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1. 发明授权

US09620426B2 Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation 有权
公开(公告)号：US09620426B2
公开(公告)日：2017-04-11
申请号：US13018729
申请日：2011-02-01
申请人： Pavel Izikson , John Robinson , Daniel Kandel
发明人： Pavel Izikson , John Robinson , Daniel Kandel
IPC分类号： G01N37/00 , H01L21/66
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention may include performing a first measurement on a wafer of a first lot of wafers via an omniscient sampling process, calculating a first set of process tool correctables utilizing one or more results of the measurement performed via an omniscient sampling process, randomly selecting a set of field sampling locations of the wafer of a first lot of wafers, calculating a second set of process tool correctables by applying an interpolation process to the randomly selected set of field sampling locations, wherein the interpolation process utilizes values from the first set of process tool correctables for the randomly selected set of field sampling locations in order to calculate correctables for fields of the wafer of the first lot not included in the set of randomly selected fields, and determining a sub-sampling scheme by comparing the first set of process tool correctables to the second set of correctables.

2. 发明申请

US20110202298A1 METHOD AND SYSTEM FOR PROVIDING PROCESS TOOL CORRECTABLES USING AN OPTIMIZED SAMPLING SCHEME WITH SMART INTERPOLATION 有权
标题翻译：使用优化采样方案与智能插值提供过程工具可修正性的方法和系统
公开(公告)号：US20110202298A1
公开(公告)日：2011-08-18
申请号：US13018729
申请日：2011-02-01
申请人： Pavel Izikson , John Robinson , Daniel Kandel
发明人： Pavel Izikson , John Robinson , Daniel Kandel
IPC分类号： G06F19/00
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention may include performing a first measurement on a wafer of a first lot of wafers via an omniscient sampling process, calculating a first set of process tool correctables utilizing one or more results of the measurement performed via an omniscient sampling process, randomly selecting a set of field sampling locations of the wafer of a first lot of wafers, calculating a second set of process tool correctables by applying an interpolation process to the randomly selected set of field sampling locations, wherein the interpolation process utilizes values from the first set of process tool correctables for the randomly selected set of field sampling locations in order to calculate correctables for fields of the wafer of the first lot not included in the set of randomly selected fields, and determining a sub-sampling scheme by comparing the first set of process tool correctables to the second set of correctables.
摘要翻译：本发明可以包括通过无所不在的采样过程对第一批晶片的晶片进行第一次测量，利用通过无所不在的采样过程执行的一个或多个测量结果来计算第一组处理工具校正值，随机选择第一批晶片的晶片的一组场采样位置，通过对随机选择的一组场采样位置应用内插处理来计算第二组处理工具可校正值，其中所述内插处理利用来自第一组处理的值用于随机选择的一组场采样位置的工具可校正，以便计算不包括在随机选择的场的集合中的第一批的晶片的场的可校正性，以及通过比较第一组处理工具来确定子采样方案可纠正到第二组可纠正的。

3. 发明申请

US20080286885A1 METHODS AND SYSTEMS FOR CREATING OR PERFORMING A DYNAMIC SAMPLING SCHEME FOR A PROCESS DURING WHICH MEASUREMENTS ARE PERFORMED ON WAFERS 有权
标题翻译：用于创建或执行测量过程中的过程的动态采样方案的方法和系统
公开(公告)号：US20080286885A1
公开(公告)日：2008-11-20
申请号：US12107346
申请日：2008-04-22
申请人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
发明人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
IPC分类号： G06F19/00 , H01L21/66
CPC分类号： G05B21/02 , G03F7/70508 , G03F7/70625 , G03F7/70633
摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
摘要翻译：提供了用于创建或执行在晶片上执行测量的过程的动态采样方案的各种方法和系统。用于为在晶片上进行测量的过程创建动态采样方案的一种方法包括在晶片上的所有测量点处对至少一批中的所有晶片执行测量。该方法还包括基于测量结果确定用于该过程的动态采样方案的最佳采样方案，增强采样方案，减少采样方案和阈值。阈值对应于最佳采样方案，增强采样方案和减少采样方案将用于该过程的测量值。

4. 发明授权

US07679069B2 Method and system for optimizing alignment performance in a fleet of exposure tools 有权
标题翻译：用于优化曝光工具的对准性能的方法和系统
公开(公告)号：US07679069B2
公开(公告)日：2010-03-16
申请号：US11686871
申请日：2007-03-15
申请人： Michael E. Adel , John Robinson , Pavel Izikson , Brad Eichelberger , Amir Widmann , Atsuhiko Kato
发明人： Michael E. Adel , John Robinson , Pavel Izikson , Brad Eichelberger , Amir Widmann , Atsuhiko Kato
IPC分类号： G21K1/00
CPC分类号： G03F7/70458 , G03F7/70525 , G03F7/706 , G03F9/7046
摘要： A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive distortion profiles are stored in a database. A wafer having reference pattern formed thereon is provided for further pattern fabrication and an exposure system is selected from the fleet to fabricate a next layer on the wafer. Linear and higher order parameters of the selected exposure system are adjusted using the distinctive distortion profiles to model the distortion of the reference pattern. Once the exposure system is adjusted, it is used to form a lithographic pattern on the wafer.
摘要翻译：用于优化曝光系统队列中的对准性能的方法涉及表征曝光系统中的每个曝光系统，以产生与每个曝光系统相关联的一组独特的失真曲线。一组有特色的失真简档存储在数据库中。提供具有形成在其上的参考图案的晶片用于进一步的图案制造，并且从车队中选择曝光系统以在晶片上制造下一层。使用不同的失真曲线来调整所选曝光系统的线性和高阶参数以对参考图案的失真进行建模。一旦调整曝光系统，就用于在晶片上形成平版印刷图案。

5. 发明申请

US20060280357A1 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US20060280357A1
公开(公告)日：2006-12-14
申请号：US11510147
申请日：2006-08-24
申请人： Joel Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06K9/00
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
摘要翻译：公开了用于从一个或多个半导体覆盖目标获取和分析各种独特度量或“目标诊断”的装置和方法。在一个实施例中，测量覆盖目标以获得两种特定类型的目标诊断信息，系统误差度量和/或随机噪声度量中的一种或两种。系统误差度量通常量化覆盖目标的不对称性，而随机噪声度量量化和/或限定与覆盖目标邻近或相关联的空间噪声。

6. 发明授权

US09651943B2 Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers 有权
公开(公告)号：US09651943B2
公开(公告)日：2017-05-16
申请号：US13457383
申请日：2012-04-26
申请人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
发明人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
IPC分类号： H01L21/66 , G06F19/00 , G05B21/02 , G03F7/20
CPC分类号： G05B21/02 , G03F7/70508 , G03F7/70625 , G03F7/70633
摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.

7. 发明申请

US20120208301A1 Methods and Systems for Creating or Performing a Dynamic Sampling Scheme for a Process During Which Measurements Are Performed on Wafers 有权
标题翻译：用于创建或执行在晶圆上执行测量的过程的动态采样方案的方法和系统
公开(公告)号：US20120208301A1
公开(公告)日：2012-08-16
申请号：US13457383
申请日：2012-04-26
申请人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
发明人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
IPC分类号： H01L21/66 , G06F19/00
CPC分类号： G05B21/02 , G03F7/70508 , G03F7/70625 , G03F7/70633
摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one tot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
摘要翻译：提供了用于创建或执行在晶片上执行测量的过程的动态采样方案的各种方法和系统。用于为在晶片上进行测量的过程创建动态采样方案的一种方法包括在晶片上的所有测量点处以至少一个tot对所有晶片进行测量。该方法还包括基于测量结果确定用于该过程的动态采样方案的最佳采样方案，增强采样方案，减少采样方案和阈值。阈值对应于最佳采样方案，增强采样方案和减少采样方案将用于该过程的测量值。

8. 发明授权

US08175831B2 Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers 有权
标题翻译：用于为晶片执行测量的过程创建或执行动态采样方案的方法和系统
公开(公告)号：US08175831B2
公开(公告)日：2012-05-08
申请号：US12107346
申请日：2008-04-22
申请人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
发明人： Pavel Izikson , John Robinson , Mike Adel , Amir Widmann , Dongsub Choi , Anat Marchelli
IPC分类号： G01N37/00
CPC分类号： G05B21/02 , G03F7/70508 , G03F7/70625 , G03F7/70633
摘要： Various methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers are provided. One method for creating a dynamic sampling scheme for a process during which measurements are performed on wafers includes performing the measurements on all of the wafers in at least one lot at all measurement spots on the wafers. The method also includes determining an optimal sampling scheme, an enhanced sampling scheme, a reduced sampling scheme, and thresholds for the dynamic sampling scheme for the process based on results of the measurements. The thresholds correspond to values of the measurements at which the optimal sampling scheme, the enhanced sampling scheme, and the reduced sampling scheme are to be used for the process.
摘要翻译：提供了用于创建或执行在晶片上执行测量的过程的动态采样方案的各种方法和系统。用于为在晶片上进行测量的过程创建动态采样方案的一种方法包括在晶片上的所有测量点处对至少一批中的所有晶片进行测量。该方法还包括基于测量结果确定用于该过程的动态采样方案的最佳采样方案，增强采样方案，减少采样方案和阈值。阈值对应于最佳采样方案，增强采样方案和减少采样方案将用于该过程的测量值。

9. 发明申请

US20080073589A1 METHOD AND SYSTEM FOR OPTIMIZING ALIGNMENT PERFORMANCE IN A FLEET OF EXPOSURE TOOLS 有权
标题翻译：在接触工具中优化对准性能的方法和系统
公开(公告)号：US20080073589A1
公开(公告)日：2008-03-27
申请号：US11686871
申请日：2007-03-15
申请人： Michael Adel , John Robinson , Pavel Izikson , Brad Eichelberger , Amir Widmann , Atsuhiko Kato
发明人： Michael Adel , John Robinson , Pavel Izikson , Brad Eichelberger , Amir Widmann , Atsuhiko Kato
IPC分类号： G21K5/10
CPC分类号： G03F7/70458 , G03F7/70525 , G03F7/706 , G03F9/7046
摘要： A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive distortion profiles are stored in a database. A wafer having reference pattern formed thereon is provided for further pattern fabrication and an exposure system is selected from the fleet to fabricate a next layer on the wafer. Linear and higher order parameters of the selected exposure system are adjusted using the distinctive distortion profiles to model the distortion of the reference pattern. Once the exposure system is adjusted, it is used to form a lithographic pattern on the wafer.
摘要翻译：用于优化曝光系统队列中的对准性能的方法涉及表征曝光系统中的每个曝光系统，以产生与每个曝光系统相关联的一组独特的失真曲线。一组有特色的失真简档存储在数据库中。提供具有形成在其上的参考图案的晶片用于进一步的图案制造，并且从车队中选择曝光系统以在晶片上制造下一层。使用不同的失真曲线来调整所选曝光系统的线性和高阶参数以对参考图案的失真进行建模。一旦调整曝光系统，就用于在晶片上形成平版印刷图案。

10. 发明授权

US07310789B2 Use of overlay diagnostics for enhanced automatic process control 有权
标题翻译：使用覆盖诊断功能进行增强的自动过程控制
公开(公告)号：US07310789B2
公开(公告)日：2007-12-18
申请号：US11510147
申请日：2006-08-24
申请人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
发明人： Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman , Vladimir Levinski
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70516 , G03F7/70633
摘要： Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or “target diagnostics” from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
摘要翻译：公开了用于从一个或多个半导体覆盖目标获取和分析各种独特度量或“目标诊断”的装置和方法。在一个实施例中，测量覆盖目标以获得两种特定类型的目标诊断信息，系统误差度量和/或随机噪声度量中的一种或两种。系统误差度量通常量化覆盖目标的不对称性，而随机噪声度量量化和/或限定与覆盖目标邻近或相关联的空间噪声。

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