专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20070109514A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070109514A1
公开(公告)日：2007-05-17
申请号：US11559084
申请日：2006-11-13
申请人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
发明人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/70341
摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.
摘要翻译：曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

2. 发明授权

US07916273B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07916273B2
公开(公告)日：2011-03-29
申请号：US11559084
申请日：2006-11-13
申请人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
发明人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341
摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.
摘要翻译：曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

3. 发明授权

US06503361B1 Polishing method and polishing apparatus using the same 失效
标题翻译：抛光方法和使用其的抛光装置
公开(公告)号：US06503361B1
公开(公告)日：2003-01-07
申请号：US09090803
申请日：1998-06-04
申请人： Masaru Nyui , Mikichi Ban
发明人： Masaru Nyui , Mikichi Ban
IPC分类号： C23F104
CPC分类号： B24B37/013 , B24B49/04 , B24B49/12
摘要： This specification discloses a polishing method of polishing the surface of a film layer provided on the surface of a substrate by polishing means with both of them driven relative to each other, having a position detecting step of detecting a predetermined position on the surface of the film layer, a first measuring step of applying momentary light from a light source to the predetermined position, and detecting the light beam from the predetermined position by a light receiving element to thereby measure the film thickness at the predetermined position, and a controlling step of controlling the polishing state by using data obtained in the first measuring step. The specification also discloses a polishing apparatus using such polishing method.
摘要翻译：该说明书公开了一种抛光方法，其通过抛光装置抛光设置在基板的表面上的膜层的表面，两者都被相对于彼此驱动，具有位置检测步骤，该位置检测步骤检测膜的表面上的预定位置第一测量步骤，将来自光源的瞬时光施加到预定位置，并且由光接收元件检测来自预定位置的光束，从而测量预定位置处的膜厚度;以及控制步骤，通过使用在第一测量步骤中获得的数据的抛光状态。本说明书还公开了使用这种抛光方法的抛光装置。

4. 发明授权

US6142855A Polishing apparatus and polishing method 失效
公开(公告)号：US6142855A
公开(公告)日：2000-11-07
申请号：US182457
申请日：1998-10-30
申请人： Masaru Nyui , Mikichi Ban , Takehiko Suzuki , Yasushi Sugiyama
发明人： Masaru Nyui , Mikichi Ban , Takehiko Suzuki , Yasushi Sugiyama
IPC分类号： B24B37/013 , B24B49/12 , B24B7/00
CPC分类号： B24B37/013 , B24B49/12
摘要： In order to measure a thickness of a surface to be polished of a material to be polished for a short time, two-dimensional images are obtained from a light reflected from the surface to be polished of the material to be polished, a location at which a thickness is to be observed is specified by the obtained two-dimensional images, and thickness measurement is carried out.

5. 发明授权

US6004187A Method and apparatus for measuring film thickness and film thickness distribution during polishing 失效
标题翻译：研磨过程中测量薄膜厚度和薄膜厚度分布的方法和装置
公开(公告)号：US6004187A
公开(公告)日：1999-12-21
申请号：US917853
申请日：1997-08-27
申请人： Masaru Nyui , Mikichi Ban
发明人： Masaru Nyui , Mikichi Ban
IPC分类号： G01B11/06 , B24B49/12 , H01L21/66 , B24B49/00 , B24B5/00
CPC分类号： B24B37/013 , H01L22/26
摘要： Disclosed is a method of polishing the surface of a film provided on a substrate, by use of a polishing device, while relatively moving the film surface and the polishing device. The method includes a position detecting step for detecting a predetermined position on the surface of the film, a first measurement step for measuring an absolute value of the film thickness at the predetermined position, and a second measurement step for measuring film thickness information of the film about the predetermined position, on the basis of a measured value obtained through the first measurement step. The method also includes a film thickness distribution measurement step for detecting a film thickness distribution of the film, on the basis of a data obtained through the first and second measurement steps, and a control step for controlling continuation/discontinuation of polishing, on the basis of a data obtained through the film thickness distribution measurement step.
摘要翻译：公开了通过使用研磨装置，在使膜面和研磨装置相对移动的同时研磨设置在基板上的膜的表面的方法。该方法包括用于检测胶片表面上的预定位置的位置检测步骤，用于测量预定位置处的膜厚绝对值的第一测量步骤，以及用于测量胶片厚度信息的第二测量步骤基于通过第一测量步骤获得的测量值来关于预定位置。该方法还包括基于通过第一和第二测量步骤获得的数据以及用于控制抛光的持续/停止的控制步骤，用于检测膜的膜厚度分布的膜厚度分布测量步骤通过膜厚分布测量步骤获得的数据。

6. 发明授权

US5640377A Rotation information detecting apparatus and method 失效
标题翻译：旋转信息检测装置及方法
公开(公告)号：US5640377A
公开(公告)日：1997-06-17
申请号：US508901
申请日：1995-07-28
申请人： Hiroshi Watanabe , Masaru Nyui
发明人： Hiroshi Watanabe , Masaru Nyui
IPC分类号： G01D5/30 , G01D5/347 , G01P3/486 , G11B5/012 , G11B7/0037 , G11B15/54 , G11B5/09 , G01D5/34
CPC分类号： G11B5/012 , G01D5/3473 , G01P3/486 , G11B15/54 , G11B7/0037
摘要： The present invention relates to a rotation information detecting method of detecting rotation information of a rotating object, comprising the step of mounting a rotating scale on a rotating shaft of the rotating object, said rotating scale having a first pattern for detecting rotation information formed thereon in advance, the detection step of detecting the rotation information of the rotating object by detecting the first pattern and the formation step of forming a second pattern for detecting rotation information on the rotating scale on the basis of the detected rotation information.
摘要翻译：旋转信息检测方法技术领域本发明涉及一种检测旋转物体的旋转信息的旋转信息检测方法，包括将旋转刻度安装在旋转物体的旋转轴上的步骤，所述旋转刻度具有用于检测形成在其上的旋转信息的第一图案通过检测第一图案来检测旋转物体的旋转信息的检测步骤，以及基于检测到的旋转信息形成用于检测旋转刻度的旋转信息的第二图案的形成步骤。

7. 发明授权

US5481106A Encoder with an optical scale and interference of zero and first order diffraction beams 失效
$Encoder with an optical scale and interference of zero and first order diffraction beams$
标题翻译：具有光刻度和零级和一级衍射光束干扰的编码器
公开(公告)号：US5481106A
公开(公告)日：1996-01-02
申请号：US70996
申请日：1993-06-04
申请人： Masaru Nyui , Masahiko Igaki , Ko Ishizuka
发明人： Masaru Nyui , Masahiko Igaki , Ko Ishizuka
IPC分类号： G01D5/347 , G01D5/36 , G01D5/38 , H01J3/14
CPC分类号： G01D5/38
摘要： An encoder capable of detecting movement information on a moving body with high accuracy without being affected by environmental changes, wherein movement information on a moving body is detected by causing a luminous flux to impinge upon a first scale section of an optical scale which is provided on the moving body and which consists of gratings of a fixed pitch, causing the luminous flux to impinge upon a second scale section of the optical scale, and receiving the luminous flux which has undergone light modulation at the second scale section, and wherein a light adjustment device for intercepting or attenuating a +1st order or -1st order diffracted ray of diffracted rays of light from the first scale section is provided in the optical path extending from the first scale section, an optical image having an intensity distribution of the same grating pitch as the first scale section being formed on the second scale section mainly by the zero order and the -1st order diffracted rays or by the zero order and the +1st order diffracted rays.
摘要翻译：一种编码器，其能够高精度地检测移动体上的移动信息而不受环境变化的影响，其中通过使光束照射到设置在所述移动体由固定间距的光栅构成，使得光束撞击到光刻尺的第二刻度部分，并且接收在第二刻度部分处经过光调制的光束，并且其中光调节在从第一刻度部分延伸的光路中设置用于截取或衰减来自第一标尺部分的衍射光线的+ 1级或-1级衍射光线的装置，具有相同光栅间距的强度分布的光学图像因为第一刻度部分主要以零级和-1级衍射光线形成在第二刻度部分上通过零级和+ 1级衍射光线。

8. 发明授权

US5369271A Rotation detector using dual position interference light 失效
标题翻译：旋转检测器采用双位置干涉光
公开(公告)号：US5369271A
公开(公告)日：1994-11-29
申请号：US202685
申请日：1994-02-25
申请人： Masaru Nyui
发明人： Masaru Nyui
IPC分类号： G01D5/30 , G01D5/38 , G01D5/34
CPC分类号： G01D5/38
摘要： In a rotation detector, a light beam from a light irradiating device is projected onto a first scale of an optical scale comprising gratings having a constant period provided around a cylindrical member of a rotating member, the light beam modulated by the first scale is projected onto a second scale of the optical scale via a region away from the center of the rotation shaft of the rotating member, the light beams as a result of modulation by the second scale are sensed by a light sensing device, and information regarding the rotation of the rotating member is detected using signals from the light sensing device.
摘要翻译：在旋转检测器中，将来自光照射装置的光束投影到包括围绕旋转部件的圆柱形部件设置的具有恒定周期的光栅的光学标尺的第一标度上，由第一标尺调制的光束投影到经由离开旋转构件的旋转轴的中心的区域的光刻尺的第二刻度，作为第二刻度的调制结果的光束由光感测装置感测，并且关于旋转的旋转的信息使用来自光检测装置的信号检测旋转构件。

9. 发明授权

US5302821A Encoder using a birefringent element and a system including the same 失效
标题翻译：使用双折射元件的编码器和包括该双折射元件的系统
公开(公告)号：US5302821A
公开(公告)日：1994-04-12
申请号：US903522
申请日：1992-06-24
申请人： Masahiko Igaki , Koh Ishizuka , Masaru Nyui
发明人： Masahiko Igaki , Koh Ishizuka , Masaru Nyui
IPC分类号： G01D5/36 , G01B11/00 , G01D5/34 , G01D5/38 , H01J3/14
CPC分类号： G01D5/344
摘要： An encoder includes a light illuminating device, an optical scale and a photosensor, and detects information of relative displacement between the scale and the illuminating light. A birefringent element, such as a Savart plate or the like, is disposed in the optical path between the light illuminating device and the photosensor to generate a plurality of images of the scale having different phases. A plurality of output signals having a phase difference are obtained using the images of the scale.
摘要翻译：编码器包括光照明装置，光学秤和光传感器，并且检测标尺和照明光之间的相对位移的信息。诸如Savart板等的双折射元件设置在光照射装置和光传感器之间的光路中，以产生具有不同相位的刻度的多个图像。使用标尺的图像获得具有相位差的多个输出信号。

10. 发明授权

US06551172B1 Polishing apparatus and polishing method 失效
标题翻译：抛光设备和抛光方法
公开(公告)号：US06551172B1
公开(公告)日：2003-04-22
申请号：US09654036
申请日：2000-09-01
申请人： Masaru Nyui , Mikichi Ban , Takehiko Suzuki , Yasushi Sugiyama
发明人： Masaru Nyui , Mikichi Ban , Takehiko Suzuki , Yasushi Sugiyama
IPC分类号： B24B4900
CPC分类号： B24B37/013 , B24B49/12
摘要： In order to measure a thickness of a surface to be polished of a material to be polished for a short time, two-dimensional images are obtained from a light reflected from the surface to be polished of the material to be polished, a location at which a thickness is to be observed is specified by the obtained two-dimensional images, and thickness measurement is carried out.
摘要翻译：为了在短时间内测量待抛光材料的被研磨表面的厚度，从被抛光材料的待抛光表面反射的光获得二维图像，在该位置处通过所获得的二维图像指定要观察的厚度，并且进行厚度测量。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式