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    • 4. 发明授权
    • Lithographic printing process
    • 平版印刷工艺
    • US07851133B2
    • 2010-12-14
    • US11081677
    • 2005-03-17
    • Naonori MakinoToshifumi Inno
    • Naonori MakinoToshifumi Inno
    • G03C1/00G03C1/72G03C7/00B41F7/00
    • B41C1/1008B41C1/1016B41C2201/02B41C2201/04B41C2201/06B41C2201/10B41C2201/14B41C2210/04B41C2210/08B41C2210/20B41C2210/22B41C2210/24
    • A lithographic printing process which comprises the steps of: imagewise scanning with a laser a presensitized lithographic plate which comprises a hydrophilic support and an image-recording layer containing a polymerization initiator, an ethylenically unsaturated polymerizable compound having no adherence to the hydrophilic support, and an ethylenically unsaturated polymerizable compound having adherence to the hydrophilic support and a molecular structure comprising a polyoxyalkylene group to polymerize the ethylenically unsaturated polymerizable compounds within the exposed area; removing the image-recording layer within the unexposed area from the lithographic plate mounted on a cylinder of a printing press; and then printing an image with the lithographic plate mounted on the cylinder of the printing press. A presensitized lithographic plate is also disclosed.
    • 一种平版印刷方法,包括以下步骤:用激光成像扫描包含亲水性支持物和含有聚合引发剂的图像记录层,不粘附于亲水性载体的烯键式不饱和可聚合化合物的预定平版印刷版,以及 具有粘附于亲水性载体的烯属不饱和可聚合化合物和包含聚氧化烯基团的分子结构,以在曝光区域内聚合烯属不饱和可聚合化合物; 从安装在印刷机的滚筒上的平版印刷板移除未曝光区域内的图像记录层; 然后用安装在印刷机滚筒上的平版印刷机印刷图像。 还公开了一种预定平版印刷版。
    • 5. 发明授权
    • Production method of lithographic printing plate, lithographic printing plate precursor and lithographic printing method
    • 平版印刷版的制作方法,平版印刷版原版和平版印刷法
    • US07745090B2
    • 2010-06-29
    • US11209798
    • 2005-08-24
    • Tomoyoshi MitsumotoToshifumi Inno
    • Tomoyoshi MitsumotoToshifumi Inno
    • B41F7/00B41N1/00G03C1/00G03C1/72G03F7/00G03F7/26
    • B41C1/1016B41C2201/02B41C2201/04B41C2201/06B41C2201/10B41C2201/14B41C2210/04B41C2210/06B41C2210/10B41C2210/20B41C2210/22B41C2210/24G03F7/3035G03F7/305
    • A method for producing a lithographic printing plate is provided, wherein, in the non-alkaline development of a lithographic printing plate precursor having a protective layer, even if the protective layer components are mingled into the developer, the reduction in development removability of the image recording layer and the generation of development scum can be inhibited; an on-press development type lithographic printing plate precursor with excellent inking property, high scratch resistance, satisfied on-press developability and good fine line reproducibility is provided; and a lithographic printing method is provided, each of which is a method for producing a lithographic printing plate, comprising: imagewise exposing a lithographic printing plate precursor comprising a support, an image recording layer and a protective layer, and rubbing the plate surface by a rubbing member of an automatic processor in the presence of a developer at a pH of 2 to 10 to remove the protective layer and the image recording layer in the unexposed area; a lithographic printing plate precursor comprising a support, an image recording layer removable with a printing ink and/or a fountain solution, and a protective layer containing a polyvinyl alcohol having a carboxyl group and/or a sulfonic acid group within the molecule; and a lithographic printing method comprising on-press development.
    • 提供了一种用于制造平版印刷版的方法,其中在具有保护层的平版印刷版原版的非碱性显影中,即使保护层组分混合到显影剂中,图像的显影去除性的降低 记录层和发育浮渣的产生可以被抑制; 提供了具有优异的着油性,高耐擦伤性,满足印刷压力显影性和良好的细线再现性的印刷机上显影型平版印刷版原版。 并提供平版印刷方法,其中每一种都是制造平版印刷版的方法,包括:将包含载体,图像记录层和保护层的平版印刷版原版成像曝光,并通过 在pH为2〜10的显影剂的存在下自动处理器的摩擦构件,以去除未曝光区域中的保护层和图像记录层; 包括载体,可用印刷油墨和/或润版液除去的图像记录层的平版印刷版原版以及含有分子内具有羧基和/或磺酸基的聚乙烯醇的保护层; 以及包括印刷机开发的平版印刷方法。
    • 8. 发明申请
    • Novel metal nanoparticle and formation of conductive pattern using the same
    • 新型金属纳米粒子和导电图案的形成使用相同
    • US20080020317A1
    • 2008-01-24
    • US11653889
    • 2007-01-17
    • Jong Jin ParkDong Woo ShinSung Woong Kim
    • Jong Jin ParkDong Woo ShinSung Woong Kim
    • G03C1/72B32B15/02
    • G03F7/0047B05D1/185C03C17/06H05K3/02H05K2201/0257H05K2203/0514Y10S977/777Y10S977/778Y10S977/779Y10T428/2991
    • A metal nanoparticle which is prepared by forming a self-assembled monolayer including a terminal reactive group on the surface thereof, and introducing a functional group capable of being removed by the action of an acid or an base into the terminal reactive group wherein the self-assembled monolayer is built up of a thiol, an isocyanide, an amine, a carboxylate or a phosphate compound having the terminal reactive group, or built up of a thiol, an isocyanide, an amine, a carboxylate or a phosphate compound having no terminal reactive group followed by introducing the terminal reactive group thereto; and a method for forming a conductive pattern using the same are provided. Since the metal nanoparticle of exemplary embodiments of the present invention can easily form a high conductive film or a high conductive pattern through photo-irradiation and photo-degradation and randomly regulate its conductivity when occasions demand, it can be advantageously applied to an antistatic washable sticky film, antistatic shoes, a conductive polyurethane printer roller, an electromagnetic interference shielding, and the like.
    • 一种金属纳米颗粒,其通过在其表面上形成包括末端反应性基团的自组装单层并将能够通过酸或碱的作用除去的官能团引入末端反应性基团而制备, 组装的单层由硫醇,异氰化物,胺,羧酸酯或具有末端反应性基团的磷酸酯化合物构成,或由硫醇,异氰化物,胺,羧酸酯或不具有末端反应性的磷酸酯化合物 然后引入末端反应性基团; 并且提供了使用其形成导电图案的方法。 由于本发明的示例性实施方案的金属纳米颗粒可以通过光照射和光降解容易地形成高导电膜或高导电图案,并且当需要时随机调节其导电性,因此可以有利地应用于抗静电可洗粘性 薄膜,抗静电鞋,导电性聚氨酯打印辊,电磁干扰屏蔽等。
    • 9. 发明授权
    • Radiation sensitive resin composition
    • 辐射敏感树脂组合物
    • US07297461B2
    • 2007-11-20
    • US10975052
    • 2004-10-28
    • Isao NishimuraTsutomu ShimokawaMakoto Sugiura
    • Isao NishimuraTsutomu ShimokawaMakoto Sugiura
    • G03F7/004G03C1/72
    • C08L83/06C08K5/0025C08K5/42C08L2666/04
    • A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R2s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.
    • 一种辐射敏感性树脂组合物,其包含(A)含有下式(I)的结构单元的树脂,(B)含有下式(II)的重复单元的树脂和(C)光酸产生剂,其中 R 1表示取代或未取代的二价(脂环族)烃,R 2表示低级烷基或一价(取代)脂环族烃基,或任意两个R 0 其中R 2为低级烷基或单价(取代)脂环族烃基,其中R为低级烷基 > 3表示氢原子,氟原子或三氟甲基,R 4表示具有(c + 1)价((C + 1)),(取代的)脂环族烃的(取代的)烃基, (c + 1)价或(c + 1)价的(取代)芳基,R 5表示氢原子或一价酸-d 相关基团,a和b分别表示0-3的整数,条件是(a + b)> = 1,c为1-3的整数。 该辐射敏感性树脂组合物在波长193nm以下具有高透明性,在LER中特别优异。