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1. 发明授权

US09190245B2 Charged particle beam writing apparatus, and charged particle beam writing method 有权
标题翻译：带电粒子束写入装置和带电粒子束写入方法
公开(公告)号：US09190245B2
公开(公告)日：2015-11-17
申请号：US14607559
申请日：2015-01-28
申请人： NuFlare Technology, Inc.
发明人： Tomoo Motosugi , Takayuki Ohnishi , Kaoru Tsuruta , Kenji Ohtoshi
IPC分类号： H01J37/16 , G21K5/04 , H01J37/317 , H01J37/302 , H01J37/21 , H01J37/20 , H01J37/10
CPC分类号： H01J37/3174 , H01J37/10 , H01J37/20 , H01J37/21 , H01J37/3026 , H01J2237/006 , H01J2237/0492 , H01J2237/063 , H01J2237/103 , H01J2237/2007
摘要： A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.
摘要翻译：带电粒子束写入装置包括发射带电粒子束的发射单元，其上安装待写入的目标物体的载物台，将带电粒子束聚焦在目标物体的表面上的物镜，该阶段是在室内的压力被控制为低于大气压力的状态下测量室内的预定气体的分压的测量单元，以及调节单元，用于调整聚焦位置以聚焦带电基于预定气体的分压，靶物体上的粒子束。

2. 发明申请

US20160020063A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：充电颗粒光束写字装置和充电颗粒光束写字方法
公开(公告)号：US20160020063A1
公开(公告)日：2016-01-21
申请号：US14798797
申请日：2015-07-14
申请人： NuFlare Technology, Inc.
发明人： Taku Yamada , Kaoru Tsuruta , Yasuyuki Taneda , Kenji Ohtoshi
IPC分类号： H01J37/147 , H01J37/04 , H01J37/141
CPC分类号： H01J37/1472 , H01J37/045 , H01J37/141 , H01J37/3174 , H01J2237/022 , H01J2237/121 , H01J2237/14 , H01J2237/1516 , H01J2237/152 , H01J2237/31776
摘要： A charged particle beam writing apparatus includes a stage configured to mount a sample placed thereon; an electron optical column including a charged particle gun and deflector, wherein the charged particle gun is configured to emit a charged particle beam, and the deflector includes a plurality of deflecting electrodes configured to control a path of the charged particle beam; an ozone introducing mechanism configured to introduce ozone into the electron optical column; a first voltage supply unit configured to apply a deflection voltage to the plurality of deflecting electrodes to deflect the charged particle beam; and a second voltage supply unit configured to apply an identical negative DC voltage to the plurality of deflecting electrodes, wherein a negative voltage in which the deflection voltage and the negative DC voltage are added is applied to the plurality of deflecting electrodes while the sample is irradiated by the charged particle beam.
摘要翻译：一种带电粒子束写入装置，包括：被配置为安装其上放置的样品的台; 包括带电粒子枪和偏转器的电子光学柱，其中所述带电粒子枪被配置为发射带电粒子束，并且所述偏转器包括被配置为控制所述带电粒子束的路径的多个偏转电极; 臭氧引入机构，被配置为将臭氧引入到电子光学柱中; 第一电压供给单元，被配置为向所述多个偏转电极施加偏转电压以使所述带电粒子束偏转; 以及第二电压供给单元，被配置为向所述多个偏转电极施加相同的负DC电压，其中，在所述多个偏转电极被照射时，将所述偏转电压和所述负的DC电压相加的负电压施加到所述多个偏转电极通过带电粒子束。

3. 发明授权

US11352694B2 Drawing apparatus and control method thereof 有权
公开(公告)号：US11352694B2
公开(公告)日：2022-06-07
申请号：US16167910
申请日：2018-10-23
申请人： NUFLARE TECHNOLOGY, INC.
发明人： Satoshi Nakahashi , Kaoru Tsuruta
IPC分类号： H01J37/32 , C23C16/44 , H01J37/317 , H01J37/20 , H01J37/21 , H01J37/02
摘要： A drawing apparatus includes: a drawing part; a cleaning-gas generator; a first valve between the cleaning-gas generator and the drawing part and adjusting a supply amount of gas to the drawing part; a first pressure gauge measuring a pressure in the drawing part; a compensation-gas introducing part introducing compensation-gas to be supplied between the cleaning-gas generator and the first valve; a second valve between the compensation-gas introducing part and the first valve and adjusting a supply amount of the compensation-gas; and a valve controller controlling the first and second valves, wherein the valve controller controls the first valve to supply the cleaning-gas at a predetermined flow rate to the drawing part and controls the second valve to cause a pressure in the drawing part to be a predetermined pressure when the first pressure gauge detects a pressure reduction due to a reduction in a supply flow rate of the cleaning-gas.

4. 发明授权

US09472372B2 Charged particle beam writing apparatus and charged particle beam writing method 有权
标题翻译：带电粒子束写入装置和带电粒子束写入方法
公开(公告)号：US09472372B2
公开(公告)日：2016-10-18
申请号：US14798797
申请日：2015-07-14
申请人： NuFlare Technology, Inc.
发明人： Taku Yamada , Kaoru Tsuruta , Yasuyuki Taneda , Kenji Ohtoshi
IPC分类号： G21K5/04 , H01J37/147 , H01J37/141 , H01J37/04
CPC分类号： H01J37/1472 , H01J37/045 , H01J37/141 , H01J37/3174 , H01J2237/022 , H01J2237/121 , H01J2237/14 , H01J2237/1516 , H01J2237/152 , H01J2237/31776
摘要： A charged particle beam writing apparatus includes a stage configured to mount a sample placed thereon; an electron optical column including a charged particle gun and deflector, wherein the charged particle gun is configured to emit a charged particle beam, and the deflector includes a plurality of deflecting electrodes configured to control a path of the charged particle beam; an ozone introducing mechanism configured to introduce ozone into the electron optical column; a first voltage supply unit configured to apply a deflection voltage to the plurality of deflecting electrodes to deflect the charged particle beam; and a second voltage supply unit configured to apply an identical negative DC voltage to the plurality of deflecting electrodes, wherein a negative voltage in which the deflection voltage and the negative DC voltage are added is applied to the plurality of deflecting electrodes while the sample is irradiated by the charged particle beam.
摘要翻译：一种带电粒子束写入装置，包括：被配置为安装其上放置的样品的台; 包括带电粒子枪和偏转器的电子光学柱，其中所述带电粒子枪被配置为发射带电粒子束，并且所述偏转器包括被配置为控制所述带电粒子束的路径的多个偏转电极; 臭氧引入机构，被配置为将臭氧引入到电子光学柱中; 第一电压供给单元，被配置为向所述多个偏转电极施加偏转电压以使所述带电粒子束偏转; 以及第二电压供给单元，被配置为向所述多个偏转电极施加相同的负DC电压，其中，在所述多个偏转电极被照射时，将所述偏转电压和所述负的DC电压相加的负电压施加到所述多个偏转电极通过带电粒子束。

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