会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明授权
    • Method of reading an NVM cell that utilizes a gated diode
    • 读取利用门控二极管的NVM单元的方法
    • US07978519B2
    • 2011-07-12
    • US12884567
    • 2010-09-17
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • G11C11/34G11C16/04G11C16/06
    • G11C16/10H01L27/11558H01L29/66825H01L29/7881
    • A method of reading an NVM cell structure formed on a deep well of N-type semiconductor material, wherein the NVM cell structure includes a PMOS transistor formed in an N-type well, the PMOS transistor including spaced-apart p-type source and drain region defining an n-type cannel region therebetween, an NMOS transistor formed in a P-type well that is adjacent to the N-type well, the NMOS transistor including spaced-apart n-type source and drain regions defining a p-type channel region therebetween, a conductive floating gate that includes a first section that extends over the n-type channel region of the PMOS transistor and is separated therefrom by intervening dielectric material and a second section that extends over the p-type channel region and is separated therefrom by intervening dielectric material, and a conductive control gate formed over at least a portion of the second section of the floating gate and is separated therefrom by intervening dielectric material, the method comprising: biasing the deep N-type well at a preselected read voltage; holding the source region of the PMOS transistor at the read voltage; holding the drain of the PMOS transistor at ground; and holding the control gate at ground for a preselected read time.
    • 一种读取在N型半导体材料的深阱中形成的NVM单元结构的方法,其中所述NVM单元结构包括形成在N型阱中的PMOS晶体管,所述PMOS晶体管包括间隔开的p型源极和漏极 区域,其间形成n型沟道区域,形成在与N型阱相邻的P型阱中的NMOS晶体管,所述NMOS晶体管包括间隔开的n型源极和漏极区,其限定p型沟道 导电浮置栅极,其包括在PMOS晶体管的n型沟道区域上延伸并且通过中间介电材料分离的第一部分和在p型沟道区域上延伸并与其分离的第二部分的第一部分 通过插入电介质材料和导电控制栅极形成在浮动栅极的第二部分的至少一部分上,并通过介电材料与其分离,该方法com 奖励:以预选的读取电压偏置深N型阱; 将PMOS晶体管的源极区域保持在读取电压; 将PMOS晶体管的漏极保持在地; 并将控制门保持在地面以进行预选的读取时间。
    • 8. 发明申请
    • METHOD OF ERASING AN NVM CELL THAT UTILIZES A GATED DIODE
    • 消除使用栅极二极管的NVM电池的方法
    • US20110007574A1
    • 2011-01-13
    • US12884519
    • 2010-09-17
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • G11C16/04
    • G11C16/10H01L27/11558H01L29/66825H01L29/7881
    • A method of erasing an NVM cell structure formed on a deep well of N-type semiconductor material, wherein the NVM cell structure includes a PMOS transistor formed in an N-type well, the PMOS transistor including spaced-apart p-type source and drain regions defining an n-type channel region therebetween, an NMOS transistor formed in a P-type well that is adjacent to the N-type well, the NMOS transistor including spaced-apart n-type source and rain regions defining a p-type channel region therebetween, a conductive floating gate that includes a first section that extends over the n-type channel region of the PMOS transistor and is separated therefrom by intervening dielectric material and a second section that extends over the p-type channel region and is separated therefrom by intervening dielectric material, and a conductive control gate formed over at least a portion of the second section of the floating gate and separated therefrom by intervening dielectric material, the erasing method comprising: biasing the deep N-type well at a selected erase voltage; holding the source and drain regions of the PMOS transistor at the erase voltage or floating; and holding the control gate at ground for a preselected erase time.
    • 一种擦除形成在N型半导体材料的深阱中的NVM单元结构的方法,其中NVM单元结构包括形成在N型阱中的PMOS晶体管,PMOS晶体管包括间隔开的p型源极和漏极 在它们之间限定n型沟道区的区域,形成在与N型阱相邻的P型阱中的NMOS晶体管,NMOS晶体管包括间隔开的n型源和限定p型沟道的雨区 导电浮置栅极,其包括在PMOS晶体管的n型沟道区域上延伸并且通过中间介电材料分离的第一部分和在p型沟道区域上延伸并与其分离的第二部分的第一部分 通过插入介电材料和导电控制栅极形成在浮动栅极的第二部分的至少一部分上,并通过介电材料与其隔开, 包括:在所选择的擦除电压下偏置所述深N型阱; 将PMOS晶体管的源极和漏极区域保持在擦除电压或浮置; 并将控制门保持在地面以进行预先选择的擦除时间。
    • 9. 发明授权
    • Method of erasing an NVM cell that utilizes a gated diode
    • 擦除使用门控二极管的NVM单元的方法
    • US07969790B2
    • 2011-06-28
    • US12884519
    • 2010-09-17
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • G11C11/34G11C16/04
    • G11C16/10H01L27/11558H01L29/66825H01L29/7881
    • A method of erasing an NVM cell structure formed on a deep well of N-type semiconductor material, wherein the NVM cell structure includes a PMOS transistor formed in an N-type well, the PMOS transistor including spaced-apart p-type source and drain regions defining an n-type channel region therebetween, an NMOS transistor formed in a P-type well that is adjacent to the N-type well, the NMOS transistor including spaced-apart n-type source and rain regions defining a p-type channel region therebetween, a conductive floating gate that includes a first section that extends over the n-type channel region of the PMOS transistor and is separated therefrom by intervening dielectric material and a second section that extends over the p-type channel region and is separated therefrom by intervening dielectric material, and a conductive control gate formed over at least a portion of the second section of the floating gate and separated therefrom by intervening dielectric material, the erasing method comprising: biasing the deep N-type well at a selected erase voltage; holding the source and drain regions of the PMOS transistor at the erase voltage or floating; and holding the control gate at ground for a preselected erase time.
    • 一种擦除形成在N型半导体材料的深阱中的NVM单元结构的方法,其中NVM单元结构包括形成在N型阱中的PMOS晶体管,PMOS晶体管包括间隔开的p型源极和漏极 在它们之间限定n型沟道区的区域,形成在与N型阱相邻的P型阱中的NMOS晶体管,NMOS晶体管包括间隔开的n型源和限定p型沟道的雨区 导电浮置栅极,其包括在PMOS晶体管的n型沟道区域上延伸并且通过中间介电材料分离的第一部分和在p型沟道区域上延伸并与其分离的第二部分的第一部分 通过插入介电材料和导电控制栅极形成在浮动栅极的第二部分的至少一部分上,并通过介电材料与其隔开, 包括:在所选择的擦除电压下偏置所述深N型阱; 将PMOS晶体管的源极和漏极区域保持在擦除电压或浮置; 并将控制门保持在地面以进行预先选择的擦除时间。
    • 10. 发明申请
    • METHOD OF READING AN NVM CELL THAT UTILIZES A GATED DIODE
    • 读取使用栅极二极管的NVM电池的方法
    • US20110007570A1
    • 2011-01-13
    • US12884567
    • 2010-09-17
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • Yuri MirgorodskiPeter J. HopperRoozbeh Parsa
    • G11C16/04
    • G11C16/10H01L27/11558H01L29/66825H01L29/7881
    • A method of reading an NVM cell structure formed on a deep well of N-type semiconductor material, wherein the NVM cell structure includes a PMOS transistor formed in an N-type well, the PMOS transistor including spaced-apart p-type source and drain region defining an n-type cannel region therebetween, an NMOS transistor formed in a P-type well that is adjacent to the N-type well, the NMOS transistor including spaced-apart n-type source and drain regions defining a p-type channel region therebetween, a conductive floating gate that includes a first section that extends over the n-type channel region of the PMOS transistor and is separated therefrom by intervening dielectric material and a second section that extends over the p-type channel region and is separated therefrom by intervening dielectric material, and a conductive control gate formed over at least a portion of the second section of the floating gate and is separated therefrom by intervening dielectric material, the method comprising: biasing the deep N-type well at a preselected read voltage; holding the source region of the PMOS transistor at the read voltage; holding the drain of the PMOS transistor at ground; and holding the control gate at ground for a preselected read time.
    • 一种读取在N型半导体材料的深阱中形成的NVM单元结构的方法,其中所述NVM单元结构包括形成在N型阱中的PMOS晶体管,所述PMOS晶体管包括间隔开的p型源极和漏极 区域,其间形成n型沟道区域,形成在与N型阱相邻的P型阱中的NMOS晶体管,所述NMOS晶体管包括间隔开的n型源极和漏极区,其限定p型沟道 导电浮置栅极,其包括在PMOS晶体管的n型沟道区域上延伸并且通过中间介电材料分离的第一部分和在p型沟道区域上延伸并与其分离的第二部分的第一部分 通过插入电介质材料和导电控制栅极形成在浮动栅极的第二部分的至少一部分上,并通过介电材料与其分离,该方法com 奖励:以预选的读取电压偏置深N型阱; 将PMOS晶体管的源极区域保持在读取电压; 将PMOS晶体管的漏极保持在地; 并将控制门保持在地面以进行预选的读取时间。