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    • 6. 发明申请
    • IMAGE SENSOR PIXEL FOR HIGH DYNAMIC RANGE IMAGE SENSOR
    • 高动态范围图像传感器的图像传感器像素
    • US20160181297A1
    • 2016-06-23
    • US15059196
    • 2016-03-02
    • OMNIVISION TECHNOLOGIES, INC.
    • Jeong-Ho LyuSohei Manabe
    • H01L27/146
    • H01L27/14605H01L27/14607H01L27/1461H01L27/14612H01L27/14627H01L27/14641H01L27/14643H01L27/14645
    • An image sensor pixel for use in a high dynamic range image sensor includes a first photodiode and a second photodiode. The first photodiode include a first doped region, a first lightly doped region, and a first highly doped region disposed between the first doped region and the first lightly doped region. The second photodiode disposed in has a second full well capacity substantially equal to a first full well capacity of the first photodiode. The second photodiode includes a second doped region, a second lightly doped region, and a second highly doped region disposed between the second doped region and the second lightly doped region. A first aperture sizer is disposed above the second photodiode to limit image light received by the second photodiode to a second amount that is less than a first amount of image light received by the first photodiode.
    • 用于高动态范围图像传感器的图像传感器像素包括第一光电二极管和第二光电二极管。 第一光电二极管包括第一掺杂区域,第一轻掺杂区域和设置在第一掺杂区域和第一轻掺杂区域之间的第一高掺杂区域。 设置在其中的第二光电二极管的第二全阱容量基本上等于第一光电二极管的第一全阱容量。 第二光电二极管包括第二掺杂区域,第二轻掺杂区域和设置在第二掺杂区域和第二轻掺杂区域之间的第二高掺杂区域。 第一光圈分光器设置在第二光电二极管的上方,以将由第二光电二极管接收的图像光限制为小于由第一光电二极管接收的第一数量的图像光的第二量。
    • 7. 发明申请
    • PHOTODIODE AND FILTER CONFIGURATION FOR HIGH DYNAMIC RANGE IMAGE SENSOR
    • 高动态范围图像传感器的光电和滤波器配置
    • US20150333099A1
    • 2015-11-19
    • US14280880
    • 2014-05-19
    • OMNIVISION TECHNOLOGIES, INC.
    • Jeong-Ho LyuSohei Manabe
    • H01L27/146
    • H01L27/14641H01L27/14621H01L27/14625H01L27/14627H01L27/14643H01L27/14647H04N5/37457
    • An image sensor pixel includes a first photodiode, a second photodiode, a first microlens, a second microlens, and a filter. The first and second photodiode are disposed adjacent to each other in a semiconductor material. The first photodiode has a first full well capacity that is substantially equal to a second full well capacity of the second photodiode. The first microlens is disposed over the first photodiode and the second microlens is disposed over the second photodiode. The first microlens is substantially identical to the first microlens. The filter is disposed between the second microlens and the second photodiode to reduce an intensity of the image light incident upon the second photodiode. The filter does not substantially affect the image light directed toward the first photodiode.
    • 图像传感器像素包括第一光电二极管,第二光电二极管,第一微透镜,第二微透镜和滤光器。 第一和第二光电二极管彼此相邻设置在半导体材料中。 第一光电二极管具有基本上等于第二光电二极管的第二满阱容量的第一全阱容量。 第一微透镜设置在第一光电二极管的上方,第二微透镜设置在第二光电二极管的上方。 第一微透镜基本上与第一微透镜相同。 滤光器设置在第二微透镜和第二光电二极管之间以减小入射在第二光电二极管上的图像光的强度。 滤光器基本上不影响朝向第一光电二极管的图像光。
    • 9. 发明申请
    • IMAGE SENSOR PIXEL CELL WITH SWITCHED DEEP TRENCH ISOLATION STRUCTURE
    • 具有开关深度分离隔离结构的图像传感器像素单元
    • US20150236058A1
    • 2015-08-20
    • US14704493
    • 2015-05-05
    • OMNIVISION TECHNOLOGIES, INC.
    • Sing-Chung HuRongsheng YangGang ChenHoward E. RhodesSohei ManabeDyson H. Tai
    • H01L27/146H04N5/378
    • H01L27/1463H01L27/14601H01L27/14607H01L27/14612H01L27/1464H01L27/14643H04N5/378
    • A pixel cell includes a photodiode disposed in an epitaxial layer in a first region of semiconductor material to accumulate image charge. A floating diffusion is disposed in a well region disposed in the epitaxial layer in the first region. A transfer transistor is coupled to selectively transfer the image charge from the photodiode to the floating diffusion. A deep trench isolation (DTI) structure disposed in the semiconductor material. The DTI structure isolates the first region of the semiconductor material on one side of the DTI structure from a second region of the semiconductor material on an other side of the DTI structure. The DTI structure includes a doped semiconductor material disposed inside the DTI structure that is selectively coupled to a readout pulse voltage in response to the transfer transistor selectively transferring the image charge from the photodiode to the floating diffusion.
    • 像素单元包括设置在半导体材料的第一区域中的外延层中以累积图像电荷的光电二极管。 浮置扩散部设置在设置在第一区域的外延层中的阱区域中。 耦合转移晶体管以选择性地将图像电荷从光电二极管转移到浮动扩散。 设置在半导体材料中的深沟槽隔离(DTI)结构。 DTI结构将DTI结构的一侧上的半导体材料的第一区域与DTI结构的另一侧上的半导体材料的第二区域隔离。 DTI结构包括设置在DTI结构内部的掺杂半导体材料,其被选择性地耦合到读出脉冲电压,响应于传输晶体管选择性地将图像电荷从光电二极管传输到浮动扩散。