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1. 发明授权

US07916273B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07916273B2
公开(公告)日：2011-03-29
申请号：US11559084
申请日：2006-11-13
申请人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
发明人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70916 , G03F7/70341
摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.
摘要翻译：曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

2. 发明申请

US20070109514A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070109514A1
公开(公告)日：2007-05-17
申请号：US11559084
申请日：2006-11-13
申请人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
发明人： Masaru Nyui , Keiko Chiba , Keiji Yamashita
IPC分类号： G03B27/42
CPC分类号： G03F7/70916 , G03F7/70341
摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.
摘要翻译：曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

3. 发明申请

US20100141911A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20100141911A1
公开(公告)日：2010-06-10
申请号：US12632457
申请日：2009-12-07
申请人： Keiji Emoto , Yutaka Watanabe , Yasuyuki Tamura , Noriyasu Hasegawa , Kentaro Doguchi , Hisashi Namba , Keiji Yamashita
发明人： Keiji Emoto , Yutaka Watanabe , Yasuyuki Tamura , Noriyasu Hasegawa , Kentaro Doguchi , Hisashi Namba , Keiji Yamashita
IPC分类号： G03B27/52 , G03B27/58
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/707
摘要： An exposure apparatus, exposing a substrate via liquid so as to transfer a pattern of a mask onto the substrate, includes a stage configured to move while holding the substrate. The stage includes a substrate supporting portion on which the substrate is disposed, a supporting surface disposed outside the substrate supporting portion configured to support the liquid together with the substrate, and a frame portion formed so as to surround the supporting surface. The frame portion includes a depression and a member whose top surface is located in a plane including the supporting surface.
摘要翻译：曝光装置，通过液体使基板曝光以将掩模的图案转印到基板上，包括配置成在保持基板的同时移动的台。台架包括：衬底支撑部分，衬底被设置在衬底支撑部分上，支撑表面设置在衬底支撑部分的外部，该衬底支撑部分构造成与衬底一起支撑液体;以及框架部分，形成为围绕支撑表面。框架部分包括凹部和其顶表面位于包括支撑表面的平面中的构件。

4. 发明申请

US20070177117A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20070177117A1
公开(公告)日：2007-08-02
申请号：US11625376
申请日：2007-01-22
申请人： Keiji Yamashita
发明人： Keiji Yamashita
IPC分类号： G03B27/42
CPC分类号： G03D3/02 , G03F7/70341
摘要： An exposure apparatus for exposing a substrate via liquid includes a supply nozzle configured to supply the liquid, and a recovery nozzle configured to recover the liquid, wherein at least one of the supply nozzle and the recovery nozzle includes porous ceramic with an oxide film.
摘要翻译：用于通过液体曝光衬底的曝光装置包括构造成供应液体的供应喷嘴和构造成回收液体的回收喷嘴，其中供应喷嘴和回收喷嘴中的至少一个包括具有氧化物膜的多孔陶瓷。

5. 发明授权

US07724350B2 Immersion exposure apparatus and device manufacturing method 失效
标题翻译：浸渍曝光装置及装置的制造方法
公开(公告)号：US07724350B2
公开(公告)日：2010-05-25
申请号：US12031575
申请日：2008-02-14
申请人： Keiji Yamashita
发明人： Keiji Yamashita
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion exposure apparatus includes a projection optical system, a first supply unit, and a second supply unit. The projection optical system projects exposure light from an original onto a substrate. The first supply unit forms a first liquid film in a space formed between the projection optical system and the substrate by supplying first liquid. The space includes a light path of the exposure light. The second supply unit forms a second liquid film around the first liquid film by supplying second liquid that is different from the first liquid.
摘要翻译：浸没曝光装置包括投影光学系统，第一供应单元和第二供应单元。投影光学系统将来自原件的曝光光投射到基板上。第一供应单元通过供应第一液体在投影光学系统和基板之间形成的空间中形成第一液膜。该空间包括曝光光的光路。第二供给单元通过供给与第一液体不同的第二液体，在第一液膜周围形成第二液膜。

6. 发明授权

US06355190B1 Method of molding ophthalmic lens product, and mold assembly used in the method 失效
标题翻译：眼镜镜片产品的成型方法以及该方法中使用的模具组装
公开(公告)号：US06355190B1
公开(公告)日：2002-03-12
申请号：US09333401
申请日：1999-06-15
申请人： Tatsuya Ojio , Kazuharu Niwa , Keiji Yamashita , Akihiro Yasuda
发明人： Tatsuya Ojio , Kazuharu Niwa , Keiji Yamashita , Akihiro Yasuda
IPC分类号： B29D1100
CPC分类号： B29C31/04 , B29C33/0061 , B29C39/24 , B29C2043/3618 , B29D11/00317 , B29D11/00432 , B29D11/023 , B29K2105/0002 , B29L2011/0041 , Y10S425/808
摘要： A method of molding an ophthalmic lens product by using a mold assembly which has a mold cavity, the lens product having a configuration corresponding to that of an ophthalmic lens or a precursor of the ophthalmic lens and being obtained by polymerizing a liquid monomer composition in the mold cavity to provide a polymer product which gives the lens product, the method comprising the steps of: preparing the mold assembly having a monomer storage space for storing the liquid monomer composition, which storage space is held in fluid communication with the mold cavity; filling the mold cavity of the mold assembly with the liquid monomer composition while the liquid monomer composition is accommodated in the monomer storage space; and polymerizing the liquid monomer composition at a temperature of 10-80° C. while a pressure higher than the atmospheric pressure is applied directly to a liquid surface of a mass of the liquid monomer composition accommodated in the monomer storage space.
摘要翻译：一种通过使用具有模具腔的模具组件来模制眼用透镜产品的方法，所述透镜产品具有与眼科镜片或眼科镜片的前体相对应的构造，并且通过使液体单体组合物在模腔以提供给予透镜产品的聚合物产品，该方法包括以下步骤：制备具有用于储存液体单体组合物的单体储存空间的模具组件，该储存空间保持与模腔流体连通; 当液体单体组合物容纳在单体储存空间中时，用液体单体组合物填充模具组件的模腔; 并在10-80℃的温度下使液体单体组合物聚合，同时将高于大气压的压力直接施加到容纳在单体储存空间中的液体单体组合物的液体表面。

7. 发明授权

US5630901A Method and jig for holding contact lens material, using light-scattering bonding adhesive 失效
标题翻译：使用光散射粘合剂保持隐形眼镜材料的方法和夹具
公开(公告)号：US5630901A
公开(公告)日：1997-05-20
申请号：US361496
申请日：1994-12-22
申请人： Yasuyoshi Yamamoto , Atsuhiro Doke , Hiroyuki Ohyama , Seiichi Ichikawa , Keiji Yamashita
发明人： Yasuyoshi Yamamoto , Atsuhiro Doke , Hiroyuki Ohyama , Seiichi Ichikawa , Keiji Yamashita
IPC分类号： G02C7/04 , B23Q3/08 , B24B13/00 , B24B13/005 , B29C39/02 , B29C65/48 , B29D11/00 , B29L11/00 , G02C13/00 , B32B31/00
CPC分类号： B24B13/0043 , B24B13/005
摘要： A jig adapted to hold a contact lens material having a concave surface, for holding the contact lens material, including a protruding portion which has a top end having as an outer surface thereof a convex surface. This convex surface of the jig is bonded to the concave surface of the contact lens material. The protruding portion has a recess which extends from an inner surface of the top end toward a bottom end of the protruding portion. The recess is defined by an inner surface which includes a first portion that corresponds to the convex surface of the top end of the protruding portion. At least the first portion of the inner surface is toughened with a light-scattering texture. A method of holding the contact lens material while the contact lens material is processed into a contact lens is disclosed.
摘要翻译：一种适于保持具有凹形表面的隐形眼镜材料的夹具，用于保持隐形眼镜材料，包括具有作为其外表面的凸起表面的顶端的突出部分。夹具的该凸面与接触透镜材料的凹面接合。突出部具有从顶端的内表面朝向突出部的底端延伸的凹部。凹部由内表面限定，该内表面包括对应于突出部分的顶端的凸出表面的第一部分。至少内表面的第一部分用光散射纹理增韧。公开了一种在将隐形眼镜材料加工成隐形眼镜时保持隐形眼镜材料的方法。

8. 发明授权

US5532768A Contact lens 失效
标题翻译：隐形眼镜
公开(公告)号：US5532768A
公开(公告)日：1996-07-02
申请号：US130728
申请日：1993-10-04
申请人： Takayuki Onogi , Keiji Yamashita , Kazuya Miyamura
发明人： Takayuki Onogi , Keiji Yamashita , Kazuya Miyamura
IPC分类号： G02C7/04
CPC分类号： G02C7/04 , G02C7/041 , G02C7/048
摘要： The inner and outer surfaces of a toric contact lens have respectively a curved surface having a different radius of curvature wherein the central axis of the outer surface is deviated downwardly from the central axis of the inner surface. Accordingly, the position of the gravity center of the lens is lowered because the lower portion of the lens is thicker than the upper portion. Further, slab-off portions are formed in the upper and lower portions of the outer surface of the lens. The contact lens of the present invention can prevent the rotation of the lens on the cornea, provides a good feeling to a wearer, and is safe in use.
摘要翻译：复曲面隐形眼镜的内表面和外表面分别具有不同曲率半径的曲面，其中外表面的中心轴线从内表面的中心轴线向下偏离。因此，由于透镜的下部比上部厚，所以透镜的重心位置降低。此外，在透镜的外表面的上部和下部形成有剥离部分。本发明的隐形眼镜可以防止透镜在角膜上的旋转，给佩戴者提供良好的感觉，并且使用安全。

9. 发明授权

US08760630B2 Exposure apparatus and method of manufacturing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08760630B2
公开(公告)日：2014-06-24
申请号：US13329747
申请日：2011-12-19
申请人： Keiji Yamashita , Yasuyuki Tamura
发明人： Keiji Yamashita , Yasuyuki Tamura
IPC分类号： G03B27/32 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/70716
摘要： An exposure apparatus which projects a pattern of an original onto a substrate via a liquid to expose the substrate, includes a substrate stage which holds the substrate and moves, the substrate stage including a peripheral member arranged to surround a region in which the substrate is arranged, the peripheral member having a holding surface which holds the liquid, wherein a trench which traps the liquid is formed in the peripheral member, and the trench is arranged to surround the region in which the substrate is arranged, and includes a bottom portion, an inner-side surface extending from the holding surface toward the bottom portion, and an outer-side surface, the inner-side surface having a slant which increases stepwise or continuously in a direction away from the holding surface, and the outer-side surface is provided with a spattering preventing portion which prevents spattering of the liquid trapped by the trench.
摘要翻译：通过液体将原稿的图案投影到基板上以暴露基板的曝光装置包括：保持基板并移动的基板台，所述基板台包括布置成围绕布置基板的区域的周边部件所述周边部件具有保持液体的保持面，其中，在所述周缘部件中形成有捕获液体的沟槽，并且所述沟槽被配置为包围所述基板配置的区域，并且包括底部，从所述保持面朝向所述底部延伸的内侧面，以及外侧面，所述内侧面具有在远离所述保持面的方向上逐步或连续地延伸的倾斜，所述外侧面为设置有防止由沟槽捕获的液体飞溅的防溅部。

10. 发明申请

US20090237638A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090237638A1
公开(公告)日：2009-09-24
申请号：US12409401
申请日：2009-03-23
申请人： Tomofumi Nishikawara , Keiji Emoto , Tatsuya Hayashi , Keiji Yamashita
发明人： Tomofumi Nishikawara , Keiji Emoto , Tatsuya Hayashi , Keiji Yamashita
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , G03F7/70341
摘要： An exposure apparatus for exposing a substrate through liquid includes a stage for holding and moving the substrate. The stage includes a holding section for holding the substrate and a supporting section disposed around the holding section. The supporting section includes a recovery port including a gap between the substrate held by the holding section and the supporting section, the recovery port for recovering the liquid, a space for storing the liquid recovered through the recovery port, a liquid recovery mechanism for draining the liquid that has collected in a lower part of the space, and a sloshing reduction member disposed in the space, the sloshing reduction member for reducing sloshing of the liquid.
摘要翻译：用于通过液体曝光衬底的曝光装置包括用于保持和移动衬底的台。该平台包括用于保持基板的保持部和设置在保持部周围的支撑部。支撑部包括回收口，该回收口包括由保持部保持的基板与支撑部之间的间隙，用于回收液体的回收口，用于储存通过回收口回收的液体的空间;液体回收机构，已经收集在该空间的下部的液体，以及设置在该空间中的晃动减少构件，该减震构件用于减少液体的晃动。

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