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1. 发明申请

US20170281980A1 ADAPTIVE PENCIL BEAM SCANNING 审中-公开
公开(公告)号：US20170281980A1
公开(公告)日：2017-10-05
申请号：US15087292
申请日：2016-03-31
申请人： Varian Medical Systems Particle Therapy GmbH
发明人： Joerg WULFF
IPC分类号： A61N5/10 , H01J37/08 , H01J37/14
CPC分类号： A61N5/1077 , A61N5/1043 , A61N2005/1087 , A61N2005/1095 , G21K1/093 , H01J37/08 , H01J37/14 , H01J2237/14
摘要： Embodiments of the present invention disclose methods and systems for producing an adaptive pencil beam having an adjustable lateral beam size and Bragg-peak width. According to one disclosed embodiment, an apparatus for producing an adaptive pencil beam is disclosed. The apparatus includes a set of momentum band expanders configured to widen a momentum spread of a pencil beam, where a momentum band expander is selected from the set of momentum band expanders to receive the pencil beam, and a slit at dispersive focus of two dipole magnets to adjust a width of a Bragg-peak of the pencil beam. According to another disclosed embodiment, a method for producing an adaptive pencil beam with an adjustable lateral beam is disclosed. The method includes selecting a scatter foil, or setting of a defocusing/focusing magnet, and adjusting a lateral size of the pencil beam.

2. 发明授权

US09583306B2 Swing objective lens 有权
标题翻译：摆动物镜
公开(公告)号：US09583306B2
公开(公告)日：2017-02-28
申请号：US14964274
申请日：2015-12-09
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： G21K5/04 , H01J37/10 , H01J37/147 , H01J37/28 , H01J37/145 , H01J37/21
CPC分类号： H01J37/1478 , H01J37/145 , H01J37/21 , H01J37/28 , H01J2237/063 , H01J2237/1035 , H01J2237/12 , H01J2237/14 , H01J2237/1508 , H01J2237/1534 , H01J2237/1536 , H01J2237/2801 , H01J2237/2811
摘要： A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.
摘要翻译：具有摆动物镜（SOL）的扫描电子显微镜（SEM）减小了偏差以提高图像分辨率，并且扩展了电子束扫描角度。扫描电子显微镜包括带电粒子源，加速电极和包括预偏转单元，摆动偏转单元和物镜的摆动物镜系统，它们都相对于光轴旋转对称。摆动偏转单元的上部内表面与SEM的外侧倾斜角度θ，其下部内表面平行于光轴。提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。优选地，两个聚焦场彼此重叠至少80％。

3. 发明申请

US20160379797A1 Charged Particle Beam Apparatus 审中-公开
标题翻译：带电粒子束装置
公开(公告)号：US20160379797A1
公开(公告)日：2016-12-29
申请号：US14902436
申请日：2014-06-25
申请人： HITACHI HIGH-TECNOLOGIES CORPORATION
发明人： Tsunenori NOMAGUCHI , Toshihide AGEMURA , Zulihuma YASENJIANG
IPC分类号： H01J37/244 , H01J37/141 , H01J37/285 , H01J37/22
CPC分类号： H01J37/244 , H01J37/141 , H01J37/145 , H01J37/1471 , H01J37/22 , H01J37/226 , H01J37/285 , H01J2237/12 , H01J2237/14
摘要： Disclosed is a charged particle beam apparatus wherein charged particles emitted from a sample are efficiently acquired at a position as close as possible to the sample, said position being in the objective lens. This charged particle beam apparatus is provided with: a charged particle beam receiving surface that is provided with a scintillator that emits light by means of charged particles; a photodetector that detects light emitted from the scintillator; a mirror that guides, to the photodetector, the light emitted from the scintillator; and an objective lens for focusing the charged particle beam to a sample. A distance (Lsm) between the charged particle beam receiving surface and the mirror is longer than a distance (Lpm) between the photodetector and the mirror, and the charged particle beam receiving surface, the mirror, and the photodetector are stored in the objective lens.
摘要翻译：公开了一种带电粒子束装置，其中从样品发射的带电粒子在尽可能靠近样品的位置被有效地获取，所述位置在物镜中。该带电粒子束装置具有：带电粒子束接收面，其具有通过带电粒子发光的闪烁器; 检测从闪烁体发出的光的光检测器; 向所述光电检测器引导从所述闪烁体发射的光的反射镜; 以及用于将带电粒子束聚焦到样品的物镜。带电粒子束接收表面和反射镜之间的距离（Lsm）长于光电检测器和反射镜之间的距离（Lpm），并且带电粒子束接收表面，反射镜和光电检测器被存储在物镜。

4. 发明申请

US20160172150A1 Swing Objective Lens 有权
标题翻译：摆动物镜
公开(公告)号：US20160172150A1
公开(公告)日：2016-06-16
申请号：US14964274
申请日：2015-12-09
申请人： Hermes Microvision Inc.
发明人： Shuai Li
IPC分类号： H01J37/147 , H01J37/145 , H01J37/21 , H01J37/28
CPC分类号： H01J37/1478 , H01J37/145 , H01J37/21 , H01J37/28 , H01J2237/063 , H01J2237/1035 , H01J2237/12 , H01J2237/14 , H01J2237/1508 , H01J2237/1534 , H01J2237/1536 , H01J2237/2801 , H01J2237/2811
摘要： A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.
摘要翻译：具有摆动物镜（SOL）的扫描电子显微镜（SEM）减小了偏差以提高图像分辨率，并且扩展了电子束扫描角度。扫描电子显微镜包括带电粒子源，加速电极和包括预偏转单元，摆动偏转单元和物镜的摆动物镜系统，它们都相对于光轴旋转对称。摆动偏转单元的上内表面倾斜一角度; 到SEM的外侧，并且其下内表面平行于光轴。提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。优选地，两个聚焦场彼此重叠至少80％。

5. 发明申请

US20160111251A1 PARTICLE-OPTICAL SYSTEMS AND ARRANGEMENTS AND PARTICLE-OPTICAL COMPONENTS FOR SUCH SYSTEMS AND ARRANGEMENTS 有权
标题翻译：颗粒光学系统和安排以及这种系统和安排的颗粒光学部件
公开(公告)号：US20160111251A1
公开(公告)日：2016-04-21
申请号：US14975314
申请日：2015-12-18
申请人： CARL ZEISS MICROSCOPY GMBH , APPLIED MATERIALS ISRAEL LTD.
发明人： Rainer KNIPPELMEYER , Oliver KIENZLE , Thomas KEMEN , Heiko MUELLER , Stephan UHLEMANN , Maximilian HAIDER , Antonio CASARES , Steven ROGERS
IPC分类号： H01J37/30 , H01J37/317 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

6. 发明授权

US09293297B2 Correlative optical and charged particle microscope 有权
标题翻译：相关光学和带电粒子显微镜
公开(公告)号：US09293297B2
公开(公告)日：2016-03-22
申请号：US14606850
申请日：2015-01-27
申请人： FEI Company
发明人： Bart Buijsse
IPC分类号： H01J37/26 , H01J37/22 , H01J37/20
CPC分类号： H01J37/226 , H01J37/20 , H01J37/228 , H01J37/26 , H01J37/261 , H01J2237/14 , H01J2237/20207 , H01J2237/20214 , H01J2237/223 , H01J2237/2602
摘要： A Correlative Light and Electron Microscope (CLEM) is equipped with a TEM column and a light microscope fitted between the pole shoes of the objective lens of the TEM. To enlarge the acceptance solid angle for enhanced sensitivity a truncated lens is used. It is noted that this does not imply that the lens shows astigmatism (it is not a cylindrical lens).Using the light microscope, a first image is made with the sample in a first direction. This image will show in one direction a higher (diffraction limited) resolution than in the direction perpendicular thereto, due to the different NA of the lens in the two directions. By rotating the sample and making a second image, a combined image can be formed showing a better resolution than either of the images in the direction where they show a low NA.
摘要翻译：相关的光电子显微镜（CLEM）配有TEM柱和光学显微镜，装在TEM的物镜的极靴之间。为了增加灵敏度的接受立体角，使用截头透镜。应注意，这并不意味着透镜显示散光（它不是柱面透镜）。使用光学显微镜，在第一方向上用样品制作第一图像。由于透镜在两个方向上的NA不同，该图像将在一个方向上显示比垂直于其方向更高（衍射受限）的分辨率。通过旋转样品并制作第二图像，可以形成组合图像，其显示出比它们显示低NA的方向中的任一个图像更好的分辨率。

7. 发明授权

US09224576B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US09224576B2
公开(公告)日：2015-12-29
申请号：US14165573
申请日：2014-01-27
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares , Steven Rogers
IPC分类号： G21K5/10 , H01J37/08 , H01J37/30 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/28 , H01J37/317 , H01J37/14 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

8. 发明申请

US20150279609A1 Method for Removing Foreign Substances in Charged Particle Beam Device, and Charged Particle Beam Device 有权
标题翻译：带电粒子束装置和带电粒子束装置中除去异物的方法
公开(公告)号：US20150279609A1
公开(公告)日：2015-10-01
申请号：US14433886
申请日：2013-10-17
申请人： Hitachi High-Technologies Corporation
发明人： Kazuma Tanii , Yuji Kasai , Masakazu Takahashi , Hajime Kawano
IPC分类号： H01J37/141 , H01J37/21
CPC分类号： H01J37/141 , H01J37/21 , H01J37/28 , H01J2237/022 , H01J2237/028 , H01J2237/14 , H01J2237/2817
摘要： Foreign substances present in a sample chamber are attached to or drawn close to an objective lens and an electrode disposed close to the objective lens by applying a higher magnetic field than when normally used to the objective lens and applying a higher electric field than when normally used to the electrode disposed close to the objective lens. A stage is moved such that the center of an optical axis is located directly above a dedicated stand capable of applying voltage, the magnetic field of the objective lens is turned off, and then the potential difference between the electrode disposed close to the objective lens and an electrode disposed close to the sage is periodically maximized and minimized to thereby forcibly drop the foreign substances onto the dedicated stand capable of applying voltage.
摘要翻译：存在于样品室中的异物通过施加比通常用于物镜时更高的磁场并且施加比通常使用的电场高的电场而附接到或靠近物镜和靠近物镜设置的电极到靠近物镜设置的电极。移动台，使得光轴的中心位于能够施加电压的专用支架的正上方，物镜的磁场被关闭，然后将靠近物镜的电极之间的电位差和靠近圣人设置的电极被周期性地最大化并最小化，从而强制将异物掉入能够施加电压的专用支架上。

9. 发明申请

US20150228450A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20150228450A1
公开(公告)日：2015-08-13
申请号：US14617259
申请日：2015-02-09
申请人： HITACHI HIGH-TECH SCIENCE CORPORATION
发明人： Atsushi UEMOTO , Tatsuya ASAHATA , Hidekazu SUZUKI , Yo YAMAMOTO
IPC分类号： H01J37/20 , H01J37/28 , H01J37/22 , H01J37/18
CPC分类号： H01J37/20 , H01J37/023 , H01J37/18 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/063 , H01J2237/14 , H01J2237/182 , H01J2237/206 , H01J2237/208 , H01J2237/2448 , H01J2237/2806 , H01J2237/2813 , H01J2237/31749
摘要： A charged particle beam apparatus includes: a charged particle beam column; a detector configured to detect secondary charged particles; an image processor; a display device; a needle arranged in an irradiation area of charged particle beam; a needle actuator; a user interface; and a controller configured to control the needle actuator to actuate the needle in accordance with a target position that is set by the user interface. The controller controls the needle actuator to move the needle to track a change of the target position that is set by the user interface.
摘要翻译：带电粒子束装置包括：带电粒子束柱; 检测器，被配置为检测次级带电粒子; 图像处理器显示装置; 布置在带电粒子束的照射区域中的针; 针式致动器; 用户界面; 以及控制器，其被配置为根据由用户界面设置的目标位置来控制针致动器致动针。控制器控制针致动器移动针以跟踪由用户界面设置的目标位置的变化。

10. 发明授权

US08436326B2 Ion beam apparatus and method employing magnetic scanning 失效
标题翻译：离子束装置和采用磁扫描的方法
公开(公告)号：US08436326B2
公开(公告)日：2013-05-07
申请号：US12948298
申请日：2010-11-17
申请人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
发明人： Hilton F. Glavish , Thomas N. Horsky , Dale C. Jacobson , Sami K. Hahto , Masao Naito , Nobuo Nagai , Nariaki Hamamoto
IPC分类号： H01J37/317 , H01J37/28 , H01L21/265
CPC分类号： H01J37/3171 , H01J37/05 , H01J37/09 , H01J2237/0044 , H01J2237/0455 , H01J2237/047 , H01J2237/0492 , H01J2237/057 , H01J2237/14 , H01J2237/30477 , H01J2237/31703 , H01L21/26513
摘要： A multipurpose ion implanter beam line configuration comprising a mass analyzer magnet followed by a magnetic scanner and magnetic collimator combination that introduce bends to the beam path, the beam line constructed for enabling implantation of common monatomic dopant ion species cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept an ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight, the magnetic scanner and magnetic collimator being constructed to successively bend the ion beam in the same sense, which is in the opposite sense to that of the bend introduced by the analyzer magnet of the beam line.
摘要翻译：一种多用途离子注入机束线配置，包括质量分析器磁体，随后是磁扫描器和磁准直器组合，其将弯曲引入到光束路径，所述束线被构造用于使得能够注入常见的单原子掺杂离子种类簇离子，所述束线配置具有质量分析器磁体限定磁体的铁磁极之间的相当宽度的磁极间隙和质量选择孔，分析器磁体的尺寸设计成接受来自至少约80mm高度的槽形离子源提取孔的离子束，并且在至少约7mm的宽度，并且在对应于梁的宽度的平面中的质量选择孔处产生分散体，质量选择孔能够被设定为质量选择宽度，该质量选择宽度的尺寸被选择为选择聚集离子的束相同的掺杂物种类但递增不同的分子量，质量选择孔径也能够基本上被设定较窄的质量选择宽度和具有质量选择孔径的分辨率的分析器磁体足以能够选择基本上单个原子或分子量的单原子掺杂离子束，磁扫描器和磁准直器被构造为连续弯曲离子在相同意义上的光束，其与由光束线的分析器磁体引入的弯曲的方向相反。

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