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1. 发明公开

US20240274396A1 METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELECTRON BEAM, AND MULTIPOLE DEVICE 审中-公开
公开(公告)号：US20240274396A1
公开(公告)日：2024-08-15
申请号：US18110284
申请日：2023-02-15
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： John Breuer , Dominik Patrick Ehberger , Kathrin Mohler , Ivo Liska
IPC分类号： H01J37/147 , H01J37/09 , H01J37/153 , H01J37/28
CPC分类号： H01J37/1472 , H01J37/09 , H01J37/153 , H01J37/28 , H01J2237/022 , H01J2237/1516 , H01J2237/1534 , H01J2237/24514
摘要： A method of forming a multipole device (100) for influencing an electron beam (11) is provided. The method is carried out in an electron beam apparatus (200) that comprises an aperture body (110) having at least one aperture opening (112). The method comprises directing the electron beam (11) onto two or more surface portions of the aperture body (110) on two or more sides of the at least one aperture opening (112) to generate an electron beam-induced deposition pattern (120) configured to act as a multipole in a charged state, particularly configured to act as a quadrupole, a hexapole and/or an octupole. The electron beam-induced deposition pattern (120) can be an electron beam-induced carbon or carbonaceous pattern. Further provided are methods of influencing an electron beam in an electron beam apparatus, particularly with a multipole device as described herein. Further provided is a multipole device for influencing an electron beam in an electron beam apparatus in a predetermined manner.

2. 发明授权

US11887807B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US11887807B2
公开(公告)日：2024-01-30
申请号：US18158444
申请日：2023-01-23
申请人： ASML Netherlands B.V.
发明人： Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/06 , H01J37/10 , H01J37/28
CPC分类号： H01J37/1474 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/1478 , H01J37/28 , H01J2237/024 , H01J2237/0453 , H01J2237/0492 , H01J2237/103 , H01J2237/1205 , H01J2237/1516 , H01J2237/1534 , H01J2237/1536
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

3. 发明公开

US20230170177A1 ELECTRODE STRUCTURE FOR GUIDING A CHARGED PARTICLE BEAM 审中-公开
公开(公告)号：US20230170177A1
公开(公告)日：2023-06-01
申请号：US17922093
申请日：2021-04-27
申请人： FRIEDRICH-ALEXANDER-UNIVERSITÄT ERLANGEN-NÜRNBERG
发明人： Robert ZIMMERMANN , Michael SEIDLING , Peter HOMMELHOFF
IPC分类号： H01J37/147 , H01J37/05
CPC分类号： H01J37/1472 , H01J37/05 , H01J2237/1516 , H01J2237/26 , H01J2237/057
摘要： An electrode structure for guiding and, for example, for splitting a beam of charged particles, for example an electron beam, along a longitudinal path has multipole electrode arrangements that are spaced apart from one another along the longitudinal path and that have DC voltage electrodes. The electrode arrangements are configured to generate static multipole fields centered around the path in transverse planes oriented perpendicular to the longitudinal path, wherein the field strengths of the static multipole fields in the transverse planes each have a local minimum at the location of the path and increase as the distance from the location of the path increases. Field directions of the static multipole fields vary periodically with a period length along the path so that the particles propagating along the path are subjected to an inhomogeneous alternating electric field due to their intrinsic movement and experience a transverse return force towards the longitudinal path on average over time.

4. 发明授权

US10879031B2 Apparatus of plural charged-particle beams 有权
公开(公告)号：US10879031B2
公开(公告)日：2020-12-29
申请号：US16551655
申请日：2019-08-26
申请人： ASML Netherlands B.V.
发明人： Weiming Ren , Xuedong Liu , Xuerang Hu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/28 , H01J37/06 , H01J37/10
CPC分类号： H01J37/1474 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/1478 , H01J37/28 , H01J2237/024 , H01J2237/0453 , H01J2237/0492 , H01J2237/103 , H01J2237/1205 , H01J2237/1516 , H01J2237/1534 , H01J2237/1536
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

5. 发明授权

US09754759B2 Electrostatic multipole device, electrostatic multipole arrangement, and method of manufacturing an electrostatic multipole device 有权
公开(公告)号：US09754759B2
公开(公告)日：2017-09-05
申请号：US14947241
申请日：2015-11-20
申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
发明人： Benjamin John Cook , Dieter Winkler
IPC分类号： H01J37/12 , H01J37/147
CPC分类号： H01J37/147 , H01J37/153 , H01J37/28 , H01J2237/1205 , H01J2237/1516 , H01J2237/1532 , H01J2237/1534
摘要： An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.

6. 发明申请

US20170125206A1 Apparatus of Plural Charged-Particle Beams 有权
公开(公告)号：US20170125206A1
公开(公告)日：2017-05-04
申请号：US15403749
申请日：2017-01-11
申请人： Hermes Microvision Inc.
发明人： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC分类号： H01J37/147 , H01J37/28
CPC分类号： H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
摘要： A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.

7. 发明授权

US09171694B2 Asymmetric electrostatic quadrupole deflector for improved field uniformity 有权
标题翻译：非对称静电四极偏转器，用于改善场均匀性
公开(公告)号：US09171694B2
公开(公告)日：2015-10-27
申请号：US14532805
申请日：2014-11-04
申请人： KLA-Tencor Corporation
发明人： Christopher Sears
IPC分类号： H01J37/147 , H01J37/141 , H01J37/12 , H01J37/153 , H01J37/10
CPC分类号： H01J37/1472 , H01J37/10 , H01J37/1471 , H01J37/153 , H01J2237/10 , H01J2237/1508 , H01J2237/1516 , H01J2237/2448 , H01J2237/2449 , H01J2237/2602 , H01J2237/28
摘要： An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.
摘要翻译：用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。在目标衬底处检测到的二次电子被聚焦成二次电子束。具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

8. 发明授权

US08723134B2 Electrostatic corrector 有权
标题翻译：静电校正器
公开(公告)号：US08723134B2
公开(公告)日：2014-05-13
申请号：US12914252
申请日：2010-10-28
申请人： Roland Janzen
发明人： Roland Janzen
IPC分类号： H01J37/153
CPC分类号： H01J37/153 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J37/26 , H01J37/3177 , H01J2237/1205 , H01J2237/121 , H01J2237/1516 , H01J2237/1532
摘要： A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.
摘要翻译：描述了用于减少，校正或反转（即调整）带电粒子束的球面像差的带电粒子束装置的校正装置。校正原理与普通多极校正器相似。但是与这种常见的装置不同，这种新的校正装置完全与具有特殊形状的孔的平面孔相交，以便提供校正所需的多极，因此被预定为用于小型化和在多列装置中的使用。

9. 发明申请

US20110268252A1 X-RAY APPARATUS, METHOD OF USING THE SAME AND X-RAY IRRADIATION METHOD 有权
标题翻译： X射线装置，其使用方法和X射线辐照方法
公开(公告)号：US20110268252A1
公开(公告)日：2011-11-03
申请号：US13142787
申请日：2010-06-30
申请人： Tetsuya Ozawa , Ryuji Matsuo , Licai Jiang , Boris Verman , Kazuhiko Omote
发明人： Tetsuya Ozawa , Ryuji Matsuo , Licai Jiang , Boris Verman , Kazuhiko Omote
IPC分类号： G01T1/36
CPC分类号： G21K1/06 , B82Y10/00 , G01J3/12 , G21K1/062 , G21K2201/064 , H01J2237/1205 , H01J2237/1516
摘要： An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided.An X-ray apparatus 100 includes a spectrometer 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100, it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.
摘要翻译：一种X射线装置，其产生具有窄能带宽的虚拟光源，并能进行高分辨率X射线衍射测量; 使用该方法的方法; 并提供X射线照射方法。 X射线装置100包括分光器105，其分散发散的X射线束;以及选择部107，其安装在聚光X射线束的聚光位置，用于选择具有波长的X射线束在一个特定的范围内，允许它通过，并创建一个虚拟源。利用这种布置，可以在焦点110处创建具有窄能带宽的虚拟源，并且借助于虚拟源，可以获得高分辨率X射线衍射测量。通过使用X射线装置100，能够从Kα2射线充分地分离具有例如Kα1射线的极窄能量带宽的X射线束。此外，还可以切出部分连续X射线束以创建虚拟源。

10. 发明授权

US07462838B2 Electrostatic deflection control circuit and method of electronic beam measuring apparatus 有权
标题翻译：电子偏转控制电路及电子束测量装置的方法
公开(公告)号：US07462838B2
公开(公告)日：2008-12-09
申请号：US11521465
申请日：2006-09-15
申请人： Hiroshi Sasaki
发明人： Hiroshi Sasaki
IPC分类号： H01J3/26
CPC分类号： H01J37/24 , H01J2237/1516 , H01J2237/2814
摘要： An electrostatic deflection circuit and method of an electronic beam measuring apparatus which can achieve the high precision of the electronic beam measuring and contribute to the simplification of the structure of the apparatus is provided. In an analog arithmetic circuit included in an analog operation part constituting an electrostatic deflection circuit, output voltages of multipliers are added and output by an adder. When the magnification is low, as the side of an ordinarily closed contact is closed driven by a relay driving circuit, the output of the adder is amplified by a high gain amplifier with a high amplification factor and applied to an electrostatic deflecting board. When the magnification is high, the side of an ordinarily open contact is closed and it is amplified by a low gain amplifier with a low amplification factor and applied to the electrostatic deflecting board in the same way.
摘要翻译：提供一种电子束测量装置的静电偏转电路和方法，其可以实现电子束测量的高精度并且有助于简化装置的结构。在包含在构成静电偏转电路的模拟操作部分中的模拟运算电路中，乘法器的输出电压由加法器相加并输出。当放大率低时，由于通常由闭合触点的一侧由继电器驱动电路驱动闭合，加法器的输出由具有高放大系数的高增益放大器放大并施加到静电偏转板。当放大率高时，常开触点的一侧闭合，并由具有低放大系数的低增益放大器放大，并以相同的方式施加到静电偏转板。

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