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1. 发明申请

US20180269031A1 Scanning Transmission Electron Microscope 审中-公开
公开(公告)号：US20180269031A1
公开(公告)日：2018-09-20
申请号：US15926623
申请日：2018-03-20
申请人： TESCAN Brno s.r.o. , TESCAN TEMPE, LLC.
发明人： Petras Stanislav , Lencova Bohumila , Benner Gerd Ludwig , Jon Karl Weiss
IPC分类号： H01J37/26 , H01J37/20 , H01J37/244 , G01N23/20058
CPC分类号： H01J37/268 , G01N23/20058 , H01J37/20 , H01J37/244 , H01J37/28 , H01J37/2955 , H01J2237/1505 , H01J2237/1506 , H01J2237/1507 , H01J2237/1508 , H01J2237/2802
摘要： A scanning transmission electron microscope is adapted to acquire high quality precession electron diffraction (PED) patterns by means of separated scanning deflectors and precession deflectors. Magnetic or electrostatic deflectors may be used for scanning and for precession. This enables independent optimization of parameters for each deflection system to achieve a broad operating range simultaneously for both deflection systems.

2. 发明授权

US09685300B2 Method for processing and/or for observing an object, and particle beam device for carrying out the method 有权
公开(公告)号：US09685300B2
公开(公告)日：2017-06-20
申请号：US14976090
申请日：2015-12-21
申请人： Carl Zeiss Microscopy GmbH
发明人： Josef Biberger , Ralph Pulwey , Katja Tsyrulin , Roland Salzer
IPC分类号： H01J37/26 , H01J37/147 , H01J37/28 , H01J37/302 , H01J37/304 , H01J37/305
CPC分类号： H01J37/1474 , H01J37/28 , H01J37/302 , H01J37/304 , H01J37/3056 , H01J2237/1505 , H01J2237/1508 , H01J2237/2801 , H01J2237/30488 , H01J2237/317 , H01J2237/31745 , H01J2237/31749
摘要： A method is provided for processing and/or observing an object using at least one particle beam that is scanned over the object. A scan region on the object is determined, the scan region having scan lines, and the particle beam is moved in a first scanning direction along one of the scan lines. The first scanning direction is changed to a second scanning direction at a change-of-direction time. Changing from the first scanning direction to the second scanning direction comprises setting of a point of rotation in that scan line of the scan region in which the particle beam is situated at the change-of-direction time, with an axis of rotation extending through the point of rotation. The first scanning direction is changed into the second scanning direction by rotating the scan region about the axis of rotation, with the point of rotation being selected dependent on the direction of rotation.

3. 发明授权

US08884254B2 Charged particle beam writing apparatus 有权
标题翻译：带电粒子束写入装置
公开(公告)号：US08884254B2
公开(公告)日：2014-11-11
申请号：US14108936
申请日：2013-12-17
申请人： NuFlare Technology, Inc.
发明人： Takanao Touya , Munehiro Ogasawara
IPC分类号： H01J37/28 , H01J37/305 , H01J37/317 , H01J37/302
CPC分类号： H01J37/3177 , H01J37/141 , H01J37/145 , H01J37/1474 , H01J37/3026 , H01J37/3174 , H01J2237/1508
摘要： A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings, a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite, and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of a plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.
摘要翻译：一种多带电粒子束写入装置，包括：在其上安装目标物体的台，发射带电粒子束的发射单元，其中形成有多个开口的孔径构件，以形成多波束，整个多个开口被照射带电粒子束并使带电粒子束的部分分别穿过多个开口的对应开口，多个电磁透镜，其磁场相反的方向，以及三个或更多的静电透镜，其中至少一个布置在多个电磁透镜的每个磁场中，并且其中一个或多个也用作用于将多光束共同偏转到目标物体上的偏转器。

4. 发明申请

US20140014836A1 CHARGED PARTICLE BEAM APPARATUS 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20140014836A1
公开(公告)日：2014-01-16
申请号：US13939767
申请日：2013-07-11
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Miki ISAWA , Minoru YAMAZAKI , Yuzuru MIZUHARA , Hiroshi MAKINO , Hideyuki KAZUMI
IPC分类号： G01N23/225
CPC分类号： G01N23/2258 , G01B2210/56 , H01J37/244 , H01J37/28 , H01J2237/1508 , H01J2237/2448 , H01J2237/281 , H01J2237/2816
摘要： The charged particle beam apparatus having an opening formation member formed with an opening for passage of a charged particle beam emitted from a charged particle source, and either a detector adapted to detect charged particles having passed through the passage opening or a detector adapted to detect charged particles resulting from bombardment on another member of the charged particles having passed through the opening, comprises an aligner for aligning charged particles discharged from the sample and a control unit for controlling the aligner, wherein the control unit controls the aligner to cause it to shift trajectories of the charged particles discharged from the sample so that length measurement may be executed on the basis of detection signals before and after the alignment by the aligner.
摘要翻译：带电粒子束装置具有开口形成构件，该开口形成构件形成有用于通过从带电粒子源发射的带电粒子束的开口，以及适于检测通过通道开口的带电粒子的检测器或适于检测带电粒子的检测器通过对通过开口的带电粒子的另一个部件进行轰击而产生的粒子包括用于对准从样品排出的带电粒子的对准器和用于控制对准器的控制单元，其中控制单元控制对准器使其移动轨迹从样品排出的带电粒子可以根据校准器对准前后的检测信号进行长度测量。

5. 发明授权

US08592761B2 Monochromator for charged particle beam apparatus 有权
标题翻译：带电粒子束装置的单色器
公开(公告)号：US08592761B2
公开(公告)日：2013-11-26
申请号：US13551947
申请日：2012-07-18
申请人： Weiming Ren , Zhongwei Chen
发明人： Weiming Ren , Zhongwei Chen
IPC分类号： G21K1/08 , H01J37/26 , H01J37/20
CPC分类号： H01J37/05 , H01J37/21 , H01J37/28 , H01J2237/057 , H01J2237/1508 , H01J2237/1532
摘要： The monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. The present invention also provides two ways to build a monochromator into a SEM, in which one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.
摘要翻译：用于减少带电粒子装置中的初级带电粒子束的能量扩散的单色仪包括光束调节元件，两个维恩滤波器型色散单元和能量限制孔径。在单色仪中，形成了沿着直线光轴的偏转色散和基本轨迹中的双比例对称性，其不仅从根本上避免了实际上不能被补偿的偏轴像差，而且确保出射光束具有虚拟交叉，是单色的，是无色的，不分散的。本发明还提供了将单色仪构建到SEM中的两种方法，其中一种是在电子源和电容器之间定位单色器，另一种是在光束极限孔径和物镜之间定位单色仪。前者提供额外的能量角取决于滤波，并获得较小的有效能量扩展。

6. 发明授权

US08153969B2 Inspection method and inspection system using charged particle beam 有权
标题翻译：使用带电粒子束的检查方法和检查系统
公开(公告)号：US08153969B2
公开(公告)日：2012-04-10
申请号：US12323167
申请日：2008-11-25
申请人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
发明人： Atsuko Fukada , Mitsugu Sato , Naomasa Suzuki , Hidetoshi Nishiyama , Muneyuki Fukuda , Noritsugu Takahashi
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/147 , H01J37/244 , H01J37/28 , H01J2237/1501 , H01J2237/1508 , H01J2237/2449 , H01J2237/24507
摘要： In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
摘要翻译：在具有高分辨能力的电浸透镜中，加速从样本产生的二次电子，以抑制由物镜施加到其上的二次电子的旋转作用对二次电子的能级的依赖性，并且当选择性地检测低角度和高角度时通过设置在电子源和物镜之间的环形检测器从二次电子产生位置观察的仰角和方位的分量，二次电子通过E×B偏转器被调节和偏转，使得中心轴线在加速度下精细收敛的二次电子与低仰角信号检测系统的中心轴一致，二次电子偏离高仰角信号检测系统的孔径。

7. 发明授权

US07394066B2 Electron microscope and electron beam inspection system 有权
标题翻译：电子显微镜和电子束检查系统
公开(公告)号：US07394066B2
公开(公告)日：2008-07-01
申请号：US11180671
申请日：2005-07-14
申请人： Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
发明人： Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
IPC分类号： G21K7/00
CPC分类号： H01J37/29 , H01J37/147 , H01J2237/1508 , H01J2237/2538 , H01J2237/28
摘要： An electron microscope includes an illuminating lens system that illuminates an electron beam that is emitted from an electron source onto a specimen as a planar illuminating electron beam having a two-dimensional spread, an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to project and form a specimen image, a beam separator that separates the illuminating electron beam from the reflecting electron beam, and a controller. The controller controls the reflecting electron beam so as to go straight through the beam separator, and the illuminating electron beam so as to keep a deflection angle of the illuminating electron beam which is made by the beam separator substantially constant.
摘要翻译：电子显微镜包括照明透镜系统，其将从电子源发射的电子束照射到样本上作为具有二维扩展的平面照明电子束;成像透镜系统，其投影并放大从投影并形成标本图像的样本，将照射电子束与反射电子束分离的光束分离器和控制器。控制器控制反射电子束以直线通过光束分离器，并且照明电子束以保持由光束分离器制成的照明电子束的偏转角大致恒定。

8. 发明申请

US20060016989A1 Electron beam apparatus and a device manufacturing method using the same apparatus 有权
标题翻译：电子束装置和使用该装置的装置制造方法
公开(公告)号：US20060016989A1
公开(公告)日：2006-01-26
申请号：US11175390
申请日：2005-07-07
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Hirosi Sobukawa , Toru Kaga , Masahiro Hatakayama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Takeshi Murakami , Hirosi Sobukawa , Toru Kaga , Masahiro Hatakayama
IPC分类号： G01N23/00
CPC分类号： G01N23/2251 , H01J37/244 , H01J37/28 , H01J2237/14 , H01J2237/1508 , H01J2237/1526 , H01J2237/2447 , H01J2237/24592
摘要： Disclosed is an electron beam apparatus, in which a plurality of electron beams is formed from electrons emitted from an electron gun 21 and used to irradiate a sample surface via an objective lens 28, said apparatus comprising: a beam separator 27 for separating a secondary electron beams emanating from respective scanned regions on the sample from the primary electron beams; a magnifying electron lens 31 for extending a beam space between adjacent beams in the separated plurality of secondary electron beams; a fiber optical plate 32 for converting the magnified plurality of secondary electron beams to optical signals by a scintillator and for transmitting the signals; a photoelectric conversion device 35 for converting the optical signal to an electric signal; an optical zoom lens 33 for focusing the optical signal from the scintillator into an image on the photoelectric conversion device; and a rotation mechanism 36 for rotating the photoelectric conversion device 35 around the optical axis.
摘要翻译：公开了一种电子束装置，其中从电子枪21发射的电子形成多个电子束，并用于经由物镜28照射样品表面，所述装置包括：用于分离二次电子的光束分离器27 来自一次电子束的样品上的各扫描区域发出的光束; 用于在分离的多个二次电子束中的相邻光束之间延伸光束空间的放大电子透镜31; 用于通过闪烁体将放大的多个二次电子束转换为光信号并用于发送信号的光纤光学板32; 用于将光信号转换为电信号的光电转换装置35; 用于将来自闪烁体的光信号聚焦到光电转换装置上的图像的光学变焦透镜33; 以及用于使光电转换装置35围绕光轴旋转的旋转机构36。

9. 发明申请

US20050082498A1 Method and fine-control collimator for accurate collimation and precise parallel alignment of scanned ion beams 失效
标题翻译：方法和精准控制准直器，用于准确的准直和扫描离子束的精确平行排列
公开(公告)号：US20050082498A1
公开(公告)日：2005-04-21
申请号：US10807772
申请日：2004-03-24
申请人： Nicholas White
发明人： Nicholas White
IPC分类号： H01J37/147 , H01J37/304 , H01J37/317
CPC分类号： H01J37/3171 , H01J37/1472 , H01J37/1474 , H01J37/3045 , H01J2237/1501 , H01J2237/1504 , H01J2237/1508 , H01J2237/152
摘要： In a system for implanting workpieces with an accurately parallel scanned ion beam, a fine-control collimator construct is used to reduce the deviation of the scanned ion beam from a specified axis of parallelism and thereby improve its collimation. The shape of the fine-control collimator matches the ribbon shape of the beam and correction of parallelism in two orthogonal directions is possible. Measurement of the non-parallelism is accomplished by sampling the scanned beam in two planes and comparing timing information; and such measurement is calibrated to the orientation of the workpiece in the plane where ion implantation occurs. Measurement of non-uniformity in the doping profile is accomplished using the same means; and the scan waveform is adjusted to substantially remove any non-uniformity in the doping profile.
摘要翻译：在用精确平行的扫描离子束注入工件的系统中，使用精细控制准直器构造来减少扫描的离子束与特定的平行轴的偏离，从而改进其准直。精细准直器的形状与光束的色带形状匹配，并且可以在两个正交方向上校正平行度。通过在两个平面中采样扫描光束并比较定时信息来实现非平行度的测量; 并且这样的测量被校准为在离子注入发生的平面中的工件的取向。使用相同的方法测量掺杂分布中的不均匀性; 并且调整扫描波形以基本上消除掺杂分布中的任何不均匀性。

10. 发明申请

US20190074159A1 SCANNING ELECTRON MICROSCOPE 审中-公开
公开(公告)号：US20190074159A1
公开(公告)日：2019-03-07
申请号：US16115287
申请日：2018-08-28
申请人： Hitachi High-Technologies Corporation
发明人： Noritsugu Takahashi , Yasunari Sohda , Akira Ikegami , Yuta Kawamoto
IPC分类号： H01J37/28 , H01J37/244 , H01J37/141 , H01J37/147
CPC分类号： H01J37/28 , H01J37/141 , H01J37/1471 , H01J37/1475 , H01J37/1477 , H01J37/244 , H01J2237/1504 , H01J2237/1508 , H01J2237/151 , H01J2237/152 , H01J2237/2449 , H01J2237/248 , H01J2237/2817
摘要： The present invention enlarges a range of movement of field of view by beam deflection with a simple deflector configuration and suppresses deterioration of a signal electron detection rate caused by the beam deflection. A scanning electron microscope according to the present invention is provided with a first deflection field setting module that sets plural deflectors to move a scanning area on a specimen by a primary electron beam to a position deviated from an axis extended from an electron source toward the center of an objective lens and a second deflection field setting module that sets the plural deflectors so that trajectories of signal electrons are corrected without changing the scanning area set by the first deflection field setting module. The control unit controls the plural deflectors by adding a setting value set by the second deflection field setting module to a setting value set by the first deflection field setting module.

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