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1. 发明申请

US20110222288A1 LIGHTING DEVICE 审中-公开
标题翻译：照明设备
公开(公告)号：US20110222288A1
公开(公告)日：2011-09-15
申请号：US13129902
申请日：2009-11-12
申请人： Michel C. J. M. Vissenberg , Maarten M. J. W. Van Herpen , Marcellinus P. C. M. Krijn , Oscar H. Willemsen , Ramon P. Van Gorkom , Tim Dekker
发明人： Michel C. J. M. Vissenberg , Maarten M. J. W. Van Herpen , Marcellinus P. C. M. Krijn , Oscar H. Willemsen , Ramon P. Van Gorkom , Tim Dekker
IPC分类号： F21V33/00 , H01L33/00 , F21V29/00
CPC分类号： F21V14/003 , F21V11/18 , F21V14/08 , F21V23/0442 , F21V23/0457 , F21Y2115/10
摘要： There is disclosed a lighting device of which the light sources and/or optical elements are hidden in a first cover state associated with a first light state. This enables an unobtrusive lighting system in the first cover state. In a second cover state associated with a second light state, optical elements, e.g. shutters or beam shaping elements, are switched, induced by the heat or the light flux generated by the light sources, such that the lighting system can function properly.
摘要翻译：公开了一种照明装置，其中光源和/或光学元件被隐藏在与第一光状态相关联的第一盖状态中。这使得在第一盖状态下的不引人注意的照明系统成为可能。在与第二光状态相关联的第二覆盖状态下，光学元件例如。百叶窗或光束成形元件由光源产生的热量或光通量进行切换，使得照明系统能够正常工作。

2. 发明申请

US20110280018A1 BEAM DIRECTION CONTROLLING DEVICE AND LIGHT-OUTPUT DEVICE 审中-公开
公开(公告)号：US20110280018A1
公开(公告)日：2011-11-17
申请号：US13122595
申请日：2009-10-02
申请人： Michel C. J. M. Vissenberg , Fetze Pijlman , Marcellinus P. C. M. Krijn , Siebe T. De Zwart , Willem L. Ijzerman
发明人： Michel C. J. M. Vissenberg , Fetze Pijlman , Marcellinus P. C. M. Krijn , Siebe T. De Zwart , Willem L. Ijzerman
IPC分类号： F21V14/04 , F21V14/00
CPC分类号： G02B3/0062 , F21S8/04 , F21V5/002 , F21V5/004 , F21V5/005 , F21V5/007 , F21V5/008 , F21V5/045 , F21V14/04 , F21V14/06 , G02B3/005 , G02B3/0056 , G02B5/045 , G02B19/0009 , G02B19/0014 , G02B19/0033 , G02B26/0883 , G02B26/108
摘要： A beam direction controlling device (22; 30; 45; 60; 80), for controlling a direction of a light-beam emitted by a light-source (21) and passing through the beam direction controlling device (22; 30; 45; 60; 80). The beam direction controlling device comprises a first optical element (23, 31; 46; 61) having first (32) and second (33) opposing faces and being configured to change a direction of a plurality of parallel light-rays (40) incident on the beam direction controlling device (22; 30; 45; 60; 80) in an incident direction (ri) at the first face (32) of the first optical element (23, 31; 46; 61) to a primary direction (rp), different from the incident direction (ri), at the second face (33) of the first optical element (23, 31; 46; 61); and a second optical element (24, 32; 47; 62) having first (36) and second (37) opposing faces, the second optical element (24, 32; 47; 62) being arranged with the first face (36) of the second optical element (24, 32; 47; 62) facing the second face (33) of the first optical element (23, 31; 46; 61), the second optical element (24, 32; 47; 62) being configured to change a direction of the plurality of light-rays from the primary direction (rp) at the first face (36) of the second optical element (24, 32; 47; 62) to a secondary direction (rs) at the second face (37) of the second optical element (24, 32; 47; 62) depending on points (41) of incidence of the light-rays on the first face (36) of the second optical element (24, 32; 47; 62). The beam direction controlling device is configured to allow relative movement between the first and second optical element for controlling the points of incidence of the light rays on the first face of the second optical element, thereby enabling control of the direction of the light-beam.

3. 发明申请

US20110194306A1 LIGHT EMITTING DEVICE 审中-公开
标题翻译：发光装置
公开(公告)号：US20110194306A1
公开(公告)日：2011-08-11
申请号：US13125979
申请日：2009-10-26
申请人： Marcellinus P. C. M. Krijn , Gabriel-Eugen Onac
发明人： Marcellinus P. C. M. Krijn , Gabriel-Eugen Onac
IPC分类号： F21V7/22
CPC分类号： G02B6/102 , G02B6/0031 , G02B6/004 , G02B6/0055
摘要： The invention relates to a light-emitting device (1) comprising: a light source (2) for emitting light of a first wavelength range; a light guide (3) having a light receiving surface (4) for receiving at least part of said light emitted by the light source (2), a front surface (31) and a rear surface (32), for guiding light of said first wavelength range by total internal reflection at said front surface and said rear surface; a plurality of outcoupling elements (5) for outcoupling light from the light guide such that at least part of the light that is outcoupled by the outcoupling elements exits the light guide through said rear surface; a reflective member (6) arranged in rear of said light guide to reflect light that is outcoupled from the light guide; and a wavelength converting member (8) comprising a wavelength converting material arranged outside the light guide to convert light of said first wavelength range to light of a second wavelength range. Advantageously, in the light-emitting device according to the invention, the color, color temperature and/or color rendering index may be tuned by modifying the wavelength converting member. As a result, white light which is perceived as warm may be obtained.
摘要翻译：本发明涉及一种发光装置（1），包括：用于发射第一波长范围的光的光源（2）; 具有用于接收由光源（2）发射的所述光的至少一部分的光接收表面（4）的光导（3），前表面（31）和后表面（32），用于引导所述光源在所述前表面和所述后表面处的全内反射的第一波长范围; 多个外耦合元件（5），用于将来自所述光导的光耦合出来，使得所述外耦合元件外耦合的至少一部分光通过所述后表面离开所述光导; 布置在所述光导的后部的反射构件（6），以反射从所述导光体输出的光; 以及波长转换构件（8），其包括布置在光导外部的波长转换材料，以将所述第一波长范围的光转换成第二波长范围的光。有利地，在根据本发明的发光装置中，可以通过修改波长转换构件来调整颜色，色温和/或显色指数。结果，可以获得感觉为温暖的白光。

4. 发明授权

US06365903B2 Method of forming a quadrupole device for projection lithography by means of charged particles 失效
标题翻译：通过带电粒子形成用于投影光刻的四极装置的方法
公开(公告)号：US06365903B2
公开(公告)日：2002-04-02
申请号：US09824620
申请日：2001-04-02
申请人： Marcellinus P. C. M. Krijn
发明人： Marcellinus P. C. M. Krijn
IPC分类号： H01J37153
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3175 , H01J2237/04928 , H01J2237/31788
摘要： According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the production of integrated circuits by means of projection lithography is determined by the amount of current in the imaging electron beam; this current is limited by the resolution-limiting interaction of the electrons (Coulomb interaction). The invention allows for a larger beam current in that areas with a high current concentration are avoided. To this end, the imaging system includes five mutually perpendicular quadrupoles, so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over. The system is telescopic and the imaging is stigmatic with equal magnifications in the x-z plane and the y-z plane.
摘要翻译：根据已知的投影光刻方法，通过旋转对称电子透镜的伸缩系统将物体成像在成像表面上。通过投影光刻生产集成电路期间的吞吐量由成像电子束中的电流量决定; 该电流受限于电子的分辨率限制相互作用（库仑相互作用）。在避免具有高电流浓度的区域中，本发明允许较大的束流。为此，成像系统包括五个相互垂直的四极，使得电子集中在线状焦点而不是（小）圆形交叉。该系统是可伸缩的，成像在x-z平面和y-z平面上具有相同的放大倍数。

5. 发明授权

US06236052B1 Quadrupole device for projection lithography by means of charged particles 失效
标题翻译：用于通过带电粒子进行投影光刻的四极杆装置
公开(公告)号：US06236052B1
公开(公告)日：2001-05-22
申请号：US09392686
申请日：1999-09-09
申请人： Marcellinus P. C. M. Krijn
发明人： Marcellinus P. C. M. Krijn
IPC分类号： H01J37153
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3175 , H01J2237/04928 , H01J2237/31788
摘要： According to a known projection lithography method an object is imaged on an imaging surface by means of a telescopic system of rotationally symmetrical electron lenses. The throughput during the production of integrated circuits by means of projection lithography is determined by the amount of current in the imaging electron beam; this current is limited by the resolution-limiting interaction of the electrons (Coulomb interaction). The invention allows for a larger beam current in that areas with a high current concentration are avoided. To this end, the imaging system includes five mutually perpendicular quadrupoles, so that the electrons are concentrated in line-shaped focal spots instead of a (small) circular cross-over (18). The system is telescopic and the imaging is stigmatic with equal magnifications in the x-z plane and the y-z plane.
摘要翻译：根据已知的投影光刻方法，通过旋转对称电子透镜的伸缩系统将物体成像在成像表面上。通过投影光刻生产集成电路期间的吞吐量由成像电子束中的电流量决定; 该电流受限于电子的分辨率限制相互作用（库仑相互作用）。在避免具有高电流浓度的区域中，本发明允许较大的束流。为此，成像系统包括五个相互垂直的四极，使得电子集中在线状焦点而不是（小）圆形交叉（18）。该系统是可伸缩的，成像在x-z平面和y-z平面上具有相同的放大倍数。

6. 发明授权

US07798648B2 Optical path length adjuster 有权
标题翻译：光路长度调节器
公开(公告)号：US07798648B2
公开(公告)日：2010-09-21
申请号：US10596882
申请日：2005-01-06
申请人： Willem L. Ijzerman , Marcellinus P. C. M. Krijn , Bart A. Salters
发明人： Willem L. Ijzerman , Marcellinus P. C. M. Krijn , Bart A. Salters
IPC分类号： G03B21/00
CPC分类号： G02B27/283 , G02B27/2278 , H04N13/395
摘要： An optical path length adjuster enables electro-optical control of a physical path length between two optical elements, suitable for use in the adjustment of an optical path length within three dimensional display devices that generate a virtual image within a defined imaging volume. The adjuster varies an optical path length between an input optical path and an output optical path and includes: a first polarization switch for selecting a polarization state for an input beam on the input optical path; first and second beam splitters having at least two possible optical paths of different lengths therebetween, for passing the input beam along a selected one of said at least two possible optical paths according to the selected polarization state of the input beam and for providing an output beam of light, on said optical output path, that has traveled along the selected optical path.
摘要翻译：光路长度调节器能够对两个光学元件之间的物理路径长度进行电光控制，适用于在限定的成像体积内产生虚像的三维显示装置内的光程长度的调整中使用。调节器改变输入光路和输出光路之间的光程长度，包括：第一偏振开关，用于选择输入光路上的输入光束的偏振状态; 第一和第二分束器具有至少两个不同长度的可能的光路，用于根据所选择的输入光束的偏振态使所述输入光束沿所选择的所述至少两个可能的光路中的所选择的光路传播，并且用于提供输出光束在所述光学输出路径上沿着所选择的光路行进的光。

7. 发明授权

US07619604B2 Switchable 2D/3D display 有权
标题翻译：可切换的2D / 3D显示
公开(公告)号：US07619604B2
公开(公告)日：2009-11-17
申请号：US10566548
申请日：2004-07-22
申请人： Gerardus P. Karman , Marcellinus P. C. M. Krijn , Volker Schoellmann
发明人： Gerardus P. Karman , Marcellinus P. C. M. Krijn , Volker Schoellmann
IPC分类号： G09G3/36
CPC分类号： H04N13/359 , H04N13/31
摘要： A display device comprises a backlight (6) and a light modulating layer (5) such as an LCD device. The backlight (6) can be controlled to operate as a single homogenous light source for producing 2D images or a series of narrow parallel light sources for producing 3D images. Preferably, the backlight (6) is an OLED device and the 2D/3D mode switching is achieved by selectively energising all or a subset of parallel control electrodes (11) of the OLED device.
摘要翻译：显示装置包括背光（6）和诸如LCD装置的光调制层（5）。可以控制背光（6）作为单个同质光源，以产生2D图像或一系列用于产生3D图像的窄平行光源。优选地，背光（6）是OLED器件，并且通过选择性地激励OLED器件的并行控制电极（11）的全部或一个子集来实现2D / 3D模式切换。

8. 发明授权

US5986269A Correction device for correcting chromatic aberration in particle-optical apparatus 失效
标题翻译：用于校正颗粒光学装置中的色差的校正装置
公开(公告)号：US5986269A
公开(公告)日：1999-11-16
申请号：US932981
申请日：1997-09-18
申请人： Marcellinus P. C. M. Krijn , Alexander Henstra , Karel D. van der Mast
发明人： Marcellinus P. C. M. Krijn , Alexander Henstra , Karel D. van der Mast
IPC分类号： H01J37/153 , H01J37/10 , H01J37/145
CPC分类号： H01J37/153 , H01J2237/1534
摘要： Particle-optical rotationally symmetrical lenses inevitably have chromatic aberration. This lens fault determines the limit of the resolution of known particle-optical apparatus at a comparatively low acceleration voltage (0.5 kV to 5 kV) of the particle beam. This lens fault cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution of the particle-optical apparatus nevertheless, it has already been proposed to mitigate said lens fault by means of a Wien type corrector. Such a known configuration is provided with a number of electrical and magnetic multipoles. In order to achieve easier adjustment of the various multipole fields, the pole faces (30-i) governing the multipole fields according to the invention have a specific length L=(2.pi..sup.2 n.sup.2)/(K.sub.obj.sup.2 C.sub.c,obj), in which K.sub.obj is the strength of the focusing lens to be corrected and C.sub.c,obj is the coefficient of chromatic aberration of this lens.
摘要翻译：颗粒光学旋转对称透镜不可避免地具有色差。这种镜片故障在粒子束的相对低的加速电压（0.5kV至5kV）下确定了已知的粒子光学装置的分辨率的极限。这种透镜故障不能通过旋转对称场的补偿来消除。然而，为了提高粒子光学装置的分辨率，已经提出通过维恩型校正器来减轻所述透镜故障。这种已知的配置设置有多个电和磁多极。为了实现各种多极场的更容易的调整，根据本发明的控制多极场的极面（30-i）具有特定长度L =（2πnn2）/（Kobj2Cc，obj），其中Kobj是要校正的聚焦透镜的强度和Cc，obj是该透镜的色差系数。

9. 发明授权

US07876397B2 Backlight for 3D display 有权
标题翻译：背光用于3D显示
公开(公告)号：US07876397B2
公开(公告)日：2011-01-25
申请号：US10573084
申请日：2004-09-23
申请人： Marcellinus P. C. M. Krijn , Willem L. Ijzerman , Siebe T. De Zwart , Hugo J. Cornelissen
发明人： Marcellinus P. C. M. Krijn , Willem L. Ijzerman , Siebe T. De Zwart , Hugo J. Cornelissen
IPC分类号： G02F1/1335
CPC分类号： G02B6/0038 , G02B6/0056
摘要： A backlight (5) for a 3D display device, the backlight (5) comprising a planar light guide (7) through which light is guided transversely by internal reflection. The light guide (7) is provided with a plurality of grooves (8), which are configured to direct light propagating within the light guide (7), out of a face (7f) of the light guide (7) so as to form a plurality of line light sources.
摘要翻译：一种用于3D显示装置的背光（5），所述背光源（5）包括平面光导（7），光线通过所述平面光导（7）通过内部反射横向引导。导光体（7）设置有多个凹槽（8），其构造成将在导光体（7）内传播的光引导出光导（7）的面（7f），从而形成多条线光源。

10. 发明授权

US06689626B2 Flexible substrate 有权
标题翻译：柔性基材
公开(公告)号：US06689626B2
公开(公告)日：2004-02-10
申请号：US09902221
申请日：2001-07-10
申请人： Marcellinus P. C. M. Krijn , Marinus J. J. Dona , Johannes M. M. Swinkels , Jeroen J. M. Vleggaar
发明人： Marcellinus P. C. M. Krijn , Marinus J. J. Dona , Johannes M. M. Swinkels , Jeroen J. M. Vleggaar
IPC分类号： H01L2100
CPC分类号： H01L51/52 , B32B17/10018 , B32B17/10055 , C03C17/32 , G02F1/133305 , G02F2001/133374
摘要： The invention relates to a substrate comprising a glass sheet (1) having a thickness which is smaller than or equal to 0.1 mm, the glass sheet (1) being provided with a layer of a synthetic resin material (2) having a thickness which is smaller than or equal to that of the glass sheet (1). This substrate proves to be flexible. In addition, the substrate cracks less easily, so that it can be processed more readily. The substrate may be used, for example, in light-emitting devices, such as a poly-LED or PALC.
摘要翻译：本发明涉及一种包括厚度小于或等于0.1mm的玻璃板（1）的基板，所述玻璃板（1）设置有合成树脂材料层（2），所述合成树脂材料层的厚度为小于或等于玻璃板（1）的厚度。这种底物被证明是灵活的。此外，基板不容易裂纹，从而可以更容易地加工。衬底可以用于例如诸如多LED或PALC的发光器件中。

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