 1如果x是1，是ORS，O-X +，NR 8 R 9，任选被一个或多个COOR 10取代的C 1 -C 20烷基，或是被一个或多个O取代的C 2 -C 20烷基，或者是C 2 -C 5烯基或苯基-C 1 -C 4烷基; R1如果x为2，例如为C 1 -C 20亚烷基; 如果x是3，则R1是例如三价基; R1if x为4，例如为四价基团; R 2和R 3为氢或C 1 -C 8烷基，或R 2和R 3一起为O，C 1 -C 3亚烷基或CH = CH; R4是C1-C4烷基; R5，R6，R7，R8，R9和R10是例如氢或C1-C4烷基; X为x-阳离子抗衡离子; 特别适用于用UV-A光（320-450nm）固化的光引发剂。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式